JP2012198560A - 小型超高開口率カタジオプトリック対物系 - Google Patents
小型超高開口率カタジオプトリック対物系 Download PDFInfo
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- JP2012198560A JP2012198560A JP2012123183A JP2012123183A JP2012198560A JP 2012198560 A JP2012198560 A JP 2012198560A JP 2012123183 A JP2012123183 A JP 2012123183A JP 2012123183 A JP2012123183 A JP 2012123183A JP 2012198560 A JP2012198560 A JP 2012198560A
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- Prior art keywords
- element group
- objective system
- lens element
- catadioptric
- field
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
- G02B21/04—Objectives involving mirrors
Abstract
【解決手段】標本撮像用の超高開口率対物系であって、
レンズ素子を1個又は複数個含み入射光を合焦させて中間像を生成する合焦レンズ素子群101と、中間像の近傍に配置された視野レンズ素子112を1個又は複数個含む視野レンズ素子群102と、前記視野レンズ素子群と標本との間に配置され中間像から採光し出射光をもたらすカタジオプトリック素子群103と、を備え、カタジオプトリック素子群が、球面状反射面、有意の反りを示さない反射面を有する1個又は複数個のマンジャン素子115、並びにメニスカスレンズ素子114を有し、そのメニスカスレンズ素子が、各マンジャン素子に直接接触せず、前記球面状反射面の球面曲率半径とは実質的に逆方向にメニスカス表面曲率半径を有するメニスカス表面を備えるよう配置される。
【選択図】図1
Description
Claims (1)
- 標本撮像用の超高開口率対物系であって、
レンズ素子を1個又は複数個含み入射光を合焦させて中間像を生成する合焦レンズ素子群と、
中間像の近傍に配置された視野レンズ素子を1個又は複数個含む視野レンズ素子群と、
前記視野レンズ素子群と標本との間に配置され中間像から採光し出射光をもたらすカタジオプトリック素子群と、
を備え、カタジオプトリック素子群が、球面状反射面、有意の反りを示さない反射面を有する1個又は複数個のマンジャン素子、並びにメニスカスレンズ素子を有し、
そのメニスカスレンズ素子が、各マンジャン素子に直接接触せず、前記球面状反射面の球面曲率半径とは実質的に逆方向にメニスカス表面曲率半径を有するメニスカス表面を備えるよう配置されている、超高開口率対物系。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/093,850 US7646533B2 (en) | 2003-02-21 | 2005-03-29 | Small ultra-high NA catadioptric objective |
US11/093,850 | 2005-03-29 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008504264A Division JP2008537164A (ja) | 2005-03-29 | 2006-03-28 | 小型超高開口率カタジオプトリック対物系 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012198560A true JP2012198560A (ja) | 2012-10-18 |
JP5367126B2 JP5367126B2 (ja) | 2013-12-11 |
Family
ID=37054034
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008504264A Pending JP2008537164A (ja) | 2005-03-29 | 2006-03-28 | 小型超高開口率カタジオプトリック対物系 |
JP2012123183A Expired - Fee Related JP5367126B2 (ja) | 2005-03-29 | 2012-05-30 | 小型超高開口率カタジオプトリック対物系 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008504264A Pending JP2008537164A (ja) | 2005-03-29 | 2006-03-28 | 小型超高開口率カタジオプトリック対物系 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7646533B2 (ja) |
EP (1) | EP1864177B1 (ja) |
JP (2) | JP2008537164A (ja) |
WO (1) | WO2006105122A2 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7697198B2 (en) * | 2004-10-15 | 2010-04-13 | Carl Zeiss Smt Ag | Catadioptric projection objective |
DE102007043896A1 (de) | 2007-09-14 | 2009-04-02 | Carl Zeiss Smt Ag | Mikrooptik zur Messung der Position eines Luftbildes |
EP2294471A4 (en) * | 2008-06-17 | 2014-01-22 | Kla Tencor Corp | EXTERNAL BEAM DELIVERY SYSTEM USING A CATADIOPTRIC OBJECTIVE WITH ASPHEREIC SURFACES |
US20110143287A1 (en) * | 2009-09-14 | 2011-06-16 | Nikon Corporation | Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method |
EP2400345B1 (en) * | 2010-06-22 | 2016-05-11 | ASML Holding N.V. | Catadioptric illumination system for metrology |
JP5627476B2 (ja) * | 2011-01-19 | 2014-11-19 | キヤノン株式会社 | 反射屈折光学系及びそれを有する撮像装置 |
JP5656682B2 (ja) * | 2011-02-22 | 2015-01-21 | キヤノン株式会社 | 反射屈折光学系及びそれを有する撮像装置 |
US8908294B2 (en) | 2012-05-18 | 2014-12-09 | Canon Kabushiki Kaisha | Catadioptric optical system with high numerical aperture |
