JP2012093685A - 透明光学基材及び該基材面への光触媒無機酸化金属膜形成方法 - Google Patents
透明光学基材及び該基材面への光触媒無機酸化金属膜形成方法 Download PDFInfo
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- JP2012093685A JP2012093685A JP2010252298A JP2010252298A JP2012093685A JP 2012093685 A JP2012093685 A JP 2012093685A JP 2010252298 A JP2010252298 A JP 2010252298A JP 2010252298 A JP2010252298 A JP 2010252298A JP 2012093685 A JP2012093685 A JP 2012093685A
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- 239000000758 substrate Substances 0.000 title claims abstract description 71
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 41
- 230000003287 optical effect Effects 0.000 title claims abstract description 36
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 22
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims description 25
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 97
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 89
- 239000011941 photocatalyst Substances 0.000 claims abstract description 66
- 239000011882 ultra-fine particle Substances 0.000 claims abstract description 30
- 239000000835 fiber Substances 0.000 claims abstract description 25
- 239000010936 titanium Substances 0.000 claims abstract description 15
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 7
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 6
- 229910052709 silver Inorganic materials 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 30
- 239000007788 liquid Substances 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- 229910052809 inorganic oxide Inorganic materials 0.000 claims description 24
- 239000011230 binding agent Substances 0.000 claims description 15
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 150000002739 metals Chemical class 0.000 claims 1
- 239000002245 particle Substances 0.000 abstract description 39
- 238000000576 coating method Methods 0.000 abstract description 33
- 239000011248 coating agent Substances 0.000 abstract description 32
- 230000000694 effects Effects 0.000 abstract description 19
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 27
- 229910004298 SiO 2 Inorganic materials 0.000 description 20
- 239000002585 base Substances 0.000 description 17
- 239000002131 composite material Substances 0.000 description 17
- 229910010413 TiO 2 Inorganic materials 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
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- 229910052760 oxygen Inorganic materials 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000002657 fibrous material Substances 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000007602 hot air drying Methods 0.000 description 4
- 229920001410 Microfiber Polymers 0.000 description 3
- -1 TiO 2 Chemical class 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 230000001877 deodorizing effect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000002923 metal particle Substances 0.000 description 3
- FMLYSTGQBVZCGN-UHFFFAOYSA-N oxosilicon(2+) oxygen(2-) titanium(4+) Chemical compound [O-2].[Ti+4].[Si+2]=O.[O-2].[O-2] FMLYSTGQBVZCGN-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
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- 239000003513 alkali Substances 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
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- 239000011164 primary particle Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- STWBBMAVGPQSFG-UHFFFAOYSA-N [Sn+2]=O.[O-2].[Zr+4].[O-2].[Ti+4] Chemical compound [Sn+2]=O.[O-2].[Zr+4].[O-2].[Ti+4] STWBBMAVGPQSFG-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002519 antifouling agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000000160 carbon, hydrogen and nitrogen elemental analysis Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
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- 238000000354 decomposition reaction Methods 0.000 description 1
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- 229910001873 dinitrogen Inorganic materials 0.000 description 1
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- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- ZHPNWZCWUUJAJC-UHFFFAOYSA-N fluorosilicon Chemical compound [Si]F ZHPNWZCWUUJAJC-UHFFFAOYSA-N 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
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- 239000003960 organic solvent Substances 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 229920000747 poly(lactic acid) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
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Abstract
【解決手段】
光触媒無機酸化金属膜である少なくとも酸化チタンが繊維状超微粒子であり、平均繊維幅及び厚さが1〜50nm、平均繊維長さが10〜1000nm、平均アスペクト比が2〜100、比表面積が30m2/g以上であり、光触媒中の無機元素が半定量値において、少なくともTiが90〜97wt%、Siが2.3〜30wt%、Agが1.4〜2.2wt%、Znが0.2〜0.3wt%含み、有機元素が定量値において少なくともCが55〜65wt%、Hが8〜12wt%、Nが0.2〜0.4wt%含み、基材面に定着させた酸化チタンを含む光触媒無機酸化金属膜が鉛筆硬度3H以上である透明光学基材とした。
【選択図】なし
Description
引用文献2 特開2000−344510号公報
引用文献3 特開2007−270097号公報
引用文献4 特開平10−306258号公報
引用文献5 特開2010−069469号公報
引用文献6 特開2001−038222号公報
引用文献7 特開2000−318089号公報
引用文献8 特開2001−277418号公報
引用文献9 特開2001−089708号公報
引用文献10 特開2005−035198号公報
以下の装置・条件で測定し、含有元素の定性・半定量を行った。
装置;理学電気(株)製 全自動蛍光X線分析装置、RIX−3000
管球;Rh管球 測定径;25mmφ
無機元素含有量=無機元素測定値×(100−CHN含有量)/100
すなわち、有機物由来と考えられるCHNの含有量(約70%)を全量から除き、その残りの(約30%)を無機元素含有量で割り振った。ただし、本測定では、必ず含まれているO(酸素)の含有量を把握できないため、無機元素の含有量には“<”を付した。Tiの形態をTiO2と仮定すると、含まれるTiとOとの重量比は100:67となり、上表の推算値は次表のように換算される。
Claims (2)
- 液状光触媒中の無機酸化金属である少なくとも酸化チタンが繊維状超微粒子であり、平均繊維幅及び厚さが1〜50nm、平均繊維長さが10〜1000nm、平均アスペクト比が2〜100、比表面積が30m2/g以上であり、光触媒中の無機元素が半定量値において少なくともTiが90〜97wt%、Siが2.3〜3.0wt%、Agが1.4〜2.2wt%、Znが0.2〜0.3wt%含み、有機元素が定量値において少なくともCが55〜65wt%、Hが8〜12wt%、Nが0.2〜0.4wt%含み、基材面に定着させた酸化チタンを含む光触媒無機酸化金属膜が鉛筆硬度で約3H以上である透明光学基材。
- 無機酸化金属である少なくとも酸化チタンが繊維状超微粒子であり、平均繊維幅及び厚さが1〜50nm、平均繊維長さが10〜1000nm、平均アスペクト比が2〜100、比表面積が30m2/g以上であり、光触媒中の無機元素が半定量値において少なくともTiが90〜97wt%、Siが2.3〜3.0wt%、Agが1.4〜2.2wt%、Znが0.2〜0.3wt%含み、有機元素が定量値において少なくともCが55〜65wt%、Hが8〜12wt%、Nが0.2〜0.4wt%含み、酸化チタン等の無機酸化物金属を有機バインダーと合わせた合計含量の約15%以上とした液状光触媒中に、透明光学基材を約1分以上浸漬した後、120℃以下で乾燥させて無機酸化金属を基材面に高密度に定着させるようにした透明光学基材面への光触媒無機酸化金属膜形成方法。
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1191030A (ja) * | 1997-09-25 | 1999-04-06 | Toto Ltd | 光触媒性親水性部材 |
JP2000206302A (ja) * | 1999-01-12 | 2000-07-28 | Kuraray Co Ltd | 映像表示装置用フィルタ― |
JP2002286904A (ja) * | 2001-03-27 | 2002-10-03 | Seiko Epson Corp | 光学部品およびこれを用いたプロジェクタ |
JP2003055841A (ja) * | 2001-08-10 | 2003-02-26 | Sumitomo Chem Co Ltd | 酸化チタン繊維およびそれを用いてなる光触媒体 |
JP2005058941A (ja) * | 2003-08-18 | 2005-03-10 | Asahi Kasei Chemicals Corp | 防汚性プラズマディスプレイパネル |
JP2010069469A (ja) * | 2008-09-22 | 2010-04-02 | Kagoshima Eden Denki:Kk | 光触媒脱臭殺菌方法及びこれに使用する透明液状光触媒。 |
-
2010
- 2010-10-22 JP JP2010252298A patent/JP5424129B2/ja not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1191030A (ja) * | 1997-09-25 | 1999-04-06 | Toto Ltd | 光触媒性親水性部材 |
JP2000206302A (ja) * | 1999-01-12 | 2000-07-28 | Kuraray Co Ltd | 映像表示装置用フィルタ― |
JP2002286904A (ja) * | 2001-03-27 | 2002-10-03 | Seiko Epson Corp | 光学部品およびこれを用いたプロジェクタ |
JP2003055841A (ja) * | 2001-08-10 | 2003-02-26 | Sumitomo Chem Co Ltd | 酸化チタン繊維およびそれを用いてなる光触媒体 |
JP2005058941A (ja) * | 2003-08-18 | 2005-03-10 | Asahi Kasei Chemicals Corp | 防汚性プラズマディスプレイパネル |
JP2010069469A (ja) * | 2008-09-22 | 2010-04-02 | Kagoshima Eden Denki:Kk | 光触媒脱臭殺菌方法及びこれに使用する透明液状光触媒。 |
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