JP2012515836A - 熱界面材料用の低圧縮力非シリコーン高熱伝導性配合物及びパッケージ - Google Patents
熱界面材料用の低圧縮力非シリコーン高熱伝導性配合物及びパッケージ Download PDFInfo
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- H—ELECTRICITY
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
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- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3737—Organic materials with or without a thermoconductive filler
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- H01L23/18—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
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Abstract
【解決手段】 半導体デバイス用の改善された熱界面材料を提供する。より具体的には、熱界面材料用の低圧縮力の非シリコーン高熱伝導性配合物を提供する。熱界面材料は、約5.5W/mK又はそれ以上の熱伝導率、及び約100psi又はそれ以下の圧縮力を用いて約100ミクロン又はそれ以下に圧縮された接合線幅を示す非シリコーン有機物の組成物を含む。
【選択図】 図1
Description
105:熱界面材料
110:ハット/リッド
115:ヒート・シンク
120:チップ
125:基板
Claims (25)
- 5.5W/mK又はそれ以上の熱伝導率、及び、100psi又はそれ以下の圧縮力を用いて100ミクロン又はそれ以下に圧縮された接合線幅を示す(図1)、非シリコーン有機物の組成物を含む熱界面材料。
- 前記組成物は、
200W/mKを上回るバルク熱伝導率、10乃至20ミクロンの粒径、及び30乃至42%の重量百分率を有する第1の成分と、
200W/mKを上回るバルク熱伝導率、3乃至10ミクロンの粒径、及び18乃至24%の重量百分率を有する第2の成分と、
5W/mKを上回るバルク熱伝導率、1.0ミクロン未満の粒径、及び31乃至39%の重量百分率を有する第3の成分と、
非シリコーン有機物のビヒクル、分散剤、酸化防止剤、増粘剤及び顔料と
を有する、
請求項1に記載の熱界面材料。 - 前記第1及び第2の成分はアルミニウムであり、前記第3の成分は酸化アルミニウムである、請求項2に記載の熱界面材料。
- 前記組成物は不揮発性溶媒を含む、請求項2に記載の熱界面材料。
- 前記非シリコーン有機物ビヒクルは、7乃至10%の重量百分率を有する、請求項2に記載の熱界面材料。
- 前記非シリコーン有機物は、0.01W/mKを上回るバルク熱伝導率を有する、請求項2に記載の熱界面材料。
- 前記熱伝導率は5.5W/mK又はそれ以上である(図1)、請求項2に記載の熱界面材料。
- 前記圧縮された接合線幅はほぼ75ミクロンであり、前記圧縮圧力は20psi又はそれ以下である(図1)、請求項1に記載の熱界面材料。
- 10乃至20ミクロンの粒径、及び30乃至42%の重量百分率を有する第1のアルミニウム成分と、
3乃至10ミクロンの粒径、及び18乃至24%の重量百分率を有する第2のアルミニウム成分と、
1.0ミクロン未満の粒径、及び31乃至39%の重量百分率を有する酸化アルミニウム成分と、
非シリコーン有機物のビヒクル、分散剤、酸化防止剤、増粘剤及び顔料と
を含む熱界面材料。 - 前記比シリコーン有機物ビヒクルの重量百分率は7乃至10%である、請求項9に記載の熱界面材料。
- 熱伝導率は5.5W/mKを上回り、75ミクロンの厚さに達するための圧縮圧力は75psi又はそれ以下である(図1)、請求項9に記載の熱界面材料。
- 熱伝導率は約6.9W/mKであり、75ミクロンの厚さに達するための圧縮圧力は10psi又はそれ以下である(図1)、請求項9に記載の熱界面材料。
- 熱伝導率は約5.9W/mKであり、75ミクロンの厚さに達するための圧縮圧力は10psi又はそれ以下である(図1)、請求項9に記載の熱界面材料。
- 熱伝導率は約5.5W/mK又はそれ以上である(図1)、請求項9に記載の熱界面材料。
- 前記非シリコーン有機物は、ビヒクル、分散剤、酸化防止剤、増粘剤及び顔料である、請求項9に記載の熱界面材料。
- ハット/リッド(110)とヒート・シンク(115)の間に配置された熱界面材料(105)を含む構造体であって、
前記ハット/リッド(110)は、基板(125)の上に取り付けられる単一チップ又は複数のチップの上に配置され、
前記熱界面材料(105)は、非シリコーン有機物及び不揮発性溶媒の組成物を含み、5.5W/mK又はそれ以上の熱伝導率、及び100psi又はそれ以下の圧縮力を用いて200ミクロン又はそれ以下に圧縮された接合線幅を示す(図1)、
構造体。 - 前記組成物は、
200W/mKを上回るバルク熱伝導率、10乃至20ミクロンの粒径、及び30乃至42%の重量百分率を有する第1の成分と、
200W/mKを上回るバルク熱伝導率、3乃至10ミクロンの粒径、及び18乃至24%の重量百分率を有する第2の成分と、
