JP2012230289A - アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン - Google Patents
アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン Download PDFInfo
- Publication number
- JP2012230289A JP2012230289A JP2011099237A JP2011099237A JP2012230289A JP 2012230289 A JP2012230289 A JP 2012230289A JP 2011099237 A JP2011099237 A JP 2011099237A JP 2011099237 A JP2011099237 A JP 2011099237A JP 2012230289 A JP2012230289 A JP 2012230289A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mold member
- screen
- array substrate
- transferred
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 229
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 43
- 238000003825 pressing Methods 0.000 claims abstract description 10
- 238000005323 electroforming Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 description 76
- 230000008569 process Effects 0.000 description 58
- 239000010408 film Substances 0.000 description 44
- 239000000463 material Substances 0.000 description 37
- 238000007740 vapor deposition Methods 0.000 description 16
- 238000010586 diagram Methods 0.000 description 14
- 238000007747 plating Methods 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000008151 electrolyte solution Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 239000000470 constituent Substances 0.000 description 3
- 238000001721 transfer moulding Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00278—Lenticular sheets
- B29D11/00298—Producing lens arrays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/002—Arrays of reflective systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
- G03B21/60—Projection screens characterised by the nature of the surface
- G03B21/602—Lenticular screens
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0215—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having a regular structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0257—Diffusing elements; Afocal elements characterised by the diffusing properties creating an anisotropic diffusion characteristic, i.e. distributing output differently in two perpendicular axes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0284—Diffusing elements; Afocal elements characterized by the use used in reflection
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Overhead Projectors And Projection Screens (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011099237A JP2012230289A (ja) | 2011-04-27 | 2011-04-27 | アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン |
| US13/449,688 US8498050B2 (en) | 2011-04-27 | 2012-04-18 | Method of manufacturing array substrate, array substrate, method of manufacturing screen, and screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011099237A JP2012230289A (ja) | 2011-04-27 | 2011-04-27 | アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012230289A true JP2012230289A (ja) | 2012-11-22 |
| JP2012230289A5 JP2012230289A5 (enExample) | 2014-06-05 |
Family
ID=47067677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011099237A Withdrawn JP2012230289A (ja) | 2011-04-27 | 2011-04-27 | アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8498050B2 (enExample) |
| JP (1) | JP2012230289A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023199926A1 (ja) * | 2022-04-15 | 2023-10-19 | デクセリアルズ株式会社 | スクリーン及びその製造方法、並びに金型 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012128137A (ja) * | 2010-12-15 | 2012-07-05 | Seiko Epson Corp | 反射型スクリーンおよび反射型スクリーンの製造方法 |
| JP2012230289A (ja) * | 2011-04-27 | 2012-11-22 | Seiko Epson Corp | アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62278136A (ja) * | 1986-05-27 | 1987-12-03 | Canon Inc | 光学素子の製造方法 |
| JPH05156484A (ja) * | 1991-12-09 | 1993-06-22 | Toppan Printing Co Ltd | フレネルレンズ電鋳用母型及びこれを用いた金型の製造方法 |
| JP2002328203A (ja) * | 2001-04-27 | 2002-11-15 | Seiko Epson Corp | プレス成形によって製造されるレンズアレイ |
| JP2005346021A (ja) * | 2003-07-04 | 2005-12-15 | Seiko Epson Corp | レンズアレイ、レンズアレイの製造方法、照明光学装置、およびプロジェクタ |
| JP2006215162A (ja) * | 2005-02-02 | 2006-08-17 | Dainippon Printing Co Ltd | 反射スクリーン及び反射投影システム |
| US20060203332A1 (en) * | 2005-01-31 | 2006-09-14 | Arisawa Mfg., Ltd. | Lens sheet, rear projection screen, and method of manufacturing lens sheet |
| JP2007132962A (ja) * | 2005-11-07 | 2007-05-31 | Seiko Epson Corp | レンズ基板の製造方法、レンズ基板、透過型スクリーンおよびリア型プロジェクタ |
| JP2009193034A (ja) * | 2008-02-18 | 2009-08-27 | Seiko Epson Corp | 反射スクリーンの製造方法 |
