JP2011030734A5 - - Google Patents

Download PDF

Info

Publication number
JP2011030734A5
JP2011030734A5 JP2009179331A JP2009179331A JP2011030734A5 JP 2011030734 A5 JP2011030734 A5 JP 2011030734A5 JP 2009179331 A JP2009179331 A JP 2009179331A JP 2009179331 A JP2009179331 A JP 2009179331A JP 2011030734 A5 JP2011030734 A5 JP 2011030734A5
Authority
JP
Japan
Prior art keywords
electrodes
vision
electrode
regeneration
assisting device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009179331A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011030734A (ja
JP5578540B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009179331A priority Critical patent/JP5578540B2/ja
Priority claimed from JP2009179331A external-priority patent/JP5578540B2/ja
Publication of JP2011030734A publication Critical patent/JP2011030734A/ja
Publication of JP2011030734A5 publication Critical patent/JP2011030734A5/ja
Application granted granted Critical
Publication of JP5578540B2 publication Critical patent/JP5578540B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2009179331A 2009-07-31 2009-07-31 視覚再生補助装置及び視覚再生補助装置の製造方法 Active JP5578540B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009179331A JP5578540B2 (ja) 2009-07-31 2009-07-31 視覚再生補助装置及び視覚再生補助装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009179331A JP5578540B2 (ja) 2009-07-31 2009-07-31 視覚再生補助装置及び視覚再生補助装置の製造方法

Publications (3)

Publication Number Publication Date
JP2011030734A JP2011030734A (ja) 2011-02-17
JP2011030734A5 true JP2011030734A5 (cg-RX-API-DMAC7.html) 2012-09-13
JP5578540B2 JP5578540B2 (ja) 2014-08-27

Family

ID=43760412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009179331A Active JP5578540B2 (ja) 2009-07-31 2009-07-31 視覚再生補助装置及び視覚再生補助装置の製造方法

Country Status (1)

Country Link
JP (1) JP5578540B2 (cg-RX-API-DMAC7.html)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9821159B2 (en) 2010-11-16 2017-11-21 The Board Of Trustees Of The Leland Stanford Junior University Stimulation devices and methods
CA2817589A1 (en) 2010-11-16 2012-05-24 The Board Of Trustees Of The Leland Stanford Junior University Systems and methods for treatment of dry eye
CN105727444B (zh) * 2011-04-07 2018-10-09 奥库利维公司 刺激装置
JP2013074956A (ja) * 2011-09-30 2013-04-25 Nidek Co Ltd 生体組織用刺激電極及び該刺激電極の加工方法
EP2967817B1 (en) 2013-03-12 2021-03-10 Oculeve, Inc. Implant delivery devices and systems
HK1220934A1 (zh) 2013-04-19 2017-05-19 Oculeve, Inc. 鼻刺激装置和方法
JP6604963B2 (ja) 2014-02-25 2019-11-20 オキュリーブ, インコーポレイテッド 鼻涙腺刺激のためのポリマー配合物
JP6643313B2 (ja) 2014-07-25 2020-02-12 オキュリーブ, インコーポレイテッド ドライアイを治療するための刺激パターン
KR20170074926A (ko) 2014-10-22 2017-06-30 오큘레브, 인크. 안구 건조증을 치료하기 위한 자극 장치 및 방법
WO2016065213A1 (en) 2014-10-22 2016-04-28 Oculeve, Inc. Implantable nasal stimulator systems and methods
CA2965514A1 (en) 2014-10-22 2016-04-28 Oculeve, Inc. Contact lens for increasing tear production
US10426958B2 (en) 2015-12-04 2019-10-01 Oculeve, Inc. Intranasal stimulation for enhanced release of ocular mucins and other tear proteins
US10252048B2 (en) 2016-02-19 2019-04-09 Oculeve, Inc. Nasal stimulation for rhinitis, nasal congestion, and ocular allergies
US10918864B2 (en) 2016-05-02 2021-02-16 Oculeve, Inc. Intranasal stimulation for treatment of meibomian gland disease and blepharitis
CA3045018A1 (en) 2016-12-02 2018-06-07 Oculeve, Inc. Apparatus and method for dry eye forecast and treatment recommendation
US12403306B2 (en) 2017-10-23 2025-09-02 Cardiac Pacemakers, Inc. Electric field shaping leads for treatment of cancer
EP3958954B1 (en) 2019-04-22 2024-04-24 Boston Scientific Scimed Inc. Electrical stimulation devices for cancer treatment
CN113766948B (zh) 2019-04-22 2025-02-07 波士顿科学国际有限公司 对癌症的电与化学组合治疗
US11607542B2 (en) 2019-04-23 2023-03-21 Boston Scientific Scimed, Inc. Electrical stimulation for cancer treatment with internal and external electrodes
CN113747936B (zh) * 2019-04-23 2024-06-18 波士顿科学国际有限公司 用于电刺激来治疗癌症的电极
US11883655B2 (en) 2020-02-24 2024-01-30 Boston Scientific Scimed, Inc. Systems and methods for treatment of pancreatic cancer
CN113041492A (zh) * 2021-03-15 2021-06-29 博睿康科技(常州)股份有限公司 均衡电荷的电极触片及制作方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5683443A (en) * 1995-02-07 1997-11-04 Intermedics, Inc. Implantable stimulation electrodes with non-native metal oxide coating mixtures
US7887681B2 (en) * 2002-04-11 2011-02-15 Second Sight Medical Products, Inc. Platinum electrode surface coating and method for manufacturing the same
DE102006048819A1 (de) * 2006-10-10 2008-04-17 NMI Naturwissenschaftliches und Medizinisches Institut an der Universität Tübingen Vorrichtung mit einem Grundkörper
JP2009004409A (ja) * 2007-06-19 2009-01-08 Nichicon Corp 電解コンデンサ用エッチング箔の製造装置および製造方法
JP5219443B2 (ja) * 2007-09-28 2013-06-26 株式会社ニデック 視覚再生補助装置用の刺激ユニットの作製方法
JP5122244B2 (ja) * 2007-11-01 2013-01-16 株式会社ニデック 視覚再生補助装置

