JP2012191018A5 - - Google Patents

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Publication number
JP2012191018A5
JP2012191018A5 JP2011053556A JP2011053556A JP2012191018A5 JP 2012191018 A5 JP2012191018 A5 JP 2012191018A5 JP 2011053556 A JP2011053556 A JP 2011053556A JP 2011053556 A JP2011053556 A JP 2011053556A JP 2012191018 A5 JP2012191018 A5 JP 2012191018A5
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JP
Japan
Prior art keywords
value
evaluation item
evaluation
target
optical system
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Application number
JP2011053556A
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English (en)
Japanese (ja)
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JP2012191018A (ja
JP5728259B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2011053556A priority Critical patent/JP5728259B2/ja
Priority claimed from JP2011053556A external-priority patent/JP5728259B2/ja
Priority to US13/409,466 priority patent/US8584055B2/en
Priority to CN201210061014.5A priority patent/CN102681354B/zh
Priority to KR1020120024427A priority patent/KR101390586B1/ko
Publication of JP2012191018A publication Critical patent/JP2012191018A/ja
Publication of JP2012191018A5 publication Critical patent/JP2012191018A5/ja
Application granted granted Critical
Publication of JP5728259B2 publication Critical patent/JP5728259B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011053556A 2011-03-10 2011-03-10 プログラム及び決定方法 Expired - Fee Related JP5728259B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011053556A JP5728259B2 (ja) 2011-03-10 2011-03-10 プログラム及び決定方法
US13/409,466 US8584055B2 (en) 2011-03-10 2012-03-01 Non-transitory computer-readable storage medium, decision method and computer for deciding exposure condition using evaluation item of interest and auxiliary evaluation item
CN201210061014.5A CN102681354B (zh) 2011-03-10 2012-03-09 决定方法和计算机
KR1020120024427A KR101390586B1 (ko) 2011-03-10 2012-03-09 컴퓨터 판독가능 저장 매체, 결정 방법 및 컴퓨터

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011053556A JP5728259B2 (ja) 2011-03-10 2011-03-10 プログラム及び決定方法

Publications (3)

Publication Number Publication Date
JP2012191018A JP2012191018A (ja) 2012-10-04
JP2012191018A5 true JP2012191018A5 (https=) 2014-04-17
JP5728259B2 JP5728259B2 (ja) 2015-06-03

Family

ID=46797206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011053556A Expired - Fee Related JP5728259B2 (ja) 2011-03-10 2011-03-10 プログラム及び決定方法

Country Status (4)

Country Link
US (1) US8584055B2 (https=)
JP (1) JP5728259B2 (https=)
KR (1) KR101390586B1 (https=)
CN (1) CN102681354B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5835968B2 (ja) * 2011-07-05 2015-12-24 キヤノン株式会社 決定方法、プログラム及び露光方法
JP5784657B2 (ja) 2013-02-26 2015-09-24 株式会社東芝 フォーカス位置調整装置、レチクル、フォーカス位置調整プログラムおよび半導体装置の製造方法
US10678143B2 (en) 2016-06-09 2020-06-09 Asml Netherlands B.V. Projection system modelling method
CN116068864B (zh) * 2023-01-17 2026-02-24 智腾科技股份有限公司 可提升光刻图形清晰度的次分辨率辅助特征图形生成方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6563566B2 (en) * 2001-01-29 2003-05-13 International Business Machines Corporation System and method for printing semiconductor patterns using an optimized illumination and reticle
JP3910032B2 (ja) * 2001-09-25 2007-04-25 大日本スクリーン製造株式会社 基板現像装置
WO2004099874A1 (ja) * 2003-04-16 2004-11-18 Nikon Corporation パターン決定方法及びシステム、マスクの製造方法、結像性能調整方法、露光方法及び装置、並びにプログラム及び情報記録媒体
JP2005136364A (ja) * 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
JP4778685B2 (ja) * 2004-03-10 2011-09-21 株式会社日立ハイテクノロジーズ 半導体デバイスのパターン形状評価方法及びその装置
TW200745771A (en) * 2006-02-17 2007-12-16 Nikon Corp Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
US8134681B2 (en) * 2006-02-17 2012-03-13 Nikon Corporation Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
JP5235322B2 (ja) 2006-07-12 2013-07-10 キヤノン株式会社 原版データ作成方法及び原版データ作成プログラム
US20080158529A1 (en) * 2006-12-28 2008-07-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5217442B2 (ja) 2008-01-08 2013-06-19 富士通セミコンダクター株式会社 露光データ作成方法及び露光方法
JP2010045309A (ja) * 2008-08-18 2010-02-25 Fujitsu Microelectronics Ltd 露光方法及び半導体装置の製造方法
US8739079B2 (en) * 2009-10-30 2014-05-27 Canon Kabushiki Kaisha Recording medium and determination method

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