JP2011258999A5 - Exposure apparatus, exposure method, and device manufacturing method - Google Patents

Claims (34)

An exposure apparatus that exposes a substrate by irradiating the substrate with exposure light through a liquid.
Projection optics,
A first nozzle member having a liquid supply port and a liquid recovery port;
A second nozzle member provided at an outer side of the first nozzle member with respect to an optical path space of exposure light emitted from the projection optical system, having a blowout port for blowing out a gas;
And a driving device capable of moving the second nozzle member relative to the first nozzle member. A column supporting the projection optical system;
A second support mechanism connected to the column and supporting the second nozzle member;
The exposure apparatus according to claim 1, wherein the second support mechanism includes the driving device.  The exposure apparatus according to claim 2, wherein the projection optical system is supported by the column via a vibration isolation device.   The exposure apparatus according to claim 2, further comprising a first support mechanism connected to the column and supporting the first nozzle member.   The exposure apparatus according to any one of claims 1 to 4, wherein the driving device is driven by Lorentz force.   The exposure apparatus according to any one of claims 1 to 5, wherein a gap is provided between the first nozzle member and the second nozzle member.  The exposure apparatus according to any one of claims 1 to 6, wherein the drive device moves the second nozzle member in a direction substantially parallel to an optical axis of the projection optical system.  The exposure apparatus according to any one of claims 1 to 7, wherein the drive device moves the second nozzle member in a direction substantially perpendicular to the optical axis of the projection optical system.  The exposure apparatus according to any one of claims 1 to 8, wherein the drive device rotates the second nozzle member about an axis substantially perpendicular to the optical axis of the projection optical system.  The position of the said 2nd nozzle member is adjusted by the said drive device based on the contact angle with the said liquid of the film member which forms the liquid contact surface of the said board | substrate in any one of the Claims 1-9 Exposure device.  The said drive device adjusts the position of the said 2nd nozzle member according to any one of Claims 1-10 according to the affinity of the film member which forms the liquid contact surface of the said board | substrate, and the said liquid. Exposure device.  The exposure apparatus according to any one of claims 1 to 11, wherein the position of the second nozzle member is adjusted by the drive device based on the movement condition of the substrate. Exposure is performed while moving the substrate in a predetermined scanning direction,
The exposure apparatus according to claim 12, wherein the movement condition includes a movement speed of the substrate.  The exposure apparatus according to any one of claims 1 to 13, wherein the drive device adjusts the distance between the second nozzle member and the substrate by moving the second nozzle member. A detection device for detecting the position of the second nozzle member;
The exposure apparatus according to any one of claims 1 to 14, wherein the drive device moves the second nozzle member based on a detection result of the detection device.  The exposure apparatus according to any one of claims 1 to 15, wherein the blowout port is disposed at a position facing the substrate.  The exposure apparatus according to any one of claims 1 to 16, wherein the blowout port blows a gas on the substrate in a tilt direction toward the optical path space.  The exposure apparatus according to any one of claims 1 to 17, wherein the blowout port is annularly formed so as to surround the light path space. The first nozzle member is an annular member surrounding an optical element of the projection optical system closest to the image plane of the projection optical system,
The exposure apparatus according to any one of claims 1 to 18, wherein the second nozzle member is an annular member surrounding the first nozzle member.   20. An exhaust port disposed between the lower end portion of the first nozzle member and the lower end portion of the second nozzle member and exhausting at least a part of the gas blown out from the air outlet. An exposure apparatus according to any one of the preceding claims.  21. The exposure apparatus according to claim 20, further comprising: a discharge flow path connected to the exhaust port between the first nozzle member and the second nozzle member.  22. The exposure apparatus according to claim 21, wherein the discharge flow path is connected to an external space.  23. The exposure apparatus according to claim 21, further comprising a suction device for suctioning a space forming the discharge flow channel.  The exposure apparatus according to any one of claims 1 to 23, wherein a distance between the first nozzle member and the second nozzle member is larger than a distance between a lower surface of the second nozzle member and the substrate.  The exposure apparatus according to any one of claims 1 to 24, further comprising an adjustment device capable of adjusting an amount of gas blown out per unit time blown out from the blowout port.  The exposure apparatus according to claim 25, wherein the adjusting device adjusts the blowout amount based on a contact angle of the film member forming the liquid contact surface of the substrate with the liquid.  The exposure apparatus according to claim 25, wherein the adjustment device adjusts the blowout amount based on a movement condition of the substrate.  The exposure apparatus according to any one of claims 1 to 27, wherein the blowout operation of the blowout port is continued during the exposure of the substrate.  The liquid of a liquid larger than the projection area of the projection optical system and smaller than the substrate by the first nozzle member so that the optical path space of the exposure light between the projection optical system and the substrate is filled with the liquid The exposure apparatus according to any one of claims 1 to 28, wherein an immersion area is locally formed on a part of the substrate including the projection area.   A device manufacturing method using the exposure apparatus according to any one of claims 1 to 29. An exposure method for exposing a substrate by irradiating the substrate with exposure light through a liquid,
The projection optical system and the substrate are provided using a first nozzle member having a liquid supply port and a liquid recovery port and disposed so as to surround an optical element of the projection optical system closest to the image plane of the projection optical system. And a liquid immersion area of a liquid larger than the projection area of the projection optical system and smaller than the substrate, so that the optical path space of the exposure light between them is filled with the liquid, on the substrate including the projection area Form locally on part of the
Irradiating the substrate with the exposure light through the liquid in the liquid immersion area;
And, moving a second nozzle member provided outside the first nozzle member with respect to the optical path space and having a blowout port for blowing out a gas with a driving device outside the first nozzle member. .  32. The exposure method according to claim 31, wherein the gas from the outlet is supplied to the interface of the liquid by the blowing operation of the outlet to suppress leakage of the liquid.   The exposure method according to claim 31, wherein the blowout port is disposed to face the substrate.   A device manufacturing method using the exposure method according to any one of claims 31 to 33.