JP2012151304A5 - - Google Patents

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Publication number
JP2012151304A5
JP2012151304A5 JP2011009198A JP2011009198A JP2012151304A5 JP 2012151304 A5 JP2012151304 A5 JP 2012151304A5 JP 2011009198 A JP2011009198 A JP 2011009198A JP 2011009198 A JP2011009198 A JP 2011009198A JP 2012151304 A5 JP2012151304 A5 JP 2012151304A5
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JP
Japan
Prior art keywords
energy beam
catalyst
substrate
drawing apparatus
gas
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JP2011009198A
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English (en)
Japanese (ja)
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JP2012151304A (ja
JP5709546B2 (ja
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Priority to JP2011009198A priority Critical patent/JP5709546B2/ja
Priority claimed from JP2011009198A external-priority patent/JP5709546B2/ja
Priority to US13/353,571 priority patent/US8563950B2/en
Publication of JP2012151304A publication Critical patent/JP2012151304A/ja
Publication of JP2012151304A5 publication Critical patent/JP2012151304A5/ja
Application granted granted Critical
Publication of JP5709546B2 publication Critical patent/JP5709546B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011009198A 2011-01-19 2011-01-19 エネルギービーム描画装置及びデバイス製造方法 Expired - Fee Related JP5709546B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011009198A JP5709546B2 (ja) 2011-01-19 2011-01-19 エネルギービーム描画装置及びデバイス製造方法
US13/353,571 US8563950B2 (en) 2011-01-19 2012-01-19 Energy beam drawing apparatus and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011009198A JP5709546B2 (ja) 2011-01-19 2011-01-19 エネルギービーム描画装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2012151304A JP2012151304A (ja) 2012-08-09
JP2012151304A5 true JP2012151304A5 (enExample) 2014-03-06
JP5709546B2 JP5709546B2 (ja) 2015-04-30

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JP2011009198A Expired - Fee Related JP5709546B2 (ja) 2011-01-19 2011-01-19 エネルギービーム描画装置及びデバイス製造方法

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US (1) US8563950B2 (enExample)
JP (1) JP5709546B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5759186B2 (ja) * 2011-01-19 2015-08-05 キヤノン株式会社 荷電粒子線描画装置及びデバイス製造方法
JP5709546B2 (ja) * 2011-01-19 2015-04-30 キヤノン株式会社 エネルギービーム描画装置及びデバイス製造方法
CN106933063B (zh) * 2012-03-20 2019-01-18 迈普尔平版印刷Ip有限公司 电子射束光刻系统
KR101586181B1 (ko) * 2013-03-28 2016-01-15 시바우라 메카트로닉스 가부시끼가이샤 적재대 및 플라즈마 처리 장치
WO2016103432A1 (ja) * 2014-12-26 2016-06-30 株式会社 日立ハイテクノロジーズ 複合荷電粒子線装置およびその制御方法
US9981293B2 (en) 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems
DE102018221191A1 (de) * 2018-12-07 2020-06-10 Carl Zeiss Smt Gmbh Optisches Element zur Reflexion von VUV-Strahlung und optische Anordnung

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US6146135A (en) * 1991-08-19 2000-11-14 Tadahiro Ohmi Oxide film forming method
JP2666734B2 (ja) * 1994-08-30 1997-10-22 日本電気株式会社 無機レジスト描画装置及び描画方法
JP3827359B2 (ja) * 1996-03-19 2006-09-27 富士通株式会社 荷電粒子ビーム露光方法及びその装置
JP3047293B1 (ja) * 1999-01-18 2000-05-29 株式会社日立製作所 荷電粒子ビ―ム装置およびこれを用いた半導体集積回路
JP2002237443A (ja) * 2001-02-09 2002-08-23 Nikon Corp 汚染除去装置、露光装置の汚染除去方法及び露光装置
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JP2003227898A (ja) * 2002-02-01 2003-08-15 Nikon Corp 多層膜反射鏡、軟ｘ線光学機器、露光装置及びその清掃方法
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JP5759186B2 (ja) * 2011-01-19 2015-08-05 キヤノン株式会社 荷電粒子線描画装置及びデバイス製造方法
JP5709546B2 (ja) * 2011-01-19 2015-04-30 キヤノン株式会社 エネルギービーム描画装置及びデバイス製造方法

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