JP2011501745A5 - - Google Patents
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- JP2011501745A5 JP2011501745A5 JP2010528358A JP2010528358A JP2011501745A5 JP 2011501745 A5 JP2011501745 A5 JP 2011501745A5 JP 2010528358 A JP2010528358 A JP 2010528358A JP 2010528358 A JP2010528358 A JP 2010528358A JP 2011501745 A5 JP2011501745 A5 JP 2011501745A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 0 C*1CCC(C*CC2)C2CC1 Chemical compound C*1CCC(C*CC2)C2CC1 0.000 description 4
- AJMCYMXBRLSJOB-UHFFFAOYSA-N CC(CC1)(C(CCC2)C2CC1C(C)=C)C(C)=C Chemical compound CC(CC1)(C(CCC2)C2CC1C(C)=C)C(C)=C AJMCYMXBRLSJOB-UHFFFAOYSA-N 0.000 description 1
- HIBKMKYNNJBLMS-UHFFFAOYSA-N CC1(C2)C34C12CCC3C4 Chemical compound CC1(C2)C34C12CCC3C4 HIBKMKYNNJBLMS-UHFFFAOYSA-N 0.000 description 1
- BGUAOGORYRIMDR-UHFFFAOYSA-N CCC(CC1)C2C1CC(C)(C)CCC2 Chemical compound CCC(CC1)C2C1CC(C)(C)CCC2 BGUAOGORYRIMDR-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07118204 | 2007-10-10 | ||
EP07118204.2 | 2007-10-10 | ||
PCT/EP2008/062991 WO2009047152A1 (en) | 2007-10-10 | 2008-09-29 | Sulphonium salt initiators |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011501745A JP2011501745A (ja) | 2011-01-13 |
JP2011501745A5 true JP2011501745A5 (ja) | 2011-11-10 |
JP5538229B2 JP5538229B2 (ja) | 2014-07-02 |
Family
ID=39171376
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010528358A Expired - Fee Related JP5538229B2 (ja) | 2007-10-10 | 2008-09-29 | スルホニウム塩開始剤 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100297541A1 (ja) |
EP (1) | EP2197839B1 (ja) |
JP (1) | JP5538229B2 (ja) |
KR (1) | KR101599562B1 (ja) |
CN (1) | CN102026967B (ja) |
TW (1) | TWI433833B (ja) |
WO (1) | WO2009047152A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7025531B2 (ja) | 2017-09-06 | 2022-02-24 | 常州強力電子新材料股▲分▼有限公司 | スルホニウム塩光開始剤、その製造方法、それを含む光硬化性組成物及びその適用 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5570424B2 (ja) * | 2007-10-10 | 2014-08-13 | ビーエーエスエフ ソシエタス・ヨーロピア | スルホニウム塩開始剤 |
EP2197840B1 (en) * | 2007-10-10 | 2013-11-06 | Basf Se | Sulphonium salt initiators |
CN102056913A (zh) * | 2008-06-12 | 2011-05-11 | 巴斯夫欧洲公司 | 锍衍生物及其作为潜酸的用途 |
KR101653427B1 (ko) * | 2008-10-20 | 2016-09-01 | 바스프 에스이 | 술포늄 유도체 및 잠재성 산으로서의 그의 용도 |
US8338076B2 (en) * | 2008-11-28 | 2012-12-25 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
JP5387181B2 (ja) * | 2009-07-08 | 2014-01-15 | 信越化学工業株式会社 | スルホニウム塩、レジスト材料及びパターン形成方法 |
JP5699365B2 (ja) | 2009-12-17 | 2015-04-08 | ディーエスエム アイピー アセッツ ビー.ブイ. | カチオン系光重合開始剤トリアリールスルホニウムボレートを含む積層造形用液状放射線硬化樹脂 |
AU2011207304B2 (en) | 2010-01-22 | 2014-07-17 | Stratasys, Inc. | Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof |
JP2011195499A (ja) * | 2010-03-19 | 2011-10-06 | San Apro Kk | スルホニウム塩、光酸発生剤及び感光性樹脂組成物 |
US8575234B2 (en) | 2010-09-06 | 2013-11-05 | Samsung Display Co., Ltd. | Ink composition, and method of forming pattern, color filter and method of preparing color filter using the same |
