JP2012182474A5 - - Google Patents
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- Publication number
- JP2012182474A5 JP2012182474A5 JP2012101324A JP2012101324A JP2012182474A5 JP 2012182474 A5 JP2012182474 A5 JP 2012182474A5 JP 2012101324 A JP2012101324 A JP 2012101324A JP 2012101324 A JP2012101324 A JP 2012101324A JP 2012182474 A5 JP2012182474 A5 JP 2012182474A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- etching
- resist
- opening
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 description 17
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- 239000001569 carbon dioxide Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012101324A JP2012182474A (ja) | 2012-04-26 | 2012-04-26 | 半導体装置の製造方法及び記憶媒体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012101324A JP2012182474A (ja) | 2012-04-26 | 2012-04-26 | 半導体装置の製造方法及び記憶媒体 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007210229A Division JP2009044090A (ja) | 2007-08-10 | 2007-08-10 | 半導体装置の製造方法及び記憶媒体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012182474A JP2012182474A (ja) | 2012-09-20 |
| JP2012182474A5 true JP2012182474A5 (https=) | 2012-11-01 |
Family
ID=47013354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012101324A Pending JP2012182474A (ja) | 2012-04-26 | 2012-04-26 | 半導体装置の製造方法及び記憶媒体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2012182474A (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9054158B2 (en) * | 2013-02-08 | 2015-06-09 | Texas Instruments Incorporated | Method of forming a metal contact opening with a width that is smaller than the minimum feature size of a photolithographically-defined opening |
| JP7178826B2 (ja) * | 2018-08-22 | 2022-11-28 | 東京エレクトロン株式会社 | 処理方法 |
| JP7220603B2 (ja) * | 2019-03-20 | 2023-02-10 | 東京エレクトロン株式会社 | 膜をエッチングする方法及びプラズマ処理装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3923927B2 (ja) * | 2003-07-07 | 2007-06-06 | 沖電気工業株式会社 | 半導体装置の製造方法 |
| JP4652140B2 (ja) * | 2005-06-21 | 2011-03-16 | 東京エレクトロン株式会社 | プラズマエッチング方法、制御プログラム、コンピュータ記憶媒体 |
| JP2007123399A (ja) * | 2005-10-26 | 2007-05-17 | Hitachi High-Technologies Corp | ドライエッチング方法 |
-
2012
- 2012-04-26 JP JP2012101324A patent/JP2012182474A/ja active Pending
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