JP2012204759A5 - - Google Patents

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Publication number
JP2012204759A5
JP2012204759A5 JP2011070120A JP2011070120A JP2012204759A5 JP 2012204759 A5 JP2012204759 A5 JP 2012204759A5 JP 2011070120 A JP2011070120 A JP 2011070120A JP 2011070120 A JP2011070120 A JP 2011070120A JP 2012204759 A5 JP2012204759 A5 JP 2012204759A5
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JP
Japan
Prior art keywords
substrate
back surface
cleaning
unit
surface cleaning
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Application number
JP2011070120A
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English (en)
Japanese (ja)
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JP5686647B2 (ja
JP2012204759A (ja
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Priority to JP2011070120A priority Critical patent/JP5686647B2/ja
Priority claimed from JP2011070120A external-priority patent/JP5686647B2/ja
Publication of JP2012204759A publication Critical patent/JP2012204759A/ja
Publication of JP2012204759A5 publication Critical patent/JP2012204759A5/ja
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Publication of JP5686647B2 publication Critical patent/JP5686647B2/ja
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JP2011070120A 2011-03-28 2011-03-28 基板保持装置、基板洗浄装置および基板処理装置 Active JP5686647B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011070120A JP5686647B2 (ja) 2011-03-28 2011-03-28 基板保持装置、基板洗浄装置および基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011070120A JP5686647B2 (ja) 2011-03-28 2011-03-28 基板保持装置、基板洗浄装置および基板処理装置

Publications (3)

Publication Number Publication Date
JP2012204759A JP2012204759A (ja) 2012-10-22
JP2012204759A5 true JP2012204759A5 (enrdf_load_stackoverflow) 2014-01-16
JP5686647B2 JP5686647B2 (ja) 2015-03-18

Family

ID=47185355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011070120A Active JP5686647B2 (ja) 2011-03-28 2011-03-28 基板保持装置、基板洗浄装置および基板処理装置

Country Status (1)

Country Link
JP (1) JP5686647B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014130883A (ja) * 2012-12-28 2014-07-10 Ebara Corp 基板洗浄装置及び基板洗浄方法
JP6836432B2 (ja) * 2017-03-22 2021-03-03 株式会社荏原製作所 基板処理装置および基板処理方法
JP7172163B2 (ja) * 2018-06-20 2022-11-16 日新電機株式会社 基板保持装置
JP6811287B2 (ja) * 2019-06-25 2021-01-13 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI366222B (en) * 2004-11-23 2012-06-11 Lam Res Ag Apparatus and method for wet treatment of wafers
JP2008147423A (ja) * 2006-12-11 2008-06-26 Seiko Epson Corp 保持ピン及び保持装置
JP5430873B2 (ja) * 2008-04-16 2014-03-05 株式会社Ｓｏｋｕｄｏ 基板洗浄装置およびそれを備えた基板処理装置

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