JP4869478B2 - 間隙率を求める装置及び方法 - Google Patents

間隙率を求める装置及び方法 Download PDF

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JP4869478B2
JP4869478B2 JP2000567934A JP2000567934A JP4869478B2 JP 4869478 B2 JP4869478 B2 JP 4869478B2 JP 2000567934 A JP2000567934 A JP 2000567934A JP 2000567934 A JP2000567934 A JP 2000567934A JP 4869478 B2 JP4869478 B2 JP 4869478B2
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room
pressure
substance
temperature
porosity
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JP2000567934A
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Japanese (ja)
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JP2002523773A (ja
Inventor
ミハイル・ロディオノヴィッチ・バクラノフ
フェードル・ニコラエヴィッチ・デュルトセフ
コンスタンティン・ペトロヴィッチ・モギルニコフ
カラン・マエ
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Interuniversitair Microelektronica Centrum vzw IMEC
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Interuniversitair Microelektronica Centrum vzw IMEC
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/08—Investigating permeability, pore-volume, or surface area of porous materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/08—Investigating permeability, pore-volume, or surface area of porous materials
    • G01N2015/0846—Investigating permeability, pore-volume, or surface area of porous materials by use of radiation, e.g. transmitted or reflected light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties

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  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • General Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Formation Of Insulating Films (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2000567934A 1998-08-28 1999-08-27 間隙率を求める装置及び方法 Expired - Lifetime JP4869478B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9824798P 1998-08-28 1998-08-28
US60/098,247 1998-08-28
PCT/EP1999/006299 WO2000012999A1 (en) 1998-08-28 1999-08-27 Apparatus and method for determining porosity

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011081804A Division JP2011237411A (ja) 1998-08-28 2011-04-01 間隙率を求める装置及び方法

Publications (2)

Publication Number Publication Date
JP2002523773A JP2002523773A (ja) 2002-07-30
JP4869478B2 true JP4869478B2 (ja) 2012-02-08

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JP2000567934A Expired - Lifetime JP4869478B2 (ja) 1998-08-28 1999-08-27 間隙率を求める装置及び方法
JP2011081804A Pending JP2011237411A (ja) 1998-08-28 2011-04-01 間隙率を求める装置及び方法

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Country Link
US (2) US6319736B1 (enExample)
EP (1) EP1032816B1 (enExample)
JP (2) JP4869478B2 (enExample)
AT (1) ATE475879T1 (enExample)
AU (1) AU5855799A (enExample)
DE (1) DE69942632D1 (enExample)
WO (1) WO2000012999A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1172847A3 (en) 2000-07-10 2004-07-28 Interuniversitair Micro-Elektronica Centrum Vzw A method to produce a porous oxygen-silicon layer
US7042570B2 (en) * 2002-01-25 2006-05-09 The Regents Of The University Of California Porous thin film time-varying reflectivity analysis of samples
EP1369682A3 (en) * 2002-06-07 2004-12-01 Interuniversitair Microelektronica Centrum Vzw A method for wafer level detection of integrity of a layer
US7016028B2 (en) 2002-06-07 2006-03-21 Interuniversitair Microelektronica Centrum (Imec) Method and apparatus for defect detection
EP1722213B1 (en) * 2005-05-12 2019-10-16 IMEC vzw Method for the quantification of hydrophilic properties of porous materials
JP4528279B2 (ja) * 2005-05-12 2010-08-18 アイメック 多孔性材料の親水性の定量化のための方法
FR2886015B1 (fr) * 2005-05-18 2007-07-13 Commissariat Energie Atomique Procede de mesure de la porosite par ellipsometrie et dispositif mettant en oeuvre un tel procede
US7363161B2 (en) * 2005-06-03 2008-04-22 Baker Hughes Incorporated Pore-scale geometric models for interpretation of downhole formation evaluation data
GB0516477D0 (en) * 2005-08-11 2005-09-14 Optical Reference Systems Ltd Apparatus for measuring semiconductor physical characteristics
DE602006015595D1 (de) * 2005-12-22 2010-09-02 Imec Verfahren zur Bestimmung der Lösungsmitteldurchlässigkeit von Filmen
US7808657B2 (en) * 2007-06-28 2010-10-05 International Business Machines Corporation Wafer and stage alignment using photonic devices
JP5555908B2 (ja) * 2007-08-08 2014-07-23 独立行政法人産業技術総合研究所 光学的測定室
JP5120927B2 (ja) * 2007-08-08 2013-01-16 独立行政法人産業技術総合研究所 薄膜の物性評価方法および評価装置
US7907264B1 (en) * 2007-09-07 2011-03-15 Kla-Tencor Corporation Measurement of thin film porosity
RU2374625C1 (ru) * 2008-05-05 2009-11-27 Институт физики полупроводников Сибирского отделения Российской академии наук Устройство для определения пористых характеристик тонких слоев (варианты)
FR2948192B1 (fr) 2009-07-20 2011-07-22 Commissariat Energie Atomique Procede de caracterisation optique
US9618441B2 (en) 2010-04-30 2017-04-11 National University Of Singapore Determination of pore size in porous materials by evaporative mass loss
WO2012012437A2 (en) * 2010-07-20 2012-01-26 The Regents Of The University Of California Temperature response sensing and classification of analytes with porous optical films
US9546943B1 (en) * 2015-03-21 2017-01-17 J.A. Woollam Co., Inc System and method for investigating change in optical properties of a porous effective substrate surface as a function of a sequence of solvent partial pressures at atmospheric pressure
US10281263B2 (en) 2016-05-02 2019-05-07 Kla-Tencor Corporation Critical dimension measurements with gaseous adsorption
US10041873B2 (en) * 2016-05-02 2018-08-07 Kla-Tencor Corporation Porosity measurement of semiconductor structures
US10145674B2 (en) 2016-05-02 2018-12-04 Kla-Tencor Corporation Measurement of semiconductor structures with capillary condensation
CN107552258B (zh) * 2016-07-01 2019-06-07 江苏鲁汶仪器有限公司 气体喷射装置
CN106990255B (zh) * 2017-04-07 2018-08-28 鲁汶仪器有限公司（比利时） 样品分析系统
WO2019100070A1 (en) * 2017-11-20 2019-05-23 Energy Everywhere, Inc. Method and system for pervoskite solar cell with scaffold structure
CN109164030A (zh) * 2018-10-17 2019-01-08 西南交通大学 一种用于观测岩石吸水渗透过程的实验装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0579973A (ja) * 1991-09-20 1993-03-30 Olympus Optical Co Ltd 金属微粒子の光学定数測定方法
JPH0693972A (ja) * 1992-09-11 1994-04-05 Seiko Epson Corp マイクロポンプ及びその製造方法
JPH08304204A (ja) * 1995-05-12 1996-11-22 Mitsubishi Cable Ind Ltd ダイヤフラムユニットの作製方法及びそのダイヤフラムユニットを用いた圧力センサ

