JP2010153932A5 - - Google Patents

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JP2010153932A5
JP2010153932A5 JP2010087343A JP2010087343A JP2010153932A5 JP 2010153932 A5 JP2010153932 A5 JP 2010153932A5 JP 2010087343 A JP2010087343 A JP 2010087343A JP 2010087343 A JP2010087343 A JP 2010087343A JP 2010153932 A5 JP2010153932 A5 JP 2010153932A5
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nozzle member
exposure apparatus
nozzle
liquid
optical system
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JP2010087343A
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JP2010153932A (en
JP5229264B2 (en
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Priority claimed from JP2010087343A external-priority patent/JP5229264B2/en
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Claims (20)

投影光学系と液浸領域の液体を介して前記基板を露光する露光装置であって、
前記液体を供給する供給口を有する第１ノズル部材と、
前記液体を回収する回収口を有する第２ノズル部材と、
前記第２ノズル部材と対向配置された物体の表面と、前記第２ノズル部材の下面との相対位置及び相対傾斜のうち少なくとも一方を調整するノズル駆動機構と、を備える露光装置。 An exposure apparatus that exposes the substrate through a liquid in a projection optical system and an immersion area,
A first nozzle member having a supply port for supplying the liquid;
A second nozzle member having a recovery port for recovering the liquid;
An exposure apparatus comprising: a nozzle drive mechanism that adjusts at least one of a relative position and a relative inclination between a surface of an object disposed opposite to the second nozzle member and a lower surface of the second nozzle member. 前記第１ノズル部材は、液体を回収する回収口を有していない請求項１に記載の露光装置。   The exposure apparatus according to claim 1, wherein the first nozzle member does not have a recovery port for recovering a liquid. 前記第１ノズル部材は、前記投影光学系を囲むように設けられ、
前記第２ノズル部材は、前記第１ノズル部材の外側を囲むように設けられる請求項１又は２に記載の露光装置。 The first nozzle member is provided so as to surround the projection optical system,
The exposure apparatus according to claim 1, wherein the second nozzle member is provided so as to surround an outer side of the first nozzle member. 前記第１ノズル部材は、前記投影光学系を構成する光学素子を保持する保持部材に接続され、
前記第２ノズル部材は、前記第１ノズル部材に対して移動する請求項１〜３のいずれか一項に記載の露光装置。 The first nozzle member is connected to a holding member that holds an optical element constituting the projection optical system,
The exposure apparatus according to claim 1, wherein the second nozzle member moves relative to the first nozzle member. 前記投影光学系を支持する支持部材を備え、
前記第２ノズル部材は、前記支持部材に支持される請求項１〜４のいずれか一項に記載の露光装置。 A support member for supporting the projection optical system;
The exposure apparatus according to claim 1, wherein the second nozzle member is supported by the support member. 前記物体の表面の面位置情報を検出する検出系を備え、
前記ノズル駆動機構は、前記検出系の検出結果に基づいて、前記第２ノズル部材を駆動する請求項１〜５のいずれか一項に記載の露光装置。 A detection system for detecting surface position information of the surface of the object;
The exposure apparatus according to claim 1, wherein the nozzle driving mechanism drives the second nozzle member based on a detection result of the detection system. 前記供給口は、前記物体が対向する前記第１ノズル部材の下面に配置される請求項１〜６のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the supply port is disposed on a lower surface of the first nozzle member facing the object. 前記回収口は、前記物体が対向する前記第２ノズル部材の下面に配置される請求項１〜７のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the recovery port is disposed on a lower surface of the second nozzle member facing the object. 前記回収口は、前記投影光学系の光軸を囲むように環状に形成されている請求項８に記載の露光装置。   The exposure apparatus according to claim 8, wherein the recovery port is formed in an annular shape so as to surround the optical axis of the projection optical system. 前記液浸領域の外側で前記物体の表面に気体を吹き付ける吹出口を有する気体吹出機構を含む請求項１〜９のいずれか一項に露光装置。   