KR20110084261A - 마이크로메시 스크린을 포함하는 자외선-투과 마이크로파 반사기 - Google Patents

마이크로메시 스크린을 포함하는 자외선-투과 마이크로파 반사기 Download PDF

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Publication number
KR20110084261A
KR20110084261A KR1020117011409A KR20117011409A KR20110084261A KR 20110084261 A KR20110084261 A KR 20110084261A KR 1020117011409 A KR1020117011409 A KR 1020117011409A KR 20117011409 A KR20117011409 A KR 20117011409A KR 20110084261 A KR20110084261 A KR 20110084261A
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KR
South Korea
Prior art keywords
ultraviolet
micromesh
processing chamber
microwave reflector
substrate processing
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English (en)
Korean (ko)
Inventor
투안 안 엔구옌
야오-헝 양
산지브 발루자
토마스 노웍
주안 카를로스 로차-알바레즈
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어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR20110084261A publication Critical patent/KR20110084261A/ko
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Overhead Projectors And Projection Screens (AREA)
KR1020117011409A 2008-10-21 2009-10-20 마이크로메시 스크린을 포함하는 자외선-투과 마이크로파 반사기 Withdrawn KR20110084261A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/255,578 US20100096569A1 (en) 2008-10-21 2008-10-21 Ultraviolet-transmitting microwave reflector comprising a micromesh screen
US12/255,578 2008-10-21

Publications (1)

Publication Number Publication Date
KR20110084261A true KR20110084261A (ko) 2011-07-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117011409A Withdrawn KR20110084261A (ko) 2008-10-21 2009-10-20 마이크로메시 스크린을 포함하는 자외선-투과 마이크로파 반사기

Country Status (6)

Country Link
US (1) US20100096569A1 (enExample)
JP (1) JP2012506639A (enExample)
KR (1) KR20110084261A (enExample)
CN (1) CN102197466A (enExample)
TW (1) TW201113950A (enExample)
WO (1) WO2010048227A2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190012720A (ko) * 2017-07-28 2019-02-11 주식회사 선익시스템 박막 증착용 마스크 제조 방법 및 이를 통해 제작된 증착 마스크
KR20190012721A (ko) * 2017-07-28 2019-02-11 주식회사 선익시스템 박막 증착용 마스크 제조 방법 및 이를 통해 제작된 증착 마스크

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190012720A (ko) * 2017-07-28 2019-02-11 주식회사 선익시스템 박막 증착용 마스크 제조 방법 및 이를 통해 제작된 증착 마스크
KR20190012721A (ko) * 2017-07-28 2019-02-11 주식회사 선익시스템 박막 증착용 마스크 제조 방법 및 이를 통해 제작된 증착 마스크

Also Published As

Publication number Publication date
CN102197466A (zh) 2011-09-21
WO2010048227A3 (en) 2010-07-15
JP2012506639A (ja) 2012-03-15
WO2010048227A2 (en) 2010-04-29
US20100096569A1 (en) 2010-04-22
TW201113950A (en) 2011-04-16

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PA0105 International application

Patent event date: 20110519

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid