JP2012198436A5 - - Google Patents

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Publication number
JP2012198436A5
JP2012198436A5 JP2011063354A JP2011063354A JP2012198436A5 JP 2012198436 A5 JP2012198436 A5 JP 2012198436A5 JP 2011063354 A JP2011063354 A JP 2011063354A JP 2011063354 A JP2011063354 A JP 2011063354A JP 2012198436 A5 JP2012198436 A5 JP 2012198436A5
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JP
Japan
Prior art keywords
edge
correction value
distribution information
edge position
dimensional distribution
Prior art date
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Application number
JP2011063354A
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English (en)
Japanese (ja)
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JP2012198436A (ja
JP5651511B2 (ja
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Priority to JP2011063354A priority Critical patent/JP5651511B2/ja
Priority claimed from JP2011063354A external-priority patent/JP5651511B2/ja
Priority to US13/427,206 priority patent/US8873830B2/en
Publication of JP2012198436A publication Critical patent/JP2012198436A/ja
Publication of JP2012198436A5 publication Critical patent/JP2012198436A5/ja
Application granted granted Critical
Publication of JP5651511B2 publication Critical patent/JP5651511B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011063354A 2011-03-22 2011-03-22 フォトマスクのパターンの輪郭抽出方法、輪郭抽出装置 Expired - Fee Related JP5651511B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011063354A JP5651511B2 (ja) 2011-03-22 2011-03-22 フォトマスクのパターンの輪郭抽出方法、輪郭抽出装置
US13/427,206 US8873830B2 (en) 2011-03-22 2012-03-22 Method for extracting contour of pattern on photo mask, contour extraction apparatus, method for guaranteeing photo mask, and method for manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011063354A JP5651511B2 (ja) 2011-03-22 2011-03-22 フォトマスクのパターンの輪郭抽出方法、輪郭抽出装置

Publications (3)

Publication Number Publication Date
JP2012198436A JP2012198436A (ja) 2012-10-18
JP2012198436A5 true JP2012198436A5 (https=) 2013-06-13
JP5651511B2 JP5651511B2 (ja) 2015-01-14

Family

ID=46877401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011063354A Expired - Fee Related JP5651511B2 (ja) 2011-03-22 2011-03-22 フォトマスクのパターンの輪郭抽出方法、輪郭抽出装置

Country Status (2)

Country Link
US (1) US8873830B2 (https=)
JP (1) JP5651511B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102085522B1 (ko) 2013-11-14 2020-03-06 삼성전자 주식회사 패턴의 결함 탐지 방법
DE102013020705B4 (de) * 2013-12-10 2018-01-25 Carl Zeiss Smt Gmbh Verfahren zur Untersuchung einer Maske
EP3274698A4 (en) * 2015-03-23 2018-12-26 Techinsights Inc. Methods, systems and devices relating to distortion correction in imaging devices
US9928316B2 (en) 2015-03-26 2018-03-27 International Business Machines Corporation Process-metrology reproducibility bands for lithographic photomasks
US10354373B2 (en) 2017-04-26 2019-07-16 Kla-Tencor Corporation System and method for photomask alignment and orientation characterization based on notch detection
KR20230064407A (ko) * 2021-11-03 2023-05-10 삼성전자주식회사 머신 러닝 기반 마스크 레이아웃 보정 방법, 및 그 보정 방법을 포함한 마스크 제조방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3512621B2 (ja) * 1998-02-24 2004-03-31 株式会社東芝 パターン寸法測定方法およびパターン寸法測定処理プログラムを記録した記録媒体
JP2005309140A (ja) 2004-04-22 2005-11-04 Toshiba Corp フォトマスク製造方法、フォトマスク欠陥修正箇所判定方法、及びフォトマスク欠陥修正箇所判定装置
JP4008934B2 (ja) * 2004-05-28 2007-11-14 株式会社東芝 画像データの補正方法、リソグラフィシミュレーション方法、プログラム及びマスク
US7313781B2 (en) 2004-05-28 2007-12-25 Kabushiki Kaisha Toshiba Image data correction method, lithography simulation method, image data correction system, program, mask and method of manufacturing a semiconductor device
JP5069814B2 (ja) * 2004-11-19 2012-11-07 株式会社ホロン 測定値の判定方法
JP4675854B2 (ja) 2006-07-25 2011-04-27 株式会社東芝 パターン評価方法と評価装置及びパターン評価プログラム
JP4856047B2 (ja) * 2007-11-12 2012-01-18 株式会社東芝 マスクパターン寸法検査方法およびマスクパターン寸法検査装置
JP4801697B2 (ja) 2008-06-09 2011-10-26 株式会社日立ハイテクノロジーズ 画像形成方法，画像形成装置、及びコンピュータプログラム
US20110208477A1 (en) * 2008-11-05 2011-08-25 Keiichiro Hitomi Measuring method of pattern dimension and scanning electron microscope using same
WO2010073360A1 (ja) * 2008-12-26 2010-07-01 株式会社アドバンテスト パターン測定装置及びパターン測定方法
JP2011043458A (ja) 2009-08-24 2011-03-03 Hitachi High-Technologies Corp パターン寸法計測方法及びそのシステム
DE112009002638T5 (de) * 2009-10-30 2012-05-16 Advantest Corp. Strukturmessgerät und Strukturmessverfahren

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