JP2011052301A - Evaporation/sublimation method for vapor deposition material for vacuum deposition, and crucible apparatus for vacuum deposition - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To achieve the evaporation/sublimation of a vapor deposition material for a long time while preventing deterioration in the vapor deposition material by a simple constitution. <P>SOLUTION: The inside of a crucible Pa is provided with a crucible holder DKa made of a conductive material, storing a vapor deposition material E and further capable of induction heating, and further, a plurality of heating regions Ha to Hd are set to the vapor deposition material E in the crucible holder DKa, and the outside of the crucible Pa is provided with split induction coils Ca to Cd inductively heating the crucible holder DKa and capable of evaporating or subliming the vapor deposition material E, and is provided with a heating region displacement means of operating a magnetic field generated from the split induction coils Ca to Cd and capable of selectively inductive-heating the heating parts of the crucible holder DKa corresponding to the heating regions Ha to Hd. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an evaporation and sublimation method capable of vaporizing (evaporating or sublimating) a deposition material for a long time in a vacuum deposition facility, and a crucible device for vacuum deposition for carrying out the method.

Patent Document 1 proposes a technique for directly heating a metal crucible by high-frequency induction heating.
In a vacuum deposition facility, the deposition material is heated to evaporate or sublimate (hereinafter referred to as transpiration). Particularly in a mass production process, it is necessary to continuously operate the deposition facility for about one week. However, when the vapor deposition material is exposed to high heat for a long time, the quality may be deteriorated.

For this reason, for example, the following techniques have been proposed.
a) Prepare a plurality of crucibles containing a sufficient amount of vapor deposition material so that the vapor deposition material evaporates before deteriorating, and perform a long-time vapor deposition operation while sequentially replacing the crucibles. As a technique for implementing this, Patent Document 1 discloses a technique in which an exchange chamber for exchanging the crucible is provided.
b) During the vapor deposition operation, the vapor deposition operation is performed for a long time while adding the vapor deposition material to a crucible or a boat (flat heating crucible). As a technique for implementing this, Patent Document 2 discloses a technique for continuously supplying a deposition material formed in a sheet shape to a crucible.
c) The vapor deposition material is formed into pellets, pressed against the heating part and partially evaporated by heating, and this is continued for a long time vapor deposition operation. As a technique for implementing this, Patent Document 3 discloses a technique of supplying a vapor deposition material to a crucible in a pellet form.

  In addition, as a method of heating the vapor deposition material, as disclosed in Patent Document 4, the electron beam is scanned to heat and vaporize the vapor deposition material, or as disclosed in Patent Document 5, the vapor deposition material is heated by high frequency dielectric heating. Some may heat and evaporate.

Japanese Patent No. 3257056 Japanese Patent Laid-Open No. 10-183346 JP 09-95775 A Japanese Patent No. 3741160 JP 2004-134250 A

  However, the technique a) requires a large number of crucibles, a space (exchange chamber) for accommodating the crucibles, and a mechanism for exchanging the crucibles. In the technique of b), a mechanism capable of continuously supplying the evaporation material to the high temperature crucible in the vacuum chamber is required. In the technique c), a device for forming the vapor deposition material in a pellet form and a mechanism for pressing the vapor deposition material against the heating unit are required. As described above, in the techniques a) to c), there are problems that the apparatus and mechanism are complicated, the size is increased, and the manufacturing cost and the operating cost are increased.

  The present invention solves the above-mentioned problems, and evaporates and sublimates a vacuum deposition material that can evaporate and sublimate for a long time while preventing deterioration of the deposition material with a simpler structure. An object is to provide a crucible device.

The invention described in claim 1
In order to deposit a thin film of a vapor deposition material on the surface of the material to be vapor-deposited in a vacuum vapor deposition container, when the vapor deposition material contained in the crucible is heated to evaporate or sublimate,
For the crucible, use an induction heating crucible formed of a material capable of induction heating,
Setting a plurality of heating zones in the vapor deposition material accommodated in the induction heating crucible;
The induction heating crucible part corresponding to the initial heating area is induction-heated by a magnetic field generated from an induction heating source installed outside the crucible to evaporate or sublimate the vapor deposition material in the heating area,
After the vapor deposition material in the first heating zone is evaporated or sublimated, by manipulating the magnetic field generated from the induction heating source, the predetermined portion of the induction heating crucible corresponding to the next heating zone is induction heated, Evaporate or sublimate the vapor deposition material in the next heating zone,
By repeating this, the vapor deposition operation is continuously performed.
The invention according to claim 2
In order to deposit a thin film of a vapor deposition material on the surface of the material to be vapor-deposited in a vacuum vapor deposition container, when the vapor deposition material contained in the crucible is heated to evaporate or sublimate,
Using a crucible that is placed in contact with the vapor deposition material and that is equipped with an induction heating member formed of a material capable of induction heating,
Set multiple heating zones for the vapor deposition material in the crucible,
By induction heating a portion of the induction heating member corresponding to the first heating area by a magnetic field generated from an induction heating source provided outside the crucible, the vapor deposition material in the heating area is evaporated or sublimated,
After the vapor deposition material corresponding to the heating area is evaporated or sublimated, the magnetic field generated from the induction heating source is operated to perform part induction heating of the induction heating member corresponding to the next heating area, and the next heating area Evaporate or sublimate the vapor deposition material
By repeating this, the vapor deposition operation is continuously performed.

The invention described in claim 3
In order to deposit a thin film of a vapor deposition material on the surface of the material to be vapor-deposited in a vacuum vapor deposition container, when the vapor deposition material contained in the crucible is heated to evaporate or sublimate,
Using a crucible made of a material capable of induction heating and provided with an upper surface induction heating member supported on the upper surface of the vapor deposition material,
Inductively heating the upper surface induction heating member by a magnetic field generated from an induction heating source provided outside the crucible, evaporating or sublimating the evaporation material below the upper surface induction heating member,
A magnetic field generated from the induction heating source is operated in response to the upper surface induction heating member descending as the deposition material decreases, and the upper surface induction heating member is continuously induction heated.

The invention according to claim 4
In order to deposit a thin film of a vapor deposition material on the surface of the material to be vapor-deposited in a vacuum vapor deposition container, the vapor deposition material contained in the crucible is heated to evaporate and sublimate.
Using a crucible in which a radiation induction heating member made of a material capable of induction heating is arranged at a predetermined distance above the vapor deposition material,
Set multiple heating zones for the vapor deposition material in the crucible,
A portion of the radiation induction heating member corresponding to the first heating region is induction heated by a magnetic field generated from an induction heating source provided outside the crucible, and the first heating region is heated by radiation heat from the radiation induction heating member. The evaporation material is heated to evaporate or sublime,
After the vapor deposition material in the first heating area is evaporated or sublimated, the magnetic field generated from the induction heating source is manipulated to inductively heat the portion of the radiation induction heating member corresponding to the next heating area. Vaporize or sublimate the vapor deposition material in the area,
By repeating this, the vapor deposition operation is continuously performed.

The invention according to claim 5 is the configuration according to any one of claims 1 to 4,
The entire vapor deposition material is cooled by cooling means provided outside the crucible.
The invention according to claim 6 is the configuration according to any one of claims 1 to 4,
The cooling means provided outside the crucible does not cool the heating zone as a non-cooling zone, but cools the vapor deposition material in other heating zones,
The non-cooling region is displaced corresponding to the displacement of the heating region.

The invention described in claim 7
In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
The crucible is an induction heating crucible formed of a conductive material capable of induction heating, and a plurality of heating zones are set for the vapor deposition material in the induction heating crucible,
An induction heating source capable of evaporating or sublimating the deposition material by induction heating the induction heating crucible outside the induction heating crucible;
By operating a magnetic field generated from the induction heating source, a heating area displacing means capable of selectively inductively heating the portion of the induction heating crucible corresponding to the heating area is provided.

The invention described in claim 8
In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
In the crucible, a crucible holder made of a conductive material capable of containing a vapor deposition material and capable of induction heating is provided, and a plurality of heating zones are set for the vapor deposition material in the crucible holder,
An induction heating source capable of evaporating or sublimating the vapor deposition material by induction heating the crucible holder outside the crucible,
By operating a magnetic field generated from the induction heating source, a heating area displacing means capable of selectively inductively heating a portion of the crucible holder corresponding to the heating area is provided.

