JP2012501252A5 - - Google Patents

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Publication number
JP2012501252A5
JP2012501252A5 JP2011525047A JP2011525047A JP2012501252A5 JP 2012501252 A5 JP2012501252 A5 JP 2012501252A5 JP 2011525047 A JP2011525047 A JP 2011525047A JP 2011525047 A JP2011525047 A JP 2011525047A JP 2012501252 A5 JP2012501252 A5 JP 2012501252A5
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JP
Japan
Prior art keywords
abrasive
layer
particles
translucent film
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2011525047A
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English (en)
Japanese (ja)
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JP5351967B2 (ja
JP2012501252A (ja
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Priority claimed from PCT/US2009/052188 external-priority patent/WO2010025003A2/en
Publication of JP2012501252A publication Critical patent/JP2012501252A/ja
Publication of JP2012501252A5 publication Critical patent/JP2012501252A5/ja
Application granted granted Critical
Publication of JP5351967B2 publication Critical patent/JP5351967B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011525047A 2008-08-28 2009-07-30 構造化研磨物品、その製造方法、及びウエハの平坦化における使用 Expired - Fee Related JP5351967B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9252108P 2008-08-28 2008-08-28
US61/092,521 2008-08-28
PCT/US2009/052188 WO2010025003A2 (en) 2008-08-28 2009-07-30 Structured abrasive article, method of making the same, and use in wafer planarization

Publications (3)

Publication Number Publication Date
JP2012501252A JP2012501252A (ja) 2012-01-19
JP2012501252A5 true JP2012501252A5 (OSRAM) 2012-07-05
JP5351967B2 JP5351967B2 (ja) 2013-11-27

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011525047A Expired - Fee Related JP5351967B2 (ja) 2008-08-28 2009-07-30 構造化研磨物品、その製造方法、及びウエハの平坦化における使用

Country Status (7)

