CN102903412B - 多层全内反射光学装置及其制造和使用方法 - Google Patents

多层全内反射光学装置及其制造和使用方法 Download PDF

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Publication number
CN102903412B
CN102903412B CN201210262390.0A CN201210262390A CN102903412B CN 102903412 B CN102903412 B CN 102903412B CN 201210262390 A CN201210262390 A CN 201210262390A CN 102903412 B CN102903412 B CN 102903412B
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refractive index
material layer
multilayer
index material
optical devices
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CN102903412A (zh
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S.M.李
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GE Precision Healthcare LLC
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General Electric Co
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Laminated Bodies (AREA)
CN201210262390.0A 2011-07-29 2012-07-27 多层全内反射光学装置及其制造和使用方法 Active CN102903412B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/194346 2011-07-29
US13/194,346 US8761346B2 (en) 2011-07-29 2011-07-29 Multilayer total internal reflection optic devices and methods of making and using the same

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CN102903412A CN102903412A (zh) 2013-01-30
CN102903412B true CN102903412B (zh) 2017-06-27

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US (1) US8761346B2 (enExample)
JP (1) JP2013033039A (enExample)
CN (1) CN102903412B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130182827A1 (en) * 2011-12-02 2013-07-18 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
JP6598612B2 (ja) * 2015-09-14 2019-10-30 浜松ホトニクス株式会社 Ｘ線光学素子及びｘ線光学装置
DE102018209368B4 (de) 2018-06-12 2020-01-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optik für Sende- und/oder Empfangs-Element, Kommunikationsmodul, Arrays aus Kommunikationsmodulen, System aus mehreren Kommunikationsmodulen und Verfahren zur Herstellung einer Optik

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US7366374B1 (en) * 2007-05-22 2008-04-29 General Electric Company Multilayer optic device and an imaging system and method using same
CN102159997A (zh) * 2008-09-19 2011-08-17 卡尔蔡司Smt有限责任公司 反射光学元件及其制造方法

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EP1397813B1 (fr) 2001-06-01 2008-06-04 Xenocs Composant optique hybride pour applications rayons x, et procede associe
ES2271277T3 (es) 2001-06-19 2007-04-16 X-Ray Optical Systems, Inc. Sistema xrf dispersivo de longitud de onda que usa optica de enfoque para la excitacion y un monocromador de enfoque para la recogida.
WO2003012797A1 (en) 2001-07-27 2003-02-13 X-Ray Optical Systems, Inc. Methods and devices for aligning and determining the focusing characteristics of x-ray optics
JP2005530170A (ja) 2002-06-19 2005-10-06 グズノク 光学アセンブリ及びその製造方法
US7120228B2 (en) 2004-09-21 2006-10-10 Jordan Valley Applied Radiation Ltd. Combined X-ray reflectometer and diffractometer
KR100809329B1 (ko) * 2006-09-08 2008-03-07 삼성전자주식회사 광학계의 수차를 보정하기 위한 미러를 포함하는포토리소그래피 장치 및 수차 보정부를 포함하는 미러
US7412131B2 (en) 2007-01-02 2008-08-12 General Electric Company Multilayer optic device and system and method for making same
US8194322B2 (en) * 2007-04-23 2012-06-05 Nikon Corporation Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
JP2008288299A (ja) * 2007-05-16 2008-11-27 Nikon Corp 多層膜反射鏡、照明装置、露光装置、及びデバイス製造方法
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US4958363A (en) * 1986-08-15 1990-09-18 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
CN1868033A (zh) * 2003-10-15 2006-11-22 株式会社尼康 多层膜反射镜、多层膜反射镜的制造方法及曝光系统
CN1854771A (zh) * 2005-04-27 2006-11-01 Asml荷兰有限公司 多层反射镜光谱纯滤光片、光刻设备以及装置制造方法
US7366374B1 (en) * 2007-05-22 2008-04-29 General Electric Company Multilayer optic device and an imaging system and method using same
CN102159997A (zh) * 2008-09-19 2011-08-17 卡尔蔡司Smt有限责任公司 反射光学元件及其制造方法

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CN102903412A (zh) 2013-01-30
US20130028387A1 (en) 2013-01-31
JP2013033039A (ja) 2013-02-14
US8761346B2 (en) 2014-06-24

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