US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
JP5386527B2 (ja) * | 2011-02-18 | 2014-01-15 | 富士フイルム株式会社 | パターン形成方法、感活性光線性又は感放射線性樹脂組成物、及びレジスト膜 |
WO2012113829A1 (en) | 2011-02-23 | 2012-08-30 | Basf Se | Sulfonium sulfates, their preparation and use |
EP2502728B1 (en) | 2011-03-23 | 2017-01-04 | DSM IP Assets B.V. | Lightweight and high strength three-dimensional articles producible by additive fabrication processes |
JP5828715B2 (ja) * | 2011-08-25 | 2015-12-09 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物 |
JP6120574B2 (ja) | 2012-01-31 | 2017-04-26 | キヤノン株式会社 | 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド |
CN102672371B (zh) * | 2012-06-13 | 2013-11-20 | 东莞市剑鑫电子材料有限公司 | 一种低挥发性高松香助焊剂及其制备方法 |
WO2015019616A1 (en) | 2013-08-07 | 2015-02-12 | Toyo Gosei Co., Ltd. | Reagent for enhancing generation of chemical species |
WO2015049871A1 (en) * | 2013-10-02 | 2015-04-09 | Toyo Gosei Co., Ltd. | Reagent for enhancing generation of chemical species |
US20160259245A1 (en) * | 2013-10-07 | 2016-09-08 | Toyo Gosei Co., Ltd. | Reagent for enhancing generation of chemical species and manufacturing apparatus |
CN105712917B (zh) * | 2016-03-29 | 2017-12-26 | 同济大学 | 具有光引发剂与光敏化剂双重功能的共轭型硫鎓盐光引发剂、制备方法及其应用 |
JP6720926B2 (ja) * | 2016-06-28 | 2020-07-08 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
US11009790B2 (en) | 2016-07-28 | 2021-05-18 | Samsung Electronics Co., Ltd. | Photoacid generator and photoresist composition including the same |
CN107698477B (zh) | 2016-08-08 | 2020-05-12 | 常州强力电子新材料股份有限公司 | 一种新型阳离子型光引发剂及其制备方法和应用 |
CN107129451B (zh) * | 2017-05-11 | 2019-12-03 | 同济大学 | 新型带氰基二苯乙烯基硫鎓盐制备方法及其应用 |
TWI834886B (zh) | 2019-06-17 | 2024-03-11 | 日商日產化學股份有限公司 | 含有二氰基苯乙烯基之可濕蝕刻之阻劑下層膜形成組成物、經圖案化的基板之製造方法及半導體裝置之製造方法 |
GB2617847B (en) * | 2022-04-21 | 2024-05-22 | Intellego Tech Ab Sweden | Stable UV indicator |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ZA805273B (en) | 1979-09-28 | 1981-11-25 | Gen Electric | Process of deep section curing photocurable compositions |
US4451409A (en) | 1982-02-08 | 1984-05-29 | The Dow Chemical Company | Sulfonium organosulfonates |
US4451408A (en) * | 1982-02-08 | 1984-05-29 | The Dow Chemical Company | Process of preparing sulfonium organosulfonates |
JPS61100557A (ja) * | 1984-10-22 | 1986-05-19 | ゼネラル・エレクトリツク・カンパニイ | トリアリールスルホニウム塩およびその製法 |
US4694029A (en) | 1985-04-09 | 1987-09-15 | Cook Paint And Varnish Company | Hybrid photocure system |
US5012001A (en) * | 1985-09-03 | 1991-04-30 | General Electric Company | Triaryl sulfonium photoinitiators |
US5220037A (en) * | 1989-07-22 | 1993-06-15 | Basf Aktiengesellschaft | Sulfonium salts and use thereof |
DE3924299A1 (de) | 1989-07-22 | 1991-01-31 | Basf Ag | Neue sulfoniumsalze und deren verwendung |
DE4219376A1 (de) * | 1992-06-12 | 1993-12-16 | Wacker Chemie Gmbh | Sulfoniumsalze und Verfahren zu deren Herstellung |