Similar Documents

Publication Publication Date Title
JP2011030734A5 (cg-RX-API-DMAC7.html)
JP2013074956A5 (cg-RX-API-DMAC7.html)
JP2008529743A5 (cg-RX-API-DMAC7.html)
WO2009047680A3 (en) Apparatus and method for ultrasound treatment
JP2011530334A5 (cg-RX-API-DMAC7.html)
WO2010058178A8 (en) Method and apparatus for performing deep brain stimulation with an electric field
JP2009524462A5 (cg-RX-API-DMAC7.html)
WO2011105822A3 (ko) 자기 조립 이중블록 공중합체와 졸-겔 공정을 이용한 산화아연 나노링 구조체의 제조방법
TW200741851A (en) Method of producing a semiconductor device and method of reducing microroughness on a semiconductor surface
JP2009513248A5 (cg-RX-API-DMAC7.html)
JP2013047171A5 (ja) 酸化グラファイトの作製方法、酸化グラフェンの作製方法及びグラフェンの作製方法
HK1252568A1 (zh) 一种治疗方法
JP2013030764A5 (ja) 半導体基板の再生方法、及びsoi基板の作製方法
WO2008108341A1 (ja) 表面粗化銅板の製造方法及び装置、並びに表面粗化銅板
JP2012522135A5 (cg-RX-API-DMAC7.html)
CN111218702A (zh) 一种能制备多种纳米线结构的表面制备方法
JP2006083467A5 (cg-RX-API-DMAC7.html)
JP2016210085A5 (cg-RX-API-DMAC7.html)
JP2009131147A5 (cg-RX-API-DMAC7.html)
EP2348524A3 (en) Method and apparatus for recovering pattern on silicon substrate
JP2011071494A5 (ja) 半導体基板の再生方法
EP2179808B8 (en) Process for producing electrode for discharge surface treatment.
JP2011160984A5 (cg-RX-API-DMAC7.html)
CN104361717A (zh) 一种佩戴式打盹提醒器的制备
CN104963998B (zh) 一体式聚氨酯同步带及其制备方法