JP2012132708A5 - - Google Patents
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- Publication number
- JP2012132708A5 JP2012132708A5 JP2010283078A JP2010283078A JP2012132708A5 JP 2012132708 A5 JP2012132708 A5 JP 2012132708A5 JP 2010283078 A JP2010283078 A JP 2010283078A JP 2010283078 A JP2010283078 A JP 2010283078A JP 2012132708 A5 JP2012132708 A5 JP 2012132708A5
- Authority
- JP
- Japan
- Prior art keywords
- dissolved oxygen
- oxygen concentration
- concentration
- dissolved
- ultrasonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 17
- 239000001301 oxygen Substances 0.000 description 17
- 229910052760 oxygen Inorganic materials 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 229910021642 ultra pure water Inorganic materials 0.000 description 6
- 239000012498 ultrapure water Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010283078A JP5298112B2 (ja) | 2010-12-20 | 2010-12-20 | 溶存窒素濃度のモニタリング方法 |
| KR1020137018767A KR101516905B1 (ko) | 2010-12-20 | 2011-12-13 | 용존 질소 농도 모니터링 방법, 기판 세정 방법, 및 기판 세정 장치 |
| MYPI2013001645A MY168210A (en) | 2010-12-20 | 2011-12-13 | Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus |
| PCT/EP2011/072639 WO2012084610A1 (en) | 2010-12-20 | 2011-12-13 | Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus |
| CN201180061112.2A CN103261885B (zh) | 2010-12-20 | 2011-12-13 | 溶解氮浓度监测方法及基材清洁方法 |
| US13/995,568 US8778085B2 (en) | 2010-12-20 | 2011-12-13 | Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus |
| SG2013030630A SG189963A1 (en) | 2010-12-20 | 2011-12-13 | Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus |
| EP11805808.0A EP2656064B1 (en) | 2010-12-20 | 2011-12-13 | Dissolved nitrogen concentration monitoring method and substrate cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010283078A JP5298112B2 (ja) | 2010-12-20 | 2010-12-20 | 溶存窒素濃度のモニタリング方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012132708A JP2012132708A (ja) | 2012-07-12 |
| JP2012132708A5 true JP2012132708A5 (enExample) | 2012-08-23 |
| JP5298112B2 JP5298112B2 (ja) | 2013-09-25 |
Family
ID=45464511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010283078A Active JP5298112B2 (ja) | 2010-12-20 | 2010-12-20 | 溶存窒素濃度のモニタリング方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8778085B2 (enExample) |
| EP (1) | EP2656064B1 (enExample) |
| JP (1) | JP5298112B2 (enExample) |
| KR (1) | KR101516905B1 (enExample) |
| CN (1) | CN103261885B (enExample) |
| MY (1) | MY168210A (enExample) |
| SG (1) | SG189963A1 (enExample) |
| WO (1) | WO2012084610A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3858501B1 (en) * | 2018-09-26 | 2024-04-03 | Nippon Steel Corporation | Metal pipe cleaning method and cleaning device |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH679890A5 (enExample) | 1989-11-17 | 1992-04-30 | Orbisphere Lab | |
| JP3742451B2 (ja) * | 1996-01-17 | 2006-02-01 | 昌之 都田 | 洗浄方法 |
| US6058945A (en) * | 1996-05-28 | 2000-05-09 | Canon Kabushiki Kaisha | Cleaning methods of porous surface and semiconductor surface |
| US5800626A (en) * | 1997-02-18 | 1998-09-01 | International Business Machines Corporation | Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates |
| JPH10335294A (ja) * | 1997-06-05 | 1998-12-18 | Toshiba Corp | 基板洗浄装置、洗浄方法およびその方法を用いて製造した半導体装置 |
| JP4232186B2 (ja) * | 1998-10-23 | 2009-03-04 | 栗田工業株式会社 | 超純水中の溶存窒素濃度測定装置及び測定方法 |
| JP2003234320A (ja) | 2002-02-06 | 2003-08-22 | Nec Electronics Corp | 基板の洗浄方法、洗浄薬液、洗浄装置及び半導体装置 |
| US6848455B1 (en) * | 2002-04-22 | 2005-02-01 | Novellus Systems, Inc. | Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species |
| JP2006310456A (ja) * | 2005-04-27 | 2006-11-09 | Dainippon Screen Mfg Co Ltd | パーティクル除去方法および基板処理装置 |
| JP2009054919A (ja) * | 2007-08-29 | 2009-03-12 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
-
2010
- 2010-12-20 JP JP2010283078A patent/JP5298112B2/ja active Active
-
2011
- 2011-12-13 SG SG2013030630A patent/SG189963A1/en unknown
- 2011-12-13 US US13/995,568 patent/US8778085B2/en active Active
- 2011-12-13 EP EP11805808.0A patent/EP2656064B1/en active Active
- 2011-12-13 CN CN201180061112.2A patent/CN103261885B/zh active Active
- 2011-12-13 KR KR1020137018767A patent/KR101516905B1/ko active Active
- 2011-12-13 WO PCT/EP2011/072639 patent/WO2012084610A1/en not_active Ceased
- 2011-12-13 MY MYPI2013001645A patent/MY168210A/en unknown
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