JP2012524411A5 - - Google Patents

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Publication number
JP2012524411A5
JP2012524411A5 JP2012506138A JP2012506138A JP2012524411A5 JP 2012524411 A5 JP2012524411 A5 JP 2012524411A5 JP 2012506138 A JP2012506138 A JP 2012506138A JP 2012506138 A JP2012506138 A JP 2012506138A JP 2012524411 A5 JP2012524411 A5 JP 2012524411A5
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JP
Japan
Prior art keywords
chip
substrate
providing
ink
cps
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2012506138A
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English (en)
Japanese (ja)
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JP2012524411A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2010/030928 external-priority patent/WO2010120809A1/en
Publication of JP2012524411A publication Critical patent/JP2012524411A/ja
Publication of JP2012524411A5 publication Critical patent/JP2012524411A5/ja
Withdrawn legal-status Critical Current

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JP2012506138A 2009-04-14 2010-04-13 導電線、ナノ粒子、インク、およびパターン形成方法 Withdrawn JP2012524411A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16925409P 2009-04-14 2009-04-14
US61/169,254 2009-04-14
PCT/US2010/030928 WO2010120809A1 (en) 2009-04-14 2010-04-13 Conducting lines, nanoparticles, inks, and patterning

Publications (2)

Publication Number Publication Date
JP2012524411A JP2012524411A (ja) 2012-10-11
JP2012524411A5 true JP2012524411A5 (https=) 2013-05-30

Family

ID=42289105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012506138A Withdrawn JP2012524411A (ja) 2009-04-14 2010-04-13 導電線、ナノ粒子、インク、およびパターン形成方法

Country Status (7)

Country Link
US (1) US20100288543A1 (https=)
EP (1) EP2419793A1 (https=)
JP (1) JP2012524411A (https=)
KR (1) KR20120013322A (https=)
AU (1) AU2010236563A1 (https=)
CA (1) CA2754701A1 (https=)
WO (1) WO2010120809A1 (https=)

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WO2018223120A1 (en) * 2017-06-02 2018-12-06 TERA-print, LLC Fabrication of micro/nanoscale barcodes using cantilever-free scanning probe lithography
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