US8947775B2 (en) * | 2012-06-08 | 2015-02-03 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Catadioptric optical system with total internal reflection for high numerical aperture imaging |
US9329373B2 (en) * | 2013-02-13 | 2016-05-03 | Canon Kabushiki Kaisha | Catadioptric optical system with multi-reflection element for high numerical aperture imaging |
DE102013112212B4 (de) * | 2013-11-06 | 2022-03-10 | Carl Zeiss Smt Gmbh | Optische Zoomeinrichtung, optische Abbildungseinrichtung, optisches Zoomverfahren und Abbildungsverfahren für die Mikroskopie |
CN104991343B (zh) * | 2015-07-21 | 2017-11-24 | 哈尔滨工业大学 | 一种基于二次成像的激光准直光学系统 |
CN109478027B (zh) | 2016-05-31 | 2022-03-11 | 株式会社尼康 | 标记检测装置和标记检测方法、计测装置、曝光装置和曝光方法以及器件制造方法 |
CN108873289B (zh) * | 2018-09-04 | 2024-02-09 | 中国科学院长春光学精密机械与物理研究所 | 显微物镜光学系统及光学设备 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001517806A (ja) * | 1997-08-07 | 2001-10-09 | クラ−テンカー コーポレイション | 広範囲ズーム機能を備えた超広帯域紫外顕微鏡映像システム |
JP2003161886A (ja) * | 2001-11-26 | 2003-06-06 | Nikon Corp | 対物レンズ及びそれを用いた光学装置 |
US20040095573A1 (en) * | 2000-09-12 | 2004-05-20 | Tsai Bin-Ming Benjamin | Excimer laser inspection system |
JP2006518876A (ja) * | 2003-02-21 | 2006-08-17 | ケーエルエー・テンコール・テクノロジーズ・コーポレーション | 高性能カタディオプトリックイメージングシステム |
Family Cites Families (59)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE108181C (ja) | ||||
US1973066A (en) * | 1932-11-11 | 1934-09-11 | Zeiss Carl Fa | Microscope for examining the profiles of surfaces |
US2432668A (en) * | 1942-03-16 | 1947-12-16 | Kingston Arthur William | Production of optical lenses, prisms, and like optical elements |
US2661658A (en) * | 1948-07-19 | 1953-12-08 | Ass Elect Ind | Optical system for increasing the working distances of microscope objectives |
US3237515A (en) * | 1963-04-16 | 1966-03-01 | Bausch & Lomb | Afocal telecentric catadioptric optical system for measuring instruments |
US5449597A (en) * | 1966-04-21 | 1995-09-12 | Sawyer; George M. | Lippmann process of color photography, which produces a photograph with a 2-dimensional image, to result in another process of color photography which produces a photograph with a 3-dimensional image |
US4155630A (en) * | 1977-11-17 | 1979-05-22 | University Of Delaware | Speckle elimination by random spatial phase modulation |
US4511220A (en) * | 1982-12-23 | 1985-04-16 | The United States Of America As Represented By The Secretary Of The Air Force | Laser target speckle eliminator |
GB8410973D0 (en) * | 1984-04-30 | 1984-06-06 | Crosfield Electronics Ltd | Modifying coherent radiation |
US4779966A (en) * | 1984-12-21 | 1988-10-25 | The Perkin-Elmer Corporation | Single mirror projection optical system |
US4795244A (en) * | 1985-09-20 | 1989-01-03 | Nikon Corporation | Projection type exposure apparatus |
US4758088A (en) * | 1987-05-01 | 1988-07-19 | Laser Precision Corporation | Microscope accessory which facilitates radiation transmission measurements in the reflectance mode |
US4898471A (en) * | 1987-06-18 | 1990-02-06 | Tencor Instruments | Particle detection on patterned wafers and the like |
DE3742806A1 (de) | 1987-12-17 | 1989-07-13 | Zeiss Carl Fa | Verfahren und vorrichtung zur erzeugung von fluoreszenzbildern |
US5110505A (en) * | 1989-02-24 | 1992-05-05 | E. I. Du Pont De Nemours And Company | Small-particle semiconductors in rigid matrices |
