JP2011042537A5 - - Google Patents

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Publication number
JP2011042537A5
JP2011042537A5 JP2009192460A JP2009192460A JP2011042537A5 JP 2011042537 A5 JP2011042537 A5 JP 2011042537A5 JP 2009192460 A JP2009192460 A JP 2009192460A JP 2009192460 A JP2009192460 A JP 2009192460A JP 2011042537 A5 JP2011042537 A5 JP 2011042537A5
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Japan
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particle size
average particle
size distribution
particle diameter
powder
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JP2009192460A
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English (en)
Japanese (ja)
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JP2011042537A (ja
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Priority to JP2009192460A priority Critical patent/JP2011042537A/ja
Priority claimed from JP2009192460A external-priority patent/JP2011042537A/ja
Priority to PCT/JP2010/063598 priority patent/WO2011021546A1/ja
Publication of JP2011042537A publication Critical patent/JP2011042537A/ja
Publication of JP2011042537A5 publication Critical patent/JP2011042537A5/ja
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JP2009192460A 2009-08-21 2009-08-21 カルコゲン化合物粉、カルコゲン化合物ペースト及びカルコゲン化合物粉の製造方法 Withdrawn JP2011042537A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009192460A JP2011042537A (ja) 2009-08-21 2009-08-21 カルコゲン化合物粉、カルコゲン化合物ペースト及びカルコゲン化合物粉の製造方法
PCT/JP2010/063598 WO2011021546A1 (ja) 2009-08-21 2010-08-04 カルコゲン化合物粉、カルコゲン化合物ペースト及びカルコゲン化合物粉の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009192460A JP2011042537A (ja) 2009-08-21 2009-08-21 カルコゲン化合物粉、カルコゲン化合物ペースト及びカルコゲン化合物粉の製造方法

Publications (2)

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JP2011042537A JP2011042537A (ja) 2011-03-03
JP2011042537A5 true JP2011042537A5 (https=) 2012-08-02

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JP2009192460A Withdrawn JP2011042537A (ja) 2009-08-21 2009-08-21 カルコゲン化合物粉、カルコゲン化合物ペースト及びカルコゲン化合物粉の製造方法

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JP (1) JP2011042537A (https=)
WO (1) WO2011021546A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5767447B2 (ja) 2010-06-29 2015-08-19 株式会社コベルコ科研 Ｃｕ、Ｉｎ、ＧａおよびＳｅの元素を含有する粉末の製造方法、及びＣｕ、Ｉｎ、ＧａおよびＳｅの元素を含有するスパッタリングターゲット
WO2012077242A1 (ja) * 2010-12-07 2012-06-14 Ｄｏｗａホールディングス株式会社 カルコゲン化合物粉、カルコゲン化合物ペースト、カルコゲン化合物粉の製造方法、カルコゲン化合物ペーストの製造方法およびカルコゲン化合物薄膜の製造方法
JP5713743B2 (ja) * 2011-03-22 2015-05-07 Ｄｏｗａエレクトロニクス株式会社 セレン化銅粒子粉末およびその製造方法
JP5713756B2 (ja) * 2011-03-30 2015-05-07 Ｄｏｗａエレクトロニクス株式会社 セレン化銅粒子粉末およびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5356839A (en) * 1993-04-12 1994-10-18 Midwest Research Institute Enhanced quality thin film Cu(In,Ga)Se2 for semiconductor device applications by vapor-phase recrystallization
JP2732352B2 (ja) * 1994-02-14 1998-03-30 勝昭 佐藤 カルコパイライト型化合物の薄膜の作製方法
SI1548159T1 (sl) * 2003-12-22 2006-08-31 Scheuten Glasgroep Bv Postopek za pripravo Cu(In,Ga)Se2 monokristalnegapraska in soncna celica z monozrnato membrano, kiobsega ta prasek

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