The exposure apparatus according to any one of claims 1 to 9, further comprising a gas blowing mechanism having a blow-out port for blowing gas onto the surface of the object outside the immersion area. 前記気体吹出機構は、前記第２ノズル部材の外側に接続され、前記物体の表面と対向する下面を有する吹出部材を有し、前記吹出口は、前記吹出部材の下面に設けられている請求項１０に記載の露光装置。   The gas blowing mechanism includes a blowing member connected to the outside of the second nozzle member and having a lower surface facing the surface of the object, and the outlet is provided on a lower surface of the blowing member. The exposure apparatus according to 10. 前記吹出口は、前記第２ノズル部材を囲むように複数設けられている請求項１１に記載の露光装置。   The exposure apparatus according to claim 11, wherein a plurality of the outlets are provided so as to surround the second nozzle member. 前記吹出口は、前記第２ノズル部材の下面に形成されている請求項１０に記載の露光装置。   The exposure apparatus according to claim 10, wherein the air outlet is formed on a lower surface of the second nozzle member. 前記第２ノズル部材の下面において、前記投影光学系の光軸に対して前記吹出口よりも外側に設けられ、気体を吸引する吸引口を備える請求項１３に記載の露光装置。   The exposure apparatus according to claim 13, further comprising a suction port that is provided outside the blowout port with respect to the optical axis of the projection optical system on the lower surface of the second nozzle member and sucks gas. 前記第１ノズル部材と前記第２ノズル部材との間には、ギャップが形成されている請求項１〜１４のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein a gap is formed between the first nozzle member and the second nozzle member. 前記ギャップの上端部は、大気開放されている請求項１５に記載の露光装置。   The exposure apparatus according to claim 15, wherein an upper end portion of the gap is open to the atmosphere. 前記物体は前記基板を含み、
前記基板は所定方向に移動しながら走査露光され、前記ノズル調整機構は、前記走査露光中に前記第２ノズル部材を調整する請求項１〜１６のいずれか一項に記載の露光装置。 The object includes the substrate;
The exposure apparatus according to claim 1, wherein the substrate is scanned and exposed while moving in a predetermined direction, and the nozzle adjustment mechanism adjusts the second nozzle member during the scanning exposure. 請求項１〜請求項１７のいずれか一項に記載の露光装置を用いるデバイス製造方法。   The device manufacturing method using the exposure apparatus as described in any one of Claims 1-17. 投影光学系と液浸領域の液体を介して前記基板を露光する露光方法であって、
第１ノズル部材が有する供給口から前記液体を供給することと、
第２ノズル部材が有する回収口から前記液体を回収することと、
前記供給口から供給された前記液体を介して前記基板を露光することと、
前記第２ノズル部材と対向配置された物体の表面位置に応じて、前記第２ノズル部材の位置及び傾きのうち少なくとも一方を調整することを、を含む露光方法。 An exposure method for exposing the substrate through a liquid in a projection optical system and an immersion area,
Supplying the liquid from a supply port of the first nozzle member;
Recovering the liquid from a recovery port of the second nozzle member;
Exposing the substrate through the liquid supplied from the supply port;
An exposure method comprising adjusting at least one of a position and an inclination of the second nozzle member according to a surface position of an object disposed to face the second nozzle member. 請求項１９に記載の露光方法を用いるデバイス製造方法。   A device manufacturing method using the exposure method according to claim 19.
JP2010087343A 2004-09-17 2010-04-05 Exposure apparatus, exposure method, and device manufacturing method Active JP5229264B2 (en)

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JP2012082548A Division JP5633533B2 (en) 2004-09-17 2012-03-30 Nozzle member, immersion exposure apparatus, immersion exposure method, and device manufacturing method

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JP2012082548A Expired - Fee Related JP5633533B2 (en) 2004-09-17 2012-03-30 Nozzle member, immersion exposure apparatus, immersion exposure method, and device manufacturing method
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JP2013271416A Expired - Fee Related JP5765415B2 (en) 2004-09-17 2013-12-27 Immersion exposure apparatus, immersion exposure method, and device manufacturing method

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