5W/mKを上回るバルク熱伝導率、1.0ミクロン未満の粒径、及び31乃至39%の重量百分率を有する第3の成分と、
非シリコーン有機物のビヒクル、分散剤、酸化防止剤、増粘剤及び顔料と
を含む、請求項16に記載の構造体。 - 前記組成物は、
10乃至20ミクロンの粒径、及び30乃至42%の重量百分率を有する第1のアルミニウム成分と、
3乃至10ミクロンの粒径、及び18乃至24%の重量百分率を有する第2のアルミニウム成分と、
1.0ミクロン未満の粒径、及び31乃至39%の重量百分率を有する酸化アルミニウム成分と、
非シリコーン有機物のビヒクル、分散剤、酸化防止剤、増粘剤及び顔料と
を含む、請求項16に記載の構造体。 - 前記熱伝導率は6.0W/mK又はそれ以上である(図1)、請求項16に記載の構造体。
- 前記組成物は不揮発性溶媒を含む、請求項16に記載の構造体。
- 基板(125)と、
前記基板(125)の上の単一又は複数のチップ(120)と、
前記単一又は複数のチップ(120)の上に配置されたハット/リッド(110)と、
前記ハット/リッド(110)の上のヒート・シンクであって、前記ハット/リッド(110)との間の界面を形成する、前記ヒート・シンク(115)と、
前記ヒート・シンク(115)及び前記ハット/リッド(110)の表面に接触する、界面における界面材料(105)と
を含み、
前記熱界面材料(105)は、6.0W/mK又はそれ以上の熱伝導率、及び100psi又はそれ以下の圧縮力を用いて200ミクロン又はそれ以下に圧縮された接合線幅を示す、非シリコーン有機物の組成物を含む、
構造体。 - 前記組成物は、
200W/mKを上回るバルク熱伝導率、10乃至20ミクロンの粒径、及び30乃至42%の重量百分率を有する第1の成分と、
200W/mKを上回るバルク熱伝導率、3乃至10ミクロンの粒径、及び18乃至24%の重量百分率を有する第2の成分と、
5W/mKを上回るバルク熱伝導率、1.0ミクロン未満の粒径、及び31乃至39%の重量百分率を有する第3の成分と
を含む、請求項21に記載の構造体。 - 前記組成物は、
10乃至20ミクロンの粒径、及び30乃至42%の重量百分率を有する第1のアルミニウム成分と、
3乃至10ミクロンの粒径、及び18乃至24%の重量百分率を有する第2のアルミニウム成分と、
1.0ミクロン未満の粒径、及び31乃至39%の重量百分率を有する酸化アルミニウム成分と
を含む、請求項21に記載の構造体。 - 前記圧縮された接合線幅は55乃至18ミクロンである(図1)、請求項21に記載の構造体。
- 前記界面表面は裸銅又はNiめっき銅である、請求項21に記載の構造体。
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US12/357,744 | 2009-01-22 | ||
US12/357,744 US7816785B2 (en) | 2009-01-22 | 2009-01-22 | Low compressive force, non-silicone, high thermal conducting formulation for thermal interface material and package |
PCT/US2010/021735 WO2010085604A1 (en) | 2009-01-22 | 2010-01-22 | Low compressive force, non-silicone, high thermal conducting formulation for thermal interface material and package |
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JP2012515836A true JP2012515836A (ja) | 2012-07-12 |
JP5731405B2 JP5731405B2 (ja) | 2015-06-10 |
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JP (1) | JP5731405B2 (ja) |
KR (1) | KR101507640B1 (ja) |
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- 2010-01-22 WO PCT/US2010/021735 patent/WO2010085604A1/en active Application Filing
- 2010-01-22 JP JP2011548117A patent/JP5731405B2/ja active Active
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US20100181663A1 (en) | 2010-07-22 |
KR20110107853A (ko) | 2011-10-04 |
TW201037068A (en) | 2010-10-16 |
WO2010085604A1 (en) | 2010-07-29 |
JP5731405B2 (ja) | 2015-06-10 |
US7816785B2 (en) | 2010-10-19 |
KR101507640B1 (ko) | 2015-03-31 |
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