JP2010530070A5 - - Google Patents

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JP2010530070A5
JP2010530070A5 JP2010512170A JP2010512170A JP2010530070A5 JP 2010530070 A5 JP2010530070 A5 JP 2010530070A5 JP 2010512170 A JP2010512170 A JP 2010512170A JP 2010512170 A JP2010512170 A JP 2010512170A JP 2010530070 A5 JP2010530070 A5 JP 2010530070A5
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optoelectronic system
view
field
image
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JP2010530070A (ja
JP5642541B2 (ja
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Claims (15)

  1. 物体を表す情報を生成するオプトエレクトロニクスシステムであって、
    視野内において光測定を行う光学センサと、
    物体が前記視野を通過するように、運動方向において前記物体と前記視野との間の相対運動を生成する運動プロセスと、
    前記視野の複数の一次元画像を撮影する撮影プロセスであって、
    前記複数の画像のそれぞれが、個々の光測定値に応答し、
    前記画像が、前記運動方向に対してほぼ平行な向きであり、
    前記画像の少なくとも一部が、前記視野に対する相対的な前記物体の複数の位置に対応する撮影プロセスと、
    前記画像の少なくとも一部を分析し、画像測定値を生成する測定プロセスと、
    前記画像測定値の中から、前記物体に応答するものであると判断された画像測定値からなる物体測定値を選択する選択プロセスと、
    前記物体測定値を分析し、前記物体を表す情報を生成する判断プロセスと
    からなるオプトエレクトロニクスシステム。
  2. 前記画像測定値の少なくとも一部が、前記視野内における物体の存在に応答し、
    前記選択プロセスは、前記視野内における物体の存在に応答する前記画像測定値の少なくとも一部に応答し、
    前記物体を表す情報は、前記視野内における物体の存在に応答する情報を含む、請求項1に記載のオプトエレクトロニクスシステム。
  3. 前記運動プロセスは、前記物体が基準時刻において基準点を横切るようにし、
    前記画像測定値の少なくとも一部が、前記視野内における物体の位置に応答し、
    前記物体測定値の少なくとも一部が、前記視野内における物体の位置に応答する画像測定値の中から選択され、
    前記判断プロセスは、前記視野内における物体の位置に応答する画像測定値の中から選択された前記物体測定値の少なくとも一部に応答し、
    前記物体を表す情報は、前記基準時刻の推定値を含む、請求項1に記載のオプトエレクトロニクスシステム。
  4. 前記撮影プロセスは、各撮影時刻が、対応する画像が撮影された時刻に応答する、複数の撮影時刻を生成し、前記判断プロセスは、前記撮影時刻の少なくとも1つに応答する、請求項3に記載のオプトエレクトロニクスシステム。
  5. 前記判断プロセスは、前記撮影時刻の少なくとも一部を含み、かつ前記視野内の物体の位置に応答する前記画像測定値の中から選択された物体測定値に対応する種々のポイントに対し、曲線をフィットさせることを含む、請求項4に記載のオプトエレクトロニクスシステム。
  6. 前記物体を表す情報に応答する信号を生成する信号プロセスをさらに含み、前記信号は、前記基準時刻の推定値に応答する信号時刻に発生することにより、前記物体を表す情報を示す、請求項3に記載のオプトエレクトロニクスシステム。
  7. 前記基準時刻と前記信号時刻との間に、待ち時間は無い、請求項6に記載のオプトエレクトロニクスシステム。
  8. 前記判断プロセスは、前記基準時刻を予測することによって前記基準時刻の推定値を決定する、請求項3に記載のオプトエレクトロニクスシステム。
  9. 例示的物体と、
    前記例示的物体が、前記視野内のセットアップ位置にあることを示すセットアップ信号と
    をさらに含み、前記基準点は、前記例示的物体、前記セットアップ信号、及び前記セットアップ位置に応答して設定される、請求項3に記載のオプトエレクトロニクスシステム。
  10. 前記物体を表す情報に応答する信号を生成する信号プロセスをさらに含み、前記信号は、前記物体が、前記セットアップ位置を横切ったときに発生する、請求項9に記載のオプトエレクトロニクスシステム。
  11. テスト物体と、
    前記テスト物体が、前記基準点よりも上流で検出されたこと、
    前記テスト物体が、前記基準点よりも下流で検出されたこと、及び
    前記テスト物体が、検出されなかったこと
    の中から選択された検出状態を示すインジケータを含むマン・マシン・インタフェースと
    をさらに含む、請求項3に記載のオプトエレクトロニクスシステム。
  12. 前記測定プロセスは、パターン検出プロセスを含む、請求項1〜3のうちの何れか一項に記載のオプトエレクトロニクスシステム。
  13. 例示的物体と、
    前記例示的物体に応答するモデルパターンを得るためのトレーニングプロセスと
    をさらに含み、
    前記パターン検出プロセスは、前記モデルパターンに応答する、請求項12に記載のオプトエレクトロニクスシステム。
  14. 前記パターン検出プロセスは、正規化相関プロセスを含む、請求項12に記載のオプトエレクトロニクスシステム。
  15. 前記光学センサは、受光素子の一次元アレイを含むリニア光学センサからなる、請求項1〜3のうちの何れか一項に記載のオプトエレクトロニクスシステム。
JP2010512170A 2007-06-15 2008-06-11 物体の光電子工学的検知、及び位置特定のための方法、及びシステム Active JP5642541B2 (ja)

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US11/763,752 US8237099B2 (en) 2007-06-15 2007-06-15 Method and system for optoelectronic detection and location of objects
US11/763,752 2007-06-15
PCT/US2008/007280 WO2008156608A2 (en) 2007-06-15 2008-06-11 Method and system for optoelectronic detection and location of objects

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