JP2012506639A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2012506639A5 JP2012506639A5 JP2011533278A JP2011533278A JP2012506639A5 JP 2012506639 A5 JP2012506639 A5 JP 2012506639A5 JP 2011533278 A JP2011533278 A JP 2011533278A JP 2011533278 A JP2011533278 A JP 2011533278A JP 2012506639 A5 JP2012506639 A5 JP 2012506639A5
- Authority
- JP
- Japan
- Prior art keywords
- micromesh
- micromesh screen
- reflector
- screen
- metal frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims 11
- 229920002120 photoresistant polymer Polymers 0.000 claims 10
- 239000007787 solid Substances 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 6
- 238000005323 electroforming Methods 0.000 claims 5
- 239000011248 coating agent Substances 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 4
- 238000004140 cleaning Methods 0.000 claims 2
- 239000003792 electrolyte Substances 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- ADKPKEZZYOUGBZ-UHFFFAOYSA-N [C].[O].[Si] Chemical compound [C].[O].[Si] ADKPKEZZYOUGBZ-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 230000005855 radiation Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/255,578 US20100096569A1 (en) | 2008-10-21 | 2008-10-21 | Ultraviolet-transmitting microwave reflector comprising a micromesh screen |
| US12/255,578 | 2008-10-21 | ||
| PCT/US2009/061380 WO2010048227A2 (en) | 2008-10-21 | 2009-10-20 | Ultraviolet-transmitting microwave reflector comprising a micromesh screen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012506639A JP2012506639A (ja) | 2012-03-15 |
| JP2012506639A5 true JP2012506639A5 (enExample) | 2012-12-06 |
Family
ID=42107915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011533278A Pending JP2012506639A (ja) | 2008-10-21 | 2009-10-20 | マイクロメッシュスクリーンを備える紫外線透過式マイクロ波反射板 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20100096569A1 (enExample) |
| JP (1) | JP2012506639A (enExample) |
| KR (1) | KR20110084261A (enExample) |
| CN (1) | CN102197466A (enExample) |
| TW (1) | TW201113950A (enExample) |
| WO (1) | WO2010048227A2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4215107B2 (ja) * | 2007-02-02 | 2009-01-28 | セイコーエプソン株式会社 | 光源装置、プロジェクタ |
| US8101931B2 (en) | 2010-04-05 | 2012-01-24 | Miltec Corporation | RF screen assembly for microwave powered UV lamps |
| CN102315720B (zh) * | 2010-06-30 | 2014-06-25 | 清华大学 | 毫米波检查设备的摆动反射装置 |
| KR20130123370A (ko) * | 2010-07-12 | 2013-11-12 | 노드슨 코포레이션 | 자외선 램프 시스템 및 방출된 자외선 광을 제어하기 위한 방법 |
| US8309421B2 (en) | 2010-11-24 | 2012-11-13 | Applied Materials, Inc. | Dual-bulb lamphead control methodology |
| US9108370B2 (en) * | 2011-10-19 | 2015-08-18 | Physical Sciences, Inc. | Microgravity fabrication and metalization of large, lightweight polymeric bubbles and films for space system applications |
| US8936709B2 (en) | 2013-03-13 | 2015-01-20 | Gtat Corporation | Adaptable free-standing metallic article for semiconductors |
| US8916038B2 (en) | 2013-03-13 | 2014-12-23 | Gtat Corporation | Free-standing metallic article for semiconductors |
| US9318364B2 (en) | 2014-01-13 | 2016-04-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device metallization systems and methods |
| US20150292815A1 (en) * | 2014-04-10 | 2015-10-15 | Applied Materials, Inc. | Susceptor with radiation source compensation |
| US11380557B2 (en) * | 2017-06-05 | 2022-07-05 | Applied Materials, Inc. | Apparatus and method for gas delivery in semiconductor process chambers |
| KR101987172B1 (ko) * | 2017-07-28 | 2019-06-10 | 주식회사 선익시스템 | 박막 증착용 마스크 제조 방법 및 이를 통해 제작된 증착 마스크 |
