JP2011237781A5 - - Google Patents

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Publication number
JP2011237781A5
JP2011237781A5 JP2011085329A JP2011085329A JP2011237781A5 JP 2011237781 A5 JP2011237781 A5 JP 2011237781A5 JP 2011085329 A JP2011085329 A JP 2011085329A JP 2011085329 A JP2011085329 A JP 2011085329A JP 2011237781 A5 JP2011237781 A5 JP 2011237781A5
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JP
Japan
Prior art keywords
layer
alignment
substrate
maskless exposure
exposure apparatus
Prior art date
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Pending
Application number
JP2011085329A
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English (en)
Japanese (ja)
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JP2011237781A (ja
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Publication date
Priority claimed from KR1020100042384A external-priority patent/KR101059811B1/ko
Application filed filed Critical
Publication of JP2011237781A publication Critical patent/JP2011237781A/ja
Publication of JP2011237781A5 publication Critical patent/JP2011237781A5/ja
Pending legal-status Critical Current

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JP2011085329A 2010-05-06 2011-04-07 マスクレス露光装置とマスクレス露光でのオーバーレイのための整列方法 Pending JP2011237781A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2010-0042384 2010-05-06
KR1020100042384A KR101059811B1 (ko) 2010-05-06 2010-05-06 마스크리스 노광 장치와 마스크리스 노광에서 오버레이를 위한 정렬 방법

Publications (2)

Publication Number Publication Date
JP2011237781A JP2011237781A (ja) 2011-11-24
JP2011237781A5 true JP2011237781A5 (https=) 2014-05-22

Family

ID=44534739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011085329A Pending JP2011237781A (ja) 2010-05-06 2011-04-07 マスクレス露光装置とマスクレス露光でのオーバーレイのための整列方法

Country Status (4)

Country Link
US (1) US8675180B2 (https=)
EP (1) EP2385426A3 (https=)
JP (1) JP2011237781A (https=)
KR (1) KR101059811B1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102020934B1 (ko) * 2012-12-07 2019-09-11 엘지디스플레이 주식회사 마스크리스 노광 장치의 얼라인 방법
TWI607291B (zh) * 2013-04-17 2017-12-01 Orc Manufacturing Co Ltd Exposure device
KR101854521B1 (ko) 2016-06-08 2018-05-03 인하대학교 산학협력단 Dmd를 이용한 노광시스템
CN110235061B (zh) 2017-01-31 2021-06-18 Asml荷兰有限公司 用于增加图案定位的准确度的方法及系统
KR102013194B1 (ko) * 2017-09-19 2019-08-22 주식회사 리텍 Dmd에 입사하는 조사광 방향을 제어할 수 있는 노광 광학계 및 이를 구성하는 광 조사 광학계
KR102042012B1 (ko) * 2017-09-26 2019-11-08 주식회사 리텍 고속 노광과 저속 노광이 가능한 ｄｍｄ 기반의 노광 장치
US10859924B2 (en) 2017-11-15 2020-12-08 Taiwan Semiconductor Manufacturing Co., Ltd. Method for manufacturing semiconductor device and system for performing the same
JP7356585B2 (ja) * 2019-10-08 2023-10-04 アプライド マテリアルズ インコーポレイテッド マスクレスリソグラフィシステム用ユニバーサル計測ファイル、プロトコル、及びプロセス
CN114442436B (zh) * 2020-10-30 2024-08-13 京东方科技集团股份有限公司 一种数字曝光设备和曝光方法
JP7660677B2 (ja) 2020-12-17 2025-04-11 アプライド マテリアルズ インコーポレイテッド デジタルリソグラフィにおけるローカルセル置換のための適応的置換マップの使用
KR20240055034A (ko) * 2021-09-03 2024-04-26 상에이 기켄 가부시키가이샤 직접 묘화 장치 및 그 제어 방법
CN114200797B (zh) * 2021-12-14 2022-11-22 南京大学 一种用于纳米压印金属光栅拼接对齐的掩模及金属光栅拼接方法
JP7808637B2 (ja) * 2024-05-29 2026-01-29 レーザーテック株式会社 情報処理方法及び情報処理装置
CN119805879B (zh) * 2025-02-11 2026-04-03 合肥芯碁微电子装备股份有限公司 应用于直写光刻机的纠偏对位方法及装置、介质和光刻机

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
JP3309747B2 (ja) 1996-12-20 2002-07-29 株式会社日立製作所 セラミックス多層配線基板と薄膜パターンのアライメント方法
JP4273030B2 (ja) * 2004-03-29 2009-06-03 富士フイルム株式会社 露光装置の校正方法及び露光装置
US7368207B2 (en) * 2006-03-31 2008-05-06 Eastman Kodak Company Dynamic compensation system for maskless lithography
JP5211487B2 (ja) * 2007-01-25 2013-06-12 株式会社ニコン 露光方法及び露光装置並びにマイクロデバイスの製造方法
JP2009210726A (ja) 2008-03-03 2009-09-17 Hitachi Via Mechanics Ltd マスクレス露光装置
JP2009223262A (ja) * 2008-03-19 2009-10-01 Orc Mfg Co Ltd 露光システムおよび露光方法
KR20100030999A (ko) 2008-09-11 2010-03-19 삼성전자주식회사 마스크리스 노광 장치 및 이를 이용한 정렬 오차의 보상 방법
US8670106B2 (en) * 2008-09-23 2014-03-11 Pinebrook Imaging, Inc. Optical imaging writer system
JP5355245B2 (ja) * 2009-06-25 2013-11-27 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
KR101678050B1 (ko) * 2009-11-16 2016-12-07 삼성전자 주식회사 오프 액시스 정렬을 이용한 마스크리스 노광 장치 및 방법
KR101678039B1 (ko) * 2010-10-01 2016-11-21 삼성전자 주식회사 마스크리스 노광 장치, 마스크리스 노광에서 노광 시작 위치와 자세를 결정하는 방법
KR101764169B1 (ko) * 2011-08-19 2017-08-02 삼성전자 주식회사 마스크리스 노광 장치와 이를 이용한 빔 위치 계측 방법

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