JP2011167021A5 - - Google Patents
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- Publication number
- JP2011167021A5 JP2011167021A5 JP2010029598A JP2010029598A JP2011167021A5 JP 2011167021 A5 JP2011167021 A5 JP 2011167021A5 JP 2010029598 A JP2010029598 A JP 2010029598A JP 2010029598 A JP2010029598 A JP 2010029598A JP 2011167021 A5 JP2011167021 A5 JP 2011167021A5
- Authority
- JP
- Japan
- Prior art keywords
- etching
- adjusting unit
- film
- strength adjusting
- photolithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 description 7
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010029598A JP5733898B2 (ja) | 2010-02-14 | 2010-02-14 | 静電容量型電気機械変換装置 |
| US13/025,869 US20110198966A1 (en) | 2010-02-14 | 2011-02-11 | Capacitive electromechanical transducer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010029598A JP5733898B2 (ja) | 2010-02-14 | 2010-02-14 | 静電容量型電気機械変換装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011167021A JP2011167021A (ja) | 2011-08-25 |
| JP2011167021A5 true JP2011167021A5 (enExample) | 2013-03-28 |
| JP5733898B2 JP5733898B2 (ja) | 2015-06-10 |
Family
ID=44369170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010029598A Expired - Fee Related JP5733898B2 (ja) | 2010-02-14 | 2010-02-14 | 静電容量型電気機械変換装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20110198966A1 (enExample) |
| JP (1) | JP5733898B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104379268B (zh) * | 2012-05-31 | 2017-02-22 | 皇家飞利浦有限公司 | 晶片及其制造方法 |
| US10293375B2 (en) | 2013-09-24 | 2019-05-21 | Koninklijke Philips N.V. | CMUT device manufacturing method, CMUT device and apparatus |
| KR102184453B1 (ko) * | 2014-07-21 | 2020-11-30 | 삼성전자주식회사 | 초음파 변환기 및 초음파 변환기의 제조 방법 |
| EP3533386A1 (en) | 2018-02-28 | 2019-09-04 | Koninklijke Philips N.V. | Pressure sensing with capacitive pressure sensor |
| US11545612B2 (en) * | 2019-05-03 | 2023-01-03 | May Sun Technology Co., Ltd. | Pseudo-piezoelectric D33 device and electronic device using the same |
| JP7581795B2 (ja) | 2020-11-25 | 2024-11-13 | セイコーエプソン株式会社 | 圧電アクチュエーター、超音波素子、超音波探触子、超音波装置、及び電子デバイス |
| TWI789229B (zh) * | 2022-01-28 | 2023-01-01 | 友達光電股份有限公司 | 換能器及其製造方法 |
| CN117000570B (zh) * | 2022-08-06 | 2025-08-29 | 洪波 | 一种先进电容纳机电超声换能器芯片单元 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19922967C2 (de) * | 1999-05-19 | 2001-05-03 | Siemens Ag | Mikromechanischer kapazitiver Ultraschallwandler und Verfahren zu dessen Herstellung |
| US6499348B1 (en) * | 1999-12-03 | 2002-12-31 | Scimed Life Systems, Inc. | Dynamically configurable ultrasound transducer with integral bias regulation and command and control circuitry |
| US6831394B2 (en) * | 2002-12-11 | 2004-12-14 | General Electric Company | Backing material for micromachined ultrasonic transducer devices |
| CN100578928C (zh) * | 2004-09-10 | 2010-01-06 | 株式会社村田制作所 | 压电薄膜共振器 |
| US7888709B2 (en) * | 2004-09-15 | 2011-02-15 | Sonetics Ultrasound, Inc. | Capacitive micromachined ultrasonic transducer and manufacturing method |
| US7037746B1 (en) * | 2004-12-27 | 2006-05-02 | General Electric Company | Capacitive micromachined ultrasound transducer fabricated with epitaxial silicon membrane |
| US7615834B2 (en) * | 2006-02-28 | 2009-11-10 | The Board Of Trustees Of The Leland Stanford Junior University | Capacitive micromachined ultrasonic transducer(CMUT) with varying thickness membrane |
| JP4699259B2 (ja) * | 2006-03-31 | 2011-06-08 | 株式会社日立製作所 | 超音波トランスデューサ |
| US7745973B2 (en) * | 2006-05-03 | 2010-06-29 | The Board Of Trustees Of The Leland Stanford Junior University | Acoustic crosstalk reduction for capacitive micromachined ultrasonic transducers in immersion |
| JP4842010B2 (ja) * | 2006-05-09 | 2011-12-21 | 株式会社日立メディコ | 超音波探触子及び超音波診断装置 |
| JP5026770B2 (ja) * | 2006-11-14 | 2012-09-19 | 株式会社日立メディコ | 超音波探触子及び超音波診断装置 |
-
2010
- 2010-02-14 JP JP2010029598A patent/JP5733898B2/ja not_active Expired - Fee Related
-
2011
- 2011-02-11 US US13/025,869 patent/US20110198966A1/en not_active Abandoned
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