The invention according to claim 9
In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
In the vapor deposition material accommodated in the crucible, an internal induction induction heating member made of a conductive material capable of induction heating is provided, and a plurality of heating zones are set in the vapor deposition material,
An induction heating source capable of evaporating or sublimating the vapor deposition material by induction heating the internal induction heating member on the outside of the crucible,
By operating a magnetic field generated from the induction heating source, a heating area displacing means capable of selectively inductively heating a portion of the interior induction heating member corresponding to the heating area is provided.

The invention according to claim 10 provides:
In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
An upper surface induction heating member made of a conductive material capable of induction heating is provided on the upper surface of the vapor deposition material accommodated in the crucible,
An induction heating source capable of evaporating or sublimating the vapor deposition material under the upper surface induction heating member by induction heating the upper surface induction heating member outside the crucible,
By operating the magnetic field generated from the induction heating source, a heating area displacing means capable of induction heating the upper surface induction heating member that descends as the deposition material decreases is provided.

The invention according to claim 11
In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
A radiation induction heating member made of a conductive material capable of induction heating is provided spaced apart above the vapor deposition material housed in the crucible,
Set multiple heating zones for the vapor deposition material in the crucible,
An induction heating source capable of inductively heating the radiation induction heating member is provided outside the crucible,
A heating area displacing means capable of selectively inductively heating a portion of the radiation induction heating member corresponding to the heating area by operating a magnetic field generated from the induction heating source is provided.

The invention according to claim 12 is the configuration according to any one of claims 7 to 11,
The induction heating source is a plurality of divided induction coils divided and arranged corresponding to the heating area,
The heating area displacing means is constituted by a transpiration control device that controls on / off of a high-frequency current supplied to each of the divided induction coils.

The invention according to claim 13 is the configuration according to any one of claims 7 to 11,
The induction heating source is a movable induction coil arranged to be movable in the arrangement direction of the heating zone,
The heating area displacing means includes a coil moving device that can move the movable induction coil, and a transpiration control device that operates the coil moving device to move the movable induction coil in accordance with the heating area.

The invention according to claim 14 is the configuration according to any one of claims 7 to 13,
Provide cooling means outside the crucible,
The cooling means is constituted by an entire cooling jacket for uniformly cooling the whole deposition material by supplying and discharging a cooling liquid.

The invention according to claim 15 is the structure according to any one of claims 7 to 13,
Provide cooling means outside the crucible,
The cooling means is divided and arranged in a plurality corresponding to the heating zone, and is constituted by a divided cooling jacket,
Provided is a transpiration control device capable of changing the divided cooling jacket for stopping the supply of the cooling liquid in response to the displacement of the heating area while stopping the supply of the cooling liquid to the divided cooling jacket corresponding to the heating area. It is a thing.

  According to the structure of Claim 1 or 7, since the predetermined site | part of the induction heating crucible corresponding to a heating area is concentrated and heated with an induction heating source, temperature rise of vapor deposition material other than the said heating area is suppressed. Deterioration of the vapor deposition material can be prevented, and the heating part of the induction heating crucible is displaced by the heating area displacing means, and the vapor deposition material in the heating area is sequentially evaporated or sublimated to continuously perform the vapor deposition work for a long time. It can be carried out.

  According to the structure of Claim 2, since the heating area | region of the predetermined part of the induction heating member corresponding to a heating area is concentrated and heated with an induction heating source, the temperature rise of vapor deposition materials other than the said heating area is suppressed. Deposition of the vapor deposition material can be prevented, and the heating area of the induction heating member is displaced by the heating area displacing means, and the vapor deposition material in the heating area is sequentially evaporated or sublimated, thereby continuing a long-time vapor deposition operation. Can be done.

  According to the invention described in claim 3 or 10, since only the upper surface induction heating member disposed on the upper surface is concentrated and heated by the induction heating source, the temperature of the vapor deposition material other than directly below the upper surface induction heating member is increased. It can suppress and can prevent deterioration of vapor deposition material. In addition, the magnetic field generated from the induction heating source can be operated in response to the upper surface induction heating member that descends as the vapor deposition material decreases by the heating area displacing means, and the upper surface induction heating member can be concentrated and induction heated continuously. . Thereby, the vapor deposition material just under the upper surface induction heating member can be effectively evaporated or sublimated, and a long-time vapor deposition operation can be continuously performed.

  According to the structure of Claim 4 or 11, since the predetermined site | part of the radiation induction heating member corresponding to a heating area is concentrated and heated with an induction heating source, the temperature rise of vapor deposition material other than the said heating area is suppressed. Deposition of the evaporation material can be prevented, and the heating part of the radiation induction heating member is displaced by the heating area displacing means, and the evaporation material in the heating area is sequentially evaporated or sublimated to continuously perform the evaporation work for a long time. Can be done.

  According to the configuration of the fifth aspect, by cooling the vapor deposition material by the cooling means, it is possible to effectively prevent the deterioration of the material, and it is possible to continuously perform the vapor deposition operation stably for a long time.

  According to the sixth aspect of the present invention, the cooling material cools the vapor deposition material except for the non-cooling region corresponding to the heating region, and the cooling region adjusting unit displaces the non-cooling region corresponding to the heating region. The vapor deposition material can be efficiently evaporated and sublimated.

  According to the structure of Claim 8, since the heating area | region of the predetermined part of the crucible holder corresponding to a heating area is concentrated and heated with an induction heating source, the temperature rise of vapor deposition materials other than the said heating area is suppressed. The deposition material can be prevented from deteriorating, and the heating area of the crucible holder is displaced by the heating area displacing means to sequentially evaporate or sublimate the evaporation material in the heating area, thereby continuously performing the evaporation operation for a long time. be able to.

  According to the structure of Claim 9, since the heating area | region of the predetermined | prescribed site | part of the interior induction heating member corresponding to a heating area is concentrated and heated with an induction heating source, the temperature rise of vapor deposition materials other than the said heating area is suppressed. Deterioration of the vapor deposition material can be prevented, and the heating part of the interior induction heating member is displaced by the heating area displacement means to sequentially evaporate or sublimate the vapor deposition material in the heating area, thereby performing a long evaporation process. Can be done continuously.

  According to the configuration of claim 12, a plurality of split induction coils are arranged corresponding to the heating region, and the high-frequency current supplied to each split induction coil is turned on and off by the transpiration control means with a simple configuration. The area can be selectively displaced.

According to the structure of Claim 13, a heating area | region can be selectively displaced by moving a movable induction coil along a heating area | region with a coil moving apparatus.
According to the structure of Claim 14, by supplying a cooling liquid to the whole cooling jacket, the whole vapor deposition material can be cooled and deterioration can be effectively prevented, and the vapor deposition operation can be continued stably for a long time. Can be done.

  According to the fifteenth aspect of the present invention, the cooling liquid is supplied to each of the divided cooling jackets and the supply of the cooling liquid of the divided cooling jacket corresponding to the heating area is stopped, thereby efficiently evaporating or sublimating the material in the heating area. It is possible to prevent the vapor deposition material in other heating regions from deteriorating. Further, by changing the divided cooling jacket in the non-cooling region in accordance with the displacement of the heating region by the cooling region adjusting device, it is possible to continuously perform the vapor deposition work efficiently for a long time.

