JP2012038732A5 - - Google Patents
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- Publication number
- JP2012038732A5 JP2012038732A5 JP2011174538A JP2011174538A JP2012038732A5 JP 2012038732 A5 JP2012038732 A5 JP 2012038732A5 JP 2011174538 A JP2011174538 A JP 2011174538A JP 2011174538 A JP2011174538 A JP 2011174538A JP 2012038732 A5 JP2012038732 A5 JP 2012038732A5
- Authority
- JP
- Japan
- Prior art keywords
- lens
- openings
- charged particle
- magnetic flux
- lens openings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10172528A EP2418672B1 (en) | 2010-08-11 | 2010-08-11 | Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens |
| EP10172528.1 | 2010-08-11 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012038732A JP2012038732A (ja) | 2012-02-23 |
| JP2012038732A5 true JP2012038732A5 (enExample) | 2014-09-25 |
| JP5685503B2 JP5685503B2 (ja) | 2015-03-18 |
Family
ID=43648718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011174538A Expired - Fee Related JP5685503B2 (ja) | 2010-08-11 | 2011-08-10 | 多軸レンズ、複合レンズを利用したビームシステム、及び複合レンズの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8481958B2 (enExample) |
| EP (1) | EP2418672B1 (enExample) |
| JP (1) | JP5685503B2 (enExample) |
| KR (1) | KR101854813B1 (enExample) |
| TW (1) | TWI469177B (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
| WO2013142068A1 (en) * | 2012-03-19 | 2013-09-26 | Kla-Tencor Corporation | Pillar-supported array of micro electron lenses |
| US9343267B2 (en) | 2012-04-18 | 2016-05-17 | D2S, Inc. | Method and system for dimensional uniformity using charged particle beam lithography |
| KR102154105B1 (ko) | 2012-04-18 | 2020-09-09 | 디2에스, 인코포레이티드 | 하전 입자 빔 리소그라피를 이용하여 패턴들을 형성하기 위한 방법 및 시스템 |
| JP5667618B2 (ja) * | 2012-12-14 | 2015-02-12 | 株式会社アドバンテスト | 電磁レンズ及び電子ビーム露光装置 |
| US9824851B2 (en) * | 2013-01-20 | 2017-11-21 | William M. Tong | Charge drain coating for electron-optical MEMS |
| US10347460B2 (en) | 2017-03-01 | 2019-07-09 | Dongfang Jingyuan Electron Limited | Patterned substrate imaging using multiple electron beams |
| DE102017205231B3 (de) * | 2017-03-28 | 2018-08-09 | Carl Zeiss Microscopy Gmbh | Teilchenoptische Vorrichtung und Teilchenstrahlsystem |
| JP7516366B2 (ja) * | 2018-11-16 | 2024-07-16 | エーエスエムエル ネザーランズ ビー．ブイ． | 電磁複合レンズ及びそのようなレンズを備えた荷電粒子光学システム |
| DE102019004124B4 (de) | 2019-06-13 | 2024-03-21 | Carl Zeiss Multisem Gmbh | Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5116754B1 (enExample) | 1970-03-04 | 1976-05-27 | ||
| JPS4929089B1 (enExample) * | 1970-05-13 | 1974-08-01 | ||
| JPS5423476A (en) * | 1977-07-25 | 1979-02-22 | Akashi Seisakusho Kk | Composite electron lens |
| US6254738B1 (en) * | 1998-03-31 | 2001-07-03 | Applied Materials, Inc. | Use of variable impedance having rotating core to control coil sputter distribution |
| US6750455B2 (en) * | 2001-07-02 | 2004-06-15 | Applied Materials, Inc. | Method and apparatus for multiple charged particle beams |
| US7223974B2 (en) * | 2002-05-22 | 2007-05-29 | Applied Materials, Israel, Ltd. | Charged particle beam column and method for directing a charged particle beam |
| EP1432007B1 (en) | 2002-12-17 | 2010-03-10 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multi-axis compound lens, beam system making use of the compound lens, and method of manufacturing the compound lens |
| DE602004026463D1 (de) * | 2004-12-30 | 2010-05-20 | Integrated Circuit Testing | Mehrfach-Linsenanordnung und Teilchenstrahlgerät mit selbiger |
-
2010
- 2010-08-11 EP EP10172528A patent/EP2418672B1/en not_active Not-in-force
- 2010-08-13 US US12/856,152 patent/US8481958B2/en active Active
-
2011
- 2011-08-09 TW TW100128385A patent/TWI469177B/zh not_active IP Right Cessation
- 2011-08-10 KR KR1020110079521A patent/KR101854813B1/ko not_active Expired - Fee Related
- 2011-08-10 JP JP2011174538A patent/JP5685503B2/ja not_active Expired - Fee Related
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