JP2012503311A5 - - Google Patents

Claims (15)

A method of processing a substrate, comprising:
Positioning the substrate on a movable substrate support;
Inducing a first quantity of heating energy toward a first fixed position below a portion of the substrate;
Inducing a second quantity of heating energy toward a second fixed position below a portion of the substrate;
Processing the selected region of the substrate by moving the substrate support and sequentially positioning each selected region over the first fixed position and then over the second fixed position; When,
See containing and maintaining a portion of said substrate at a temperature lower than 500 ° C., both the first heating energy or heating energy of the second quantity of quantities, no part melting of the substrate, method .   The method of claim 1, wherein the second quantity of heating energy has sufficient power to anneal a portion of the substrate.   The method of claim 2, wherein the first quantity of heating energy has a power that is less than a power required to anneal a portion of the substrate. A method of annealing a substrate surface,
Preheating the preheated portion of the substrate surface by applying energy to the preheated portion;
While preheating the preheated portion of the substrate, wherein the annealing portion of a substrate preheating portion, viewed contains a annealing by applying an incremental energy to the annealing portion, the preheating portion and the annealing portion The method wherein at least one outer periphery is not circular . An apparatus for heat-treating a substrate,
A movable substrate support;
A first energy source oriented to induce annealing energy toward a first portion of the surface of the substrate support;
A second energy source oriented to induce preheating energy toward a second portion of the surface of the substrate support;
And an optical assembly containing said first and second energy sources , wherein neither said first energy source nor said second energy source generates energy exceeding 10 kW / cm ² .   The apparatus of claim 5, wherein the first energy source is a laser and the second energy source is a laser.   The apparatus of claim 5, wherein the first energy source is a laser and the second energy source is a plurality of lamps.   The apparatus of claim 5, wherein the optical assembly further comprises a first optical tuner for shaping the annealing energy and a second optical tuner for shaping the preheating energy.   The apparatus of claim 5, further comprising a control device coupled to the substrate support. An apparatus for heat-treating a substrate,
A fixed substrate support;
One or more oriented to induce annealing energy toward a first portion of the surface of the substrate support and to induce preheating energy toward a second portion of the surface of the substrate support. Energy sources,
An optical assembly containing the one or more energy sources;
And an actuator for moving the annealing energy and the preheat energy to the substrate support of the fixed, each energy source that have a power of up to about 10 kW / cm ^2, device.   The apparatus of claim 10, wherein the at least one energy source is a laser.   The apparatus of claim 10, wherein the optical assembly further comprises one or more optical tuners for shaping the annealing energy and the preheating energy.   The apparatus of claim 10, further comprising a controller coupled to the actuator.   The apparatus of claim 10, further comprising a detector for sensing the temperature of one or more portions of the substrate. The apparatus of claim 10, wherein the actuator rotates the optical assembly to direct the annealing energy and the preheating energy.