(A), (b) shows the structure of Example 1 of the crucible device for vacuum evaporation according to the present invention, (a) is a longitudinal sectional view, and (b) is a perspective view showing the structure of the heating device and the cooling means. is there. It is a graph which shows the example of discrimination | determination of deterioration of vapor deposition material. (A), (b) shows the basic structure of a vacuum evaporation apparatus and a crucible apparatus, (a) is a longitudinal cross-sectional view which shows a vacuum evaporation apparatus, (b) is a longitudinal cross-sectional view which shows a crucible apparatus. (A)-(f) is a longitudinal cross-sectional view which shows the structure of a vacuum evaporation container, (a) shows an up-deposition type, a container-shaped crucible placement type, (b) is an up-deposition type, a container type (C) is an up-deposition type, showing a dish-type crucible inside type, (d) is a side-deposition type, showing a container-type crucible outside type, (e) Is a side deposition type and shows a container-type crucible placement type, and (f) is a side deposition type and a dish-type crucible placement type. (A)-(h) is a longitudinal cross-sectional view which shows the structure of an induction heating member, (a) is what equipped the crucible holder in the container-shaped crucible, (b) used the crucible holder in the dish-shaped crucible. (C) is a container-shaped dielectric heating crucible, (d) is a dish-shaped dielectric heating crucible, (e) is a container-shaped crucible with an internal induction heating member, (F) is a dish-shaped crucible with an interior induction heating member, (g) is a container-shaped crucible with a radiation induction heating member, and (h) is a dish-shaped crucible with a radiation induction heating member. It is arranged. (A)-(d) shows an induction heating source and a heating area displacement means, (a) and (b) are perspective views showing a split induction coil, and (c) and (d) are movable types, respectively. It is a schematic side view which shows an induction coil. (A)-(d) is a perspective view which shows a cooling means and a cooling area adjustment means, (a) shows a cylindrical whole cooling jacket, (b) shows a plate-like whole cooling jacket, (c) Shows a cylindrical divided cooling jacket, and (d) shows a plate-shaped divided cooling jacket. (A)-(h) is a longitudinal cross-sectional view which shows the arrangement structure of a coil, (a)-(d) shows a dielectric coil exterior type, (e)-(h) shows a dielectric coil interior type. (A), (b) shows Example 2 of the crucible apparatus for vacuum evaporation which concerns on this invention, (a) is a longitudinal cross-sectional view which shows the structure of a crucible apparatus, (b) is a top view. (A), (b) shows Example 3 of the crucible apparatus for vacuum evaporation which concerns on this invention, (a) is a longitudinal cross-sectional view which shows the structure of a crucible apparatus, (b) is a perspective view. It is a longitudinal cross-sectional view which shows the modification of Example 3 of the crucible apparatus for vacuum evaporation which concerns on this invention. (A), (b) shows Example 4 of the crucible apparatus for vacuum evaporation which concerns on this invention, (a) is a longitudinal cross-sectional view which shows the structure of a crucible apparatus, (b) is a perspective view. It is a longitudinal cross-sectional view which shows the structure of Example 5 of the crucible apparatus for vacuum evaporation which concerns on this invention. (A), (b) is a top view which shows the modification of an internal induction heating member, (a) shows arrangement | positioning of two internal heating rods, (b) shows arrangement | positioning of six internal heating rods. . FIG. 10 is a longitudinal sectional view showing a configuration of a modified example of Example 5. It is a longitudinal cross-sectional view which shows the structure of Example 6 of the crucible apparatus which concerns on this invention. (A), (b) is a perspective view which shows an upper surface heating plate, (a) is a plate type, (b) is a perforated type. It is a longitudinal cross-sectional view which shows the modification of Example 6 of the crucible apparatus which concerns on this invention. It is a longitudinal cross-sectional view which shows the structure of Example 7 of a crucible apparatus. It is a principal part expanded longitudinal cross-sectional view which shows Example 8 of a crucible apparatus. It is a principal part expanded longitudinal cross-sectional view which shows Example 9 of a crucible apparatus. (A), (b) shows an interior induction heating member, (a) is a partial sectional view in plan view showing a rod-like interior induction heating member, and (b) is a plan view showing a plate-like interior induction heating member. FIG. It is a longitudinal cross-sectional view which shows the structure of Example 10 of a crucible apparatus. (A), (b) shows a radiation induction heating member, (a) is a top view which shows a rod-shaped radiation induction heating member, (b) is a top view which shows a plate-shaped radiation induction heating member.

Embodiments of the present invention will be described below with reference to the drawings.
[Basic structure]
As shown in FIG. 3, the vacuum vapor deposition apparatus equipped with the crucible apparatus according to the present invention is an example of an induction heating source C from a high frequency power supply apparatus B which is a heating means of the crucible apparatus in the vapor deposition chamber a of the vacuum vapor deposition container A. A high-frequency (electromagnetic) induction of a part (heating part) of the crucible holder DKa, which is an example of the induction heating member D, is performed by feeding a high-frequency current of the divided induction coils Ca to Cd that is Heating is performed to heat and evaporate (evaporate or sublimate) the vapor deposition material E in the crucible Pa, and deposit it on the surface of the substrate (vapor deposition material) T held by the holder in the vacuum vapor deposition container A. In this crucible device, in order to perform continuous vapor deposition for a long time, not the entire induction heating member D by the induction heating source C, but heating zones Ha to Hd set in the vapor deposition material E as described later (FIG. 6). A part of the crucible holder DKa corresponding to the above is intensively heated to evaporate the vapor deposition material E in the heating areas Ha to Hd, and sequentially displace the heating areas Ha to Hd to evaporate the entire vapor deposition material E. A heating zone displacement means is provided. Moreover, in order to prevent deterioration of the vapor deposition material E other than the heating zones Ha to Hd during vapor deposition, a cooling means for cooling the vapor deposition material E is provided. Here, the vapor deposition material E is a non-conductive material that does not generate heat due to a high-frequency magnetic field, or a material that is conductive but has a small electric resistance and a small amount of heat generation.

  As shown in FIGS. 4A to 4F, there are four types I to VI of the crucible arrangement structure in the vacuum evaporation container A, and the arrangement structure of the induction heating member D is shown in FIGS. There are five types i to v as shown in h). Further, as shown in FIGS. 6A, 6B, 6C, and 6D, the heating area displacing means includes two types α and β that displace the heating area of the induction heating member D, and further includes a cooling area. As shown in FIGS. 7A and 7B, there are two types of adjusting means, γ and δ, which will be briefly described below.

As shown in FIG. 4, the crucible arrangement structure includes
Type I: Up-deposition type that deposits evaporated and sublimated deposition material E from below on a horizontally held substrate T. A vertically long crucible Pa is placed outside the vacuum deposition container A at the top opening. A crucible outside-mounted type [Fig. 4 (a)],
Type II-a, II-b: Updeposition type, crucible Pa or a dish-shaped crucible Pb having a wide opening surface placed in the vapor deposition chamber a [FIGS. 4 (b) (c)],
Type III: A side deposition type in which the evaporated and sublimated deposition material E is vapor-deposited from the side of the substrate T held vertically. A crucible Pa is arranged outside the vacuum deposition vessel A and the nozzle G is arranged. Through the crucible to be introduced into the vacuum deposition container A [Fig. 4 (d)],
Type IV-a, IV-b: Side deposition type, in which crucible Pa or Pb is placed in vacuum vapor deposition container A and discharged from nozzle G in vacuum vapor deposition container A [FIG. 4 (e) (F)].

As shown in FIG. 5, the induction heating member D includes
Type ia, ib: Peripheral heating type, a container shape made of a material that does not easily generate heat due to a high-frequency magnetic field (non-conductive or conductive and low-electric resistance material (hereinafter referred to as non-conductive)) A crucible holder (induction heating member, outer periphery induction heating member) DKa made of a conductive material is installed in the dish-shaped crucibles Pa and Pb, and a predetermined part of the crucible holder DKa is heated by a magnetic field generated from the induction coil C. , One that heats the vapor deposition material E from the outer peripheral side mainly by conduction heat and evaporates [FIGS. 5 (a) (b)],
Type ii-a, ii-b: Direct heating type, which uses induction heating crucibles DPa and DPb formed of a material having high electrical resistance that is conductive and easily generates heat by a high-frequency magnetic field (hereinafter referred to as conductive material). Then, predetermined portions of the crucibles DPa and DPb are heated by the magnetic field generated from the induction coil C, and the vapor deposition material E is heated from the outer peripheral side mainly by conduction heat to evaporate [FIGS. 5 (c) (d)] ,
Type iii-a, iii-b: Internal heating type, an internal induction heating member (induction heating member) DL made of a conductive material is disposed inside the vapor deposition material E in the non-conductive crucible Pa, Pb, The interior induction heating member DL is heated by a magnetic field generated from the induction coil C, and the evaporation material E is evaporated from the inside mainly by conduction heat [FIGS. 5 (e) (f)]. ,
Type iv: a top surface heating type, and a top surface heating plate (top surface induction heating member) DM is disposed so as to be movable up and down so as to be grounded to the top surface of the vapor deposition material E in a non-conductive crucible Pa, The upper surface heating plate DM is heated by a magnetic field, and the evaporation material E is heated from the upper surface mainly by conduction heat to evaporate [FIG. 5 (g)],
Type v: Radiation induction heating type, a non-conductive crucible Pb, a radiation induction heating member DN disposed above the vapor deposition material E by a certain distance, and radiation induction heating by a magnetic field generated from the induction coil C There is one that heats a predetermined portion of the member DN and partially heats the vapor deposition material E by radiant heat to evaporate [FIG. 5 (h)].

