JP2011053204A - 光学検査装置、及びこれを利用した検査方法 - Google Patents

光学検査装置、及びこれを利用した検査方法 Download PDF

Info

Publication number
JP2011053204A
JP2011053204A JP2010139199A JP2010139199A JP2011053204A JP 2011053204 A JP2011053204 A JP 2011053204A JP 2010139199 A JP2010139199 A JP 2010139199A JP 2010139199 A JP2010139199 A JP 2010139199A JP 2011053204 A JP2011053204 A JP 2011053204A
Authority
JP
Japan
Prior art keywords
light
inspection
optical inspection
inspection object
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010139199A
Other languages
English (en)
Japanese (ja)
Inventor
Hyun Ho Choi
ホ チェ，ヒョン
Min-Soo Kim
ス キム，ミン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AJUHITEK Inc
Original Assignee
AJUHITEK Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AJUHITEK Inc filed Critical AJUHITEK Inc
Publication of JP2011053204A publication Critical patent/JP2011053204A/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G01N2021/8965—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod using slant illumination, using internally reflected light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2010139199A 2009-09-02 2010-06-18 光学検査装置、及びこれを利用した検査方法 Pending JP2011053204A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090082676A KR101240564B1 (ko) 2009-09-02 2009-09-02 광학 검사 장치 및 이를 이용한 검사 방법

Publications (1)

Publication Number Publication Date
JP2011053204A true JP2011053204A (ja) 2011-03-17

Family

ID=43811653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010139199A Pending JP2011053204A (ja) 2009-09-02 2010-06-18 光学検査装置、及びこれを利用した検査方法

Country Status (3)

Country Link
JP (1) JP2011053204A (zh)
KR (1) KR101240564B1 (zh)
CN (1) CN102004110A (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013053904A (ja) * 2011-09-02 2013-03-21 Fujitsu Semiconductor Ltd 表面検査方法及び表面検査装置
KR20180123861A (ko) * 2017-05-10 2018-11-20 세메스 주식회사 기판 처리 장치
KR20180123859A (ko) * 2017-05-10 2018-11-20 세메스 주식회사 기판 처리 장치

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101479970B1 (ko) * 2012-06-22 2015-01-08 (주)엘립소테크놀러지 터치스크린 패널의 ｉｔｏ 패턴 검사용 현미경 및 이를 이용한 터치 스크린 패널의 ｉｔｏ 패턴 검사 방법
JP6085188B2 (ja) * 2013-02-15 2017-02-22 株式会社Ｓｃｒｅｅｎホールディングス パターン検査装置
KR101490118B1 (ko) * 2013-04-25 2015-02-11 주식회사 티아이 카메라 모듈 조립장치
KR101809009B1 (ko) 2017-08-02 2017-12-15 주식회사 제덱스 투명 또는 반투명 필름의 표면 이물 검출기
TWI647465B (zh) * 2017-08-16 2019-01-11 旺矽科技股份有限公司 光學檢測系統
KR20200047259A (ko) 2018-10-25 2020-05-07 동우 화인켐 주식회사 광학 필름의 결함 검사 방법 및 장치
KR20200088788A (ko) 2019-01-15 2020-07-23 동우 화인켐 주식회사 결함 검사 방법 및 결함 검사 장치
KR20210110025A (ko) 2020-02-28 2021-09-07 동우 화인켐 주식회사 도전성 패턴의 결함 검사 방법
KR102558406B1 (ko) * 2020-11-16 2023-07-25 주식회사 트윔 파우치 외형불량 검사장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004150885A (ja) * 2002-10-29 2004-05-27 Toppan Printing Co Ltd ホログラムの検査装置および検査方法
KR100737758B1 (ko) * 2004-06-30 2007-07-10 아주하이텍(주) 조명장치를 구비하는 자동 광학 검사 시스템 및 그의 검사 방법
KR100969283B1 (ko) * 2007-05-16 2010-07-09 아주하이텍(주) 광학 검사 장치

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013053904A (ja) * 2011-09-02 2013-03-21 Fujitsu Semiconductor Ltd 表面検査方法及び表面検査装置
KR20180123861A (ko) * 2017-05-10 2018-11-20 세메스 주식회사 기판 처리 장치
KR20180123859A (ko) * 2017-05-10 2018-11-20 세메스 주식회사 기판 처리 장치
KR101977757B1 (ko) * 2017-05-10 2019-05-14 세메스 주식회사 기판 처리 장치
KR101977771B1 (ko) * 2017-05-10 2019-05-14 세메스 주식회사 기판 처리 장치

Also Published As

Publication number Publication date
KR20110024608A (ko) 2011-03-09
KR101240564B1 (ko) 2013-03-14
CN102004110A (zh) 2011-04-06

Similar Documents

Publication Publication Date Title
JP2011053204A (ja) 光学検査装置、及びこれを利用した検査方法
US8223326B2 (en) Dark-field examination device
JP5419304B2 (ja) 発光素子検査装置およびその検査方法
TWI442016B (zh) A light source for illumination and a pattern inspection device using it
JP2010112941A (ja) 表面検査装置
TWI504885B (zh) 圖案檢查裝置及圖案檢查方法
JP2007078404A (ja) 太陽電池パネル検査装置
JP2017090360A (ja) 表面検査装置および表面検査方法
JP5097912B2 (ja) 光照射装置
TWI534424B (zh) 圖案檢查裝置及圖案檢查方法
JP2005321319A (ja) 表面検査装置および表面検査方法
JP2009150835A (ja) 光学的検査方法および光学的検査装置
KR101124567B1 (ko) 하이브리드 조명부를 포함하는 웨이퍼 검사 장치
TWI503535B (zh) 非接觸式發光二極體檢查裝置
JP5556733B2 (ja) 光照射装置
TWI730681B (zh) 確定晶片方位的設備
KR101350218B1 (ko) 공초점센서를 포함하는 발광다이오드 검사장치
JP2007240627A (ja) 液晶表示装置用調整装置
JP5708385B2 (ja) 表面検査方法及び表面検査装置
TW200916761A (en) Inspection method and system capable of quickly differentiating defects on internal or external layers
KR20220133575A (ko) 광학 검사 장치
JP5710300B2 (ja) マーク検出装置、基板検査装置およびマーク検出方法
JP2022127700A (ja) 表示装置
TW201245703A (en) Wafer image capture device
JP2016050869A (ja) 検査方法及び検査装置