| US20100321592A1 (en) * | 2009-06-18 | 2010-12-23 | Seiko Epson Corporation | Screen, projection system, front projection television receiver, and screen manufacturing method |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5225935A (en) * | 1989-10-30 | 1993-07-06 | Sharp Kabushiki Kaisha | Optical device having a microlens and a process for making microlenses |
| JPH07225303A (ja) * | 1993-12-16 | 1995-08-22 | Sharp Corp | マイクロレンズ基板及びそれを用いた液晶表示素子ならびに液晶プロジェクタ装置 |
| EP1054270A4 (en) * | 1996-07-22 | 2004-07-28 | Maikurooputo Co Ltd | METHOD FOR PRODUCING A FLAT PLATE MICRO LENS AND A FLAT PLATE MICROL LENS |
| US5877889A (en) | 1996-08-30 | 1999-03-02 | Daewoo Electronics Co., Ltd. | Method for the manufacture of a thin film actuated mirror array |
| JPH11123771A (ja) * | 1997-10-22 | 1999-05-11 | Micro Opt:Kk | 平板型マイクロレンズアレイ製造用スタンパ及び平板型マイクロレンズアレイの製造方法 |
| JPH11326603A (ja) * | 1998-05-19 | 1999-11-26 | Seiko Epson Corp | マイクロレンズアレイ及びその製造方法並びに表示装置 |
| JP2002160232A (ja) * | 2000-11-22 | 2002-06-04 | Dainippon Printing Co Ltd | レンズシート成形型及びその製造方法 |
| JP4200662B2 (ja) * | 2001-02-19 | 2008-12-24 | 富士ゼロックス株式会社 | 画像表示媒体の製造方法 |
| US7329611B2 (en) * | 2002-04-11 | 2008-02-12 | Nec Corporation | Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part |
| US6894840B2 (en) * | 2002-05-13 | 2005-05-17 | Sony Corporation | Production method of microlens array, liquid crystal display device and production method thereof, and projector |
| JP4115210B2 (ja) | 2002-09-10 | 2008-07-09 | 株式会社リコー | 静電型アクチュエータ、液滴吐出ヘッド及びその製造方法、インクカートリッジ、マイクロポンプ、光学デバイス、画像形成装置、液滴を吐出する装置 |
| US7416281B2 (en) | 2002-08-06 | 2008-08-26 | Ricoh Company, Ltd. | Electrostatic actuator formed by a semiconductor manufacturing process |
| JP3919186B2 (ja) * | 2002-08-30 | 2007-05-23 | 株式会社リコー | マイクロレンズ駒、マイクロレンズ駒形成方法 |
| JP4231702B2 (ja) * | 2003-01-17 | 2009-03-04 | 日東電工株式会社 | マイクロレンズアレイ |
| JP3788800B2 (ja) * | 2003-12-26 | 2006-06-21 | セイコーエプソン株式会社 | エッチング方法 |
| JP4067017B2 (ja) * | 2005-04-26 | 2008-03-26 | セイコーエプソン株式会社 | マイクロレンズ基板の製造方法、マイクロレンズ基板、液晶パネル用対向基板、液晶パネルおよび投射型表示装置 |
| JP2007094368A (ja) * | 2005-09-01 | 2007-04-12 | Seiko Epson Corp | マイクロレンズ基板、マイクロレンズ基板の製造方法、液晶パネルおよび投射型表示装置 |
| JP4835165B2 (ja) * | 2006-01-18 | 2011-12-14 | 日立化成工業株式会社 | 金属反射膜を有する拡散反射層の開口部形成方法 |
| JP5092948B2 (ja) | 2008-07-07 | 2012-12-05 | 株式会社豊田中央研究所 | マイクロメカニカル構造体とその製造方法 |
| JP5262554B2 (ja) * | 2008-10-15 | 2013-08-14 | セイコーエプソン株式会社 | スクリーン |
| WO2011024700A1 (ja) * | 2009-08-31 | 2011-03-03 | コニカミノルタオプト株式会社 | 成形型、光学素子及び成形型の製造方法 |
| JP2012218415A (ja) * | 2011-04-14 | 2012-11-12 | Seiko Epson Corp | アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン |
| JP2012230289A (ja) * | 2011-04-27 | 2012-11-22 | Seiko Epson Corp | アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン |
-
2011
- 2011-04-27 JP JP2011099237A patent/JP2012230289A/ja not_active Withdrawn
-
2012
- 2012-04-18 US US13/449,688 patent/US8498050B2/en not_active Expired - Fee Related
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62278136A (ja) * | 1986-05-27 | 1987-12-03 | Canon Inc | 光学素子の製造方法 |
| JPH05156484A (ja) * | 1991-12-09 | 1993-06-22 | Toppan Printing Co Ltd | フレネルレンズ電鋳用母型及びこれを用いた金型の製造方法 |
| JP2002328203A (ja) * | 2001-04-27 | 2002-11-15 | Seiko Epson Corp | プレス成形によって製造されるレンズアレイ |
| JP2005346021A (ja) * | 2003-07-04 | 2005-12-15 | Seiko Epson Corp | レンズアレイ、レンズアレイの製造方法、照明光学装置、およびプロジェクタ |
| US20060203332A1 (en) * | 2005-01-31 | 2006-09-14 | Arisawa Mfg., Ltd. | Lens sheet, rear projection screen, and method of manufacturing lens sheet |
| JP2006215162A (ja) * | 2005-02-02 | 2006-08-17 | Dainippon Printing Co Ltd | 反射スクリーン及び反射投影システム |
| JP2007132962A (ja) * | 2005-11-07 | 2007-05-31 | Seiko Epson Corp | レンズ基板の製造方法、レンズ基板、透過型スクリーンおよびリア型プロジェクタ |
| JP2009193034A (ja) * | 2008-02-18 | 2009-08-27 | Seiko Epson Corp | 反射スクリーンの製造方法 |
| US20100321592A1 (en) * | 2009-06-18 | 2010-12-23 | Seiko Epson Corporation | Screen, projection system, front projection television receiver, and screen manufacturing method |
| JP2011022556A (ja) * | 2009-06-18 | 2011-02-03 | Seiko Epson Corp | スクリーン、投影システム、フロントプロジェクションテレビ及びスクリーンの製造方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023199926A1 (ja) * | 2022-04-15 | 2023-10-19 | デクセリアルズ株式会社 | スクリーン及びその製造方法、並びに金型 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20120275020A1 (en) | 2012-11-01 |
| US8498050B2 (en) | 2013-07-30 |
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