As shown in FIG. 6, the induction coil C and the heating area displacing means include
Type α: Split switching type, the induction heating coil C is composed of a plurality of split induction coils Ca to Cd and Ce to Ch arranged corresponding to the heating zones Ha to Hd and He to Hh, and switches SWa to SWd, By switching the supply of high-frequency current with SWe to SWh, the heating part corresponding to the heating zones Ha to Hd is displaced, and type a using cylindrical divided induction coils Ca to Cd [FIG. 6 (a)] , And type b [FIG. 6 (b)] using a planar split induction coil Ce to Ch that displaces the heating portion corresponding to the heating zones He to Hh,
Type β: a moving displacement type, and by moving the cylindrical or planar movable induction coils Cma and Cmb along the arrangement direction of the heating zones Ha to Hd and He to Hh by the coil moving device S, the heating zone Ha ˜Hd, He˜Hh, which is to displace the heating part of the induction heating member D, type a using a cylindrical movable induction coil Cma [FIG. 6C], and a planar movable induction coil Cmb And type b [FIG. 6 (d)].

As shown in FIG. 7, the cooling means and the cooling region adjusting means include
Type γ: Overall cooling type, in which the overall cooling jackets Q and R are arranged along the arrangement direction of the induction heating member D, and the cooling liquid is supplied so as to be uniformly cooled in the overall cooling jackets Q and R for vapor deposition. A type a that cools the material E, using a cylindrical overall cooling jacket Q [FIG. 7A], and a type b that uses a plate-like overall cooling jacket R [FIG. 7B],
Type δ: Divided cooling type, in which a plurality of divided cooling jackets Qa to Qd and Ra to Rd are divided and arranged for each predetermined cooling region, and the cooling liquid is selectively supplied to each divided cooling jacket Qa to Qd and Ra to Rd. Is used to make the vapor deposition material E corresponding to the heating zones Ha to Hd and He to Hh into the non-cooling zone, and the type a using the cylindrical divided cooling jackets Qa to Qd [FIG. And type b (FIG. 7D) using plate-shaped divided cooling jackets Ra to Rd.

As shown in FIG. 8, the arrangement structure of the dielectric coil C includes
Type ε: Dielectric coil exterior type, and divided induction coils Ca to Cd and Ce to Ch are disposed outside the cooling jackets Q, Qa to Qd, R, and Ra to Rd, respectively [FIGS. )]things and,
Type ζ: Dielectric coil built-in type, and divided induction coils Ca to Cd and Ce to Ch are disposed in the cooling jackets Q, Qa to Qd, R, and Ra to Rd so as to be immersed in the cooling liquid [FIG. (E) to (f)].

[Example 1]
Embodiment 1 of a crucible device for vacuum evaporation according to the present invention will be described below with reference to FIGS.

  In the first embodiment, the vacuum deposition apparatus A includes an up-deposition external arrangement type I, an up-deposition internal arrangement type II-a, a side-deposition external arrangement type III, and a side-deposition internal arrangement type shown in FIG. Applicable for IV-a. Moreover, the induction heating member D is the outer periphery heating type i shown to Fig.5 (a), and the electroconductive crucible holder DKa is fitted in the nonelectroconductive crucible Pa. As shown in FIG. Further, the cooling means is a whole cooling type γ-a, and a container-like whole cooling jacket Q having an open upper surface is fitted on the crucible Pa, and the crucible is supplied with the cooling liquid from the cooling water supply device 14 to the whole cooling jacket Q. The vapor deposition material E in Pa is cooled throughout. The cooling liquid is fed over the entire cooling jacket Q by fins (not shown), and the whole is uniformly cooled.

(Cooling / heating structure)
The induction heating member D and the heating displacement means are the split switching type α-a shown in FIG. 6A, and the coil arrangement structure in the cooling / heating structure is the dielectric coil exterior type ε, but the dielectric coil interior type ζ. May be. The induction coil C in the dielectric coil exterior type ε corresponds to the heating areas Ha to Hd set in the vapor deposition material E, and the entire cooling jacket Q extends along the height direction of the crucible holder DKa (the arrangement direction of the heating area). It is comprised by several division | segmentation induction coil Ca-Cd externally arrange | positioned by the outer peripheral part.

  Therefore, a high frequency current is supplied from the high frequency power supply device B to the induction coils Ca to Cd via the switches SWa to SWd. Then, from the parameters such as the high-frequency current, transpiration time, vapor deposition material E type, vapor deposition film thickness, vacuum vapor deposition apparatus A and crucible P structure obtained in advance through experiments, the amount of vapor deposition material E decreases with respect to the vapor deposition amount and transpiration time. Data for obtaining the quantity is recorded in the transpiration data table 11. In the transpiration control unit 13, the switches SWa to SWd are operated based on the vapor deposition amount and the heating vapor deposition time measured by the sensor and the data in the transpiration data table 11 based on the vapor deposition conditions input from the operation device 12. The heating zones Ha to Hd are controlled.

  In the above configuration, when the vapor deposition material E is put into the crucible holder DKa and the vapor deposition operation is started by the operation of the operation device 12, the switch SWa is first turned on to supply a high-frequency current to the uppermost induction coil Ca. A magnetic field generated from the induction coil Ca acts on the uppermost part of the crucible holder DKa corresponding to the heating area Ha to be induction heated, and the vapor deposition material E in the heating area Ha is evaporated by conduction heat or radiation heat.

  When a predetermined transpiration time elapses, the transpiration control unit 13 determines that the vapor deposition material E in the heating area Ha has been transpiration based on the data of the transpiration data table 11, and turns off the switch SWa and turns on the switch SWb. The part of the crucible holder DKa corresponding to the lower heating area Hb from the upper heating area Ha is dielectrically heated to cope with the decrease in the vapor deposition material E. This is repeated in the following order on the lower side, and a long-time deposition operation is performed to evaporate all the deposition material E.

  During this vapor deposition operation, the cooling liquid is supplied from the cooling water supply device 14 to the entire cooling jacket Q to be uniformly cooled, and the entire vapor deposition material E is uniformly cooled, and the vapor deposition material E is deteriorated by heating. Is preventing. Further, since the amount of heat generated in the portion of the crucible holder DKa corresponding to the heating area Ha to Hd that is induction-heated by the divided induction coils Ca to Cd is much larger than the heat absorption amount by the entire cooling jacket Q, the evaporation of the heating areas Ha to Hd is performed. The material E is concentrated and evaporated, and the vapor deposition material E deviated from the heating zones Ha to Hd is cooled to effectively prevent deterioration.

Here, the deterioration of the vapor deposition material E can be measured by PL measurement or the like, and FIG. 2 shows the measurement result of α-NDP which is the vapor deposition material E of the liquid crystal panel.
According to Example 1, since the heating parts of the crucible holder DKa corresponding to the heating zones Ha to Hd are concentrated and heated by the divided induction coils Ca to Cd, the vapor deposition material E other than the heating zones Ha to Hd is provided. The vapor deposition material E can be prevented from deteriorating without being heated, and the transpiration control unit 13 operates the switches SWa to SWd to control the high frequency current supplied from the high frequency power supply device B to the induction coils Ca to Cd. By displacing the heating part of the crucible holder DKa corresponding to the heating zones Ha to Hd, the vapor deposition material E can be sequentially evaporated or sublimated, and the vapor deposition operation can be performed continuously for a long time. Further, the cooling liquid can be supplied from the cooling water supply device 14 to the entire cooling jacket Q to cool the vapor deposition material E, thereby preventing deterioration and efficient continuous vapor deposition for a long time.

[Example 2]
Hereinafter, Example 2 of the crucible apparatus for vacuum evaporation according to the present invention will be described with reference to FIG. In the second embodiment, the heating displacement means in the first embodiment is changed from the split switching type α-a to the moving displacement type β-a, and the same members are denoted by the same reference numerals and description thereof is omitted.

  The vacuum deposition apparatus A is applied to the updeposition external arrangement type I, the updeposition internal arrangement type II-a, the side deposition external arrangement type III, and the side deposition internal arrangement type IV-a shown in FIG. Moreover, the induction heating member D is the outer periphery heating type ia crucible holder DKa shown to Fig.5 (a). Further, the cooling means is a whole cooling type γ-a, and is cooled by a whole cooling jacket Q that is externally fitted to the crucible Pa.

(Cooling / heating structure)
The induction heating member D and the heating displacement means are the movement displacement type β-a, and the coil arrangement structure in the cooling / heating structure is the dielectric coil exterior type ε, but may be a dielectric coil interior type ζ. Then, the coil moving device S moves the cylindrical movable induction coil Cma that is loosely fitted to the entire cooling jacket Q in the up and down direction, so that the heating part of the crucible holder DKa corresponding to the heating zones Ha to Hd is moved. Can be displaced.

  In the coil moving device S, the screw shaft 16 along the arrangement direction (vertical direction) of the heating zones Ha to Hd is rotatably supported by the gantry 15, and the movable induction coil Cma is held by the coil holder 17, and this coil A female screw member 18 that is screwed onto the screw shaft 16 is attached to the holder 17. An output shaft of a displacement motor 19 with a speed reducer is connected to the lower end portion of the screw shaft 16, and the displacement motor 19 is operated by the transpiration control unit 13 via the motor controller 20. Reference numeral 21 denotes a pair of guide rods for guiding the holder 17.

  Accordingly, a high-frequency current is supplied from the high-frequency power supply device B to the movable induction coil Cma via the extendable power supply cable 22 to heat a predetermined heating part of the crucible holder DKa by the magnetic field generated from the movable induction coil Cma. The vapor deposition material E in the heating area Ha to Hd is evaporated by heat or radiant heat. Also, the transpiration control unit 13 counts the transpiration time based on the data of the transpiration data table 11 according to the vapor deposition conditions input from the operation device 12. Then, when the evaporation time during which the vapor deposition material E in the heating areas Ha to Hd evaporates has elapsed, the displacement motor 19 of the coil moving device S is driven via the motor controller 20 to displace the movable induction coil Cma, The heating part of the crucible holder DKa corresponding to the next heating area Ha to Hd is induction-heated.

  In the above configuration, when the vapor deposition material E is put into the crucible holder DKa and the vapor deposition operation is started by the operation of the operation device 12, a high frequency power source is supplied to the movable induction coil Cma arranged corresponding to the uppermost heating area Ha. A high-frequency current is supplied from the device B, the magnetic field generated from the movable induction coil Cma acts, the uppermost part is induction-heated, and the vapor deposition material E in the heating area Ha is evaporated.

  The transpiration control unit 13 determines that the vapor deposition material E in the heating area Ha has been evaporated when a predetermined transpiration time has elapsed based on the data in the transpiration data table 11, and drives the coil moving device S to move the movable induction coil Cma. Is lowered and stopped at the position corresponding to the next heating area Hb, the heated portion of the crucible holder DKa corresponding to the next heating area Hb is induction-heated, and the vapor deposition material E in the heating area Hb is evaporated. This is sequentially repeated for the next heating zones Hc and Hd, and a long-time vapor deposition operation is performed to evaporate all the vapor deposition material E.

  During this vapor deposition operation, the cooling liquid is supplied from the cooling water supply device 14 to the entire cooling jacket Q to uniformly cool the vapor deposition material E, and the vapor deposition material E is prevented from being deteriorated by the heat in the heating zones Ha to Hd. is doing.

  According to the second embodiment, the coil moving device S is operated to displace the movable induction coil Cma along the heating zones Ha to Hd of the crucible holder DKa, thereby sequentially heating the heating zones Ha to Hd to perform the vapor deposition operation. Can be performed continuously over a long period of time. Since the vapor deposition material E is cooled by the entire cooling jacket Q, it is possible to prevent the vapor deposition material E from being deteriorated and perform continuous vapor deposition for a long time.

[Example 3]
A third embodiment of the vacuum evaporation crucible apparatus according to the present invention will be described below with reference to FIG. In the third embodiment, the whole cooling type γ-a that cools the whole area equally in the first embodiment is changed to a divided cooling type δ-a that can displace the non-cooling region. The same members as those in the example are denoted by the same reference numerals and description thereof is omitted.

  The vacuum deposition container A is applied to the updeposition external arrangement type I, the updeposition internal arrangement type II-a, the side deposition external arrangement type III, and the side deposition internal arrangement type IV-a shown in FIG. Moreover, the induction heating member D is the outer periphery heating type ia crucible holder DKa shown to Fig.5 (a).

  Further, the cooling means is a divided cooling type δ-a shown in FIG. 7 (c), and a plurality of divided cooling jackets Qa to Qd that are externally fitted to the crucible Pa and divided for each cooling area corresponding to the heating areas Ha to Hd. And a supply pipe and a drain pipe for supplying the coolant to the respective divided cooling jackets Qa to Qd from the cooling water supply device 14, and open / close valves 23a to 23d respectively interposed in the liquid supply pipes, and transpiration control. The on / off valves 23a to 23d can be selectively operated by the section 13 to stop the supply of the cooling liquid to the divided cooling jackets Qa to Qd corresponding to the heating zones Ha to Hd, thereby making the non-cooling zone.

(Cooling / heating structure)
The induction heating member D and the heating displacement means are the split switching type α-a shown in FIG. 6A, and the coil arrangement structure in the cooling / heating structure is the dielectric coil exterior type ε shown in FIG. Inductive coils Ca to Cd are arranged along the height direction of the crucible holder DKa (moving direction of the heating region) on the outer peripheral portion of each of the divided cooling jackets Qa to Qd, and from the high frequency power supply device B via the switches SWa to SWd. A high-frequency current is selectively supplied to each of the divided induction coils Ca to Cd.

  The transpiration control unit 13 operates the switches SWa to SWd based on the vapor deposition conditions input from the operation device 12 and the data of the transpiration data table 11, and sequentially supplies the high frequency current to the divided induction coils Ca to Cd. The heating zones Ha to Hd are controlled. At the same time, the transpiration control unit 13 operates the on-off valves 23a to 23d to stop the supply of the coolant to the divided cooling jackets Qa to Qd and control the non-cooling region.

  In the above configuration, when the vapor deposition material E is put into the crucible holder DKa and the vapor deposition operation is started by the operation of the operation device 12, the high frequency power supply device B applies a high frequency to the divided induction coil Ca corresponding to the uppermost heating area Ha. A current is supplied, and a magnetic field generated from the movable induction coil Cma acts on the uppermost part of the crucible holder DKa to perform induction heating, and the vapor deposition material E in the heating area Ha is evaporated. At the same time, the on-off valve 23a is closed to stop the supply of the cooling liquid to the divided cooling jacket Qa corresponding to the heating area Ha, thereby setting the non-cooling area. Thereby, the vapor deposition material E in the heating area Ha is efficiently evaporated.

  When a predetermined transpiration time elapses, the transpiration control unit 13 determines that the vapor deposition material E in the heating area Ha has been transpiration based on the data of the transpiration data table 11, and turns off the switch SWa and turns on the switch SWb. The next heating zone Hb is displaced from the upper heating zone Ha and a high frequency current is supplied to the divided induction coil Cb. Next, the corresponding part of the crucible holder DKa is induction heated, and the vapor deposition material E in the heating zone Hb evaporates. At the same time, the on-off valve 23a is opened to supply the coolant to the divided cooling jacket Qa, and the on-off valve 23b is closed to make a non-cooling region. This is sequentially repeated to perform a long-time vapor deposition operation, and all the vapor deposition material E is evaporated.

  According to the third embodiment, during the vapor deposition operation, the supply of the cooling liquid to the divided cooling jackets Qa to Qd other than the selected heating zones Ha to Hd is stopped to be the non-cooling zone, and the other heating zones Ha to The cooling liquid is supplied to the divided cooling jackets Qa to Qd corresponding to Hd to cool the vapor deposition material E other than the heating zones Ha to Hd, thereby preventing the vapor deposition material E from deteriorating and vapor deposition in the heating zones Ha to Hd. The material E can be efficiently evaporated and continuous vapor deposition for a long time can be performed.

  FIG. 11 shows a modification. The vacuum deposition container A in Example 3 is applied to the updeposition external arrangement type I, the updeposition internal arrangement type II-a, the side deposition external arrangement type III, and the side deposition internal arrangement type IV-a shown in FIG. Is done. In addition, the induction heating member D is a direct heating type ii-a shown in FIG. 5C and is shown to use the induction heating crucible DPa, but the outer periphery heating type ia or the interior heating type iii-a. Further, the upper surface heating type iv may be used. Further, the dielectric coil C is an interior type ζ: FIG. 8G in which the divided dielectric coils Ca to Cd are respectively provided in the divided cooling jacket Qb. The modification of the third embodiment can also provide the same operational effects as the third embodiment.

[Example 4]
A fourth embodiment of the crucible device for vacuum evaporation according to the present invention will be described below with reference to FIG. In this fourth embodiment, the induction heating member D and the heating displacement means in the second embodiment are divided into the displacement type β-a and the divided cooling type δ-a in which a non-cooling region can be formed and the non-cooling region can be displaced. In addition, the same code | symbol is attached | subjected to the same member and description is abbreviate | omitted.

  The divided cooling type δ-a includes a plurality of divided cooling jackets Qa to Qd that are externally fitted to the crucible Pa and divided for each predetermined cooling region, and a cooling liquid from the cooling water supply device 14 to each divided cooling jacket Qa to Qd. Open / close valves 23a to 23d interposed in the liquid supply pipe for supplying the liquid, and the liquid supply pipe and the drain pipe are provided through the other divided cooling jackets Qb to Qd, respectively.

  According to the fourth embodiment, the heating part of the crucible holder DKa corresponding to the heating zones Ha to Hd is concentrated and heated by the movable induction coil Cma, and at the same time, arranged corresponding to the selected heating zones Ha to Hd. By stopping the supply of the cooling liquid to the divided cooling jackets Qa to Qd of the cooling region to make the non-cooling region, only the vapor deposition material E in the heating region Ha to Hd is effectively heated, and the remaining vapor deposition material E As a result, the deposition material E can be effectively prevented from deteriorating. Then, by operating the coil moving device S to displace the movable induction coil Cma along the heating zones Ha to Hd, the vapor deposition material E in the heating zones Ha to Hd is sequentially heated, and the vapor deposition operation is continued for a long time. Can be done.

[Example 5]
Hereinafter, Example 5 of the crucible apparatus for vacuum evaporation according to the present invention will be described with reference to FIG. The same members as those in the previous embodiment are denoted by the same reference numerals and description thereof is omitted.

  In Example 5, the vacuum deposition container A is for up-deposition external arrangement type I, up-deposition internal arrangement type II-a, side deposition external arrangement type III, and side deposition internal arrangement type IV-a shown in FIG. Applied. The induction heating member D is an internal heating type iii shown in FIG. 5E, and is a rod-shaped internal induction heating member made of a conductive material at the axial center position in the vapor deposition material E in the nonconductive crucible Pa. DL is arrange | positioned corresponding to heating area Ha-Hd. And the interior induction heating member DL is heated by the division | segmentation induction coils Ca-Cd, the vapor deposition material E is heated from the inside by conduction heat or radiant heat, and the vapor deposition material E is evaporated.

  Further, the cooling means is a divided cooling type δ-a shown in FIG. 7C, and is a plurality of divided cooling jackets Qa to Qd that are externally fitted to the crucible Pa and divided for each cooling region corresponding to the heating regions Ha to Hd. And a supply pipe and a drain pipe for supplying the coolant to the respective divided cooling jackets Qa to Qd from the cooling water supply device 14, and open / close valves 23a to 23d respectively interposed in the liquid supply pipes, and transpiration control. Each of the on-off valves 23a to 23d can be operated by the section 13 so that the divided cooling jackets Qa to Qd corresponding to the heating region can be set as non-cooling regions.

(Cooling / heating structure)
The induction heating member D and the heating displacement means are the split switching type α-a shown in FIG. 6 (a), and the coil arrangement structure in the cooling / heating structure is the dielectric coil exterior type ε shown in FIG. 8 (b). The dielectric coil interior type ζ shown in FIG. 8G may be used, and is constituted by a plurality of divided induction coils Ca to Cd.

  According to the fifth embodiment, the predetermined portions of the interior induction heating member DL corresponding to the heating zones Ha to Hd are sequentially induction-heated by the divided induction coils Ca to Cd, and the vapor deposition material E is heated from the inside, thereby vapor deposition material E. Can be transpired. Moreover, only the vapor deposition material E other than the heating zones Ha to Hd can be cooled using the divided cooling jackets Qa to Qd corresponding to the heating zones Ha to Hd as non-cooling zones. Therefore, the vapor deposition material E can be evaporated for a long time while preventing the vapor deposition material E from being deteriorated, and continuous vapor deposition for a long time is possible.

  In addition, as shown in the other modification of Example 5 of FIG. 15, interior induction heating member DL can also be heated with movable dielectric coil Cma. Here, the cooling means is an overall cooling type γ-a using an overall cooling jacket Q.

  In FIG. 13, one interior induction heating member DL is arranged in the axial center portion of the crucible Pa. However, as shown in FIGS. 14A and 14B, a plurality of interior induction heating members DL are arranged on an arc centered on the axial center. By arranging the interior induction heating member DL, it is possible to increase the contact area between the interior induction heating member DL and the vapor deposition member E and efficiently evaporate it.

[Example 6]
Hereinafter, Example 6 of the crucible apparatus for vacuum evaporation according to the present invention will be described with reference to FIGS. 16 and 17. The same members as those in the previous embodiment are denoted by the same reference numerals and description thereof is omitted.

  In Example 6, the interior induction heating member DL in Example 5 is used as the upper surface heating type iv shown in FIG. 5 (g) using an upper surface heating plate (upper surface induction heating member) DM. The upper surface heating plate DM has a disk shape as shown in FIG. 17A, or one or a plurality of transpiration holes 24 are formed in the disk as shown in FIG. 17B.

  The vacuum deposition container apparatus A is applied to the updeposition external arrangement type I, the updeposition internal arrangement type II-a, the side deposition external arrangement type III, and the side deposition internal arrangement type IV-a shown in FIG. And the upper surface heating plate DM is heated by the division | segmentation induction coils Ca-Cd, the vapor deposition material E is heated from an upper surface mainly by conduction heat, and the vapor deposition material E is evaporated.

  An upper surface heating plate DM is disposed so as to be supported on the upper surface of the vapor deposition material E in the conductive crucible Pa, and the upper surface heating plate DM is induction-heated by the induction coil C. Heat from to evaporate. The evaporation material E decreases due to transpiration, the upper surface heating plate DM is lowered, and when the upper surface heating plate DM reaches the heating area Ha to Hd, the transpiration control unit 13 operates the switches SWa to SWd to supply the high frequency current. The induction coils Ca to Cd are switched to the lower side, and the upper surface heating plate DM is controlled to be disposed in the high-density magnetic field. Further, the cooling region is also displaced according to the displacement of the upper surface heating plate DM.

Of course, the movable induction coil Cma may be lowered by the coil moving device S as the upper surface heating plate DM is lowered, as in the modification of the sixth embodiment shown in FIG.
According to the modification of the sixth embodiment and the sixth embodiment, the upper surface heating plate DM disposed on the upper surface of the vapor deposition material E is induction-heated by the divided induction coils Ca to Cd or the movable induction coil Dm, and the conductive heat or radiant heat is used. The vapor deposition material E in contact with the upper surface heating plate DM is heated to evaporate. When the upper surface heating plate DM is lowered according to the vapor deposition material E that decreases due to evaporation, the divided induction coils Ca to Cd to be fed are changed to the lower side, or the movable induction coil Dm is displaced downward by the coil moving device S. Thus, the vapor deposition material E can be evaporated for a long time by controlling the high-density magnetic field to act on the upper surface heating plate DM and continuing the induction heating. On the other hand, the cooling region adjusting means can set the selected heating regions Ha to Hd as non-cooling regions and cool the remaining vapor deposition material E. Therefore, the vapor deposition material E can be evaporated for a long time while preventing the vapor deposition material E from being deteriorated, and continuous vapor deposition for a long time is possible.

