CN102256792B - 阳图制版可成像元件及其制造方法 - Google Patents
阳图制版可成像元件及其制造方法 Download PDFInfo
- Publication number
- CN102256792B CN102256792B CN200980151905.6A CN200980151905A CN102256792B CN 102256792 B CN102256792 B CN 102256792B CN 200980151905 A CN200980151905 A CN 200980151905A CN 102256792 B CN102256792 B CN 102256792B
- Authority
- CN
- China
- Prior art keywords
- group
- substituted
- amount
- imageable
- repeating unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/339469 | 2008-12-19 | ||
| US12/339,469 | 2008-12-19 | ||
| US12/339,469 US8048609B2 (en) | 2008-12-19 | 2008-12-19 | Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s |
| PCT/US2009/006533 WO2010080102A2 (en) | 2008-12-19 | 2009-12-14 | Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102256792A CN102256792A (zh) | 2011-11-23 |
| CN102256792B true CN102256792B (zh) | 2014-08-20 |
Family
ID=42102646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200980151905.6A Active CN102256792B (zh) | 2008-12-19 | 2009-12-14 | 阳图制版可成像元件及其制造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8048609B2 (enExample) |
| EP (1) | EP2376286B1 (enExample) |
| JP (1) | JP5612598B2 (enExample) |
| CN (1) | CN102256792B (enExample) |
| WO (1) | WO2010080102A2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8298750B2 (en) * | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
| US20120189770A1 (en) * | 2011-01-20 | 2012-07-26 | Moshe Nakash | Preparing lithographic printing plates by ablation imaging |
| JP6125965B2 (ja) * | 2013-09-27 | 2017-05-10 | 上野製薬株式会社 | p‐ヒドロキシ安息香酸アリルポリマーの製造方法 |
| EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| ES2617557T3 (es) | 2014-05-15 | 2017-06-19 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
| EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
| CN106292183A (zh) * | 2016-08-24 | 2017-01-04 | 青岛蓝帆新材料有限公司 | 一种阳图热敏平版印刷版版材 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2130283A1 (de) * | 1970-06-19 | 1971-12-23 | Fuji Chem Ind Co Ltd | Vinylpolymere,Verfahren zur Herstellung derselben und diese Polymeren enthaltende photosensitive Zusammensetzungen |
| WO2001009682A2 (en) * | 1999-07-30 | 2001-02-08 | Creo, Ltd. | Positive acting photoresist composition and imageable element |
| EP1543046B1 (en) * | 2002-08-28 | 2006-05-10 | Kodak Polychrome Graphics GmbH | Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS508658A (enExample) * | 1973-05-30 | 1975-01-29 | ||
| JP3272150B2 (ja) * | 1994-06-06 | 2002-04-08 | 富士写真フイルム株式会社 | 感光性平版印刷版および感光性組成物 |
| WO2004081662A2 (en) | 2003-03-14 | 2004-09-23 | Creo Inc. | Development enhancement of radiation-sensitive elements |
| JP4391285B2 (ja) * | 2004-03-26 | 2009-12-24 | 富士フイルム株式会社 | 感光性平版印刷版 |
| JP4340601B2 (ja) * | 2004-08-16 | 2009-10-07 | 富士フイルム株式会社 | 平版印刷版原版 |
| ATE389900T1 (de) * | 2004-08-24 | 2008-04-15 | Fujifilm Corp | Verfahren zur herstellung einer lithographischen druckplatte |
| JP2006154099A (ja) * | 2004-11-26 | 2006-06-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US7544462B2 (en) * | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
-
2008
- 2008-12-19 US US12/339,469 patent/US8048609B2/en not_active Expired - Fee Related
-
2009
- 2009-12-14 JP JP2011542123A patent/JP5612598B2/ja not_active Expired - Fee Related
- 2009-12-14 WO PCT/US2009/006533 patent/WO2010080102A2/en not_active Ceased
- 2009-12-14 CN CN200980151905.6A patent/CN102256792B/zh active Active
- 2009-12-14 EP EP09774995.6A patent/EP2376286B1/en not_active Not-in-force
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2130283A1 (de) * | 1970-06-19 | 1971-12-23 | Fuji Chem Ind Co Ltd | Vinylpolymere,Verfahren zur Herstellung derselben und diese Polymeren enthaltende photosensitive Zusammensetzungen |
| WO2001009682A2 (en) * | 1999-07-30 | 2001-02-08 | Creo, Ltd. | Positive acting photoresist composition and imageable element |
| EP1543046B1 (en) * | 2002-08-28 | 2006-05-10 | Kodak Polychrome Graphics GmbH | Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010080102A3 (en) | 2010-10-07 |
| EP2376286B1 (en) | 2014-08-27 |
| US20100159390A1 (en) | 2010-06-24 |
| JP5612598B2 (ja) | 2014-10-22 |
| CN102256792A (zh) | 2011-11-23 |
| WO2010080102A2 (en) | 2010-07-15 |
| JP2012513039A (ja) | 2012-06-07 |
| EP2376286A2 (en) | 2011-10-19 |
| US8048609B2 (en) | 2011-11-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |