DE602004026463D1 - Mehrfach-Linsenanordnung und Teilchenstrahlgerät mit selbiger - Google Patents

Mehrfach-Linsenanordnung und Teilchenstrahlgerät mit selbiger

Info

Publication number
DE602004026463D1
DE602004026463D1 DE602004026463T DE602004026463T DE602004026463D1 DE 602004026463 D1 DE602004026463 D1 DE 602004026463D1 DE 602004026463 T DE602004026463 T DE 602004026463T DE 602004026463 T DE602004026463 T DE 602004026463T DE 602004026463 D1 DE602004026463 D1 DE 602004026463D1
Authority
DE
Germany
Prior art keywords
selbiger
particle beam
lens assembly
beam device
multiple lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004026463T
Other languages
English (en)
Inventor
Pavel Adamec
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Publication of DE602004026463D1 publication Critical patent/DE602004026463D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/121—Lenses electrostatic characterised by shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2611—Stereoscopic measurements and/or imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
DE602004026463T 2004-12-30 2004-12-30 Mehrfach-Linsenanordnung und Teilchenstrahlgerät mit selbiger Active DE602004026463D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP04031042A EP1679734B1 (de) 2004-12-30 2004-12-30 Mehrfach-Linsenanordnung und Teilchenstrahlgerät mit selbiger

Publications (1)

Publication Number Publication Date
DE602004026463D1 true DE602004026463D1 (de) 2010-05-20

Family

ID=36297377

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004026463T Active DE602004026463D1 (de) 2004-12-30 2004-12-30 Mehrfach-Linsenanordnung und Teilchenstrahlgerät mit selbiger

Country Status (3)

Country Link
US (1) US7928403B2 (de)
EP (1) EP1679734B1 (de)
DE (1) DE602004026463D1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201307833A (zh) * 2005-02-17 2013-02-16 Ebara Corp 電子射線裝置
EP1883094B1 (de) * 2006-07-24 2012-05-02 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Teilchenstrahlapparat und Verfahren zur Untersuchung einer Probe
EP2418672B1 (de) * 2010-08-11 2013-03-20 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Mehrachsige Linse, Strahlsystem unter Verwendung der Verbundlinse sowie Verfahren zur Herstellung der Verbundlinse
EP2629317B1 (de) * 2012-02-20 2015-01-28 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Teilchenstrahlvorrichtung mit dynamischem Fokus und Verfahren zu deren Betrieb
US9984848B2 (en) * 2016-03-10 2018-05-29 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-beam lens device, charged particle beam device, and method of operating a multi-beam lens device
US10347460B2 (en) 2017-03-01 2019-07-09 Dongfang Jingyuan Electron Limited Patterned substrate imaging using multiple electron beams
US11705301B2 (en) * 2021-01-19 2023-07-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam manipulation device and method for manipulating charged particle beamlets

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2441850A (en) * 1945-01-27 1948-05-18 Rca Corp Apparatus for stereoscopic work
DE2165089C2 (de) 1971-12-28 1985-08-29 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Korpuskularstrahlenmikroskop zur dreidimensionale Darstellung räumlicher Objekte
US4209698A (en) 1971-12-28 1980-06-24 Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. Transmission-type charged particle beam apparatus
US4465934A (en) * 1981-01-23 1984-08-14 Veeco Instruments Inc. Parallel charged particle beam exposure system
JPS6276619A (ja) * 1985-09-30 1987-04-08 Toshiba Corp マルチ荷電ビ−ム描画装置
JPH0261952A (ja) 1988-08-26 1990-03-01 Sharp Corp 電子線走査型顕微鏡
JP3724949B2 (ja) * 1998-05-15 2005-12-07 株式会社東芝 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法
DE69939309D1 (de) * 1999-03-31 2008-09-25 Advantest Corp Teilchenstrahlgerät zur schrägen Beobachtung einer Probe
US6437352B1 (en) 1999-06-01 2002-08-20 Nikon Corporation Charged particle beam projection lithography with variable beam shaping
US7094312B2 (en) * 1999-07-22 2006-08-22 Fsi Company Focused particle beam systems and methods using a tilt column
JP3953309B2 (ja) * 2001-12-04 2007-08-08 株式会社トプコン 走査電子顕微鏡装置
EP1389797B1 (de) * 2002-08-13 2008-10-08 Carl Zeiss NTS GmbH Teilchenoptischer Apparat und seine Verwendung als elektronenmikroskopisches System
US6812462B1 (en) * 2003-02-21 2004-11-02 Kla-Tencor Technologies Corporation Dual electron beam instrument for multi-perspective

Also Published As

Publication number Publication date
EP1679734A3 (de) 2006-07-26
US7928403B2 (en) 2011-04-19
US20060151713A1 (en) 2006-07-13
EP1679734A2 (de) 2006-07-12
EP1679734B1 (de) 2010-04-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition