JP2011061163A5 - - Google Patents

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Publication number
JP2011061163A5
JP2011061163A5 JP2009212513A JP2009212513A JP2011061163A5 JP 2011061163 A5 JP2011061163 A5 JP 2011061163A5 JP 2009212513 A JP2009212513 A JP 2009212513A JP 2009212513 A JP2009212513 A JP 2009212513A JP 2011061163 A5 JP2011061163 A5 JP 2011061163A5
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JP
Japan
Prior art keywords
exposure
lots
processing
projection optical
lot
Prior art date
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Application number
JP2009212513A
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English (en)
Japanese (ja)
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JP5383399B2 (ja
JP2011061163A (ja
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Application filed filed Critical
Priority to JP2009212513A priority Critical patent/JP5383399B2/ja
Priority claimed from JP2009212513A external-priority patent/JP5383399B2/ja
Priority to TW099128097A priority patent/TW201109863A/zh
Priority to KR1020100086960A priority patent/KR20110029082A/ko
Priority to US12/880,727 priority patent/US8428763B2/en
Publication of JP2011061163A publication Critical patent/JP2011061163A/ja
Publication of JP2011061163A5 publication Critical patent/JP2011061163A5/ja
Application granted granted Critical
Publication of JP5383399B2 publication Critical patent/JP5383399B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009212513A 2009-09-14 2009-09-14 管理装置、露光方法及びデバイス製造方法 Expired - Fee Related JP5383399B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009212513A JP5383399B2 (ja) 2009-09-14 2009-09-14 管理装置、露光方法及びデバイス製造方法
TW099128097A TW201109863A (en) 2009-09-14 2010-08-23 Management apparatus, exposure method, and method of manufacturing device
KR1020100086960A KR20110029082A (ko) 2009-09-14 2010-09-06 관리 장치, 노광 방법 및 디바이스 제조 방법
US12/880,727 US8428763B2 (en) 2009-09-14 2010-09-13 Management apparatus, exposure method, and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009212513A JP5383399B2 (ja) 2009-09-14 2009-09-14 管理装置、露光方法及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011061163A JP2011061163A (ja) 2011-03-24
JP2011061163A5 true JP2011061163A5 (enExample) 2012-10-25
JP5383399B2 JP5383399B2 (ja) 2014-01-08

Family

ID=43730231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009212513A Expired - Fee Related JP5383399B2 (ja) 2009-09-14 2009-09-14 管理装置、露光方法及びデバイス製造方法

Country Status (4)

Country Link
US (1) US8428763B2 (enExample)
JP (1) JP5383399B2 (enExample)
KR (1) KR20110029082A (enExample)
TW (1) TW201109863A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2010262A (en) * 2012-03-07 2013-09-10 Asml Netherlands Bv Lithographic method and apparatus.
JP2014143306A (ja) 2013-01-24 2014-08-07 Canon Inc 露光方法、露光装置、それを用いたデバイスの製造方法
JP2015167168A (ja) * 2014-03-03 2015-09-24 キヤノン株式会社 決定方法、露光装置、露光システム、物品の製造方法、およびプログラム
JP6324246B2 (ja) * 2014-07-11 2018-05-16 キヤノン株式会社 リソグラフィ装置、および物品製造方法
US10281825B2 (en) * 2016-05-19 2019-05-07 Asml Netherlands B.V. Method of sequencing lots for a lithographic apparatus
JP2023157300A (ja) * 2022-04-14 2023-10-26 キヤノン株式会社 露光装置、露光方法、および物品製造方法
CN114740692B (zh) * 2022-04-25 2025-08-01 华虹半导体(无锡)有限公司 曝光批次的控制方法和系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2550579B2 (ja) * 1987-05-25 1996-11-06 株式会社ニコン 投影露光装置及び投影露光方法
JPH0413548A (ja) 1990-04-28 1992-01-17 Mitsubishi Electric Corp 生産管理方法及び装置
JP3218478B2 (ja) * 1992-09-04 2001-10-15 株式会社ニコン 投影露光装置及び方法
AU1504799A (en) * 1997-12-16 1999-07-05 Nikon Corporation Aligner, exposure method and method of manufacturing device
JP2001267209A (ja) * 2000-03-15 2001-09-28 Canon Inc 露光処理システム
JP2002190443A (ja) * 2000-12-20 2002-07-05 Hitachi Ltd 露光方法およびその露光システム
US6880135B2 (en) * 2001-11-07 2005-04-12 Synopsys, Inc. Method of incorporating lens aberration information into various process flows
JP3833209B2 (ja) * 2003-10-24 2006-10-11 キヤノン株式会社 露光装置及びデバイス製造方法
JP2006073584A (ja) * 2004-08-31 2006-03-16 Nikon Corp 露光装置及び方法並びにデバイス製造方法
JP2006108474A (ja) * 2004-10-07 2006-04-20 Canon Inc 露光装置及びそれを用いたデバイス製造方法
US7262831B2 (en) * 2004-12-01 2007-08-28 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus
JP4984038B2 (ja) * 2006-07-27 2012-07-25 株式会社ニコン 管理方法

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