US5554664A (en) | 1995-03-06 | 1996-09-10 | Minnesota Mining And Manufacturing Company | Energy-activatable salts with fluorocarbon anions |
JP3063615B2 (ja) * | 1995-03-16 | 2000-07-12 | 信越化学工業株式会社 | トリアリールスルホニウム塩の製造方法 |
JPH10287643A (ja) | 1997-04-10 | 1998-10-27 | Nippon Kayaku Co Ltd | 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JP4204113B2 (ja) * | 1997-12-04 | 2009-01-07 | 株式会社Adeka | 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 |
CA2452566C (en) | 2001-07-19 | 2011-08-23 | Lamberti Spa | Sulfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems |
GB0204467D0 (en) | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
US20030235775A1 (en) * | 2002-06-13 | 2003-12-25 | Munirathna Padmanaban | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
US20040053160A1 (en) * | 2002-07-04 | 2004-03-18 | Fuji Photo Film Co., Ltd. | Resist composition |
EP2308865B1 (en) * | 2002-09-25 | 2013-08-07 | Adeka Corporation | Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape |
CN1603957A (zh) | 2003-10-03 | 2005-04-06 | 住友化学工业株式会社 | 化学放大型正光刻胶组合物及其树脂 |
EP1752502A1 (en) | 2004-05-31 | 2007-02-14 | Konica Minolta Medical & Graphic, Inc. | Active ray-curable inkjet ink, method for storing active ray-curable inkjet ink, image forming method, and inkjet recording device |
ATE473209T1 (de) * | 2005-07-01 | 2010-07-15 | Basf Se | Sulfoniumsalzinitiatoren |
WO2007118794A1 (en) | 2006-04-13 | 2007-10-25 | Ciba Holding Inc. | Sulphonium salt initiators |
JP4950549B2 (ja) * | 2006-04-18 | 2012-06-13 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版 |
WO2007125795A1 (ja) * | 2006-04-27 | 2007-11-08 | Konica Minolta Medical & Graphic, Inc. | 活性光線硬化型組成物、活性光線硬化型インクジェットインク、該活性光線硬化型インクジェットインクを用いた画像形成方法及びインクジェット記録装置 |
EP2125713B1 (en) | 2006-10-04 | 2012-04-18 | Basf Se | Sulphonium salt photoinitiators |
JP5570424B2 (ja) * | 2007-10-10 | 2014-08-13 | ビーエーエスエフ ソシエタス・ヨーロピア | スルホニウム塩開始剤 |
USD638423S1 (en) * | 2010-07-01 | 2011-05-24 | Hitachi Global Storage Technologies Netherlands B.V. | External storage device |
USD639297S1 (en) * | 2010-07-01 | 2011-06-07 | Hitachi Global Storage Technologies Netherlands B.V. | Combined external storage device and removable portable memory key |
-
2008
- 2008-09-29 WO PCT/EP2008/062991 patent/WO2009047152A1/en active Application Filing
- 2008-09-29 KR KR1020107010101A patent/KR101599562B1/ko not_active IP Right Cessation
- 2008-09-29 EP EP08804853A patent/EP2197839B1/en not_active Not-in-force
- 2008-09-29 CN CN200880119876.0A patent/CN102026967B/zh not_active Expired - Fee Related
- 2008-09-29 JP JP2010528358A patent/JP5538229B2/ja not_active Expired - Fee Related
- 2008-09-29 US US12/681,786 patent/US20100297541A1/en not_active Abandoned
- 2008-10-09 TW TW097138884A patent/TWI433833B/zh active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7025531B2 (ja) | 2017-09-06 | 2022-02-24 | 常州強力電子新材料股▲分▼有限公司 | スルホニウム塩光開始剤、その製造方法、それを含む光硬化性組成物及びその適用 |