JP2011516892A5 - - Google Patents

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Publication number
JP2011516892A5
JP2011516892A5 JP2011504197A JP2011504197A JP2011516892A5 JP 2011516892 A5 JP2011516892 A5 JP 2011516892A5 JP 2011504197 A JP2011504197 A JP 2011504197A JP 2011504197 A JP2011504197 A JP 2011504197A JP 2011516892 A5 JP2011516892 A5 JP 2011516892A5
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JP
Japan
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ray
optical system
source
microfocus
ray irradiation
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JP2011504197A
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English (en)
Japanese (ja)
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JP2011516892A (ja
JP5531009B2 (ja
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Priority claimed from PCT/US2009/040178 external-priority patent/WO2009126868A1/en
Publication of JP2011516892A publication Critical patent/JP2011516892A/ja
Publication of JP2011516892A5 publication Critical patent/JP2011516892A5/ja
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JP2011504197A 2008-04-11 2009-04-10 ポリキャピラリ光学系を有するx線発生装置 Active JP5531009B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4414808P 2008-04-11 2008-04-11
US61/044,148 2008-04-11
PCT/US2009/040178 WO2009126868A1 (en) 2008-04-11 2009-04-10 X-ray generator with polycapillary optic

Publications (3)

Publication Number Publication Date
JP2011516892A JP2011516892A (ja) 2011-05-26
JP2011516892A5 true JP2011516892A5 (OSRAM) 2014-04-10
JP5531009B2 JP5531009B2 (ja) 2014-06-25

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JP2011504197A Active JP5531009B2 (ja) 2008-04-11 2009-04-10 ポリキャピラリ光学系を有するx線発生装置

Country Status (5)

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US (2) US7933383B2 (OSRAM)
EP (1) EP2263238B1 (OSRAM)
JP (1) JP5531009B2 (OSRAM)
CA (1) CA2720776C (OSRAM)
WO (1) WO2009126868A1 (OSRAM)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5531009B2 (ja) * 2008-04-11 2014-06-25 リガク イノベイティブ テクノロジーズ インコーポレイテッド ポリキャピラリ光学系を有するx線発生装置
FR2958858B1 (fr) * 2010-04-15 2012-06-29 Joel Kerjean Dispositif de guidage de photons pour appareil de radiotherapie
JP2013528804A (ja) * 2010-05-19 2013-07-11 シルヴァー,エリック,エイチ ハイブリッドx線光学機器および方法
CN102543243B (zh) * 2010-12-28 2016-07-13 Ge医疗系统环球技术有限公司 集成毛细管式平行x射线聚焦透镜
JP6175436B2 (ja) * 2011-08-06 2017-08-02 リガク イノベイティブ テクノロジーズ インコーポレイテッド X線光子及び中性子を導くナノチューブ素材の装置
CN103137233A (zh) * 2011-12-02 2013-06-05 佳能株式会社 X射线波导和x射线波导系统
JP6016386B2 (ja) * 2012-03-09 2016-10-26 キヤノン株式会社 X線光学装置
JP5964705B2 (ja) * 2012-09-14 2016-08-03 浜松ホトニクス株式会社 ポリキャピラリレンズ
EP2898361A4 (en) * 2012-09-24 2016-06-01 Convergent R N R Ltd X-RAY REFLECTIVE LENS ARRANGEMENT
CN202905197U (zh) * 2012-10-09 2013-04-24 北京师范大学 用于聚焦同步辐射光源的光学器件
US20140161233A1 (en) * 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
US9846132B2 (en) * 2013-10-21 2017-12-19 Kla-Tencor Corporation Small-angle scattering X-ray metrology systems and methods
US9885962B2 (en) * 2013-10-28 2018-02-06 Kla-Tencor Corporation Methods and apparatus for measuring semiconductor device overlay using X-ray metrology
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲x線集光素子およびその構成体、二重湾曲x線分光素子およびその構成体の製造方法
CN108028089B (zh) * 2015-09-25 2021-07-06 国立大学法人大阪大学 X射线显微镜
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
CN109313145A (zh) * 2016-07-15 2019-02-05 株式会社理学 X射线检测设备、x射线薄膜检测方法和测量摇摆曲线的方法
JP6857400B2 (ja) * 2018-03-01 2021-04-14 株式会社リガク X線発生装置、及びx線分析装置
CN116194760A (zh) * 2020-07-15 2023-05-30 丹麦技术大学 基于实验室的3D扫描X射线劳厄微衍射系统和方法(Lab3DμXRD)

