JP2012004108A5 - - Google Patents

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Publication number
JP2012004108A5
JP2012004108A5 JP2011106983A JP2011106983A JP2012004108A5 JP 2012004108 A5 JP2012004108 A5 JP 2012004108A5 JP 2011106983 A JP2011106983 A JP 2011106983A JP 2011106983 A JP2011106983 A JP 2011106983A JP 2012004108 A5 JP2012004108 A5 JP 2012004108A5
Authority
JP
Japan
Prior art keywords
upper electrode
processing apparatus
plasma processing
space
inert gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011106983A
Other languages
English (en)
Japanese (ja)
Other versions
JP5749071B2 (ja
JP2012004108A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2011106983A priority Critical patent/JP5749071B2/ja
Priority claimed from JP2011106983A external-priority patent/JP5749071B2/ja
Publication of JP2012004108A publication Critical patent/JP2012004108A/ja
Publication of JP2012004108A5 publication Critical patent/JP2012004108A5/ja
Application granted granted Critical
Publication of JP5749071B2 publication Critical patent/JP5749071B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011106983A 2010-05-18 2011-05-12 プラズマ処理装置 Expired - Fee Related JP5749071B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011106983A JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010114377 2010-05-18
JP2010114377 2010-05-18
JP2011106983A JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2012004108A JP2012004108A (ja) 2012-01-05
JP2012004108A5 true JP2012004108A5 (enExample) 2014-06-19
JP5749071B2 JP5749071B2 (ja) 2015-07-15

Family

ID=45535848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011106983A Expired - Fee Related JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP5749071B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120043636A (ko) * 2010-10-26 2012-05-04 가부시키가이샤 한도오따이 에네루기 켄큐쇼 플라즈마 처리 장치 및 플라즈마 ｃｖｄ 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60114577A (ja) * 1983-11-26 1985-06-21 Matsushita Electric Ind Co Ltd 化学処理装置
JP4499005B2 (ja) * 2004-09-29 2010-07-07 積水化学工業株式会社 プラズマ処理装置
JP5122805B2 (ja) * 2006-12-20 2013-01-16 株式会社アルバック 成膜装置
JP2008186939A (ja) * 2007-01-29 2008-08-14 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法並びに記憶媒体
US8247315B2 (en) * 2008-03-17 2012-08-21 Semiconductor Energy Laboratory Co., Ltd. Plasma processing apparatus and method for manufacturing semiconductor device
JP5328685B2 (ja) * 2010-01-28 2013-10-30 三菱電機株式会社 プラズマ処理装置及びプラズマ処理方法

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