| KR102000672B1 (ko) * | 2017-07-28 | 2019-07-17 | 주식회사 선익시스템 | 박막 증착용 마스크 제조 방법 및 이를 통해 제작된 증착 마스크 |
| US11649560B2 (en) | 2019-06-20 | 2023-05-16 | Applied Materials, Inc. | Method for forming silicon-phosphorous materials |
| US11375584B2 (en) * | 2019-08-20 | 2022-06-28 | Applied Materials, Inc. | Methods and apparatus for processing a substrate using microwave energy |
| US11670491B2 (en) * | 2020-07-15 | 2023-06-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Radio frequency screen for an ultraviolet lamp system |
| US12187626B2 (en) * | 2021-09-20 | 2025-01-07 | Sudhish Madapur SWAIN | Apparatus and method for purifying water |
| CN114256111B (zh) * | 2021-12-30 | 2025-05-13 | 拓荆科技股份有限公司 | 一种uv微波屏蔽结构和反应腔设备 |
Family Cites Families (61)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3389951A (en) * | 1963-07-01 | 1968-06-25 | Gen Electric | Diffuse reflector incorporating wire mesh structure |
| US3872349A (en) * | 1973-03-29 | 1975-03-18 | Fusion Systems Corp | Apparatus and method for generating radiation |
| US4501993A (en) * | 1982-10-06 | 1985-02-26 | Fusion Systems Corporation | Deep UV lamp bulb |
| AU574435B2 (en) * | 1984-03-02 | 1988-07-07 | Mitsubishi Denki Kabushiki Kaisha | Microwave discharge light source apparatus |
| JPS61160926A (ja) * | 1985-01-09 | 1986-07-21 | Toshiba Corp | 光励起薄膜形成装置 |
| JPS63149484A (ja) * | 1986-12-11 | 1988-06-22 | Jeco Co Ltd | 流路切換バルブ |
| US4794503A (en) * | 1987-09-23 | 1988-12-27 | Fusion Systems Corporation | Lamp having improved image resolution |
| US4835932A (en) * | 1988-05-13 | 1989-06-06 | Trw Inc. | D-section structural tubes |
| US5032689A (en) * | 1989-08-15 | 1991-07-16 | Halligan Brian S | EMI/RFI shielding vent and method of use |
| EP0450131B1 (en) * | 1990-04-06 | 1995-08-02 | New Japan Radio Co., Ltd. | Electrodeless microwave-generated radiation apparatus |
| US5467220A (en) * | 1994-02-18 | 1995-11-14 | Applied Materials, Inc. | Method and apparatus for improving semiconductor wafer surface temperature uniformity |
| US5841233A (en) * | 1996-01-26 | 1998-11-24 | Fusion Lighting, Inc. | Method and apparatus for mounting a dichroic mirror in a microwave powered lamp assembly using deformable tabs |
| US6465959B1 (en) * | 1997-06-04 | 2002-10-15 | Fusion Lighting, Inc. | Method and apparatus for improved electrodeless lamp screen |
| JPH11121974A (ja) * | 1997-10-16 | 1999-04-30 | Dainippon Printing Co Ltd | 電磁波遮蔽板とそれを作成するためのメッシュパターン版 |
| US6098637A (en) * | 1998-03-03 | 2000-08-08 | Applied Materials, Inc. | In situ cleaning of the surface inside a vacuum processing chamber |
| US6187133B1 (en) * | 1998-05-29 | 2001-02-13 | Applied Materials, Inc. | Gas manifold for uniform gas distribution and photochemistry |
| US6635583B2 (en) * | 1998-10-01 | 2003-10-21 | Applied Materials, Inc. | Silicon carbide deposition for use as a low-dielectric constant anti-reflective coating |
| US6376387B2 (en) * | 1999-07-09 | 2002-04-23 | Applied Materials, Inc. | Method of sealing an epitaxial silicon layer on a substrate |
| PT1200985E (pt) * | 1999-07-29 | 2012-07-17 | Sev Trent Water Purification Inc | Fonte de luz uv |
| US6555835B1 (en) * | 1999-08-09 | 2003-04-29 | Samco International, Inc. | Ultraviolet-ozone oxidation system and method |
| US7265062B2 (en) * | 2000-04-04 | 2007-09-04 | Applied Materials, Inc. | Ionic additives for extreme low dielectric constant chemical formulations |
| US6559460B1 (en) * | 2000-10-31 | 2003-05-06 | Nordson Corporation | Ultraviolet lamp system and methods |