Family Cites Families (12)

* Cited by examiner, † Cited by third party
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US3976450A (en) * 1973-01-02 1976-08-24 Roland Marcote Gas sample preparation system and method
US4246775A (en) * 1979-06-08 1981-01-27 Philip Morris Incorporated Porosity measuring apparatus and perforating system using same
US4304122A (en) * 1980-05-06 1981-12-08 E. I. Du Pont De Nemours And Company Deep well simulator
US4389878A (en) * 1981-05-01 1983-06-28 The Dow Chemical Company Dynamic gas transmission measuring apparatus
IT1138019B (it) * 1981-07-09 1986-09-10 Erba Strumentazione Procedimento e apparecchiatura per l'effettuazione di analisi porosimetriche
GB8313635D0 (en) * 1983-05-17 1983-06-22 Whatman Reeve Angel Plc Porosimeter
US4531404A (en) * 1983-12-29 1985-07-30 Mobil Oil Corporation Flow cell assembly
US5002399A (en) 1987-07-23 1991-03-26 Mufit Akinc Thermoporosimeter
DE4003619A1 (de) * 1990-02-07 1991-08-14 Bosch Gmbh Robert Mikroventil
US5342580A (en) 1990-04-17 1994-08-30 Alan Brenner Apparatus and method for measuring the amount of gas adsorbed on or desorbed from a solid and reactions of a gas with a solid
SE9504417D0 (sv) 1995-12-11 1995-12-11 Siemens Elema Ab Metod för att bestämma koncentrationen av en specifik gas och en analysapparat
US6245690B1 (en) * 1998-11-04 2001-06-12 Applied Materials, Inc. Method of improving moisture resistance of low dielectric constant films

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0579973A (ja) * 1991-09-20 1993-03-30 Olympus Optical Co Ltd 金属微粒子の光学定数測定方法
JPH0693972A (ja) * 1992-09-11 1994-04-05 Seiko Epson Corp マイクロポンプ及びその製造方法
JPH08304204A (ja) * 1995-05-12 1996-11-22 Mitsubishi Cable Ind Ltd ダイヤフラムユニットの作製方法及びそのダイヤフラムユニットを用いた圧力センサ

Also Published As

Publication number Publication date
EP1032816A1 (en) 2000-09-06
JP2002523773A (ja) 2002-07-30
WO2000012999A1 (en) 2000-03-09
JP2011237411A (ja) 2011-11-24
ATE475879T1 (de) 2010-08-15
US6319736B1 (en) 2001-11-20
DE69942632D1 (de) 2010-09-09
EP1032816B1 (en) 2010-07-28
US20010054306A1 (en) 2001-12-27
US6435008B2 (en) 2002-08-20
AU5855799A (en) 2000-03-21

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