JP2011237411A5 - - Google Patents

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Publication number
JP2011237411A5
JP2011237411A5 JP2011081804A JP2011081804A JP2011237411A5 JP 2011237411 A5 JP2011237411 A5 JP 2011237411A5 JP 2011081804 A JP2011081804 A JP 2011081804A JP 2011081804 A JP2011081804 A JP 2011081804A JP 2011237411 A5 JP2011237411 A5 JP 2011237411A5
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JP
Japan
Prior art keywords
room
pressure
porosity
substrate
disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011081804A
Other languages
English (en)
Japanese (ja)
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JP2011237411A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2011237411A publication Critical patent/JP2011237411A/ja
Publication of JP2011237411A5 publication Critical patent/JP2011237411A5/ja
Pending legal-status Critical Current

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JP2011081804A 1998-08-28 2011-04-01 間隙率を求める装置及び方法 Pending JP2011237411A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9824798P 1998-08-28 1998-08-28
US60/098,247 1998-08-28

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2000567934A Division JP4869478B2 (ja) 1998-08-28 1999-08-27 間隙率を求める装置及び方法

Publications (2)

Publication Number Publication Date
JP2011237411A JP2011237411A (ja) 2011-11-24
JP2011237411A5 true JP2011237411A5 (enExample) 2012-07-05

Family

ID=22268341

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2000567934A Expired - Lifetime JP4869478B2 (ja) 1998-08-28 1999-08-27 間隙率を求める装置及び方法
JP2011081804A Pending JP2011237411A (ja) 1998-08-28 2011-04-01 間隙率を求める装置及び方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2000567934A Expired - Lifetime JP4869478B2 (ja) 1998-08-28 1999-08-27 間隙率を求める装置及び方法

Country Status (7)