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5175755A (en) * 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5497008A (en) * 1990-10-31 1996-03-05 X-Ray Optical Systems, Inc. Use of a Kumakhov lens in analytic instruments
US5192869A (en) * 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
EP0723272B1 (en) 1994-07-08 2001-04-25 Muradin Abubekirovich Kumakhov Method of guiding beams of neutral and charged particles and a device for implementing said method
US5570408A (en) * 1995-02-28 1996-10-29 X-Ray Optical Systems, Inc. High intensity, small diameter x-ray beam, capillary optic system
US5604353A (en) * 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
US5745547A (en) * 1995-08-04 1998-04-28 X-Ray Optical Systems, Inc. Multiple channel optic
US6041099A (en) 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
GB9815968D0 (en) 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
US6333966B1 (en) * 1998-08-18 2001-12-25 Neil Charles Schoen Laser accelerator femtosecond X-ray source
DE60025191T2 (de) * 1999-04-01 2006-08-31 Sectra Mamea Ab Verfahren und vorrichtung zur vereinfachten ausrichtung in röntgenstrahlungen-bildgebung
US6704389B1 (en) * 1999-07-16 2004-03-09 X-Ray Optical Systems, Inc. Support device for a polycapillary optic
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6697454B1 (en) * 2000-06-29 2004-02-24 X-Ray Optical Systems, Inc. X-ray analytical techniques applied to combinatorial library screening
DE10112928C1 (de) * 2001-03-12 2002-08-22 Ifg Inst Fuer Geraetebau Gmbh Kapillaroptisches Element bestehend aus Kanäle bildenden Kapillaren und Verfahren zu dessen Herstellung
RU2339974C2 (ru) * 2001-06-19 2008-11-27 Икс-Рэй Оптикал Системз, Инк. Волновая дисперсивная рентгенофлуоресцентная система с использованием фокусирующей оптики для возбуждения и фокусирующий монохроматор для собирания
WO2003012797A1 (en) * 2001-07-27 2003-02-13 X-Ray Optical Systems, Inc. Methods and devices for aligning and determining the focusing characteristics of x-ray optics
US7382856B2 (en) * 2001-12-04 2008-06-03 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
US6781060B2 (en) * 2002-07-26 2004-08-24 X-Ray Optical Systems Incorporated Electrical connector, a cable sleeve, and a method for fabricating an electrical connection
CN100336422C (zh) * 2001-12-04 2007-09-05 X射线光学系统公司 输出稳定性增强的x射线源组件及优化x射线传输的方法
JP4514130B2 (ja) * 2002-12-20 2010-07-28 株式会社アルネアラボラトリ 光パルスレーザ
JP2007501503A (ja) * 2003-08-04 2007-01-25 エックス−レイ オプティカル システムズ インコーポレーテッド 管電力調節および遠隔較正を使用して出力安定性が向上したx線源アセンブリ
US7023955B2 (en) * 2003-08-12 2006-04-04 X-Ray Optical System, Inc. X-ray fluorescence system with apertured mask for analyzing patterned surfaces
US7991116B2 (en) 2005-08-04 2011-08-02 X-Ray Optical Systems, Inc. Monochromatic x-ray micro beam for trace element mapping
US20080159479A1 (en) * 2006-08-10 2008-07-03 X-Ray Optical Systems, Inc. Wide parallel beam diffraction imaging method and system
JP4860418B2 (ja) * 2006-10-10 2012-01-25 株式会社リガク X線光学系
JP5531009B2 (ja) * 2008-04-11 2014-06-25 リガク イノベイティブ テクノロジーズ インコーポレイテッド ポリキャピラリ光学系を有するx線発生装置

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