Country Link
US (1) US8251774B2 (OSRAM)
EP (1) EP2327088B1 (OSRAM)
JP (1) JP5351967B2 (OSRAM)
KR (1) KR101602001B1 (OSRAM)
CN (1) CN102138203B (OSRAM)
TW (1) TWI429735B (OSRAM)
WO (1) WO2010025003A2 (OSRAM)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106753240A (zh) * 2010-11-01 2017-05-31 3M创新有限公司 成形陶瓷磨粒和成形陶瓷前体粒子
CN103702800B (zh) 2011-06-30 2017-11-10 圣戈本陶瓷及塑料股份有限公司 包括氮化硅磨粒的磨料制品
EP2760639B1 (en) 2011-09-26 2021-01-13 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles including abrasive particulate materials, coated abrasives using the abrasive particulate materials and methods of forming
CN102492233A (zh) * 2011-12-05 2012-06-13 张莉娟 复合磨粒、其制备方法及用途
KR102074138B1 (ko) 2011-12-30 2020-02-07 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 형상화 연마입자 및 이의 형성방법
EP3851248B1 (en) 2011-12-30 2024-04-03 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
KR101667943B1 (ko) 2012-01-10 2016-10-20 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 복잡한 형상들을 가지는 연마 입자들 및 이의 성형 방법들
WO2013106602A1 (en) 2012-01-10 2013-07-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
CN102604543B (zh) * 2012-04-11 2014-02-19 宣城晶瑞新材料有限公司 一种抛光液用高稳定纳米二氧化铈水性浆料制备方法
KR101813466B1 (ko) 2012-05-23 2017-12-29 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 형상화 연마입자들 및 이의 형성방법
US10106714B2 (en) 2012-06-29 2018-10-23 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
CN104822495A (zh) * 2012-09-21 2015-08-05 3M创新有限公司 向固定磨料幅材中引入添加剂以改善cmp性能
FI2906392T3 (fi) 2012-10-15 2025-06-20 Saint Gobain Abrasives Inc Hiomahiukkasia, joilla on erityisiä muotoja, ja menetelmiä tällaisten hiukkasten muodostamiseksi
KR101818946B1 (ko) 2012-12-31 2018-01-17 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 미립자 소재 및 이의 형성방법
CN107685296B (zh) 2013-03-29 2020-03-06 圣戈班磨料磨具有限公司 具有特定形状的磨粒、形成这种粒子的方法及其用途
KR20160015356A (ko) 2013-06-07 2016-02-12 쓰리엠 이노베이티브 프로퍼티즈 컴파니 기재 내에 리세스를 형성하는 방법, 연마 휠, 및 커버
TW201502263A (zh) 2013-06-28 2015-01-16 Saint Gobain Ceramics 包含成形研磨粒子之研磨物品
RU2643004C2 (ru) 2013-09-30 2018-01-29 Сен-Гобен Серэмикс Энд Пластикс, Инк. Формованные абразивные частицы и способы их получения
USD742196S1 (en) * 2013-12-16 2015-11-03 3M Innovative Properties Company Sanding article with pattern
USD742195S1 (en) * 2013-12-16 2015-11-03 3M Innovation Properties Company Sanding article with pattern
MX380754B (es) 2013-12-31 2025-03-12 Saint Gobain Abrasives Inc Artículo abrasivo que incluye partículas abrasivas perfiladas.
US9771507B2 (en) 2014-01-31 2017-09-26 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle including dopant material and method of forming same
WO2015160855A1 (en) 2014-04-14 2015-10-22 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
CA2945491C (en) 2014-04-14 2023-03-14 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
KR20160147700A (ko) * 2014-05-01 2016-12-23 쓰리엠 이노베이티브 프로퍼티즈 컴파니 가요성 연마 물품 및 이의 사용 방법
US9902045B2 (en) 2014-05-30 2018-02-27 Saint-Gobain Abrasives, Inc. Method of using an abrasive article including shaped abrasive particles
KR102420782B1 (ko) * 2014-10-21 2022-07-14 쓰리엠 이노베이티브 프로퍼티즈 컴파니 연마 예비성형품, 연마 용품, 및 접합된 연마 용품을 제조하는 방법
US9914864B2 (en) 2014-12-23 2018-03-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and method of forming same
US9707529B2 (en) 2014-12-23 2017-07-18 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
US9676981B2 (en) 2014-12-24 2017-06-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle fractions and method of forming same
EP3277459B1 (en) * 2015-03-31 2023-08-16 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
TWI634200B (zh) 2015-03-31 2018-09-01 聖高拜磨料有限公司 固定磨料物品及其形成方法
ES2819375T3 (es) 2015-06-11 2021-04-15 Saint Gobain Ceramics & Plastics Inc Artículo abrasivo que incluye partículas abrasivas conformadas
EP3455320A4 (en) 2016-05-10 2019-11-20 Saint-Gobain Ceramics&Plastics, Inc. GRINDING PARTICLES AND METHOD FOR FORMING THEREOF
KR102390844B1 (ko) 2016-05-10 2022-04-26 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 연마 입자 및 이의 형성 방법
CN109475998B (zh) 2016-07-20 2021-12-31 3M创新有限公司 成形玻璃化磨料团聚物、磨料制品和研磨方法
EP3519134B1 (en) 2016-09-29 2024-01-17 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
CN109890564B (zh) 2016-10-25 2022-04-29 3M创新有限公司 具有成形磨粒的成形玻璃化磨料团聚物、磨料制品和相关方法
KR20180072243A (ko) * 2016-12-21 2018-06-29 엠.씨.케이 (주) 연마체 수지 조성물 및 이에 의해 제조된 패드
US10563105B2 (en) 2017-01-31 2020-02-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US10759024B2 (en) 2017-01-31 2020-09-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
WO2018236989A1 (en) 2017-06-21 2018-12-27 Saint-Gobain Ceramics & Plastics, Inc. Particulate materials and methods of forming same
CN112055737B (zh) 2018-03-01 2022-04-12 3M创新有限公司 具有成型磨料颗粒的成型硅质磨料团聚物、磨料制品及相关方法
EP4081609A4 (en) 2019-12-27 2024-06-05 Saint-Gobain Ceramics & Plastics Inc. Abrasive articles and methods of forming same
KR102765343B1 (ko) 2019-12-27 2025-02-13 세인트-고바인 세라믹스 앤드 플라스틱스, 인크. 연마 물품 및 이의 형성 방법
