JP2012204837A - 反強磁性物質層と弱い交換結合を有する磁気装置 - Google Patents

反強磁性物質層と弱い交換結合を有する磁気装置 Download PDF

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JP2012204837A
JP2012204837A JP2012064758A JP2012064758A JP2012204837A JP 2012204837 A JP2012204837 A JP 2012204837A JP 2012064758 A JP2012064758 A JP 2012064758A JP 2012064758 A JP2012064758 A JP 2012064758A JP 2012204837 A JP2012204837 A JP 2012204837A
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Japan
Prior art keywords
layer
free layer
magnetic
antiferromagnetic
magnetic device
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JP2012064758A
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Japanese (ja)
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JP2012204837A5 (enExample
Inventor
Romney R Katti
ロムニー・アール・カッティ
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Honeywell International Inc
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Honeywell International Inc
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Publication of JP2012204837A publication Critical patent/JP2012204837A/ja
Publication of JP2012204837A5 publication Critical patent/JP2012204837A5/ja
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/3218—Exchange coupling of magnetic films via an antiferromagnetic interface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3286—Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/329—Spin-exchange coupled multilayers wherein the magnetisation of the free layer is switched by a spin-polarised current, e.g. spin torque effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Hall/Mr Elements (AREA)
JP2012064758A 2011-03-23 2012-03-22 反強磁性物質層と弱い交換結合を有する磁気装置 Pending JP2012204837A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/070,249 US8525602B2 (en) 2011-03-23 2011-03-23 Magnetic device with weakly exchange coupled antiferromagnetic layer
US13/070,249 2011-03-23

Publications (2)

Publication Number Publication Date
JP2012204837A true JP2012204837A (ja) 2012-10-22
JP2012204837A5 JP2012204837A5 (enExample) 2015-05-07

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JP2012064758A Pending JP2012204837A (ja) 2011-03-23 2012-03-22 反強磁性物質層と弱い交換結合を有する磁気装置

Country Status (6)

Country Link
US (1) US8525602B2 (enExample)
EP (1) EP2503564A1 (enExample)
JP (1) JP2012204837A (enExample)
KR (1) KR20120108944A (enExample)
CN (1) CN102709465A (enExample)
IN (1) IN2012DE00855A (enExample)

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JP5542761B2 (ja) * 2011-09-20 2014-07-09 株式会社東芝 磁気抵抗効果素子およびその製造方法
US8737023B2 (en) * 2012-10-15 2014-05-27 Seagate Technology Llc Magnetic reader with tuned anisotropy
US9047894B2 (en) 2013-10-03 2015-06-02 HGST Netherlands B.V. Magnetic write head having spin torque oscillator that is self aligned with write pole
JP6173979B2 (ja) * 2014-06-30 2017-08-02 株式会社東芝 磁気ディスク装置
US9196271B1 (en) * 2014-10-21 2015-11-24 Kabushiki Kaisha Toshiba Spin-torque oscillation element and microwave-assisted magnetic recording head using the same
CN106252503B (zh) * 2015-06-15 2019-03-19 中国科学院物理研究所 基于反铁磁材料的超高频自旋微波振荡器
US9966901B2 (en) * 2015-11-19 2018-05-08 Samsung Electronics Co., Ltd. Spin-torque oscillator based on easy-cone anisotropy
CN108780779B (zh) * 2016-06-10 2023-04-25 Tdk株式会社 交换偏置利用型磁化反转元件、交换偏置利用型磁阻效应元件、交换偏置利用型磁存储器、非易失性逻辑电路及磁神经元元件
EP3961632A1 (en) * 2020-08-25 2022-03-02 Commissariat à l'Energie Atomique et aux Energies Alternatives Magnetic tunnel junction comprising an inhomogeneous granular free layer and associated spintronic devices
US12524659B2 (en) * 2021-07-21 2026-01-13 Institute of Microelectronics, Chinese Academy of Sciences Neuron device based on spin orbit torque
EP4231031A1 (en) * 2022-02-22 2023-08-23 Crocus Technology S.A. Magnetoresistive element having thermally robust performances after high-field exposure and sensor comprising the magnetoresistive element

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US6765770B2 (en) * 2001-10-11 2004-07-20 Storage Technology Corporation Apparatus and method of making a stabilized MR/GMR spin valve read element using longitudinal ferromagnetic exchange interactions
US7035062B1 (en) 2001-11-29 2006-04-25 Seagate Technology Llc Structure to achieve sensitivity and linear density in tunneling GMR heads using orthogonal magnetic alignments
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Also Published As

Publication number Publication date
KR20120108944A (ko) 2012-10-05
US8525602B2 (en) 2013-09-03
EP2503564A1 (en) 2012-09-26
CN102709465A (zh) 2012-10-03
US20120242416A1 (en) 2012-09-27
IN2012DE00855A (enExample) 2015-08-28

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