CN101990470B - 大面积辊子对辊子的刻印平版印刷 - Google Patents

大面积辊子对辊子的刻印平版印刷 Download PDF

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Publication number
CN101990470B
CN101990470B CN200980112481.2A CN200980112481A CN101990470B CN 101990470 B CN101990470 B CN 101990470B CN 200980112481 A CN200980112481 A CN 200980112481A CN 101990470 B CN101990470 B CN 101990470B
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CN
China
Prior art keywords
membrane
template
polymerizable material
droplets
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
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CN200980112481.2A
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English (en)
Chinese (zh)
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CN101990470A (zh
Inventor
S·V·斯里尼瓦桑
S·辛格豪尔
B-J·乔伊
I·M·麦克麦基
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Nanotechnologies Inc
University of Texas System
Original Assignee
University of Texas System
Molecular Imprints Inc
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Publication of CN101990470A publication Critical patent/CN101990470A/zh
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/44—Compression means for making articles of indefinite length
    • B29C43/46—Rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CN200980112481.2A 2008-04-01 2009-04-01 大面积辊子对辊子的刻印平版印刷 Active CN101990470B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US4126408P 2008-04-01 2008-04-01
US61/041,264 2008-04-01
US12/415,563 2009-03-31
US12/415,563 US8187515B2 (en) 2008-04-01 2009-03-31 Large area roll-to-roll imprint lithography
PCT/US2009/002032 WO2009123721A2 (en) 2008-04-01 2009-04-01 Large area roll-to-roll imprint lithography

Publications (2)

Publication Number Publication Date
CN101990470A CN101990470A (zh) 2011-03-23
CN101990470B true CN101990470B (zh) 2016-05-04

Family

ID=41115897

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980112481.2A Active CN101990470B (zh) 2008-04-01 2009-04-01 大面积辊子对辊子的刻印平版印刷

Country Status (8)

Country Link
US (1) US8187515B2 (enExample)
EP (1) EP2262592A4 (enExample)
JP (1) JP5613658B2 (enExample)
KR (1) KR101767966B1 (enExample)
CN (1) CN101990470B (enExample)
MY (1) MY152467A (enExample)
TW (1) TWI391233B (enExample)
WO (1) WO2009123721A2 (enExample)

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US20080160129A1 (en) * 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
WO2005120834A2 (en) * 2004-06-03 2005-12-22 Molecular Imprints, Inc. Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
KR20100090046A (ko) * 2009-02-05 2010-08-13 엘지디스플레이 주식회사 박막 태양전지 및 그 제조방법
JP5411557B2 (ja) * 2009-04-03 2014-02-12 株式会社日立ハイテクノロジーズ 微細構造転写装置
KR20110066793A (ko) * 2009-12-11 2011-06-17 엘지디스플레이 주식회사 패터닝 장치
US8691134B2 (en) * 2010-01-28 2014-04-08 Molecular Imprints, Inc. Roll-to-roll imprint lithography and purging system
JP5828626B2 (ja) * 2010-10-04 2015-12-09 キヤノン株式会社 インプリント方法
JP2013064836A (ja) * 2011-09-16 2013-04-11 Olympus Corp 微細構造形成用型および光学素子の製造方法
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
JP6412317B2 (ja) 2013-04-24 2018-10-24 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
US9415418B2 (en) 2013-08-19 2016-08-16 Board Of Regents, The University Of Texas System Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy
US9718096B2 (en) 2013-08-19 2017-08-01 Board Of Regents, The University Of Texas System Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy
JP6399839B2 (ja) * 2014-07-15 2018-10-03 キヤノン株式会社 インプリント装置、および物品の製造方法
CN107107525B (zh) * 2014-11-05 2019-04-26 鲍勃斯脱梅克斯股份有限公司 阴压花工具的生产方法，阴压花工具，以及配备所述阴压花工具的压花模组
IL258703B2 (en) * 2015-10-15 2023-11-01 Univ Texas A versatile process for precise manufacturing on a nanometer scale
SG10201709153VA (en) * 2016-12-12 2018-07-30 Canon Kk Fluid droplet methodology and apparatus for imprint lithography
US11131923B2 (en) * 2018-10-10 2021-09-28 Canon Kabushiki Kaisha System and method of assessing surface quality by optically analyzing dispensed drops
EP3969244A4 (en) * 2019-05-13 2023-09-13 Board of Regents, The University of Texas System Roll-to-roll nanoimprint lithography tools processes
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US11908711B2 (en) 2020-09-30 2024-02-20 Canon Kabushiki Kaisha Planarization process, planarization system and method of manufacturing an article

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WO2007136832A2 (en) * 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold

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CN101022894A (zh) * 2004-09-23 2007-08-22 分子制模股份有限公司 减小氧气抑制液体固化的聚合技术以及用于该技术的组合物
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Also Published As

Publication number Publication date
US8187515B2 (en) 2012-05-29
JP5613658B2 (ja) 2014-10-29
WO2009123721A3 (en) 2009-12-30
KR20110004380A (ko) 2011-01-13
EP2262592A2 (en) 2010-12-22
MY152467A (en) 2014-10-15
US20090243153A1 (en) 2009-10-01
JP2011520641A (ja) 2011-07-21
TW200950958A (en) 2009-12-16
WO2009123721A2 (en) 2009-10-08
TWI391233B (zh) 2013-04-01
EP2262592A4 (en) 2012-07-11
CN101990470A (zh) 2011-03-23
KR101767966B1 (ko) 2017-08-14

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