US4971428A (en) * | 1989-03-27 | 1990-11-20 | Lenzar Optics Corporation | Catadioptric zoom lens |
US5140459A (en) * | 1989-08-29 | 1992-08-18 | Texas Instruments | Apparatus and method for optical relay and reimaging |
US4974094A (en) * | 1989-12-04 | 1990-11-27 | Yuhkoh Morito | Direct lighting/illuminating system for miniature CCD camera |
US5114238A (en) * | 1990-06-28 | 1992-05-19 | Lockheed Missiles & Space Company, Inc. | Infrared catadioptric zoom relay telescope |
US5089913A (en) * | 1990-07-11 | 1992-02-18 | International Business Machines Corporation | High resolution reduction catadioptric relay lens |
US5031976A (en) * | 1990-09-24 | 1991-07-16 | Kla Instruments, Corporation | Catadioptric imaging system |
US5274494A (en) * | 1991-04-25 | 1993-12-28 | Hughes Aircraft Company | Speckle suppression illuminator |
US5177559A (en) * | 1991-05-17 | 1993-01-05 | International Business Machines Corporation | Dark field imaging defect inspection system for repetitive pattern integrated circuits |
US5668673A (en) * | 1991-08-05 | 1997-09-16 | Nikon Corporation | Catadioptric reduction projection optical system |
US5233460A (en) * | 1992-01-31 | 1993-08-03 | Regents Of The University Of California | Method and means for reducing speckle in coherent laser pulses |
US5264912A (en) * | 1992-02-07 | 1993-11-23 | Tencor Instruments | Speckle reduction track filter apparatus for optical inspection of patterned substrates |
US6219015B1 (en) * | 1992-04-28 | 2001-04-17 | The Board Of Directors Of The Leland Stanford, Junior University | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
GB9215595D0 (en) | 1992-07-22 | 1992-09-02 | Univ Nottingham | Optical systems |
US5337170A (en) * | 1992-07-29 | 1994-08-09 | The United States Of America As Represented By The Secretary Of The Air Force | Quadratic optical processor for reducing multiplicative noise and other uses |
US5309456A (en) * | 1992-10-30 | 1994-05-03 | The United States Of America As Represented By The United States Department Of Energy | Pulse stretcher |
US5323263A (en) * | 1993-02-01 | 1994-06-21 | Nikon Precision Inc. | Off-axis catadioptric projection system |
US5636066A (en) * | 1993-03-12 | 1997-06-03 | Nikon Corporation | Optical apparatus |
JPH09311278A (ja) * | 1996-05-20 | 1997-12-02 | Nikon Corp | 反射屈折光学系 |
JP3635684B2 (ja) * | 1994-08-23 | 2005-04-06 | 株式会社ニコン | 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置 |
US5428442A (en) * | 1993-09-30 | 1995-06-27 | Optical Specialties, Inc. | Inspection system with in-lens, off-axis illuminator |
US5515207A (en) * | 1993-11-03 | 1996-05-07 | Nikon Precision Inc. | Multiple mirror catadioptric optical system |
US5434662A (en) * | 1993-12-23 | 1995-07-18 | Hughes Aircraft Company | Speckle resistant method and apparatus with chirped laser beam |
DE4413832C2 (de) * | 1994-04-20 | 2000-05-31 | Siemens Ag | Vorrichtungen zur Kontrolle von Halbleiterscheiben |
JP3395801B2 (ja) * | 1994-04-28 | 2003-04-14 | 株式会社ニコン | 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法 |
US5990983A (en) * | 1994-09-30 | 1999-11-23 | Laser Power Corporation | High resolution image projection system and method employing lasers |
US5488229A (en) * | 1994-10-04 | 1996-01-30 | Excimer Laser Systems, Inc. | Deep ultraviolet microlithography system |