[Example 7]
A seventh embodiment of the vacuum evaporation crucible apparatus according to the present invention will be described below with reference to FIG. The same members as those in the previous embodiment are denoted by the same reference numerals and description thereof is omitted.

  The seventh embodiment uses a dish-shaped crucible (boat) Pb with a wide opening shown in FIG. 4 and is applied to the up-deposition internal arrangement type II-b and the side deposition internal arrangement type type IV-b. Is done. The induction heating member D is a direct heating type ii-b shown in FIG. 5D, and a dielectric heating crucible DPb formed of a conductive material is used for the crucible Pb, which is generated from the divided induction coils Ca to Cd. A predetermined heating portion of the induction heating crucible DPb is induction heated by a magnetic field to evaporate the vapor deposition material E by conduction heat or radiation heat.

  The cooling means is of the type δ-b shown in FIG. 7 (d), and a plurality of divided cooling jackets Ra to Rd divided for each cooling region corresponding to the heating regions Ha to Hd on the outside of the bottom of the vacuum evaporation container A, A liquid supply pipe and a drain pipe for supplying the cooling liquid from the cooling water supply apparatus 14 to each of the divided cooling jackets Ra to Rd, a cooling liquid supply apparatus 14 for circulating and supplying the cooling liquid, and a liquid supply pipe, respectively. Intervening on-off valves 23a to 23d are provided. Then, the on / off valves 23a to 23d are operated by the transpiration control unit 13 to stop the supply of the cooling liquid to the divided cooling jackets Qa to Qd corresponding to the heating zones Ha to Hd, thereby setting the non-cooling zone. Can do.

  The heating displacement means is the split switching type α-b shown in FIG. 6 (b), and the arrangement structure of the induction coil C is the interior / exterior type ζ shown in FIG. 8 (h), which is in the split cooling jackets Qa to Qd. Divided dielectric coils Ce to Ch are respectively arranged.

  According to the seventh embodiment, a predetermined portion of the conductive induction heating crucible DPb corresponding to the heating area Ha is heated by the magnetic field generated from the first split induction coil Ce, and the heating area Ha is heated by conduction heat or radiant heat. The evaporation material E inside is heated and evaporated. When the vapor deposition material E in the heating area He decreases, the feeding of the high-frequency current to the divided induction coil Ce is stopped, and the high-frequency current is fed to the divided induction coil Cf of the next heating area Hb to correspond to the heating area Hb. The next part of the induction heating crucible DPb to be heated is heated, and the vapor deposition material E in the heating area Hf is heated and evaporated by conduction heat or radiation heat.

  On the other hand, the supply of cooling water to the divided cooling jackets Ra to Rd corresponding to the selected heating areas Ha to Hd is stopped to be a non-cooling area, and the remaining vapor deposition material E is cooled, thereby While preventing the deterioration, the vapor deposition material E can be evaporated for a long time, and continuous vapor deposition for a long time becomes possible.

[Example 8]
Example 8 of the crucible device for vacuum evaporation according to the present invention will be described with reference to FIG. The same members as those in the previous embodiment are denoted by the same reference numerals and description thereof is omitted.

  Example 8 is an outer peripheral heating type i-b in which a conductive crucible holder DKb is arranged in a dish-shaped crucible Pb, and an up-deposition internal arrangement type II-b in which a crucible DPb is arranged in a vapor deposition chamber a. Applies to side deposition internal arrangement type IV-b. And the predetermined site | part of the crucible holder DKb corresponding to heating area Ha-Hd is induction-heated with the magnetic field generate | occur | produced from the movable coil Cmb, and the vapor deposition material E is evaporated by conduction heat or radiation heat.

  The cooling means is of the type γ-b shown in FIG. 7 (b). A liquid pipe and a cooling liquid supply device 14 that circulates and supplies the cooling liquid are provided.

  As for the induction coil C and the heating area displacement means, as shown in FIG. 6 (d), the coil displacement device S moves the movable induction coil Cmb along the arrangement direction of the heating areas Ha to Hd. b. The induction coil Cmb is disposed on the lower side of the entire cooling jacket R.

  According to the said Example 8, the heating site | part of the crucible holder DKb corresponding to heating area Ha-Hd is displaced by moving movable induction coil Cmb along heating area Ha-Hd by the coil moving apparatus S, and conduction is carried out. The vapor deposition material E in the heating areas Ha to Hd can be sequentially heated and evaporated by heat or radiant heat. Moreover, since cooling water is supplied to the whole cooling jacket R and the whole vapor deposition material E is cooled, the vapor deposition materials E other than the heating zones Ha to Hd are not deteriorated by heat. Therefore, the vapor deposition material E can be evaporated for a long time while preventing the vapor deposition material E from being deteriorated, and continuous vapor deposition for a long time is possible.

[Example 9]
A ninth embodiment of the vacuum evaporation crucible apparatus according to the present invention will be described with reference to FIGS. The same members as those in the previous embodiment are denoted by the same reference numerals and description thereof is omitted.

  In Example 7, the direct heating type ii-b induction heating crucible DPb was used, whereas in this Example 9, the internal heating type iii-b shown in FIG. The structure of is the same as that of Example 7.

  The interior induction heating material DL disposed inside the vapor deposition material E in the crucible Pb is, for example, as shown in FIG. 22A, a single or a plurality of rod-shaped interiors disposed along the heating zones Ha to Hd. As shown in FIG. 22 (b), the induction heating member DL is configured by a plate-shaped interior induction heating member DL arranged along the heating zones Ha to Hd and having a plurality of or a large number of evaporation holes 25 formed therein. The

  According to the ninth embodiment, in addition to the effects of the seventh embodiment, the rod-shaped or plate-shaped interior induction heating member DL has a wide surface in contact with the vapor deposition material E, and the conductive heat and the radiant heat are vaporized more effectively. The thermal efficiency of the interior induction heating material DL that can be transmitted to the material E and is induction-heated can be improved.

[Example 10]
Example 10 of the crucible apparatus for vacuum evaporation according to the present invention will be described with reference to FIGS. The same members as those in the previous embodiment are denoted by the same reference numerals and description thereof is omitted.

  In the eighth embodiment, the induction heating member D is the crucible holder DKb, whereas in this tenth embodiment, the radiation induction heating type v shown in FIG. The same.

  Above the crucible Pb, a radiation induction heating material DN is disposed via a support member at a certain distance from the vapor deposition material E. For example, as shown in FIG. 24 (a), the radiation induction heating material DN includes one or a plurality of rod-shaped radiation induction heating members DN arranged along the heating zones Ha to Hd, and FIG. 24 (b). As shown in FIG. 4, the plate-shaped radiation induction heating member DN is disposed along the heating zones Ha to Hd and formed with a plurality of or many evaporation holes 26.

  According to the ninth embodiment, in addition to the function and effect of the eighth embodiment, since the rod-shaped or plate-shaped radiation induction heating member DN is arranged at a certain distance from the vapor deposition material E, the radiant heat is reduced. It can supply uniformly over the whole heating zone Ha-Hd, and can perform stable heating and transpiration.

A Vacuum evaporation vessel B High frequency power supply device C Inductive coil Ca-Cd, Ce-Ch Split induction coil Cma, Cmb Movable induction coil D Induction heating member DPa, DPb Conductive crucible
DKa, DKb crucible holder
DL Internal induction heating member
DM Upper surface heating plate DN Radiation induction heating member E Evaporation material G Nozzle Q, R Whole cooling jacket Qa-Qd Split cooling jacket Ra-Rd Split cooling jacket Ha-Hd, He-Hh Heating area Pa, Pb Crucible SWa-SWd, SWe ˜SWh switch S coil moving device T substrate 11 transpiration data table 12 controller 13 transpiration control unit 14 coolant supply devices 23a-23d on-off valve

Claims (15)

In order to deposit a thin film of a vapor deposition material on the surface of the material to be vapor-deposited in a vacuum vapor deposition container, when the vapor deposition material contained in the crucible is heated to evaporate or sublimate,
For the crucible, use an induction heating crucible formed of a material capable of induction heating,
Setting a plurality of heating zones in the vapor deposition material accommodated in the induction heating crucible;
The induction heating crucible part corresponding to the initial heating area is induction-heated by a magnetic field generated from an induction heating source installed outside the crucible to evaporate or sublimate the vapor deposition material in the heating area,
After the vapor deposition material in the first heating zone is evaporated or sublimated, by manipulating the magnetic field generated from the induction heating source, the predetermined portion of the induction heating crucible corresponding to the next heating zone is induction heated, Evaporate or sublimate the vapor deposition material in the next heating zone,
A method of evaporation and sublimation of a vapor deposition material for vacuum vapor deposition, characterized in that the vapor deposition operation is continuously performed by repeating this. In order to deposit a thin film of a vapor deposition material on the surface of the material to be vapor-deposited in a vacuum vapor deposition container, when the vapor deposition material contained in the crucible is heated to evaporate or sublimate,
Using a crucible that is placed in contact with the vapor deposition material and that is equipped with an induction heating member formed of a material capable of induction heating,
Set multiple heating zones for the vapor deposition material in the crucible,
By induction heating a portion of the induction heating member corresponding to the first heating area by a magnetic field generated from an induction heating source provided outside the crucible, the vapor deposition material in the heating area is evaporated or sublimated,
After the vapor deposition material corresponding to the heating area is evaporated or sublimated, the magnetic field generated from the induction heating source is operated to perform part induction heating of the induction heating member corresponding to the next heating area, and the next heating area Evaporate or sublimate the vapor deposition material
A method of evaporation and sublimation of a vapor deposition material for vacuum vapor deposition, characterized in that the vapor deposition operation is continuously performed by repeating this. In order to deposit a thin film of a vapor deposition material on the surface of the material to be vapor-deposited in a vacuum vapor deposition container, when the vapor deposition material contained in the crucible is heated to evaporate or sublimate,
Using a crucible made of a material capable of induction heating and provided with an upper surface induction heating member supported on the upper surface of the vapor deposition material,
Inductively heating the upper surface induction heating member by a magnetic field generated from an induction heating source provided outside the crucible, evaporating or sublimating the evaporation material below the upper surface induction heating member,
Vaporization of vapor deposition material for vacuum deposition characterized by operating a magnetic field generated from an induction heating source corresponding to a top surface induction heating member that descends as the deposition material decreases, and continuously inductively heating the top surface induction heating member , Sublimation method. In order to deposit a thin film of a vapor deposition material on the surface of the material to be vapor-deposited in a vacuum vapor deposition container, the vapor deposition material contained in the crucible is heated to evaporate and sublimate.
Using a crucible in which a radiant heating member made of a material capable of induction heating is arranged at a predetermined distance above the vapor deposition material,
Set multiple heating zones for the vapor deposition material in the crucible,
The material of the radiant heating member corresponding to the first heating area is induction-heated by the magnetic field generated from the induction heating source provided outside the crucible, and the vapor deposition material in the first heating area is radiated from the radiant heating member. Heat and evaporate or sublimate,
After the vapor deposition material in the first heating zone is evaporated or sublimated, the magnetic field generated from the induction heating source is operated to induction-heat the portion of the radiant heating member corresponding to the next heating zone, and the next heating zone Evaporate or sublimate the vapor deposition material
A method of evaporation and sublimation of a vapor deposition material for vacuum vapor deposition, characterized in that the vapor deposition operation is continuously performed by repeating this. The evaporation material sublimation method for vacuum evaporation according to any one of claims 1 to 4, wherein the entire evaporation material is cooled by a cooling means provided outside the crucible. The cooling means provided outside the crucible does not cool the heating zone as a non-cooling zone, but cools the vapor deposition material in other heating zones,
5. The evaporation and sublimation method for a vapor deposition material according to claim 1, wherein the non-cooling region is displaced corresponding to the displacement of the heating region. In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
The crucible is an induction heating crucible formed of a conductive material capable of induction heating, and a plurality of heating zones are set for the vapor deposition material in the induction heating crucible,
An induction heating source capable of evaporating or sublimating the deposition material by induction heating the induction heating crucible outside the induction heating crucible;
A crucible device for vacuum vapor deposition characterized in that a heating area displacing means capable of selectively inductively heating a portion of the induction heating crucible corresponding to a heating area by operating a magnetic field generated from the induction heating source. In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
In the crucible, a crucible holder made of a conductive material capable of containing a vapor deposition material and capable of induction heating is provided, and a plurality of heating zones are set for the vapor deposition material in the crucible holder,
An induction heating source capable of evaporating or sublimating the vapor deposition material by induction heating the crucible holder outside the crucible,
A crucible device for vacuum vapor deposition characterized in that a heating area displacing means is provided that can selectively inductively heat a portion of the crucible holder corresponding to the heating area by operating a magnetic field generated from the induction heating source. In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
In the vapor deposition material accommodated in the crucible, an internal induction heating member made of a conductive material capable of induction heating is provided, and a plurality of heating zones are set in the vapor deposition material.
An induction heating source capable of evaporating or sublimating the vapor deposition material by induction heating the internal induction heating member on the outside of the crucible,
A crucible device for vacuum vapor deposition, characterized in that a heating area displacing means is provided that is capable of selectively inductively heating a portion of the interior induction heating member corresponding to a heating area by operating a magnetic field generated from the induction heating source. . In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
An upper surface induction heating member made of a conductive material capable of induction heating is provided on the upper surface of the vapor deposition material accommodated in the crucible,
An induction heating source capable of evaporating or sublimating the vapor deposition material under the upper surface induction heating member by induction heating the upper surface induction heating member outside the crucible,
A crucible device for vacuum vapor deposition, characterized in that a heating area displacing means is provided that operates the magnetic field generated from the induction heating source to inductively heat the upper surface induction heating member that descends as the vapor deposition material decreases. In a vacuum evaporation crucible device for evaporating or sublimating a deposition material by heating in order to deposit a thin film on the surface of the deposition material in a vacuum deposition container,
A radiation induction heating member made of a conductive material capable of induction heating is provided spaced apart above the vapor deposition material housed in the crucible,
Set multiple heating zones for the vapor deposition material in the crucible,
An induction heating source capable of inductively heating the radiation induction heating member is provided outside the crucible,
A crucible device for vacuum vapor deposition, characterized in that a heating area displacing means is provided that can selectively heat the part of the radiation induction heating member corresponding to the heating area by operating a magnetic field generated from the induction heating source. . The induction heating source is a plurality of divided induction coils divided and arranged corresponding to the heating area,
The crucible device for vacuum evaporation according to any one of claims 7 to 11, wherein the heating area displacing means is constituted by a transpiration control device that controls on and off of a high-frequency current supplied to each of the divided induction coils. . The induction heating source is a movable induction coil arranged to be movable in the arrangement direction of the heating zone,
The heating area displacing means comprises a coil moving device that can move the movable induction coil, and a transpiration control device that operates the coil moving device to move the movable induction coil in response to the heating area. The crucible device for vacuum evaporation according to any one of claims 7 to 11. Provide cooling means outside the crucible,
The crucible device for vacuum vapor deposition according to any one of claims 7 to 13, wherein the cooling means is constituted by an entire cooling jacket for uniformly cooling the whole vapor deposition material by supplying and discharging a cooling liquid. Provide cooling means outside the crucible,
The cooling means is divided and arranged in a plurality corresponding to the heating zone, and is constituted by a divided cooling jacket,
Provided is a transpiration control device capable of changing the divided cooling jacket for stopping the supply of the cooling liquid in response to the displacement of the heating area while stopping the supply of the cooling liquid to the divided cooling jacket corresponding to the heating area. The crucible device for vacuum evaporation according to any one of claims 7 to 13, wherein the crucible device is used for vacuum evaporation.

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