JP2012529163A5 - - Google Patents
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- Publication number
- JP2012529163A5 JP2012529163A5 JP2012513486A JP2012513486A JP2012529163A5 JP 2012529163 A5 JP2012529163 A5 JP 2012529163A5 JP 2012513486 A JP2012513486 A JP 2012513486A JP 2012513486 A JP2012513486 A JP 2012513486A JP 2012529163 A5 JP2012529163 A5 JP 2012529163A5
- Authority
- JP
- Japan
- Prior art keywords
- salts
- fluoride
- amines
- polymeric
- polyallylamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000003839 salts Chemical class 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical class N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 8
- 150000001412 amines Chemical class 0.000 claims description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 5
- 229910001515 alkali metal fluoride Inorganic materials 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 229920000083 poly(allylamine) Polymers 0.000 claims description 4
- 125000005270 trialkylamine group Chemical group 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 3
- 229920002717 polyvinylpyridine Polymers 0.000 claims description 2
- MSWVMWGCNZQPIA-UHFFFAOYSA-N 1-fluoropropan-2-one Chemical compound CC(=O)CF MSWVMWGCNZQPIA-UHFFFAOYSA-N 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09007411.3 | 2009-06-04 | ||
| EP09007411 | 2009-06-04 | ||
| PCT/EP2010/002949 WO2010139390A1 (en) | 2009-06-04 | 2010-05-12 | Two component etching |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012529163A JP2012529163A (ja) | 2012-11-15 |
| JP2012529163A5 true JP2012529163A5 (https=) | 2015-08-20 |
| JP5801798B2 JP5801798B2 (ja) | 2015-10-28 |
Family
ID=42830717
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012513486A Expired - Fee Related JP5801798B2 (ja) | 2009-06-04 | 2010-05-12 | 二成分エッチング |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8647526B2 (https=) |
| EP (1) | EP2438140A1 (https=) |
| JP (1) | JP5801798B2 (https=) |
| KR (1) | KR20120036939A (https=) |
| CN (1) | CN102449112B (https=) |
| SG (1) | SG176274A1 (https=) |
| TW (1) | TWI481693B (https=) |
| WO (1) | WO2010139390A1 (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013008877A (ja) * | 2011-06-24 | 2013-01-10 | Kuraray Co Ltd | カーボンナノチューブ層とオーバーコート層とを具備する複合層のパターン形成方法、及び前記方法で形成されたパターン |
| CN102929418A (zh) * | 2011-08-09 | 2013-02-13 | 群康科技(深圳)有限公司 | 装饰膜、影像显示系统及触控感测装置的制造方法 |
| TWI495560B (zh) * | 2011-08-09 | 2015-08-11 | Chimei Innolux Corp | 透明基底上的裝飾膜、影像顯示系統及觸控感測裝置之製造方法 |
| EP2743969A4 (en) * | 2011-08-12 | 2015-04-01 | Univ Osaka | METHOD AND METHOD FOR PERFORMING SURFACE TREATMENT ON SOLID MATERIAL FOR A SOLAR CELL |
| JP6136186B2 (ja) * | 2012-10-16 | 2017-05-31 | 日立化成株式会社 | 液状組成物 |
| JP6011234B2 (ja) * | 2012-10-16 | 2016-10-19 | 日立化成株式会社 | 組成物 |
| JP6060611B2 (ja) * | 2012-10-16 | 2017-01-18 | 日立化成株式会社 | 組成物 |
| JP2014082330A (ja) * | 2012-10-16 | 2014-05-08 | Hitachi Chemical Co Ltd | ＳｉＮ膜の除去方法 |
| US9550940B2 (en) | 2012-10-16 | 2017-01-24 | Hitachi Chemical Company, Ltd. | Etching material |
| CN104854684B (zh) | 2012-11-14 | 2017-10-10 | 太阳化学公司 | 用于制造背面钝化太阳能电池的组合物和方法 |
| JP6369460B2 (ja) * | 2013-05-31 | 2018-08-08 | 日立化成株式会社 | エッチング組成物 |
| CN104993019A (zh) * | 2015-07-09 | 2015-10-21 | 苏州阿特斯阳光电力科技有限公司 | 一种局部背接触太阳能电池的制备方法 |
| TWI550886B (zh) * | 2015-07-10 | 2016-09-21 | 國立屏東科技大學 | 矽基板表面粗糙化方法 |
| JP2016086187A (ja) * | 2016-02-01 | 2016-05-19 | 日立化成株式会社 | ＳｉＮ膜の除去方法 |
| JP7603517B2 (ja) * | 2021-04-26 | 2024-12-20 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理方法、および、基板処理装置 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3979241A (en) * | 1968-12-28 | 1976-09-07 | Fujitsu Ltd. | Method of etching films of silicon nitride and silicon dioxide |
| US4781792A (en) * | 1985-05-07 | 1988-11-01 | Hogan James V | Method for permanently marking glass |
| GB9210514D0 (en) * | 1992-05-16 | 1992-07-01 | Micro Image Technology Ltd | Etching compositions |
| WO1997002958A1 (en) | 1995-07-10 | 1997-01-30 | Advanced Chemical Systems International | Organic amine/hydrogen fluoride etchant composition and method |
| US5698503A (en) | 1996-11-08 | 1997-12-16 | Ashland Inc. | Stripping and cleaning composition |
| DE19962136A1 (de) * | 1999-12-22 | 2001-06-28 | Merck Patent Gmbh | Verfahren zur Rauhätzung von Siliziumsolarzellen |
| RU2274615C2 (ru) | 2000-04-28 | 2006-04-20 | Мерк Патент Гмбх | Гравировальные пасты для неорганических поверхностей |
| JP2004503081A (ja) * | 2000-06-30 | 2004-01-29 | エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド | シリコンウェーハのエッチング方法 |
| GB2367788A (en) * | 2000-10-16 | 2002-04-17 | Seiko Epson Corp | Etching using an ink jet print head |
| DE10241300A1 (de) * | 2002-09-04 | 2004-03-18 | Merck Patent Gmbh | Ätzpasten für Siliziumoberflächen und -schichten |
| US20040188385A1 (en) * | 2003-03-26 | 2004-09-30 | Kenji Yamada | Etching agent composition for thin films having high permittivity and process for etching |
| AU2003901559A0 (en) | 2003-04-07 | 2003-05-01 | Unisearch Limited | Glass texturing method |
| WO2005036268A1 (ja) * | 2003-10-14 | 2005-04-21 | Asahi Denka Co., Ltd. | フォトレジスト組成物 |
| CN1950338B (zh) * | 2004-03-05 | 2012-05-16 | 霍尼韦尔国际公司 | 杂环胺的离子液体 |
| DE102005007743A1 (de) * | 2005-01-11 | 2006-07-20 | Merck Patent Gmbh | Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten |
| DE102005033724A1 (de) * | 2005-07-15 | 2007-01-18 | Merck Patent Gmbh | Druckfähige Ätzmedien für Siliziumdioxid-und Siliziumnitridschichten |
| GB0608463D0 (en) * | 2006-04-27 | 2006-06-07 | Sericol Ltd | A printing ink |
| EP1918985B1 (en) * | 2006-10-31 | 2010-05-26 | S.O.I.TEC. Silicon on Insulator Technologies S.A. | Methods for characterizing defects on silicon surfaces, etching composition for silicon surfaces and process of treating silicon surfaces with the etching composition |
| US7582398B2 (en) * | 2007-06-13 | 2009-09-01 | Xerox Corporation | Inkless reimageable printing paper and method |
| JP4947654B2 (ja) * | 2007-09-28 | 2012-06-06 | シャープ株式会社 | 誘電体膜のパターニング方法 |
-
2010
- 2010-05-12 KR KR1020127000228A patent/KR20120036939A/ko not_active Ceased
- 2010-05-12 WO PCT/EP2010/002949 patent/WO2010139390A1/en not_active Ceased
- 2010-05-12 SG SG2011087863A patent/SG176274A1/en unknown
- 2010-05-12 EP EP10721703A patent/EP2438140A1/en not_active Withdrawn
- 2010-05-12 JP JP2012513486A patent/JP5801798B2/ja not_active Expired - Fee Related
- 2010-05-12 CN CN201080023477.1A patent/CN102449112B/zh not_active Expired - Fee Related
- 2010-05-12 US US13/375,812 patent/US8647526B2/en not_active Expired - Fee Related
- 2010-06-01 TW TW099117602A patent/TWI481693B/zh not_active IP Right Cessation
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