CN114845838B (zh) 2019-12-27 2024-10-25 圣戈本陶瓷及塑料股份有限公司 磨料制品及其形成方法
JP2025500060A (ja) 2021-12-30 2025-01-07 サンーゴバン アブレイシブズ，インコーポレイティド 研磨物品及びそれを形成する方法
CN119095930A (zh) * 2022-08-09 2024-12-06 株式会社力森诺科 研磨液、研磨液套组及研磨方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2868772B2 (ja) * 1988-09-20 1999-03-10 大日本印刷株式会社 研磨テープの製造方法
US5152917B1 (en) 1991-02-06 1998-01-13 Minnesota Mining & Mfg Structured abrasive article
BR9407536A (pt) * 1993-09-13 1997-08-26 Minnesota Mining & Mfg Artigo abrasivo processos de fabricação e de refino de peça em trabalho corn o mesmo ferramenta de produção para fabricação do mesmo e processo de produção de matriz mestra para formação da mesma
AU686335B2 (en) 1994-02-22 1998-02-05 Minnesota Mining And Manufacturing Company Abrasive article, a method of making same, and a method of using same for finishing
US5551959A (en) * 1994-08-24 1996-09-03 Minnesota Mining And Manufacturing Company Abrasive article having a diamond-like coating layer and method for making same
US5645471A (en) 1995-08-11 1997-07-08 Minnesota Mining And Manufacturing Company Method of texturing a substrate using an abrasive article having multiple abrasive natures
US5958794A (en) 1995-09-22 1999-09-28 Minnesota Mining And Manufacturing Company Method of modifying an exposed surface of a semiconductor wafer
US5624303A (en) 1996-01-22 1997-04-29 Micron Technology, Inc. Polishing pad and a method for making a polishing pad with covalently bonded particles
US5692950A (en) 1996-08-08 1997-12-02 Minnesota Mining And Manufacturing Company Abrasive construction for semiconductor wafer modification
US6329058B1 (en) 1998-07-30 2001-12-11 3M Innovative Properties Company Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers
US6213845B1 (en) 1999-04-26 2001-04-10 Micron Technology, Inc. Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same
US6290572B1 (en) 2000-03-23 2001-09-18 Micron Technology, Inc. Devices and methods for in-situ control of mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies
ATE302092T1 (de) * 2000-04-28 2005-09-15 3M Innovative Properties Co Schleifmittel und verfahren zum schleifen von glas
US6497957B1 (en) 2000-10-04 2002-12-24 Eastman Kodak Company Antireflection article of manufacture
US20020072296A1 (en) 2000-11-29 2002-06-13 Muilenburg Michael J. Abrasive article having a window system for polishing wafers, and methods
KR100905266B1 (ko) 2000-12-01 2009-06-29 도요 고무 고교 가부시키가이샤 연마 패드
JP2002254316A (ja) * 2001-02-28 2002-09-10 Hitachi Maxell Ltd 研磨シ―ト
US6884723B2 (en) 2001-12-21 2005-04-26 Micron Technology, Inc. Methods for planarization of group VIII metal-containing surfaces using complexing agents
US6949128B2 (en) * 2001-12-28 2005-09-27 3M Innovative Properties Company Method of making an abrasive product
US7030018B2 (en) 2002-02-04 2006-04-18 Kla-Tencor Technologies Corp. Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
US7131889B1 (en) 2002-03-04 2006-11-07 Micron Technology, Inc. Method for planarizing microelectronic workpieces
US20040005769A1 (en) 2002-07-03 2004-01-08 Cabot Microelectronics Corp. Method and apparatus for endpoint detection
US20040127045A1 (en) 2002-09-12 2004-07-01 Gorantla Venkata R. K. Chemical mechanical planarization of wafers or films using fixed polishing pads and a nanoparticle composition
US7066801B2 (en) 2003-02-21 2006-06-27 Dow Global Technologies, Inc. Method of manufacturing a fixed abrasive material
US6910951B2 (en) 2003-02-24 2005-06-28 Dow Global Technologies, Inc. Materials and methods for chemical-mechanical planarization
US6918821B2 (en) 2003-11-12 2005-07-19 Dow Global Technologies, Inc. Materials and methods for low pressure chemical-mechanical planarization
US20060030156A1 (en) 2004-08-05 2006-02-09 Applied Materials, Inc. Abrasive conductive polishing article for electrochemical mechanical polishing
US7591865B2 (en) * 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
CN101175607A (zh) * 2005-04-08 2008-05-07 圣戈本磨料股份有限公司 具有反应活性生色团的研磨制品
US7344574B2 (en) * 2005-06-27 2008-03-18 3M Innovative Properties Company Coated abrasive article, and method of making and using the same
US20070066186A1 (en) 2005-09-22 2007-03-22 3M Innovative Properties Company Flexible abrasive article and methods of making and using the same
JP2007273910A (ja) * 2006-03-31 2007-10-18 Fujifilm Corp 研磨用組成液
KR100772034B1 (ko) * 2006-12-08 2007-10-31 주식회사 썬텍인더스트리 코팅된 3차원 연마재 구조물을 갖는 연마포지의 제조방법
US8083820B2 (en) 2006-12-22 2011-12-27 3M Innovative Properties Company Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same
US7497885B2 (en) 2006-12-22 2009-03-03 3M Innovative Properties Company Abrasive articles with nanoparticulate fillers and method for making and using them
JP5274647B2 (ja) * 2008-04-18 2013-08-28 サンーゴバン アブレイシブズ，インコーポレイティド 高空隙率研摩材物品およびその製造方法

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