JP2011137237A - プラズマ・アーク被覆システム - Google Patents
プラズマ・アーク被覆システム Download PDFInfo
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- JP2011137237A JP2011137237A JP2011026767A JP2011026767A JP2011137237A JP 2011137237 A JP2011137237 A JP 2011137237A JP 2011026767 A JP2011026767 A JP 2011026767A JP 2011026767 A JP2011026767 A JP 2011026767A JP 2011137237 A JP2011137237 A JP 2011137237A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
Abstract
【解決手段】下地がプラズマ・アーク被覆システムを通って進む際に前記下地を加熱するための装置であって、二次元配列された複数の第1の熱源にして、該第1の熱源配列の前で下地に熱を供給する、複数の第1の熱源と、下地のための所定の温度プロファイルに従って前記下地の表面の局部区域を加熱するために、各第1の熱源の動作を制御する制御装置とを含む、加熱装置。
【選択図】なし
Description
Claims (15)
- 下地がプラズマ・アーク被覆システムを通って進む際に前記下地を加熱するための装置であって、
二次元配列された複数の第1の熱源にして、該第1の熱源配列の前で下地に熱を供給する、複数の第1の熱源と、
下地のための所定の温度プロファイルに従って前記下地の表面の局部区域を加熱するために、各第1の熱源の動作を制御する制御装置と
を含む、加熱装置。 - 二次元配列された複数の第2の熱源を更に含み、前記2つの熱源配列からのエネルギーが、下地が前記2つの熱源配列の前にある時に、前記下地の両側に向けられる、請求項1に記載の加熱装置。
- 1つの真空室を更に含み、2つの前記熱源配列が前記真空室の両側にそれぞれ位置している、請求項1に記載の加熱装置。
- 下地がプラズマ・アーク被覆システムを通って進む際に前記下地を加熱するためのシステムであって、
第1の二次元配列された複数の熱源と第2の二次元配列された複数の熱源とを有する微調整ヒータにして、前記2つの熱源配列からのエネルギーが、前記下地が前記2つの熱源配列の前にある時に前記下地の両側に向けられる微調整ヒータと、
前記下地のための所定の温度プロファイルに従って前記下地のそれぞれの表面の局部区域を加熱するために、各熱源の動作を制御する制御装置と
を含む、加熱システム。 - 前記下地が前記微調整ヒータの中に入る前に前記下地を加熱するように位置した粗調整ヒータを更に含む、請求項4に記載の加熱システム。
- 第1被覆ステーションと第2被覆ステーションとの間に位置する第2微調整ヒータを更に含み、前記第2微調整ヒータが、第3の二次元配列された複数の熱源と第4の二次元配列された複数の熱源とを含み、前記第3及び第4の熱源からのエネルギーが前記制御装置の指図の下で前記下地の両側に向けられる、請求項4に記載の加熱システム。
- 前記下地の前記温度プロファイルの特性を表すように構成された複数の温度センサを更に含む、請求項4又は6に記載の加熱システム。
- 下地がプラズマ・アーク被覆システムを通って進む際に前記下地を加熱するための方法であって、
前記下地が二次元配列された複数の熱源配列の前にある時に、前記下地の表面を前記熱源によって加熱する工程と、
前記下地のための所定の温度プロファイルに従って前記下地の前記表面の局部区域を加熱するために、各熱源の動作を制御する工程と
を含む、加熱方法。 - 下地がプラズマ・アーク被覆システムを通って進む際に前記下地を加熱するための方法であって、
前記下地を、第1の二次元配列された複数の熱源と第2の二次元配列された複数の熱源とを有する微調整ヒータによって加熱する工程にして、前記2つの熱源配列からのエネルギーが、前記下地が前記熱源配列の前にある時に、前記下地の両側に向けられる工程と、
前記下地のための所定の温度プロファイルに従って前記下地のそれぞれの表面の局部区域を加熱するために、各前記熱源の動作を制御する工程と
を含む、加熱方法。 - 各熱源から放出されるエネルギーを、前記制御装置において実行されるプログラムに従って時間と共に変動させる工程を更に含む、請求項8又は9に記載の加熱方法。
- 前記加熱する工程は前記下地が被覆ステーションの中に入る前に起る、請求項8又は9に記載の加熱方法。
- 前記下地が微調整ヒータの中に入る前に、前記下地を粗調整ヒータによって加熱する工程を更に含む、請求項9に記載の加熱方法。
- 第1被覆ステーションと第2被覆ステーションとの間に位置する第2微調整ヒータによって前記基板を加熱する工程を更に含み、前記第2微調整ヒータが第3の二次元配列された複数の熱源と第4の二次元配列された複数の熱源とを含み、前記第3及び第4の熱源からのエネルギーが前記制御装置の指図の下で前記下地の両側に向けられる、請求項9に記載の加熱方法。
- 前記下地の前記温度プロファイルを決定する工程を更に含む、請求項9又は13に記載の加熱方法。
- 前記制御装置が前記下地の前記温度プロファイルを受け取り、前記熱源からのエネルギー出力を変更し前記下地の前記温度プロファイルを制御する、請求項14に記載の加熱方法。
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US10/910,143 | 2004-08-03 | ||
US10/910,143 US7521653B2 (en) | 2004-08-03 | 2004-08-03 | Plasma arc coating system |
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JP2007524782A Division JP5069113B2 (ja) | 2004-08-03 | 2004-10-27 | プラズマ・アーク被覆システム |
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JP2011137237A true JP2011137237A (ja) | 2011-07-14 |
JP5436472B2 JP5436472B2 (ja) | 2014-03-05 |
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JP2007524782A Active JP5069113B2 (ja) | 2004-08-03 | 2004-10-27 | プラズマ・アーク被覆システム |
JP2011026767A Expired - Fee Related JP5436472B2 (ja) | 2004-08-03 | 2011-02-10 | 加熱装置、加熱システムおよび方法 |
