JP2011520641A5 - - Google Patents

Download PDF

Info

Publication number
JP2011520641A5
JP2011520641A5 JP2011502956A JP2011502956A JP2011520641A5 JP 2011520641 A5 JP2011520641 A5 JP 2011520641A5 JP 2011502956 A JP2011502956 A JP 2011502956A JP 2011502956 A JP2011502956 A JP 2011502956A JP 2011520641 A5 JP2011520641 A5 JP 2011520641A5
Authority
JP
Japan
Prior art keywords
imprint lithography
droplets
lithography template
membrane sheet
polymerizable material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011502956A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011520641A (ja
JP5613658B2 (ja
Filing date
Publication date
Priority claimed from US12/415,563 external-priority patent/US8187515B2/en
Application filed filed Critical
Publication of JP2011520641A publication Critical patent/JP2011520641A/ja
Publication of JP2011520641A5 publication Critical patent/JP2011520641A5/ja
Application granted granted Critical
Publication of JP5613658B2 publication Critical patent/JP5613658B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011502956A 2008-04-01 2009-04-01 大面積ロールツーロール・インプリント・リソグラフィ Active JP5613658B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US4126408P 2008-04-01 2008-04-01
US61/041,264 2008-04-01
US12/415,563 2009-03-31
US12/415,563 US8187515B2 (en) 2008-04-01 2009-03-31 Large area roll-to-roll imprint lithography
PCT/US2009/002032 WO2009123721A2 (en) 2008-04-01 2009-04-01 Large area roll-to-roll imprint lithography

Publications (3)

Publication Number Publication Date
JP2011520641A JP2011520641A (ja) 2011-07-21
JP2011520641A5 true JP2011520641A5 (enExample) 2012-05-17
JP5613658B2 JP5613658B2 (ja) 2014-10-29

Family

ID=41115897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011502956A Active JP5613658B2 (ja) 2008-04-01 2009-04-01 大面積ロールツーロール・インプリント・リソグラフィ

Country Status (8)

Country Link
US (1) US8187515B2 (enExample)
EP (1) EP2262592A4 (enExample)
JP (1) JP5613658B2 (enExample)
KR (1) KR101767966B1 (enExample)
CN (1) CN101990470B (enExample)
MY (1) MY152467A (enExample)
TW (1) TWI391233B (enExample)
WO (1) WO2009123721A2 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080160129A1 (en) * 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
DE602005022874D1 (de) * 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
KR20100090046A (ko) * 2009-02-05 2010-08-13 엘지디스플레이 주식회사 박막 태양전지 및 그 제조방법
JP5411557B2 (ja) * 2009-04-03 2014-02-12 株式会社日立ハイテクノロジーズ 微細構造転写装置
KR20110066793A (ko) * 2009-12-11 2011-06-17 엘지디스플레이 주식회사 패터닝 장치
US8691134B2 (en) 2010-01-28 2014-04-08 Molecular Imprints, Inc. Roll-to-roll imprint lithography and purging system
JP5828626B2 (ja) * 2010-10-04 2015-12-09 キヤノン株式会社 インプリント方法
JP2013064836A (ja) * 2011-09-16 2013-04-11 Olympus Corp 微細構造形成用型および光学素子の製造方法
US9616614B2 (en) 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
JP6412317B2 (ja) 2013-04-24 2018-10-24 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
US9718096B2 (en) 2013-08-19 2017-08-01 Board Of Regents, The University Of Texas System Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy
EP3950148A1 (en) * 2013-08-19 2022-02-09 Board Of Regents Of the University Of Texas System Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy
JP6399839B2 (ja) 2014-07-15 2018-10-03 キヤノン株式会社 インプリント装置、および物品の製造方法
ES2701477T3 (es) * 2014-11-05 2019-02-22 Bobst Mex Sa Procedimientos de realización de una herramienta de estampado hembra, herramientas de estampado, módulo y procedimiento de estampado y máquina de estampado equipada con dichas herramientas
IL258703B2 (en) * 2015-10-15 2023-11-01 Univ Texas A versatile process for precise manufacturing on a nanometer scale
SG10201709153VA (en) * 2016-12-12 2018-07-30 Canon Kk Fluid droplet methodology and apparatus for imprint lithography
US11131923B2 (en) * 2018-10-10 2021-09-28 Canon Kabushiki Kaisha System and method of assessing surface quality by optically analyzing dispensed drops
US20220229361A1 (en) * 2019-05-13 2022-07-21 Board Of Regents, The University Of Texas System Roll-to-roll nanoimprint lithography tools and processes
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US11908711B2 (en) 2020-09-30 2024-02-20 Canon Kabushiki Kaisha Planarization process, planarization system and method of manufacturing an article

