JP2011082246A5 - - Google Patents

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Publication number
JP2011082246A5
JP2011082246A5 JP2009231319A JP2009231319A JP2011082246A5 JP 2011082246 A5 JP2011082246 A5 JP 2011082246A5 JP 2009231319 A JP2009231319 A JP 2009231319A JP 2009231319 A JP2009231319 A JP 2009231319A JP 2011082246 A5 JP2011082246 A5 JP 2011082246A5
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JP
Japan
Prior art keywords
specifying information
specifying
abnormal phenomenon
information
substrate processing
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Application number
JP2009231319A
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English (en)
Japanese (ja)
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JP5546197B2 (ja
JP2011082246A (ja
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Priority to JP2009231319A priority Critical patent/JP5546197B2/ja
Priority claimed from JP2009231319A external-priority patent/JP5546197B2/ja
Priority to US12/884,568 priority patent/US8538571B2/en
Priority to TW099133004A priority patent/TWI437394B/zh
Publication of JP2011082246A publication Critical patent/JP2011082246A/ja
Publication of JP2011082246A5 publication Critical patent/JP2011082246A5/ja
Application granted granted Critical
Publication of JP5546197B2 publication Critical patent/JP5546197B2/ja
Active legal-status Critical Current
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JP2009231319A 2009-10-05 2009-10-05 基板処理システム、群管理装置および基板処理装置の情報解析方法 Active JP5546197B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009231319A JP5546197B2 (ja) 2009-10-05 2009-10-05 基板処理システム、群管理装置および基板処理装置の情報解析方法
US12/884,568 US8538571B2 (en) 2009-10-05 2010-09-17 Substrate processing system, group managing apparatus, and method of analyzing abnormal state
TW099133004A TWI437394B (zh) 2009-10-05 2010-09-29 基板處理系統、群管理裝置及異常解析方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009231319A JP5546197B2 (ja) 2009-10-05 2009-10-05 基板処理システム、群管理装置および基板処理装置の情報解析方法

Publications (3)

Publication Number Publication Date
JP2011082246A JP2011082246A (ja) 2011-04-21
JP2011082246A5 true JP2011082246A5 (enExample) 2012-11-15
JP5546197B2 JP5546197B2 (ja) 2014-07-09

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JP2009231319A Active JP5546197B2 (ja) 2009-10-05 2009-10-05 基板処理システム、群管理装置および基板処理装置の情報解析方法

Country Status (3)

Country Link
US (1) US8538571B2 (enExample)
JP (1) JP5546197B2 (enExample)
TW (1) TWI437394B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101930981B1 (ko) * 2011-11-25 2018-12-19 도쿄엘렉트론가부시키가이샤 처리 장치군 컨트롤러, 생산 처리 시스템, 처리 장치군 제어 방법, 생산 효율화 시스템, 생산 효율화 장치 및 생산 효율화 방법
KR101644257B1 (ko) * 2012-02-23 2016-08-10 가부시키가이샤 히다치 고쿠사이 덴키 기판 처리 시스템, 관리 장치 및 표시 방법
CN107240564B (zh) 2016-03-29 2021-01-05 株式会社国际电气 处理装置、装置管理控制器、以及装置管理方法
JP6645993B2 (ja) * 2016-03-29 2020-02-14 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 処理装置、装置管理コントローラ、及びプログラム並びに半導体装置の製造方法
KR102192094B1 (ko) 2016-03-31 2020-12-16 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치, 장치 관리 컨트롤러 및 기록 매체
JP6625098B2 (ja) * 2017-07-20 2019-12-25 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理システム、半導体装置の製造方法およびプログラム
JP7303678B2 (ja) * 2019-07-08 2023-07-05 東京エレクトロン株式会社 基板処理システム及び基板処理方法
KR102455758B1 (ko) 2020-01-30 2022-10-17 가부시키가이샤 스크린 홀딩스 데이터 처리 방법, 데이터 처리 장치 및 기억 매체
JP7082630B2 (ja) 2020-03-19 2022-06-08 株式会社Kokusai Electric 基板処理装置、半導体装置の表示方法、半導体装置の製造方法、及びプログラム
US11437254B2 (en) * 2020-06-24 2022-09-06 Applied Materials, Inc. Sequencer time leaping execution
JP7442407B2 (ja) * 2020-07-14 2024-03-04 東京エレクトロン株式会社 制御装置、システム及び制御方法
JP2023043716A (ja) * 2021-09-16 2023-03-29 株式会社Ｓｃｒｅｅｎホールディングス 処理装置群管理システム、処理装置群管理方法およびプログラム
JP2024005828A (ja) * 2022-06-30 2024-01-17 住友重機械工業株式会社 塗工装置用データ処理装置、塗工装置用データ処理方法、塗工装置用データ処理プログラム

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6419801B1 (en) * 1998-04-23 2002-07-16 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US7133807B2 (en) * 2001-01-22 2006-11-07 Tokyo Electron Limited Apparatus productivity improving system and its method
US6616759B2 (en) * 2001-09-06 2003-09-09 Hitachi, Ltd. Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
KR100923263B1 (ko) * 2003-09-25 2009-10-23 가부시키가이샤 히다치 고쿠사이 덴키 기판 처리 장치, 반도체 디바이스의 제조 방법 및 기판의 이동 적재 방법
JP4942174B2 (ja) * 2006-10-05 2012-05-30 東京エレクトロン株式会社 基板処理システムの処理レシピ最適化方法，基板処理システム，基板処理装置
JP2008311461A (ja) * 2007-06-15 2008-12-25 Hitachi Kokusai Electric Inc 基板処理装置

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