CN102256792B - 阳图制版可成像元件及其制造方法 - Google Patents

阳图制版可成像元件及其制造方法 Download PDF

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Publication number
CN102256792B
CN102256792B CN200980151905.6A CN200980151905A CN102256792B CN 102256792 B CN102256792 B CN 102256792B CN 200980151905 A CN200980151905 A CN 200980151905A CN 102256792 B CN102256792 B CN 102256792B
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CN
China
Prior art keywords
group
substituted
amount
imageable
repeating unit
Prior art date
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Active
Application number
CN200980151905.6A
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English (en)
Chinese (zh)
Other versions
CN102256792A (zh
Inventor
M·勒瓦龙
G·布里纳
V·卡佩
L·波斯特
M·鲁宾
T·库特塞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
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Eastman Kodak Co
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Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CN102256792A publication Critical patent/CN102256792A/zh
Application granted granted Critical
Publication of CN102256792B publication Critical patent/CN102256792B/zh
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02Positive working, i.e. the exposed (imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262Phenolic condensation polymers, e.g. novolacs, resols
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/11Vinyl alcohol polymer or derivative

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Plates And Materials Therefor (AREA)
CN200980151905.6A 2008-12-19 2009-12-14 阳图制版可成像元件及其制造方法 Active CN102256792B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US12/339469 2008-12-19
US12/339,469 2008-12-19
US12/339,469 US8048609B2 (en) 2008-12-19 2008-12-19 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s
PCT/US2009/006533 WO2010080102A2 (en) 2008-12-19 2009-12-14 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s

Publications (2)

Publication Number Publication Date
CN102256792A CN102256792A (zh) 2011-11-23
CN102256792B true CN102256792B (zh) 2014-08-20

Family

ID=42102646

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980151905.6A Active CN102256792B (zh) 2008-12-19 2009-12-14 阳图制版可成像元件及其制造方法

Country Status (5)

Country Link
US (1) US8048609B2 (enExample)
EP (1) EP2376286B1 (enExample)
JP (1) JP5612598B2 (enExample)
CN (1) CN102256792B (enExample)
WO (1) WO2010080102A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US20120189770A1 (en) * 2011-01-20 2012-07-26 Moshe Nakash Preparing lithographic printing plates by ablation imaging
JP6125965B2 (ja) * 2013-09-27 2017-05-10 上野製薬株式会社 p‐ヒドロキシ安息香酸アリルポリマーの製造方法
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
CN106292183A (zh) * 2016-08-24 2017-01-04 青岛蓝帆新材料有限公司 一种阳图热敏平版印刷版版材

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2130283A1 (de) * 1970-06-19 1971-12-23 Fuji Chem Ind Co Ltd Vinylpolymere,Verfahren zur Herstellung derselben und diese Polymeren enthaltende photosensitive Zusammensetzungen
WO2001009682A2 (en) * 1999-07-30 2001-02-08 Creo, Ltd. Positive acting photoresist composition and imageable element
EP1543046B1 (en) * 2002-08-28 2006-05-10 Kodak Polychrome Graphics GmbH Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS508658A (enExample) * 1973-05-30 1975-01-29
JP3272150B2 (ja) * 1994-06-06 2002-04-08 富士写真フイルム株式会社 感光性平版印刷版および感光性組成物
WO2004081662A2 (en) 2003-03-14 2004-09-23 Creo Inc. Development enhancement of radiation-sensitive elements
JP4391285B2 (ja) * 2004-03-26 2009-12-24 富士フイルム株式会社 感光性平版印刷版
JP4340601B2 (ja) * 2004-08-16 2009-10-07 富士フイルム株式会社 平版印刷版原版
ATE389900T1 (de) * 2004-08-24 2008-04-15 Fujifilm Corp Verfahren zur herstellung einer lithographischen druckplatte
JP2006154099A (ja) * 2004-11-26 2006-06-15 Fuji Photo Film Co Ltd 平版印刷版原版
US7544462B2 (en) * 2007-02-22 2009-06-09 Eastman Kodak Company Radiation-sensitive composition and elements with basic development enhancers

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2130283A1 (de) * 1970-06-19 1971-12-23 Fuji Chem Ind Co Ltd Vinylpolymere,Verfahren zur Herstellung derselben und diese Polymeren enthaltende photosensitive Zusammensetzungen
WO2001009682A2 (en) * 1999-07-30 2001-02-08 Creo, Ltd. Positive acting photoresist composition and imageable element
EP1543046B1 (en) * 2002-08-28 2006-05-10 Kodak Polychrome Graphics GmbH Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals

Also Published As

Publication number Publication date
WO2010080102A3 (en) 2010-10-07
EP2376286B1 (en) 2014-08-27
US20100159390A1 (en) 2010-06-24
JP5612598B2 (ja) 2014-10-22
CN102256792A (zh) 2011-11-23
WO2010080102A2 (en) 2010-07-15
JP2012513039A (ja) 2012-06-07
EP2376286A2 (en) 2011-10-19
US8048609B2 (en) 2011-11-01

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