US5621529A (en) * | 1995-04-05 | 1997-04-15 | Intelligent Automation Systems, Inc. | Apparatus and method for projecting laser pattern with reduced speckle noise |
US5729374A (en) * | 1995-07-03 | 1998-03-17 | The Regents Of The University Of California | Speckle averaging system for laser raster-scan image projection |
WO1997012226A1 (en) | 1995-09-25 | 1997-04-03 | Tencor Instruments | Improved system for surface inspection |
US5748365A (en) | 1996-03-26 | 1998-05-05 | Hughes Electronics | Catadioptric one-to-one telecentric image combining system |
DE19616922A1 (de) * | 1996-04-27 | 1997-10-30 | Zeiss Carl Fa | Hochauflösendes lichtstarkes Objektiv |
JPH103041A (ja) * | 1996-06-14 | 1998-01-06 | Nikon Corp | 反射屈折縮小光学系 |
JPH1020195A (ja) * | 1996-06-28 | 1998-01-23 | Nikon Corp | 反射屈折光学系 |
US5717518A (en) * | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
US6064517A (en) * | 1996-07-22 | 2000-05-16 | Kla-Tencor Corporation | High NA system for multiple mode imaging |
US6483638B1 (en) * | 1996-07-22 | 2002-11-19 | Kla-Tencor Corporation | Ultra-broadband UV microscope imaging system with wide range zoom capability |
IL141487A (en) * | 1998-08-20 | 2004-07-25 | Orbotech Ltd | Laser repetition rate multiplier |
US6370178B1 (en) * | 1998-12-21 | 2002-04-09 | Imed Lasers | Wide area laser and multi-pass laser optical cavity for use therein |
KR20010041257A (ko) * | 1998-12-25 | 2001-05-15 | 오노 시게오 | 반사굴절 결상 광학계 및 그 광학계를 구비한 투영 노광장치 |
US6191887B1 (en) * | 1999-01-20 | 2001-02-20 | Tropel Corporation | Laser illumination with speckle reduction |
JP2002082285A (ja) * | 2000-09-07 | 2002-03-22 | Nikon Corp | 反射屈折光学系および該光学系を備えた露光装置 |
US6842298B1 (en) * | 2000-09-12 | 2005-01-11 | Kla-Tencor Technologies Corporation | Broad band DUV, VUV long-working distance catadioptric imaging system |
US6548797B1 (en) * | 2000-10-20 | 2003-04-15 | Nikon Corporation | Apparatus and method for measuring a wavefront using a screen with apertures adjacent to a multi-lens array |
JP4014840B2 (ja) * | 2001-10-12 | 2007-11-28 | 株式会社日立製作所 | コマ収差補正素子およびこれを用いた光ヘッド用光学系 |
-
2005
- 2005-03-29 US US11/093,850 patent/US7646533B2/en not_active Expired - Fee Related
-
2006
- 2006-03-28 WO PCT/US2006/011342 patent/WO2006105122A2/en active Search and Examination
- 2006-03-28 JP JP2008504264A patent/JP2008537164A/ja active Pending
- 2006-03-28 EP EP06739860.2A patent/EP1864177B1/en not_active Expired - Fee Related
-
2012
- 2012-05-30 JP JP2012123183A patent/JP5367126B2/ja not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001517806A (ja) * | 1997-08-07 | 2001-10-09 | クラ−テンカー コーポレイション | 広範囲ズーム機能を備えた超広帯域紫外顕微鏡映像システム |
US20040095573A1 (en) * | 2000-09-12 | 2004-05-20 | Tsai Bin-Ming Benjamin | Excimer laser inspection system |
JP2003161886A (ja) * | 2001-11-26 | 2003-06-06 | Nikon Corp | 対物レンズ及びそれを用いた光学装置 |
JP2006518876A (ja) * | 2003-02-21 | 2006-08-17 | ケーエルエー・テンコール・テクノロジーズ・コーポレーション | 高性能カタディオプトリックイメージングシステム |
Also Published As
Publication number | Publication date |
---|---|
EP1864177A4 (en) | 2012-01-25 |
EP1864177B1 (en) | 2014-05-28 |
WO2006105122A2 (en) | 2006-10-05 |
US20060158720A1 (en) | 2006-07-20 |
JP5367126B2 (ja) | 2013-12-11 |
EP1864177A2 (en) | 2007-12-12 |
WO2006105122A3 (en) | 2007-07-19 |
US7646533B2 (en) | 2010-01-12 |
JP2008537164A (ja) | 2008-09-11 |
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