JP2013033039A - 多層内部全反射光学デバイスならびにその製作方法および使用方法 - Google Patents

多層内部全反射光学デバイスならびにその製作方法および使用方法 Download PDF

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Publication number
JP2013033039A
JP2013033039A JP2012164287A JP2012164287A JP2013033039A JP 2013033039 A JP2013033039 A JP 2013033039A JP 2012164287 A JP2012164287 A JP 2012164287A JP 2012164287 A JP2012164287 A JP 2012164287A JP 2013033039 A JP2013033039 A JP 2013033039A
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optical device
multilayer
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JP2013033039A5 (enExample
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Madeline Lee Susanne
スザンヌ・マデリン・リー
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General Electric Co
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General Electric Co
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Publication of JP2013033039A5 publication Critical patent/JP2013033039A5/ja
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Laminated Bodies (AREA)
JP2012164287A 2011-07-29 2012-07-25 多層内部全反射光学デバイスならびにその製作方法および使用方法 Pending JP2013033039A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/194,346 2011-07-29
US13/194,346 US8761346B2 (en) 2011-07-29 2011-07-29 Multilayer total internal reflection optic devices and methods of making and using the same

Publications (2)

Publication Number Publication Date
JP2013033039A true JP2013033039A (ja) 2013-02-14
JP2013033039A5 JP2013033039A5 (enExample) 2015-09-03

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JP2012164287A Pending JP2013033039A (ja) 2011-07-29 2012-07-25 多層内部全反射光学デバイスならびにその製作方法および使用方法

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US (1) US8761346B2 (enExample)
JP (1) JP2013033039A (enExample)
CN (1) CN102903412B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017058150A (ja) * 2015-09-14 2017-03-23 浜松ホトニクス株式会社 Ｘ線光学素子及びｘ線光学装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130182827A1 (en) * 2011-12-02 2013-07-18 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
DE102018209368B4 (de) 2018-06-12 2020-01-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optik für Sende- und/oder Empfangs-Element, Kommunikationsmodul, Arrays aus Kommunikationsmodulen, System aus mehreren Kommunikationsmodulen und Verfahren zur Herstellung einer Optik

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JP2008288299A (ja) * 2007-05-16 2008-11-27 Nikon Corp 多層膜反射鏡、照明装置、露光装置、及びデバイス製造方法
JP2009121904A (ja) * 2007-11-14 2009-06-04 Nippon Telegr & Teleph Corp <Ntt> Ｘ線集光レンズ
WO2009076111A2 (en) * 2007-12-07 2009-06-18 General Electric Company A multi-energy imaging system and method using optic devices
WO2010135024A2 (en) * 2009-05-20 2010-11-25 General Electric Company Optimizing total internal reflection multilayer optics through material selection

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US5192869A (en) 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
US5604353A (en) 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
EP1397813B1 (fr) 2001-06-01 2008-06-04 Xenocs Composant optique hybride pour applications rayons x, et procede associe
ES2271277T3 (es) 2001-06-19 2007-04-16 X-Ray Optical Systems, Inc. Sistema xrf dispersivo de longitud de onda que usa optica de enfoque para la excitacion y un monocromador de enfoque para la recogida.
WO2003012797A1 (en) 2001-07-27 2003-02-13 X-Ray Optical Systems, Inc. Methods and devices for aligning and determining the focusing characteristics of x-ray optics
JP2005530170A (ja) 2002-06-19 2005-10-06 グズノク 光学アセンブリ及びその製造方法
CN100449690C (zh) * 2003-10-15 2009-01-07 株式会社尼康 多层膜反射镜、多层膜反射镜的制造方法及曝光系统
US7120228B2 (en) 2004-09-21 2006-10-10 Jordan Valley Applied Radiation Ltd. Combined X-ray reflectometer and diffractometer
US7336416B2 (en) * 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
US7412131B2 (en) 2007-01-02 2008-08-12 General Electric Company Multilayer optic device and system and method for making same
US7366374B1 (en) 2007-05-22 2008-04-29 General Electric Company Multilayer optic device and an imaging system and method using same
US20090041198A1 (en) 2007-08-07 2009-02-12 General Electric Company Highly collimated and temporally variable x-ray beams
US7508911B1 (en) 2007-09-19 2009-03-24 General Electric Company X-ray imaging system and methods of using and forming an array of optic devices therein
TW200921780A (en) * 2007-11-15 2009-05-16 Ind Tech Res Inst Method for forming a corrugation multilayer
DE102008042212A1 (de) * 2008-09-19 2010-04-01 Carl Zeiss Smt Ag Reflektives optisches Element und Verfahren zu seiner Herstellung
DE102009017095A1 (de) * 2009-04-15 2010-10-28 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
US8311184B2 (en) * 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
US8744048B2 (en) * 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080062397A1 (en) * 2006-09-08 2008-03-13 Dong-Seok Nam Photolithography Apparatus Having Mirror for Correcting Aberrations in Optical Illumination System and Mirror Having Aberration Correcting Part
JP2008270808A (ja) * 2007-04-23 2008-11-06 Nikon Corp 多層膜反射鏡、露光装置、デバイス製造方法、多層膜反射鏡の製造方法
JP2008288299A (ja) * 2007-05-16 2008-11-27 Nikon Corp 多層膜反射鏡、照明装置、露光装置、及びデバイス製造方法
JP2009121904A (ja) * 2007-11-14 2009-06-04 Nippon Telegr & Teleph Corp <Ntt> Ｘ線集光レンズ
WO2009076111A2 (en) * 2007-12-07 2009-06-18 General Electric Company A multi-energy imaging system and method using optic devices
WO2010135024A2 (en) * 2009-05-20 2010-11-25 General Electric Company Optimizing total internal reflection multilayer optics through material selection

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017058150A (ja) * 2015-09-14 2017-03-23 浜松ホトニクス株式会社 Ｘ線光学素子及びｘ線光学装置

Also Published As

Publication number Publication date
CN102903412B (zh) 2017-06-27
CN102903412A (zh) 2013-01-30
US20130028387A1 (en) 2013-01-31
US8761346B2 (en) 2014-06-24

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