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US (3) | US7521653B2 (ja) |
EP (2) | EP2048264A1 (ja) |
JP (2) | JP5069113B2 (ja) |
KR (1) | KR101181179B1 (ja) |
CN (1) | CN101218372A (ja) |
DE (1) | DE602004019153D1 (ja) |
WO (1) | WO2006022778A2 (ja) |
Families Citing this family (11)
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US7521653B2 (en) * | 2004-08-03 | 2009-04-21 | Exatec Llc | Plasma arc coating system |
CN101198463A (zh) * | 2005-02-23 | 2008-06-11 | 埃克阿泰克有限责任公司 | 具有均匀耐候特性的塑料板 |
KR101482805B1 (ko) | 2006-12-28 | 2015-01-14 | 엑사테크 엘.엘.씨. | 플라즈마 아크 코팅용 장치와 방법 |
KR101588174B1 (ko) * | 2007-05-17 | 2016-01-27 | 엑사테크 엘.엘.씨. | 공통 플라즈마 코팅 구역에서 복수의 코팅 재료를 침착시키기 위한 장치 및 방법 |
US20110054029A1 (en) * | 2009-06-26 | 2011-03-03 | Kuhrts Eric H | Water-soluble dietary fatty acids |
JP2011144412A (ja) * | 2010-01-13 | 2011-07-28 | Honda Motor Co Ltd | プラズマ成膜装置 |
EP2697295B1 (en) | 2011-04-14 | 2018-12-19 | Exatec, LLC. | Organic resin laminate |
CN103337457B (zh) * | 2013-05-29 | 2016-05-25 | 京东方科技集团股份有限公司 | 退火装置和退火工艺 |
US9631981B2 (en) * | 2013-09-30 | 2017-04-25 | Electronics And Telecommunications Research Institute | Apparatus and method for measuring thermoelectric device |
EP3212696B1 (en) | 2014-10-29 | 2018-10-24 | PPG Industries Ohio, Inc. | Protective coating system for plastic substrate |
US11812540B1 (en) * | 2019-09-30 | 2023-11-07 | Board Of Trustees Of The University Of Alabama, For And On Behalf Of The University Of Alabama In Huntsville | Continuous large area cold atmospheric pressure plasma sheet source |
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- 2004-10-27 JP JP2007524782A patent/JP5069113B2/ja active Active
- 2004-10-27 CN CNA2004800437342A patent/CN101218372A/zh active Pending
- 2004-10-27 DE DE602004019153T patent/DE602004019153D1/de active Active
- 2004-10-27 EP EP04796493A patent/EP1781837B1/en active Active
- 2004-10-27 WO PCT/US2004/035572 patent/WO2006022778A2/en active Application Filing
- 2004-10-27 KR KR1020077004972A patent/KR101181179B1/ko active IP Right Grant
-
2009
- 2009-03-18 US US12/406,166 patent/US8049144B2/en not_active Expired - Fee Related
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2011
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Also Published As
Publication number | Publication date |
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JP5069113B2 (ja) | 2012-11-07 |
CN101218372A (zh) | 2008-07-09 |
US20110165333A1 (en) | 2011-07-07 |
DE602004019153D1 (de) | 2009-03-05 |
WO2006022778A3 (en) | 2007-09-20 |
EP2048264A1 (en) | 2009-04-15 |
JP5436472B2 (ja) | 2014-03-05 |
EP1781837A2 (en) | 2007-05-09 |
EP1781837B1 (en) | 2009-01-14 |
US8203103B2 (en) | 2012-06-19 |
US8049144B2 (en) | 2011-11-01 |
KR101181179B1 (ko) | 2012-09-18 |
KR20070048224A (ko) | 2007-05-08 |
US7521653B2 (en) | 2009-04-21 |
US20060029746A1 (en) | 2006-02-09 |
US20090181186A1 (en) | 2009-07-16 |
JP2008509283A (ja) | 2008-03-27 |
WO2006022778A2 (en) | 2006-03-02 |
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