JP2012513039A5 - - Google Patents

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Publication number
JP2012513039A5
JP2012513039A5 JP2011542123A JP2011542123A JP2012513039A5 JP 2012513039 A5 JP2012513039 A5 JP 2012513039A5 JP 2011542123 A JP2011542123 A JP 2011542123A JP 2011542123 A JP2011542123 A JP 2011542123A JP 2012513039 A5 JP2012513039 A5 JP 2012513039A5
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JP
Japan
Prior art keywords
mol
repeating unit
positive
group
present
Prior art date
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Application number
JP2011542123A
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English (en)
Japanese (ja)
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JP5612598B2 (ja
JP2012513039A (ja
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Publication date
Priority claimed from US12/339,469 external-priority patent/US8048609B2/en
Application filed filed Critical
Publication of JP2012513039A publication Critical patent/JP2012513039A/ja
Publication of JP2012513039A5 publication Critical patent/JP2012513039A5/ja
Application granted granted Critical
Publication of JP5612598B2 publication Critical patent/JP5612598B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011542123A 2008-12-19 2009-12-14 ポリ（ビニルヒドロキシアリールカルボン酸エステル）を含有する輻射線感受性組成物及び要素 Expired - Fee Related JP5612598B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/339,469 2008-12-19
US12/339,469 US8048609B2 (en) 2008-12-19 2008-12-19 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s
PCT/US2009/006533 WO2010080102A2 (en) 2008-12-19 2009-12-14 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s

Publications (3)

Publication Number Publication Date
JP2012513039A JP2012513039A (ja) 2012-06-07
JP2012513039A5 true JP2012513039A5 (enExample) 2013-02-07
JP5612598B2 JP5612598B2 (ja) 2014-10-22

Family

ID=42102646

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011542123A Expired - Fee Related JP5612598B2 (ja) 2008-12-19 2009-12-14 ポリ（ビニルヒドロキシアリールカルボン酸エステル）を含有する輻射線感受性組成物及び要素

Country Status (5)

Country Link
US (1) US8048609B2 (enExample)
EP (1) EP2376286B1 (enExample)
JP (1) JP5612598B2 (enExample)
CN (1) CN102256792B (enExample)
WO (1) WO2010080102A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US20120189770A1 (en) * 2011-01-20 2012-07-26 Moshe Nakash Preparing lithographic printing plates by ablation imaging
JP6125965B2 (ja) * 2013-09-27 2017-05-10 上野製薬株式会社 ｐ‐ヒドロキシ安息香酸アリルポリマーの製造方法
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
CN106292183A (zh) * 2016-08-24 2017-01-04 青岛蓝帆新材料有限公司 一种阳图热敏平版印刷版版材

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS508658B1 (enExample) 1970-06-19 1975-04-05
JPS508658A (enExample) * 1973-05-30 1975-01-29
JP3272150B2 (ja) * 1994-06-06 2002-04-08 富士写真フイルム株式会社 感光性平版印刷版および感光性組成物
US6255033B1 (en) * 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
DE10239505B4 (de) 2002-08-28 2005-05-04 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit
JP4473262B2 (ja) 2003-03-14 2010-06-02 コダック グラフィック コミュニケーションズ カナダ カンパニー 放射線感受性素子の現像性促進
JP4391285B2 (ja) * 2004-03-26 2009-12-24 富士フイルム株式会社 感光性平版印刷版
JP4340601B2 (ja) * 2004-08-16 2009-10-07 富士フイルム株式会社 平版印刷版原版
ATE389900T1 (de) * 2004-08-24 2008-04-15 Fujifilm Corp Verfahren zur herstellung einer lithographischen druckplatte
JP2006154099A (ja) * 2004-11-26 2006-06-15 Fuji Photo Film Co Ltd 平版印刷版原版
US7544462B2 (en) * 2007-02-22 2009-06-09 Eastman Kodak Company Radiation-sensitive composition and elements with basic development enhancers

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