JP2012031240A - 微細構造転写用の光重合性樹脂組成物 - Google Patents

微細構造転写用の光重合性樹脂組成物 Download PDF

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Publication number
JP2012031240A
JP2012031240A JP2010169956A JP2010169956A JP2012031240A JP 2012031240 A JP2012031240 A JP 2012031240A JP 2010169956 A JP2010169956 A JP 2010169956A JP 2010169956 A JP2010169956 A JP 2010169956A JP 2012031240 A JP2012031240 A JP 2012031240A
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JP
Japan
Prior art keywords
component
resin composition
acrylate
photopolymerizable resin
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2010169956A
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English (en)
Japanese (ja)
Other versions
JP2012031240A5 (enExample
Inventor
Ryuta Washitani
隆太 鷲谷
Masahiko Ogino
雅彦 荻野
Noritake Shizawa
礼健 志澤
Kyoichi Mori
恭一 森
Akihiro Miyauchi
昭浩 宮内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2010169956A priority Critical patent/JP2012031240A/ja
Priority to PCT/JP2011/067217 priority patent/WO2012014961A1/ja
Priority to US13/193,658 priority patent/US20120029110A1/en
Publication of JP2012031240A publication Critical patent/JP2012031240A/ja
Publication of JP2012031240A5 publication Critical patent/JP2012031240A5/ja
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/067—Polyurethanes; Polyureas

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2010169956A 2010-07-29 2010-07-29 微細構造転写用の光重合性樹脂組成物 Abandoned JP2012031240A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010169956A JP2012031240A (ja) 2010-07-29 2010-07-29 微細構造転写用の光重合性樹脂組成物
PCT/JP2011/067217 WO2012014961A1 (ja) 2010-07-29 2011-07-28 微細構造転写用の光重合性樹脂組成物
US13/193,658 US20120029110A1 (en) 2010-07-29 2011-07-29 Photopolymerizable resin composition for transferring microstructure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010169956A JP2012031240A (ja) 2010-07-29 2010-07-29 微細構造転写用の光重合性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2012031240A true JP2012031240A (ja) 2012-02-16
JP2012031240A5 JP2012031240A5 (enExample) 2013-01-10

Family

ID=45527356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010169956A Abandoned JP2012031240A (ja) 2010-07-29 2010-07-29 微細構造転写用の光重合性樹脂組成物

Country Status (3)

Country Link
US (1) US20120029110A1 (enExample)
JP (1) JP2012031240A (enExample)
WO (1) WO2012014961A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012214716A (ja) * 2011-03-30 2012-11-08 Kyoritsu Kagaku Sangyo Kk インプリント成型用光硬化性樹脂組成物、インプリント成型硬化体及びこれらの製造方法
JP2015090903A (ja) * 2013-11-05 2015-05-11 太陽インキ製造株式会社 プリント配線板用硬化型組成物、これを用いた硬化塗膜及びプリント配線板
JP2015179806A (ja) * 2013-09-18 2015-10-08 キヤノン株式会社 膜の製造方法、光学部品の製造方法、回路基板の製造方法、電子部品の製造方法、及び光硬化性組成物
JP2016134629A (ja) * 2015-01-21 2016-07-25 東洋合成工業株式会社 光学部材の製造方法及びそれに用いられる組成物
US10113066B2 (en) 2013-11-05 2018-10-30 Taiyo Ink Mfg. Co., Ltd. Curable composition, cured coating film using same, and printed wiring board

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2858093A4 (en) * 2012-05-25 2015-12-02 Soken Kagaku Kk PHOTOCURABLE RESIN COMPOSITION FOR PRINTING, METHOD FOR MANUFACTURING SAME, AND STRUCTURE
US20150240015A1 (en) * 2012-10-22 2015-08-27 Soken Chemical & Engineering Co., Ltd. Photocurable Resin Composition for Imprinting, Method for Producing Imprinting, Mold and Imprinting Mold
TWI722980B (zh) * 2014-02-04 2021-04-01 日商迪睿合股份有限公司 異向性導電膜及其製造方法
CN110546751A (zh) * 2018-06-11 2019-12-06 厦门三安光电有限公司 发光组件
JP7490476B2 (ja) * 2019-08-20 2024-05-27 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003160623A (ja) * 2001-11-26 2003-06-03 Toagosei Co Ltd 光学部材用活性エネルギー線硬化型組成物
JP2004284178A (ja) * 2003-03-20 2004-10-14 Dainippon Printing Co Ltd 賦型方法、賦型フィルム、及び射出成形品
JP2004352781A (ja) * 2003-05-27 2004-12-16 San Nopco Ltd 放射線硬化性組成物
JP2006063144A (ja) * 2004-08-25 2006-03-09 Jsr Corp 液状硬化性樹脂組成物
WO2007040159A1 (ja) * 2005-10-04 2007-04-12 The Inctec Inc. 特定の表面形状と物性を有する構造体及びその構造体形成用の（メタ）アクリル系重合性組成物
WO2011115162A1 (ja) * 2010-03-17 2011-09-22 三菱レイヨン株式会社 活性エネルギー線硬化性樹脂組成物および微細凹凸構造を表面に有する物品

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4668558A (en) * 1978-07-20 1987-05-26 Minnesota Mining And Manufacturing Company Shaped plastic articles having replicated microstructure surfaces
US5626800A (en) * 1995-02-03 1997-05-06 Minnesota Mining And Manufacturing Company Prevention of groove tip deformation in brightness enhancement film
KR100568581B1 (ko) * 2003-04-14 2006-04-07 주식회사 미뉴타텍 미세패턴 형성 몰드용 조성물 및 이로부터 제작된 몰드
JP4770354B2 (ja) * 2005-09-20 2011-09-14 日立化成工業株式会社 光硬化性樹脂組成物及びこれを用いたパターン形成方法
JP5243887B2 (ja) * 2008-02-12 2013-07-24 富士フイルム株式会社 ナノインプリント用硬化性組成物およびパターン形成方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003160623A (ja) * 2001-11-26 2003-06-03 Toagosei Co Ltd 光学部材用活性エネルギー線硬化型組成物
JP2004284178A (ja) * 2003-03-20 2004-10-14 Dainippon Printing Co Ltd 賦型方法、賦型フィルム、及び射出成形品
JP2004352781A (ja) * 2003-05-27 2004-12-16 San Nopco Ltd 放射線硬化性組成物
JP2006063144A (ja) * 2004-08-25 2006-03-09 Jsr Corp 液状硬化性樹脂組成物
WO2007040159A1 (ja) * 2005-10-04 2007-04-12 The Inctec Inc. 特定の表面形状と物性を有する構造体及びその構造体形成用の（メタ）アクリル系重合性組成物
WO2011115162A1 (ja) * 2010-03-17 2011-09-22 三菱レイヨン株式会社 活性エネルギー線硬化性樹脂組成物および微細凹凸構造を表面に有する物品

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012214716A (ja) * 2011-03-30 2012-11-08 Kyoritsu Kagaku Sangyo Kk インプリント成型用光硬化性樹脂組成物、インプリント成型硬化体及びこれらの製造方法
JP2016066809A (ja) * 2011-03-30 2016-04-28 協立化学産業株式会社 インプリント成型用光硬化性樹脂組成物、インプリント成型硬化体及びこれらの製造方法
JP2015179806A (ja) * 2013-09-18 2015-10-08 キヤノン株式会社 膜の製造方法、光学部品の製造方法、回路基板の製造方法、電子部品の製造方法、及び光硬化性組成物
JP2017135413A (ja) * 2013-09-18 2017-08-03 キヤノン株式会社 膜の製造方法、光学部品の製造方法、回路基板の製造方法、電子部品の製造方法、及び光硬化性組成物
US10338467B2 (en) 2013-09-18 2019-07-02 Canon Kabushiki Kaisha Method of producing film
JP2015090903A (ja) * 2013-11-05 2015-05-11 太陽インキ製造株式会社 プリント配線板用硬化型組成物、これを用いた硬化塗膜及びプリント配線板
US10113066B2 (en) 2013-11-05 2018-10-30 Taiyo Ink Mfg. Co., Ltd. Curable composition, cured coating film using same, and printed wiring board
JP2016134629A (ja) * 2015-01-21 2016-07-25 東洋合成工業株式会社 光学部材の製造方法及びそれに用いられる組成物

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Publication number Publication date
WO2012014961A1 (ja) 2012-02-02
US20120029110A1 (en) 2012-02-02

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