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69022647D1 (de) * 1989-07-12 1995-11-02 Canon Kk Gerät zur Herstellung einer Substratschicht für optische Aufzeichnungsmedien, Verfahren zur Herstellung einer Substratschicht für optische Aufzeichnungsmedien, das Gebrauch davon macht, Gerät zur Herstellung eines optischen Aufzeichnungsmediums und Verfahren zur Herstellung eines optischen Aufzeichnungsmediums, das Gebrauch davon macht.
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
CN100504598C (zh) * 2000-07-16 2009-06-24 得克萨斯州大学系统董事会 用于平版印刷工艺中的高分辨率重叠对齐方法和系统
EP1303793B1 (en) * 2000-07-17 2015-01-28 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
EP2306242A3 (en) * 2000-10-12 2011-11-02 Board of Regents, The University of Texas System Method of forming a pattern on a substrate
US6926929B2 (en) * 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6900881B2 (en) * 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7071088B2 (en) * 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6929762B2 (en) * 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US6871558B2 (en) * 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US20050160934A1 (en) * 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US8211214B2 (en) * 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US20050106321A1 (en) * 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
KR100585951B1 (ko) * 2004-02-18 2006-06-01 한국기계연구원 조합/분리형 독립구동이 가능한 복수 개의 모듈을 갖는 임프린팅 장치
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) * 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US20050276919A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method for dispensing a fluid on a substrate
DE602005022874D1 (de) * 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
US20060062922A1 (en) * 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
JP5198071B2 (ja) * 2004-12-01 2013-05-15 モレキュラー・インプリンツ・インコーポレーテッド インプリントリソグラフィ・プロセスにおける熱管理のための露光方法
KR20070111544A (ko) * 2005-03-09 2007-11-21 쓰리엠 이노베이티브 프로퍼티즈 컴파니 미세 복제품 제조 장치 및 방법
CN101573659A (zh) * 2005-12-08 2009-11-04 分子制模股份有限公司 排除位于基板和模具之间的气体的方法
JP4778788B2 (ja) * 2005-12-28 2011-09-21 東芝機械株式会社 微細パターンシート作成装置および微細パターンシート作成方法
WO2007136832A2 (en) * 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
KR100804734B1 (ko) * 2007-02-22 2008-02-19 연세대학교 산학협력단 자외선 롤 나노임프린팅을 이용한 연속 리소그라피 장치 및 방법

Similar Documents

Publication Publication Date Title
JP2011520641A5 (enExample)
CN101990470B (zh) 大面积辊子对辊子的刻印平版印刷
JP2013515378A5 (enExample)
TWI545030B (zh) 用於壓紋之結構印模、裝置及方法
JP5597381B2 (ja) 放射硬化性インクを用いた印刷方法
CN105586807B (zh) 猫眼、浮雕镭射全息转移卡纸及其制备方法
JP2008535682A5 (enExample)
WO2008117738A1 (ja) 水現像可能な感光性平版印刷版材料
JP2013520686A5 (enExample)
CN101722742A (zh) 用于在衬底上固定可辐射固化胶状油墨影像的双卷材设备
JP2010525968A5 (enExample)
EP2535200A3 (en) Printing method, transfer material, and inkjet discharge device
TW201501952A (zh) 卷對卷製程中具有高浮雕印章之微接觸印刷
CN102753353A (zh) 无缝套管及无缝基体
WO2009038292A3 (en) Method for manufacturing interior material using transfer paper and interior material made using the method
WO2009007894A3 (en) Method for providing a coating (metal-back printing blanket) of a typographic printing roll with thermo-adhesive plastic sheet as undercoating
WO2009017319A3 (en) Apparatus of fabricating optical sheet, method for fabricating optical sheet, and optical sheet fabricated using the same
WO2012064633A3 (en) Nanoscale photolithography
JP2010510093A5 (enExample)
TW201501951A (zh) 用於卷對卷製程中微接觸印刷的再上墨輥
CN109445247A (zh) 压印模板及其制备方法和压印方法
WO2018026378A1 (en) Method of imprint lithography of conductive materials; stamp for imprint lithography, and apparatus for imprint lithograph
CN114126878A (zh) 均匀的打印头表面涂层
Schleunitz et al. Hybrid working stamps for high speed roll-to-roll nanoreplication with molded sol–gel relief on a metal backbone
JP2018052095A (ja) ロール状刻印及びこれを用いた箔転写装置並びに箔転写方法