JP2012074575A - Semiconductor package substrate - Google Patents

Semiconductor package substrate Download PDF

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JP2012074575A
JP2012074575A JP2010218899A JP2010218899A JP2012074575A JP 2012074575 A JP2012074575 A JP 2012074575A JP 2010218899 A JP2010218899 A JP 2010218899A JP 2010218899 A JP2010218899 A JP 2010218899A JP 2012074575 A JP2012074575 A JP 2012074575A
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connection terminal
solder
convex shape
semiconductor package
package substrate
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Norihiro Nishida
典弘 西田
Tadashi Tamura
匡史 田村
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Resonac Corp
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Hitachi Chemical Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor package substrate capable of coping with densification and in which a solder bump having a volume and a height required for connection can be formed at a predetermined position in a longitudinal direction of a connection terminal by providing a convex shape at a part of the longitudinal-shaped connection terminal for connecting with a semiconductor element.SOLUTION: A semiconductor package substrate has a plurality of longitudinal-shaped connection terminals for connecting with a semiconductor element. These connection terminals are aligned in a lateral direction. A convex shape is formed in a part in the longitudinal direction of the connection terminals. The convex shape may be formed at a predetermined position in the longitudinal direction of the connection terminals aligned in the lateral direction. A length of the convex shape in the longitudinal direction of the connection terminals is one-fifth to one-third of a length of the connection terminal.

Description

本発明は、半導体パッケージ基板に関するものであり、特には、半導体素子実装用の接続端子上に設けるはんだバンプを、所定の位置に安定して形成することにより、接続信頼性を向上することができる半導体パッケージ基板に関するものである。   The present invention relates to a semiconductor package substrate, and in particular, it is possible to improve connection reliability by stably forming solder bumps provided on connection terminals for mounting semiconductor elements at predetermined positions. The present invention relates to a semiconductor package substrate.

従来、半導体パッケージ基板を用いて半導体素子を接続するには、半導体パッケージ基板の接続端子側にはんだバンプを形成し、半導体素子側には金バンプ等を形成して、両者を圧着し、さらに熱を加えてはんだバンプを溶融することにより行っている。その際、接続端子上に形成したはんだバンプの頂上の位置と、半導体素子側の金バンプ等の位置を合わすことが必要である。また、このはんだバンプは、半導体素子側の金バンプ等と安定して接続させるには、ある程度のボリュームと高さが必要である。   Conventionally, in order to connect semiconductor elements using a semiconductor package substrate, solder bumps are formed on the connection terminal side of the semiconductor package substrate, gold bumps or the like are formed on the semiconductor element side, and both are pressure-bonded. Is added to melt the solder bumps. At that time, it is necessary to match the position of the top of the solder bump formed on the connection terminal with the position of the gold bump or the like on the semiconductor element side. Further, this solder bump needs a certain volume and height in order to be stably connected to a gold bump or the like on the semiconductor element side.

このはんだバンプの形成は、表面が銅のままの接続端子に対して行うこともあるが、通常は、半導体パッケージ基板に形成した接続端子の表面に、Ni/Auめっきを行い、このNi/Auめっきした接続端子に対して行うことが多い。具体的には、接続端子の表面に、フラックスを含有させたはんだペーストを印刷し、リフロー炉を通して加熱溶融させた後、不要なフラックス分を薬液洗浄して除去することによって、接続端子の表面にはんだバンプを形成する。   The solder bumps may be formed on the connection terminals whose surfaces remain copper, but usually, Ni / Au plating is performed on the surfaces of the connection terminals formed on the semiconductor package substrate. Often performed on plated connection terminals. Specifically, a solder paste containing flux is printed on the surface of the connection terminal, heated and melted through a reflow furnace, and then the unnecessary flux is removed by washing with a chemical solution on the surface of the connection terminal. Form solder bumps.

はんだペーストが接続端子の表面上で溶融する際、はんだははんだ自身の表面張力で丸くなろうとする。その時、短手方向に並んだ複数の各接続端子上で、接続端子の長手方向に対して所定の箇所にはんだが凝集して丸くなり、凝固してはんだバンプを形成すれば問題無いが、実際には様々な位置で凝集するため、はんだバンプが形成される位置を制御しにくい問題がある。所定の箇所にはんだバンプが形成されないと、半導体素子を実装する際に半導体素子側のバンプ位置と半導体パッケージ基板側のはんだバンプの位置が合わずに接合不具合を発生する可能性がある。   When the solder paste melts on the surface of the connection terminal, the solder tends to be rounded by the surface tension of the solder itself. At that time, on each of the plurality of connection terminals arranged in the short direction, there is no problem if the solder is agglomerated and rounded at a predetermined position with respect to the longitudinal direction of the connection terminal, and solidifies to form a solder bump. Has a problem that it is difficult to control the position at which the solder bumps are formed, since it aggregates at various positions. If solder bumps are not formed at predetermined locations, when mounting a semiconductor element, the bump position on the semiconductor element side may not match the position of the solder bump on the semiconductor package substrate side, which may cause a bonding failure.

この不具合を解消する方法として、接続端子の一部を平面側に太らせる方法が開示されている(特許文献1)。これは、接続端子の長手方向の一部の幅を、幅方向の両側に太らせることにより、その部分に印刷等で転写するはんだペーストの量を多くしたものである。これによると、リフロー時に多く転写された箇所の溶融したはんだが、表面張力により他の部分のはんだを引き寄せるので、所定の箇所に大きなはんだバンプを形成することができる。   As a method for solving this problem, a method is disclosed in which part of the connection terminal is thickened to the plane side (Patent Document 1). In this method, the width of a part of the connection terminal in the longitudinal direction is thickened on both sides in the width direction so that the amount of solder paste transferred to the part by printing or the like is increased. According to this, the melted solder at a location that has been transferred a lot during reflow attracts the other portion of the solder due to surface tension, so that a large solder bump can be formed at a predetermined location.

同様に、接続端子の長手方向の一部の幅を、幅方向の片側に太らせる方法も開示されている(特許文献2)。これも、特許文献1と同様に、太らせた箇所へのはんだペーストの転写量が増えるため、リフロー時に多く転写された箇所の溶融したはんだが、表面張力により他の部分のはんだを引き寄せるので、所定の箇所に大きなはんだバンプを形成することができる。   Similarly, a method of increasing the width of a part of the connection terminal in the longitudinal direction to one side in the width direction is also disclosed (Patent Document 2). Similarly to Patent Document 1, since the transfer amount of the solder paste to the thickened portion increases, the melted solder in the portion that has been transferred a lot during reflow attracts the other portion of the solder due to the surface tension. Large solder bumps can be formed at predetermined locations.

特開2002−329744号公報JP 2002-329744 A 特開2005−11902号公報Japanese Patent Laid-Open No. 2005-11902

しかしながら、特許文献1の方法は、接続端子の長手方向の一部に接続端子を太らせた部分を設けるため、接続端子を太らせた部分では隣接した接続端子間の間隙が部分的に狭くなる。このため、接続端子の配置が狭ピッチになるにつれて、回路加工時にエッチング残りが生じたり、無電解Ni/Auめっきなどの表面処理の加工時に接続端子の間隙にも無電解Ni/Auめっきが析出することがあり、接続端子の配置ピッチをあまり狭くすることができないことから、高密度化の障害となる問題がある。特許文献2の方法は、接続端子の長手方向の一部の幅を、幅方向の片側にだけ太らせるため、特許文献1に比べれば接続端子の間隙に対する制約は緩和されるが、接続端子の配置が狭ピッチになるにつれて、やはり特許文献1と同様の問題がある。このように、従来技術においては、接続端子上の所定の箇所に、接続に必要なボリュームと高さを有するはんだバンプを形成するためには、接続端子の配置ピッチが制約を受け、高密度化への対応が困難であった。   However, in the method of Patent Document 1, since a portion where the connection terminal is thickened is provided in a part of the connection terminal in the longitudinal direction, the gap between adjacent connection terminals is partially narrowed in the portion where the connection terminal is thickened. . For this reason, as the arrangement of the connection terminals becomes narrower, etching residue is generated during circuit processing, or electroless Ni / Au plating is deposited in the gaps of the connection terminals during surface treatment such as electroless Ni / Au plating. Since the arrangement pitch of the connection terminals cannot be made too narrow, there is a problem that hinders high density. In the method of Patent Document 2, since the width of a part of the connection terminal in the longitudinal direction is thickened only to one side in the width direction, the restriction on the gap of the connection terminal is relaxed compared to Patent Document 1, but the connection terminal As the arrangement becomes narrower, there is still a problem similar to that of Patent Document 1. As described above, in the prior art, in order to form a solder bump having a volume and a height necessary for connection at a predetermined location on the connection terminal, the arrangement pitch of the connection terminal is restricted and the density is increased. It was difficult to respond to

本発明は、上記問題に鑑みなされたものであり、高密度化にも対応可能で、かつ接続に必要なボリュームと高さを有するはんだバンプを、接続端子の長手方向の所定の位置に形成可能な半導体パッケージ基板を提供することを目的とする。   The present invention has been made in view of the above-described problems, can cope with high density, and can form solder bumps having a volume and height necessary for connection at predetermined positions in the longitudinal direction of the connection terminals. An object of the present invention is to provide a simple semiconductor package substrate.

上記課題を解決するために本発明は、以下に示す構成を備える。
(1) 半導体素子接続用の長手形状の複数の接続端子を有し、これらの複数の接続端子が短手方向に並んで形成され、前記複数の接続端子の一部に凸形状が形成されることを特徴とする半導体パッケージ基板。
(2) 上記(1)において、凸形状が、短手方向に並んで形成される複数の接続端子の長手方向の所定の位置に形成されることを特徴とする半導体パッケージ基板。
(3) 上記(1)または(2)において、接続端子の長手方向における凸形状の長さが、前記接続端子の長さの1/5〜1/3の大きさであることを特徴とする半導体パッケージ基板。
(4) 上記(1)から(3)の何れかにおいて、接続端子の長さが、前記接続端子の長手方向の両側もしくは片側を覆って形成されるソルダーレジストの開口幅で規定されることを特徴とする半導体パッケージ基板。
(5) 上記(1)から(4)の何れかにおいて、凸形状が形成された接続端子上にはんだを供給することにより、前記接続端子上の長手方向の所定の位置にはんだバンプが形成されることを特徴とする半導体パッケージ基板。
In order to solve the above problems, the present invention has the following configuration.
(1) It has a plurality of long connection terminals for connecting semiconductor elements, these connection terminals are formed side by side in the short direction, and a convex shape is formed on a part of the plurality of connection terminals. A semiconductor package substrate characterized by the above.
(2) The semiconductor package substrate according to (1), wherein the convex shape is formed at a predetermined position in the longitudinal direction of a plurality of connection terminals formed side by side in the lateral direction.
(3) In the above (1) or (2), the length of the convex shape in the longitudinal direction of the connection terminal is 1/5 to 1/3 of the length of the connection terminal. Semiconductor package substrate.
(4) In any one of the above (1) to (3), the length of the connection terminal is defined by the opening width of the solder resist formed so as to cover both sides or one side of the connection terminal in the longitudinal direction. A featured semiconductor package substrate.
(5) In any one of the above (1) to (4), by supplying solder on the connection terminal having a convex shape, a solder bump is formed at a predetermined position in the longitudinal direction on the connection terminal. A semiconductor package substrate.

本発明によれば、高密度化にも対応可能で、かつ接続に必要なボリュームと高さを有するはんだバンプを、接続端子の長手方向の所定の位置に形成可能な半導体パッケージ基板を提供することができる。   According to the present invention, it is possible to provide a semiconductor package substrate capable of forming a solder bump having a volume and a height necessary for connection at a predetermined position in a longitudinal direction of a connection terminal, which can cope with high density. Can do.

本発明の実施例の半導体パッケージ基板の平面図である。It is a top view of the semiconductor package board | substrate of the Example of this invention. 本発明の実施例の半導体パッケージ基板の図1におけるA−A’断面図で ある。It is A-A 'sectional drawing in FIG. 1 of the semiconductor package board | substrate of the Example of this invention. 本発明の実施例の半導体パッケージ基板を用いてはんだバンプを形成した 時の平面図である。It is a top view when forming a solder bump using the semiconductor package substrate of the example of the present invention. 本発明の実施例の半導体パッケージ基板の図3におけるA−A’断面図で ある。FIG. 4 is a cross-sectional view taken along the line A-A ′ in FIG. 3 of the semiconductor package substrate of the embodiment of the present invention. 従来(比較例)の半導体パッケージ基板の平面図である。It is a top view of the conventional semiconductor package substrate (comparative example). 従来(比較例)の半導体パッケージ基板の図5におけるA−A’断面図で ある。FIG. 6 is a cross-sectional view taken along the line A-A ′ of FIG. 5 of a conventional (comparative example) semiconductor package substrate. 従来(比較例)の半導体パッケージ基板を用いてはんだバンプを形成した 時の平面図である。It is a top view when forming a solder bump using a conventional semiconductor package substrate (comparative example).

本発明の半導体パッケージ基板の構造を、図1〜図4に示す例を用いて説明する。   The structure of the semiconductor package substrate of the present invention will be described using the examples shown in FIGS.

本発明の半導体パッケージ基板6は、図1〜図4に示すように、半導体素子接続用の長手形状の複数の接続端子7を有し、これらの複数の接続端子7が短手方向に並んで配置され、前記複数の接続端子7の長手方向の一部に凸形状2が形成される。   As shown in FIGS. 1 to 4, the semiconductor package substrate 6 of the present invention has a plurality of longitudinal connection terminals 7 for connecting semiconductor elements, and the plurality of connection terminals 7 are arranged in the short direction. The convex shape 2 is formed on a part of the plurality of connection terminals 7 in the longitudinal direction.

本発明の半導体パッケージ基板6とは、半導体素子である半導体素子(図示しない。)を直接搭載するための接続端子7を有する配線基板をいう。また、本発明の接続端子7とは、半導体パッケージ基板6上に設けられた配線パターン1のうち、半導体素子と電気的に接続するための部分をいう。   The semiconductor package substrate 6 of the present invention refers to a wiring substrate having connection terminals 7 for directly mounting a semiconductor element (not shown) as a semiconductor element. The connection terminal 7 of the present invention refers to a portion of the wiring pattern 1 provided on the semiconductor package substrate 6 for electrical connection with a semiconductor element.

本発明の半導体パッケージ基板6は、一般的な半導体パッケージ基板6に用いられる材料・製法によって形成することができる。例えば、まず、エポキシ樹脂系やポリイミド樹脂系の基材4を準備し、表面に形成された銅箔や銅めっきに対してサブトラクト法等で回路加工し、接続端子7を含めた配線パターン1を形成する。基材4には、必要な層数の内層パターンを有した多層基板(図示しない。)を用いてもよい。   The semiconductor package substrate 6 of the present invention can be formed by a material / manufacturing method used for a general semiconductor package substrate 6. For example, first, an epoxy resin-based or polyimide resin-based substrate 4 is prepared, a circuit process is performed on the copper foil or copper plating formed on the surface by a subtracting method, and the wiring pattern 1 including the connection terminals 7 is formed. Form. As the base material 4, a multilayer substrate (not shown) having an inner layer pattern of the required number of layers may be used.

次に、接続端子7の一部に、少なくとも接続端子7の他の部分よりは高さが高い凸形状2を形成する。この凸形状2は、配線パターン1を形成後、接続端子7上の一部にだけ部分的にめっきをつけて作製したり、または、配線パターン1を形成後、接続端子7上の凸形状2になる部分のみをエッチングレジスト等で保護した後、エッチングにて、凸形状2となる部分を除く、周りの接続端子7全体を薄くして形成してもよい。   Next, the convex shape 2 having a height higher than at least the other part of the connection terminal 7 is formed on a part of the connection terminal 7. This convex shape 2 is produced by forming a part of the connection terminal 7 after the wiring pattern 1 is formed, or by forming a plating pattern 2 on the connection terminal 7 after forming the wiring pattern 1. After protecting only the portion to be formed with an etching resist or the like, the entire connecting terminal 7 except for the portion to be the convex shape 2 may be formed by etching to be thin.

次に、ソルダーレジスト3を形成する。ソルダーレジスト3は、接続端子7の長手方向の両側もしくは片側を覆って形成される。つまり、接続端子7の長さは、ソルダーレジスト3の開口幅8で規定されることになる。ソルダーレジスト3には、液状タイプ、フィルムタイプのいずれも使用できる。また、感光性タイプ、印刷タイプの何れも使用できるが、ソルダーレジスト3の開口幅8の寸法精度が優れる点で、感光性タイプのソルダーレジストが望ましい。   Next, a solder resist 3 is formed. The solder resist 3 is formed so as to cover both sides or one side of the connection terminal 7 in the longitudinal direction. That is, the length of the connection terminal 7 is defined by the opening width 8 of the solder resist 3. As the solder resist 3, either a liquid type or a film type can be used. Although either a photosensitive type or a printing type can be used, a photosensitive type solder resist is desirable in that the dimensional accuracy of the opening width 8 of the solder resist 3 is excellent.

図1は、本発明の半導体パッケージ基板の平面図を、図2は、図1のA−A’部分に示す箇所の断面構造である。凸形状2は、短手方向に並んで形成される複数の接続端子7の長手方向の所定の位置に形成される。ここで、長手方向の所定の位置とは、接続端子7の短手方向に並んだ複数の接続端子7において、接続端子7の長さ方向における位置が同じであることをいう。凸形状2の影響により、凸形状2の近傍には、はんだペーストが厚くなり、はんだペースト量が多いので、リフロー時には、多く転写された箇所の溶融したはんだが、表面張力により他の部分のはんだを引き寄せるので、図4に示すように、この凸形状2の位置に大きなはんだバンプ5を形成することができる。つまり、凸形状2は、他の部分のはんだ11を引き寄せるきっかけとなり、はんだ11は、凸形状2を中心として凝集するので、凸形状2を接続端子7の長手方向の所定の位置に設けることで、はんだバンプ5を接続端子7の長手方向の所定の位置に形成することができる。   FIG. 1 is a plan view of a semiconductor package substrate according to the present invention, and FIG. 2 is a cross-sectional structure of a portion indicated by A-A ′ in FIG. 1. The convex shape 2 is formed at a predetermined position in the longitudinal direction of the plurality of connection terminals 7 formed side by side in the lateral direction. Here, the predetermined position in the longitudinal direction means that the plurality of connection terminals 7 arranged in the short direction of the connection terminal 7 have the same position in the length direction of the connection terminal 7. Due to the influence of the convex shape 2, the solder paste becomes thick in the vicinity of the convex shape 2 and the amount of the solder paste is large. Therefore, a large solder bump 5 can be formed at the position of the convex shape 2 as shown in FIG. That is, the convex shape 2 is a trigger for attracting other portions of the solder 11, and the solder 11 aggregates around the convex shape 2. Therefore, by providing the convex shape 2 at a predetermined position in the longitudinal direction of the connection terminal 7. The solder bumps 5 can be formed at predetermined positions in the longitudinal direction of the connection terminals 7.

凸形状2は、少なくとも他の部分の接続端子7より高い構造となっており、その高さは、望ましくは接続端子7の表面から凸形状2の上までが、1〜10μm程度である。3〜5μmが特に好ましい。凸形状2の高さが1μm未満では、凸形状2近傍のはんだペーストの量が他の部分と比べてあまり差がないので、他の部分のはんだ11を引き寄せるきっかけとなる作用が弱い。一方、凸形状2の高さが10μmを超えると、はんだバンプ5の高さが、ソルダーレジスト3の高さを大きく超えることがあり、接触傷の原因となる場合がある。   The convex shape 2 has a structure higher than at least the connection terminal 7 in the other part, and the height is preferably about 1 to 10 μm from the surface of the connection terminal 7 to the top of the convex shape 2. 3-5 micrometers is especially preferable. If the height of the convex shape 2 is less than 1 μm, the amount of solder paste in the vicinity of the convex shape 2 is not much different from that of other portions, so that the effect of triggering the solder 11 in other portions is weak. On the other hand, if the height of the convex shape 2 exceeds 10 μm, the height of the solder bump 5 may greatly exceed the height of the solder resist 3, which may cause contact damage.

接続端子7の長手方向における凸形状2の長さは、望ましくは、接続端子7の長さの1/5〜1/3である。凸形状2の長さが接続端子7の長手方向の長さの1/3より大きいと、凸形状2上での溶融したはんだの移動が大きくなり、結果的にははんだバンプ5の位置が安定しなくなる。また1/5より小さいと凸形状2上に凝集するはんだ11の量が少なく、他の部分のはんだ11を引き寄せるきっかけとなる作用が弱く、はんだバンプ5のボリュームや高さの確保ができなくなる。   The length of the convex shape 2 in the longitudinal direction of the connection terminal 7 is desirably 1/5 to 1/3 of the length of the connection terminal 7. If the length of the convex shape 2 is larger than 1/3 of the length in the longitudinal direction of the connection terminal 7, the movement of the molten solder on the convex shape 2 becomes large, and as a result, the position of the solder bump 5 is stable. No longer. On the other hand, if it is smaller than 1/5, the amount of the solder 11 that aggregates on the convex shape 2 is small, the action that attracts the solder 11 in other parts is weak, and the volume and height of the solder bump 5 cannot be secured.

図3は、本発明の図1、図2の半導体パッケージ基板6に、半導体素子と接続するためのはんだバンプ5を形成した状態を示す。また、図4は、図3のA−A’部分に示す箇所の断面図である。凸形状2が形成された接続端子7上にはんだペーストを供給することにより、接続端子7上の長手方向の所定の位置にはんだバンプ5が形成される。つまり、図1の接続端子7および凸形状2に、接続端子7上の他の部分のはんだ11が凝集したものがはんだバンプ5になる。このはんだバンプ5は、接続端子7上に凸形状2を設けることで、この部分にはんだ11が集まりやすくなるので、安定的に高さとボリュームを確保することができ、また安定的に所定の位置に形成することができる。この結果、凸形状2によって、安定した位置に、安定した高さとボリュームのフリップチップ接続用のはんだバンプ5を形成することが可能となる。   FIG. 3 shows a state in which solder bumps 5 for connection to semiconductor elements are formed on the semiconductor package substrate 6 of FIGS. 1 and 2 of the present invention. FIG. 4 is a cross-sectional view of a portion indicated by A-A ′ in FIG. 3. By supplying a solder paste onto the connection terminal 7 on which the convex shape 2 is formed, the solder bump 5 is formed at a predetermined position in the longitudinal direction on the connection terminal 7. That is, the solder bumps 5 are formed by aggregating the connection terminals 7 and the convex shape 2 in FIG. Since the solder bump 5 is provided with the convex shape 2 on the connection terminal 7 so that the solder 11 easily gathers in this portion, the height and volume can be stably secured, and the solder bump 5 can be stably provided at a predetermined position. Can be formed. As a result, it becomes possible to form the solder bumps 5 for flip chip connection having a stable height and volume at a stable position by the convex shape 2.

はんだバンプ5は、フラックスを含有したはんだペーストを、接続端子7上に塗布した後、半導体パッケージ基板6をリフロー炉に通過させて、塗布したはんだペーストが溶融することにより形成される。リフロー後、はんだバンプ5の周囲にはフラックスが析出するため、フラックス洗浄機により薬液処理を行い、フラックスの除去を行う。   The solder bumps 5 are formed by applying a solder paste containing flux on the connection terminals 7 and then passing the semiconductor package substrate 6 through a reflow furnace and melting the applied solder paste. After reflow, since flux is deposited around the solder bumps 5, chemical treatment is performed by a flux cleaning machine to remove the flux.

以下、本発明を実施例により説明するが,本発明はこれに限定されない。   EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to this.

(実施例)
図1から図4を用いて本発明の実施例を説明する。まず、基材4として、エポキシ系の絶縁樹脂を用いた両面銅張積層板であるMCL−E−679FG(日立化成工業株式会社製、商品名)を準備し、表面の銅箔(厚さ18μm)をサブトラクト法で回路加工し、接続端子7を含めた配線パターン1を形成した。このとき、形成された接続端子7を含む配線パターン1の厚みは18μm、幅は20μmであった。
(Example)
An embodiment of the present invention will be described with reference to FIGS. First, MCL-E-679FG (trade name, manufactured by Hitachi Chemical Co., Ltd.), which is a double-sided copper-clad laminate using an epoxy-based insulating resin, is prepared as the base material 4, and the surface copper foil (thickness: 18 μm) ) Was processed by the subtract method to form the wiring pattern 1 including the connection terminals 7. At this time, the thickness of the wiring pattern 1 including the formed connection terminal 7 was 18 μm and the width was 20 μm.

次に、図1、図2に示すように、接続端子7上の凸形状2になる部分のみをエッチングレジストで覆った後、エッチングにて、凸形状2となる部分を除いて、周りの接続端子7全体を含む配線パターンが薄くなるようにした。このとき、周りの接続端子7の表面に対する凸形状2の高さは、3μm〜5μm、長さは20μm〜33μm(接続端子7の長さに対して1/3〜1/5の長さに相当。)に設定した。   Next, as shown in FIG. 1 and FIG. 2, only the portion of the connection terminal 7 that becomes the convex shape 2 is covered with an etching resist, and then the surrounding connection is made except for the portion that becomes the convex shape 2 by etching. The wiring pattern including the entire terminal 7 was made thin. At this time, the height of the convex shape 2 with respect to the surface of the surrounding connection terminal 7 is 3 μm to 5 μm, and the length is 20 μm to 33 μm (1/3 to 1/5 of the length of the connection terminal 7). Equivalent).

次に、図1、図2に示すように、ソルダーレジスト3を接続端子7の長手方向の両側を覆うように形成した。つまり、接続端子7の長さは、ソルダーレジスト3の開口幅8(100μm)で規定され、その長さは100μmであった。   Next, as shown in FIGS. 1 and 2, the solder resist 3 was formed so as to cover both sides of the connection terminal 7 in the longitudinal direction. That is, the length of the connection terminal 7 is defined by the opening width 8 (100 μm) of the solder resist 3 and the length is 100 μm.

その後、図1、図2に示すように、ソルダーレジスト3から露出した接続端子7上には、凸形状2も含めて、無電解Ni/Auメッキを行った。ソルダーレジスト3の厚みは、接続端子7上で、15μmで、無電解Niめっきの厚みは3μm、Auめっきの厚みは0.05μmとした。   Thereafter, as shown in FIGS. 1 and 2, electroless Ni / Au plating was performed on the connection terminals 7 exposed from the solder resist 3 including the convex shape 2. The thickness of the solder resist 3 was 15 μm on the connection terminal 7, the thickness of the electroless Ni plating was 3 μm, and the thickness of the Au plating was 0.05 μm.

図3、図4に示すように、上記無電解Ni/Auめっきを施した半導体パッケージ基板6の凸形状2を含む接続端子7上に、はんだペーストを印刷法により塗布した。その後、引き続き、リフローを用いてはんだペーストを溶融させ、フラックス洗浄機にてフラックスの除去を行った。形成されたはんだバンプ5は、ソルダーレジスト3の開口9から露出した接続端子7の凸形状2の位置に形成させることができた。また、はんだバンプ5の高さは、凸形状2以外の部分のはんだ11の高さに対して、約10μmの高さを確保することができた。   As shown in FIGS. 3 and 4, a solder paste was applied to the connection terminals 7 including the convex shape 2 of the semiconductor package substrate 6 subjected to the electroless Ni / Au plating by a printing method. Subsequently, the solder paste was melted using reflow, and the flux was removed with a flux washer. The formed solder bump 5 could be formed at the position of the convex shape 2 of the connection terminal 7 exposed from the opening 9 of the solder resist 3. Moreover, the height of the solder bump 5 was able to ensure a height of about 10 μm with respect to the height of the solder 11 other than the convex shape 2.

(比較例)
図5から図7を用いて比較例について説明する。平面図を図5に、図5のA−A’断面図を図6に示す。比較例では、接続端子7に凸形状2を設けなかった。それ以外は実施例と同様である。
(Comparative example)
A comparative example will be described with reference to FIGS. FIG. 5 is a plan view, and FIG. 6 is a cross-sectional view taken along line AA ′ of FIG. In the comparative example, the convex shape 2 was not provided on the connection terminal 7. Other than that is the same as the embodiment.

実施例と同様に、図5、図6の半導体パッケージ基板6に対して、はんだペーストを接続端子7上に塗布した。その後、引き続きリフローを行い、はんだペーストを溶融させ、フラックス洗浄を行って、フラックスの除去を行い、図7に示すように、はんだバンプ5を形成した。観察を行ったところ、はんだバンプ5が接続端子7上の様々な位置に形成され、安定した位置に形成されなかった。   Similarly to the example, a solder paste was applied on the connection terminals 7 to the semiconductor package substrate 6 of FIGS. Subsequently, reflow was performed, the solder paste was melted, flux cleaning was performed, the flux was removed, and solder bumps 5 were formed as shown in FIG. As a result of observation, the solder bumps 5 were formed at various positions on the connection terminals 7 and were not formed at stable positions.

1…配線パターン
2…凸形状
3…ソルダーレジスト
4…基材
5…はんだバンプ
6…半導体パッケージ基板
7…接続端子
8…(ソルダーレジストの)開口幅
9…(ソルダーレジストの)開口
10…Ni/Auめっき
11…はんだ
DESCRIPTION OF SYMBOLS 1 ... Wiring pattern 2 ... Convex shape 3 ... Solder resist 4 ... Base material 5 ... Solder bump 6 ... Semiconductor package substrate 7 ... Connection terminal 8 ... Opening width (of solder resist) 9 ... Opening (of solder resist) 10 ... Ni / Au plating 11 ... solder

Claims (5)

半導体素子接続用の長手形状の複数の接続端子を有し、これらの複数の接続端子が短手方向に並んで配置され、前記複数の接続端子の長手方向の一部に凸形状が形成されることを特徴とする半導体パッケージ基板。   There are a plurality of longitudinal connection terminals for connecting semiconductor elements, the plurality of connection terminals are arranged side by side in the lateral direction, and a convex shape is formed in a part of the plurality of connection terminals in the longitudinal direction. A semiconductor package substrate characterized by the above. 請求項1において、凸形状が、短手方向に並んで形成される複数の接続端子の長手方向の所定の位置に形成されることを特徴とする半導体パッケージ基板。   2. The semiconductor package substrate according to claim 1, wherein the convex shape is formed at a predetermined position in the longitudinal direction of the plurality of connection terminals formed side by side in the lateral direction. 請求項1または2において、接続端子の長手方向における凸形状の長さが、前記接続端子の長さの1/5〜1/3の大きさであることを特徴とする半導体パッケージ基板。   3. The semiconductor package substrate according to claim 1, wherein the length of the convex shape in the longitudinal direction of the connection terminal is 1/5 to 1/3 of the length of the connection terminal. 請求項1から3の何れかにおいて、接続端子の長さが、前記接続端子の長手方向の両側もしくは片側を覆って形成されるソルダーレジストの開口幅で規定されることを特徴とする半導体パッケージ基板。   4. The semiconductor package substrate according to claim 1, wherein a length of the connection terminal is defined by an opening width of a solder resist formed so as to cover both sides or one side in the longitudinal direction of the connection terminal. . 請求項1から4の何れかにおいて、凸形状が形成された接続端子上にはんだを供給することにより、前記接続端子上の長手方向の所定の位置にはんだバンプが形成されることを特徴とする半導体パッケージ基板。   5. The solder bump according to claim 1, wherein a solder bump is formed at a predetermined position in a longitudinal direction on the connection terminal by supplying solder onto the connection terminal having a convex shape. Semiconductor package substrate.
JP2010218899A 2010-09-29 2010-09-29 Semiconductor package substrate Pending JP2012074575A (en)

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