JP2011520641A5 - - Google Patents

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Publication number
JP2011520641A5
JP2011520641A5 JP2011502956A JP2011502956A JP2011520641A5 JP 2011520641 A5 JP2011520641 A5 JP 2011520641A5 JP 2011502956 A JP2011502956 A JP 2011502956A JP 2011502956 A JP2011502956 A JP 2011502956A JP 2011520641 A5 JP2011520641 A5 JP 2011520641A5
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JP
Japan
Prior art keywords
imprint lithography
droplets
lithography template
membrane sheet
polymerizable material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011502956A
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English (en)
Japanese (ja)
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JP5613658B2 (ja
JP2011520641A (ja
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Publication date
Priority claimed from US12/415,563 external-priority patent/US8187515B2/en
Application filed filed Critical
Publication of JP2011520641A publication Critical patent/JP2011520641A/ja
Publication of JP2011520641A5 publication Critical patent/JP2011520641A5/ja
Application granted granted Critical
Publication of JP5613658B2 publication Critical patent/JP5613658B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011502956A 2008-04-01 2009-04-01 大面積ロールツーロール・インプリント・リソグラフィ Active JP5613658B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US4126408P 2008-04-01 2008-04-01
US61/041,264 2008-04-01
US12/415,563 2009-03-31
US12/415,563 US8187515B2 (en) 2008-04-01 2009-03-31 Large area roll-to-roll imprint lithography
PCT/US2009/002032 WO2009123721A2 (en) 2008-04-01 2009-04-01 Large area roll-to-roll imprint lithography

Publications (3)

Publication Number Publication Date
JP2011520641A JP2011520641A (ja) 2011-07-21
JP2011520641A5 true JP2011520641A5 (enExample) 2012-05-17
JP5613658B2 JP5613658B2 (ja) 2014-10-29

Family

ID=41115897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011502956A Active JP5613658B2 (ja) 2008-04-01 2009-04-01 大面積ロールツーロール・インプリント・リソグラフィ

Country Status (8)

Country Link
US (1) US8187515B2 (enExample)
EP (1) EP2262592A4 (enExample)
JP (1) JP5613658B2 (enExample)
KR (1) KR101767966B1 (enExample)
CN (1) CN101990470B (enExample)
MY (1) MY152467A (enExample)
TW (1) TWI391233B (enExample)
WO (1) WO2009123721A2 (enExample)

Families Citing this family (20)

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US20080160129A1 (en) * 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
KR101193918B1 (ko) * 2004-06-03 2012-10-29 몰레큘러 임프린츠 인코퍼레이티드 나노-스케일 제조공정을 위한 유체 배분방법과 필요에 따른액적 배분방법
KR20100090046A (ko) * 2009-02-05 2010-08-13 엘지디스플레이 주식회사 박막 태양전지 및 그 제조방법
JP5411557B2 (ja) * 2009-04-03 2014-02-12 株式会社日立ハイテクノロジーズ 微細構造転写装置
KR20110066793A (ko) * 2009-12-11 2011-06-17 엘지디스플레이 주식회사 패터닝 장치
US8691134B2 (en) * 2010-01-28 2014-04-08 Molecular Imprints, Inc. Roll-to-roll imprint lithography and purging system
JP5828626B2 (ja) * 2010-10-04 2015-12-09 キヤノン株式会社 インプリント方法
JP2013064836A (ja) * 2011-09-16 2013-04-11 Olympus Corp 微細構造形成用型および光学素子の製造方法
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
JP6412317B2 (ja) 2013-04-24 2018-10-24 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
EP3036048B8 (en) * 2013-08-19 2025-04-02 Board of Regents, The University of Texas System Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy
US9718096B2 (en) 2013-08-19 2017-08-01 Board Of Regents, The University Of Texas System Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy
JP6399839B2 (ja) * 2014-07-15 2018-10-03 キヤノン株式会社 インプリント装置、および物品の製造方法
US10618240B2 (en) * 2014-11-05 2020-04-14 Bobst Mex Sa Method for production of a female embossing tool, a female embossing tool, and an embossing module equipped therewith
EP3362189B1 (en) * 2015-10-15 2024-12-04 Board of Regents, The University of Texas System Versatile process for depositing thin films
SG10201709153VA (en) * 2016-12-12 2018-07-30 Canon Kk Fluid droplet methodology and apparatus for imprint lithography
US11131923B2 (en) * 2018-10-10 2021-09-28 Canon Kabushiki Kaisha System and method of assessing surface quality by optically analyzing dispensed drops
US12578637B2 (en) * 2019-05-13 2026-03-17 Board Of Regents, The University Of Texas System Roll-to-roll nanoimprint lithography tools and processes
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US11908711B2 (en) 2020-09-30 2024-02-20 Canon Kabushiki Kaisha Planarization process, planarization system and method of manufacturing an article

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AU2001297642A1 (en) 2000-10-12 2002-09-04 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
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US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
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US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US7365103B2 (en) 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
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US20050106321A1 (en) * 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
KR100585951B1 (ko) * 2004-02-18 2006-06-01 한국기계연구원 조합/분리형 독립구동이 가능한 복수 개의 모듈을 갖는 임프린팅 장치
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
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KR101193918B1 (ko) 2004-06-03 2012-10-29 몰레큘러 임프린츠 인코퍼레이티드 나노-스케일 제조공정을 위한 유체 배분방법과 필요에 따른액적 배분방법
US20060062922A1 (en) * 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
EP1825502A4 (en) 2004-12-01 2008-01-23 Molecular Imprints Inc EXPOSURE METHOD FOR HEAT MANAGEMENT FOR IMPRINT LITHOGRAPHIC PROCESSES
MX2007010994A (es) * 2005-03-09 2007-11-07 3M Innovative Properties Co Aparato y metodo para elaborar un articulo microrreplicado.
WO2007067469A2 (en) * 2005-12-08 2007-06-14 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
JP4778788B2 (ja) * 2005-12-28 2011-09-21 東芝機械株式会社 微細パターンシート作成装置および微細パターンシート作成方法
WO2007136832A2 (en) * 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
KR100804734B1 (ko) * 2007-02-22 2008-02-19 연세대학교 산학협력단 자외선 롤 나노임프린팅을 이용한 연속 리소그라피 장치 및 방법

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