Country Link
US (2) US6319736B1 (enExample)
EP (1) EP1032816B1 (enExample)
JP (2) JP4869478B2 (enExample)
AT (1) ATE475879T1 (enExample)
AU (1) AU5855799A (enExample)
DE (1) DE69942632D1 (enExample)
WO (1) WO2000012999A1 (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1172847A3 (en) 2000-07-10 2004-07-28 Interuniversitair Micro-Elektronica Centrum Vzw A method to produce a porous oxygen-silicon layer
US7042570B2 (en) * 2002-01-25 2006-05-09 The Regents Of The University Of California Porous thin film time-varying reflectivity analysis of samples
US7016028B2 (en) 2002-06-07 2006-03-21 Interuniversitair Microelektronica Centrum (Imec) Method and apparatus for defect detection
EP1369682A3 (en) * 2002-06-07 2004-12-01 Interuniversitair Microelektronica Centrum Vzw A method for wafer level detection of integrity of a layer
EP1722213B1 (en) * 2005-05-12 2019-10-16 IMEC vzw Method for the quantification of hydrophilic properties of porous materials
JP4528279B2 (ja) * 2005-05-12 2010-08-18 アイメック 多孔性材料の親水性の定量化のための方法
FR2886015B1 (fr) * 2005-05-18 2007-07-13 Commissariat Energie Atomique Procede de mesure de la porosite par ellipsometrie et dispositif mettant en oeuvre un tel procede
US7363161B2 (en) * 2005-06-03 2008-04-22 Baker Hughes Incorporated Pore-scale geometric models for interpretation of downhole formation evaluation data
GB0516477D0 (en) * 2005-08-11 2005-09-14 Optical Reference Systems Ltd Apparatus for measuring semiconductor physical characteristics
DE602006015595D1 (de) * 2005-12-22 2010-09-02 Imec Verfahren zur Bestimmung der Lösungsmitteldurchlässigkeit von Filmen
US7808657B2 (en) * 2007-06-28 2010-10-05 International Business Machines Corporation Wafer and stage alignment using photonic devices
JP5555908B2 (ja) * 2007-08-08 2014-07-23 独立行政法人産業技術総合研究所 光学的測定室
JP5120927B2 (ja) * 2007-08-08 2013-01-16 独立行政法人産業技術総合研究所 薄膜の物性評価方法および評価装置
US7907264B1 (en) * 2007-09-07 2011-03-15 Kla-Tencor Corporation Measurement of thin film porosity
RU2374625C1 (ru) * 2008-05-05 2009-11-27 Институт физики полупроводников Сибирского отделения Российской академии наук Устройство для определения пористых характеристик тонких слоев (варианты)
FR2948192B1 (fr) * 2009-07-20 2011-07-22 Commissariat Energie Atomique Procede de caracterisation optique
WO2011137454A1 (en) * 2010-04-30 2011-11-03 The Regents Of The University Of Colorado, A Body Corporate Determination of pore size in porous materials by evaporative mass loss
WO2012012437A2 (en) * 2010-07-20 2012-01-26 The Regents Of The University Of California Temperature response sensing and classification of analytes with porous optical films
US9546943B1 (en) * 2015-03-21 2017-01-17 J.A. Woollam Co., Inc System and method for investigating change in optical properties of a porous effective substrate surface as a function of a sequence of solvent partial pressures at atmospheric pressure
US10041873B2 (en) * 2016-05-02 2018-08-07 Kla-Tencor Corporation Porosity measurement of semiconductor structures
US10145674B2 (en) 2016-05-02 2018-12-04 Kla-Tencor Corporation Measurement of semiconductor structures with capillary condensation
US10281263B2 (en) 2016-05-02 2019-05-07 Kla-Tencor Corporation Critical dimension measurements with gaseous adsorption
CN107552258B (zh) * 2016-07-01 2019-06-07 江苏鲁汶仪器有限公司 气体喷射装置
CN106990255B (zh) * 2017-04-07 2018-08-28 鲁汶仪器有限公司（比利时） 样品分析系统
WO2019100070A1 (en) * 2017-11-20 2019-05-23 Energy Everywhere, Inc. Method and system for pervoskite solar cell with scaffold structure
CN109164030A (zh) * 2018-10-17 2019-01-08 西南交通大学 一种用于观测岩石吸水渗透过程的实验装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3976450A (en) * 1973-01-02 1976-08-24 Roland Marcote Gas sample preparation system and method
US4246775A (en) * 1979-06-08 1981-01-27 Philip Morris Incorporated Porosity measuring apparatus and perforating system using same
US4304122A (en) * 1980-05-06 1981-12-08 E. I. Du Pont De Nemours And Company Deep well simulator
US4389878A (en) * 1981-05-01 1983-06-28 The Dow Chemical Company Dynamic gas transmission measuring apparatus
IT1138019B (it) * 1981-07-09 1986-09-10 Erba Strumentazione Procedimento e apparecchiatura per l'effettuazione di analisi porosimetriche
GB8313635D0 (en) * 1983-05-17 1983-06-22 Whatman Reeve Angel Plc Porosimeter
US4531404A (en) * 1983-12-29 1985-07-30 Mobil Oil Corporation Flow cell assembly
US5002399A (en) * 1987-07-23 1991-03-26 Mufit Akinc Thermoporosimeter
DE4003619A1 (de) * 1990-02-07 1991-08-14 Bosch Gmbh Robert Mikroventil
US5342580A (en) 1990-04-17 1994-08-30 Alan Brenner Apparatus and method for measuring the amount of gas adsorbed on or desorbed from a solid and reactions of a gas with a solid
JPH0579973A (ja) * 1991-09-20 1993-03-30 Olympus Optical Co Ltd 金属微粒子の光学定数測定方法
JPH0693972A (ja) * 1992-09-11 1994-04-05 Seiko Epson Corp マイクロポンプ及びその製造方法
JPH08304204A (ja) * 1995-05-12 1996-11-22 Mitsubishi Cable Ind Ltd ダイヤフラムユニットの作製方法及びそのダイヤフラムユニットを用いた圧力センサ
SE9504417D0 (sv) 1995-12-11 1995-12-11 Siemens Elema Ab Metod för att bestämma koncentrationen av en specifik gas och en analysapparat
US6245690B1 (en) * 1998-11-04 2001-06-12 Applied Materials, Inc. Method of improving moisture resistance of low dielectric constant films

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