| US7922923B2 (en) * | 2001-02-01 | 2011-04-12 | Creatv Microtech, Inc. | Anti-scatter grid and collimator designs, and their motion, fabrication and assembly |
| US6436194B1 (en) * | 2001-02-16 | 2002-08-20 | Applied Materials, Inc. | Method and a system for sealing an epitaxial silicon layer on a substrate |
| JP4799748B2 (ja) * | 2001-03-28 | 2011-10-26 | 忠弘 大見 | マイクロ波プラズマプロセス装置、プラズマ着火方法、プラズマ形成方法及びプラズマプロセス方法 |
| US20030020027A1 (en) * | 2001-07-25 | 2003-01-30 | Nordson Corporation | Apparatus for infrared reduction in ultraviolet radiation generators |
| GB0120993D0 (en) * | 2001-08-30 | 2001-10-24 | Quay Technologies | Pulsed UV light source |
| US6753129B2 (en) * | 2001-12-07 | 2004-06-22 | Applied Materials Inc. | Method and apparatus for modification of chemically amplified photoresist by electron beam exposure |
| US7091137B2 (en) * | 2001-12-14 | 2006-08-15 | Applied Materials | Bi-layer approach for a hermetic low dielectric constant layer for barrier applications |
| ITTO20020215A1 (it) * | 2002-03-12 | 2003-09-12 | Tetra Laval Holdings E Finance | Dispositivo per il trattamento di un materiale di confezionamento mediante una radiazione uv. |
| US20040026255A1 (en) * | 2002-08-06 | 2004-02-12 | Applied Materials, Inc | Insoluble anode loop in copper electrodeposition cell for interconnect formation |
| US6928839B2 (en) * | 2002-08-15 | 2005-08-16 | Ceramoptec Industries, Inc. | Method for production of silica optical fiber preforms |
| US7297247B2 (en) * | 2003-05-06 | 2007-11-20 | Applied Materials, Inc. | Electroformed sputtering target |
| US7153615B2 (en) * | 2003-08-20 | 2006-12-26 | Intel Corporation | Extreme ultraviolet pellicle using a thin film and supportive mesh |
| JP4386413B2 (ja) * | 2003-08-25 | 2009-12-16 | 株式会社エンプラス | ワイヤーグリッド偏光子の製造方法 |
| US6841790B1 (en) * | 2003-10-07 | 2005-01-11 | Miltec Corporation | Snap-in radio frequency screen for ultraviolet lamp system |
| US20050095859A1 (en) * | 2003-11-03 | 2005-05-05 | Applied Materials, Inc. | Precursor delivery system with rate control |
| US20050250346A1 (en) * | 2004-05-06 | 2005-11-10 | Applied Materials, Inc. | Process and apparatus for post deposition treatment of low k dielectric materials |
| US7709814B2 (en) * | 2004-06-18 | 2010-05-04 | Axcelis Technologies, Inc. | Apparatus and process for treating dielectric materials |
| US7077547B2 (en) * | 2004-07-29 | 2006-07-18 | Nordson Corporation | Shuttered lamp assembly and method of cooling the lamp assembly |
| US20060105106A1 (en) * | 2004-11-16 | 2006-05-18 | Applied Materials, Inc. | Tensile and compressive stressed materials for semiconductors |
| JP2006147782A (ja) * | 2004-11-18 | 2006-06-08 | Toshiba Ceramics Co Ltd | 半導体基板用マイクロ波加熱セラミックスヒータ |
| US7777198B2 (en) * | 2005-05-09 | 2010-08-17 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation |
| US20060251827A1 (en) * | 2005-05-09 | 2006-11-09 | Applied Materials, Inc. | Tandem uv chamber for curing dielectric materials |
| US7648927B2 (en) * | 2005-06-21 | 2010-01-19 | Applied Materials, Inc. | Method for forming silicon-containing materials during a photoexcitation deposition process |
| US20060286774A1 (en) * | 2005-06-21 | 2006-12-21 | Applied Materials. Inc. | Method for forming silicon-containing materials during a photoexcitation deposition process |
| WO2007001281A1 (en) * | 2005-06-22 | 2007-01-04 | Axcelis Technologies, Inc. | Apparatus and process for treating dielectric materials |
| US20070116934A1 (en) * | 2005-11-22 | 2007-05-24 | Miller Scott M | Antireflective surfaces, methods of manufacture thereof and articles comprising the same |
