JP2012129479A5 - - Google Patents

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Publication number
JP2012129479A5
JP2012129479A5 JP2010282239A JP2010282239A JP2012129479A5 JP 2012129479 A5 JP2012129479 A5 JP 2012129479A5 JP 2010282239 A JP2010282239 A JP 2010282239A JP 2010282239 A JP2010282239 A JP 2010282239A JP 2012129479 A5 JP2012129479 A5 JP 2012129479A5
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Japan
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shape
resist
data
charged particle
particle beam
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JP2010282239A
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Japanese (ja)
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JP5658997B2 (ja
JP2012129479A (ja
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JP2010282239A 2010-12-17 2010-12-17 荷電粒子ビーム描画装置および描画データ生成方法 Expired - Fee Related JP5658997B2 (ja)

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JP2010282239A JP5658997B2 (ja) 2010-12-17 2010-12-17 荷電粒子ビーム描画装置および描画データ生成方法

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Application Number Priority Date Filing Date Title
JP2010282239A JP5658997B2 (ja) 2010-12-17 2010-12-17 荷電粒子ビーム描画装置および描画データ生成方法

Publications (3)

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JP2012129479A JP2012129479A (ja) 2012-07-05
JP2012129479A5 true JP2012129479A5 (enrdf_load_stackoverflow) 2014-01-16
JP5658997B2 JP5658997B2 (ja) 2015-01-28

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JP2010282239A Expired - Fee Related JP5658997B2 (ja) 2010-12-17 2010-12-17 荷電粒子ビーム描画装置および描画データ生成方法

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JP (1) JP5658997B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016076654A (ja) 2014-10-08 2016-05-12 株式会社ニューフレアテクノロジー 描画データ生成方法、プログラム、マルチ荷電粒子ビーム描画装置、及びパターン検査装置
EP3037878B1 (en) * 2014-12-23 2020-09-09 Aselta Nanographics Method of applying vertex based corrections to a semiconductor design
JP6679933B2 (ja) * 2016-01-05 2020-04-15 株式会社ニューフレアテクノロジー 描画データ作成方法
CN114341735B (zh) 2019-09-23 2024-03-08 应用材料公司 用于数字光刻装置的数字图案文件优化
JP7506870B2 (ja) * 2020-04-08 2024-06-27 日本コントロールシステム株式会社 マスク情報調整装置、マスクデータ調整方法、プログラム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204125A (en) * 1981-06-10 1982-12-14 Hitachi Ltd Electron-ray drawing device
JPS63199421A (ja) * 1987-02-16 1988-08-17 Toshiba Corp 荷電ビ−ム描画方法
JPH02170516A (ja) * 1988-12-23 1990-07-02 Jeol Ltd 荷電粒子ビーム描画装置
JPH09293669A (ja) * 1996-04-26 1997-11-11 Toshiba Corp 荷電ビーム描画装置および描画方法
JPH10270341A (ja) * 1997-03-28 1998-10-09 Jeol Ltd 電子ビーム描画方法
JP4752152B2 (ja) * 2001-08-08 2011-08-17 ソニー株式会社 描画用パターンの分割処理方法、描画用パターンの分割処理装置、描画方法、マスクの作成方法、半導体装置の製造方法、描画用パターンの分割処理プログラム及びこのプログラムを記録したコンピュータ読みとり可能な記録媒体
JP5257571B2 (ja) * 2007-09-07 2013-08-07 大日本印刷株式会社 図形パターン分割方法
JP2009177051A (ja) * 2008-01-28 2009-08-06 Jeol Ltd 荷電粒子ビーム描画装置のパターン描画方法及び装置
JP5216347B2 (ja) * 2008-02-04 2013-06-19 株式会社ニューフレアテクノロジー 描画装置及び描画データの変換方法
JP2011077313A (ja) * 2009-09-30 2011-04-14 Nuflare Technology Inc 荷電粒子ビーム描画装置およびその描画データ作成方法
JP5631151B2 (ja) * 2010-10-20 2014-11-26 株式会社ニューフレアテクノロジー 描画データの製造方法

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