JP2011091261A5 - - Google Patents

Download PDF

Info

Publication number
JP2011091261A5
JP2011091261A5 JP2009244535A JP2009244535A JP2011091261A5 JP 2011091261 A5 JP2011091261 A5 JP 2011091261A5 JP 2009244535 A JP2009244535 A JP 2009244535A JP 2009244535 A JP2009244535 A JP 2009244535A JP 2011091261 A5 JP2011091261 A5 JP 2011091261A5
Authority
JP
Japan
Prior art keywords
particles
substrate
latent image
image pattern
photoreceptor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009244535A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011091261A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009244535A priority Critical patent/JP2011091261A/ja
Priority claimed from JP2009244535A external-priority patent/JP2011091261A/ja
Publication of JP2011091261A publication Critical patent/JP2011091261A/ja
Publication of JP2011091261A5 publication Critical patent/JP2011091261A5/ja
Pending legal-status Critical Current

Links

JP2009244535A 2009-10-23 2009-10-23 基板処理装置、基板処理方法及びこの方法によって処理された基板 Pending JP2011091261A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009244535A JP2011091261A (ja) 2009-10-23 2009-10-23 基板処理装置、基板処理方法及びこの方法によって処理された基板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009244535A JP2011091261A (ja) 2009-10-23 2009-10-23 基板処理装置、基板処理方法及びこの方法によって処理された基板

Publications (2)

Publication Number Publication Date
JP2011091261A JP2011091261A (ja) 2011-05-06
JP2011091261A5 true JP2011091261A5 (https=) 2012-08-23

Family

ID=44109246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009244535A Pending JP2011091261A (ja) 2009-10-23 2009-10-23 基板処理装置、基板処理方法及びこの方法によって処理された基板

Country Status (1)

Country Link
JP (1) JP2011091261A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109904107A (zh) * 2019-03-27 2019-06-18 韩进龙 一种微型器件补充装置、补充系统及补充方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10280170A (ja) * 1997-04-11 1998-10-20 Omron Corp エッチングマスクの形成方法及び装置
JP2000261008A (ja) * 1999-03-10 2000-09-22 Mitsubishi Electric Corp 太陽電池用シリコン基板の粗面化方法
JP2002040687A (ja) * 2000-07-28 2002-02-06 Sharp Corp 電子写真感光体、プロセスカートリッジ及び電子写真装置
JP2006210394A (ja) * 2005-01-25 2006-08-10 Canon Inc シリコン基体表面の凹凸形成方法
JP2007059715A (ja) * 2005-08-25 2007-03-08 Sumitomo Heavy Ind Ltd パターン作製方法及びパターン作製装置
KR101159438B1 (ko) * 2007-11-16 2012-06-22 가부시키가이샤 아루박 기판 처리 방법, 및 이 방법에 의해 처리된 기판

Similar Documents

Publication Publication Date Title
TW200741332A (en) Reflective-type mask blank for EUV lithography
JP2008209867A5 (https=)
WO2013049367A3 (en) Plasmonic lithography using phase mask
JP2014529169A5 (https=)
JP2010089076A5 (https=)
JP2016130922A5 (https=)
JP2011508265A5 (https=)
JP2009283970A5 (https=)
JP2010039352A5 (https=)
JP2010114106A5 (https=)
JP2010505264A5 (https=)
JP2009545878A5 (https=)
WO2011087896A3 (en) Nanopatterning method and apparatus
JP2009134274A5 (https=)
JP2013061485A5 (https=)
JP2012004349A5 (https=)
JP2009043879A5 (https=)
JP2011091261A5 (https=)
JP2011148247A5 (https=)
JP2006270057A5 (https=)
JP2008268528A5 (https=)
JP2015120611A5 (https=)
JP2011237839A5 (https=)
JP2009511987A5 (https=)
JP2009014915A5 (https=)