| US7566891B2 (en) * | 2006-03-17 | 2009-07-28 | Applied Materials, Inc. | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors |
| US7909595B2 (en) * | 2006-03-17 | 2011-03-22 | Applied Materials, Inc. | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections |
| US7692171B2 (en) * | 2006-03-17 | 2010-04-06 | Andrzei Kaszuba | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors |
| JP4896555B2 (ja) * | 2006-03-29 | 2012-03-14 | 株式会社東芝 | 半導体製造装置及び半導体装置の製造方法 |
| US20070286956A1 (en) * | 2006-04-07 | 2007-12-13 | Applied Materials, Inc. | Cluster tool for epitaxial film formation |
| US7978964B2 (en) * | 2006-04-27 | 2011-07-12 | Applied Materials, Inc. | Substrate processing chamber with dielectric barrier discharge lamp assembly |
| US7547633B2 (en) * | 2006-05-01 | 2009-06-16 | Applied Materials, Inc. | UV assisted thermal processing |
| US20070256635A1 (en) * | 2006-05-02 | 2007-11-08 | Applied Materials, Inc. A Delaware Corporation | UV activation of NH3 for III-N deposition |
| US8069814B2 (en) * | 2006-05-04 | 2011-12-06 | Advanced Cardiovascular Systems, Inc. | Stent support devices |
| US20090095221A1 (en) * | 2007-10-16 | 2009-04-16 | Alexander Tam | Multi-gas concentric injection showerhead |
| US20090095222A1 (en) * | 2007-10-16 | 2009-04-16 | Alexander Tam | Multi-gas spiral channel showerhead |
| US7976631B2 (en) * | 2007-10-16 | 2011-07-12 | Applied Materials, Inc. | Multi-gas straight channel showerhead |
| US7977659B2 (en) * | 2008-05-01 | 2011-07-12 | Fusion Uv Systems, Inc. | Radio frequency screen assembly for microwave cavities |
-
2008
- 2008-10-21 US US12/255,578 patent/US20100096569A1/en not_active Abandoned
-
2009
- 2009-10-20 WO PCT/US2009/061380 patent/WO2010048227A2/en not_active Ceased
- 2009-10-20 CN CN2009801424446A patent/CN102197466A/zh active Pending
- 2009-10-20 KR KR1020117011409A patent/KR20110084261A/ko not_active Withdrawn
- 2009-10-20 JP JP2011533278A patent/JP2012506639A/ja active Pending
- 2009-10-21 TW TW098135652A patent/TW201113950A/zh unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2012506639A5 (enExample) | ||
| TWI868170B (zh) | 光阻乾式沉積用設備 | |
| US20100167181A1 (en) | Photomask for Extreme Ultraviolet Lithography and Method for Fabricating the Same | |
| JP7431288B2 (ja) | 極端紫外線リソグラフィマスク用のマスクペリクル及びその製造方法 | |
| US20050042153A1 (en) | Extreme ultraviolet pellicle using a thin film and supportive mesh | |
| TW201937266A (zh) | 用於處理遮罩基板以致使較佳膜品質之方法 | |
| US12174526B2 (en) | Pellicle for an EUV lithography mask and a method of manufacturing thereof | |
| TW200405393A (en) | Pattern forming method and method for manufacturing semiconductor device | |
| JP2011511476A (ja) | 乾式または液浸リソグラフィを用いる４５ｎｍフィーチャサイズでの、フォトレジスト材料の崩壊およびポイゾニングの解消 | |
| JP2009141329A (ja) | 液浸リソグラフィーにおけるパターン崩壊を防止するためのプラズマ表面処理 | |
| TWI882421B (zh) | 用於極紫外線反射遮罩的光罩護膜及製造半導體裝置的方法 | |
| KR102839709B1 (ko) | Euv 리소그래피 마스크용 펠리클 및 이의 제조 방법 | |
| JP5818252B2 (ja) | 金属膜パターン付き基体の製造方法 | |
| JP5306404B2 (ja) | パターン形成方法 | |
| KR102727055B1 (ko) | 극자외선 리소그래피용 펠리클 및 그 제조방법 | |
| CN110119064A (zh) | 表膜和包括其的掩模版 | |
| JP2022513010A (ja) | ウェハ上の欠陥、金属粒子汚染及び膜成長を抑制するシステム及び方法 | |
| TWI821518B (zh) | 藉由電漿選擇性沉積之線粗糙度改善方法 | |
| CN118613894A (zh) | 利用扩散阻挡层的增强euv下层效应 | |
| KR102897940B1 (ko) | 나노튜브를 기반으로 하는 극자외선 노광용 펠리클 및 그의 제조 방법 | |
| TWI852653B (zh) | 光罩護膜以及其製造方法 | |
| KR100928513B1 (ko) | 반도체 소자의 제조방법 | |
| CN117471838A (zh) | 用于euv光刻掩模的薄膜及其制造方法 | |
| KR20230171906A (ko) | Euv 리소그래피용 펠리클 구조체, 및 그 제조 방법, 그리고 제조 장치, 그리고 이를 포함하는 euv 리소그래피 장치 | |
| KR20250040189A (ko) | 클러스터층을 포함하는 멤브레인을 구비한 극자외선 리소그래피용 펠리클 |