JP2010528480A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2010528480A5 JP2010528480A5 JP2010509734A JP2010509734A JP2010528480A5 JP 2010528480 A5 JP2010528480 A5 JP 2010528480A5 JP 2010509734 A JP2010509734 A JP 2010509734A JP 2010509734 A JP2010509734 A JP 2010509734A JP 2010528480 A5 JP2010528480 A5 JP 2010528480A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- base
- molded body
- depositing
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims 63
- 238000000151 deposition Methods 0.000 claims 13
- 238000000926 separation method Methods 0.000 claims 13
- 229910004298 SiO 2 Inorganic materials 0.000 claims 10
- 230000003287 optical effect Effects 0.000 claims 10
- 238000005323 electroforming Methods 0.000 claims 6
- 238000001816 cooling Methods 0.000 claims 5
- 229910052751 metal Inorganic materials 0.000 claims 5
- 239000002184 metal Substances 0.000 claims 5
- 229910052707 ruthenium Inorganic materials 0.000 claims 4
- 238000007740 vapor deposition Methods 0.000 claims 4
- 229910000990 Ni alloy Inorganic materials 0.000 claims 3
- 229910052737 gold Inorganic materials 0.000 claims 3
- 229910052759 nickel Inorganic materials 0.000 claims 3
- 238000009304 pastoral farming Methods 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 238000010894 electron beam technology Methods 0.000 claims 2
- 150000002739 metals Chemical class 0.000 claims 2
- 229910052750 molybdenum Inorganic materials 0.000 claims 2
- 238000005498 polishing Methods 0.000 claims 2
- 238000004544 sputter deposition Methods 0.000 claims 2
- 230000003746 surface roughness Effects 0.000 claims 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US93251707P | 2007-05-31 | 2007-05-31 | |
| DE102007025278 | 2007-05-31 | ||
| PCT/EP2008/004273 WO2008145364A2 (de) | 2007-05-31 | 2008-05-29 | Verfahren zur herstellung eines optischen elementes mit hilfe von abformung, optisches element hergestellt nach diesem verfahren, kollektor und beleuchtungssystem |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010528480A JP2010528480A (ja) | 2010-08-19 |
| JP2010528480A5 true JP2010528480A5 (OSRAM) | 2011-07-07 |
Family
ID=39865722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010509734A Pending JP2010528480A (ja) | 2007-05-31 | 2008-05-29 | 成形によって光学素子を作製する方法、この方法により作製した光学素子、集光器および照明系 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20100182710A1 (OSRAM) |
| EP (1) | EP2155932A2 (OSRAM) |
| JP (1) | JP2010528480A (OSRAM) |
| KR (1) | KR20100017443A (OSRAM) |
| WO (1) | WO2008145364A2 (OSRAM) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8153994B2 (en) * | 2009-12-02 | 2012-04-10 | Media Lario S.R.L. | Cooling systems and methods for grazing incidence EUV lightography collectors |
| WO2012113591A1 (en) * | 2011-02-24 | 2012-08-30 | Asml Netherlands B.V. | Grazing incidence reflector, lithographic apparatus, method for manufacturing grazing incidence reflector and method for manufacturing a device |
| DE102011087323A1 (de) | 2011-11-29 | 2012-12-13 | Carl Zeiss Smt Gmbh | Zwangsgeformtes optisches Element und Verfahren zu seiner Herstellung |
| DE102012200454A1 (de) * | 2012-01-13 | 2013-01-03 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung eines reflektiven optischen Elements und reflektives optisches Element |
| DE102012201497A1 (de) | 2012-02-02 | 2013-01-17 | Carl Zeiss Smt Gmbh | Kollektor mit einem Beugungsgitter |
| US20140134351A1 (en) * | 2012-11-09 | 2014-05-15 | Applied Materials, Inc. | Method to deposit cvd ruthenium |
| DE102015100918A1 (de) | 2015-01-22 | 2016-07-28 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines reflektiven optischen Elements, reflektives optisches Element und Verwendung eines reflektiven optischen Elements |
| DE102015104262A1 (de) | 2015-03-20 | 2016-09-22 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines reflektiven optischen Elements und reflektives optisches Element |
| DE102015213253A1 (de) * | 2015-07-15 | 2017-01-19 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102016110351B4 (de) * | 2016-06-03 | 2019-08-29 | Carl Zeiss Meditec Ag | Verfahren zur Herstellung eines optischen Elements |
| DE102018212224A1 (de) | 2018-07-23 | 2020-01-23 | Carl Zeiss Smt Gmbh | Vorrichtung zur Rückkopplung von emittierter Strahlung in eine Laserquelle |
| US12388230B2 (en) * | 2020-05-26 | 2025-08-12 | The Regents Of The University Of Colorado, A Body Corporate | Monolithic photonic resonator and associated laser frequency stabilization method |
| DE102020214466A1 (de) | 2020-11-18 | 2022-05-19 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung eines Grundkörpers eines optischen Elementes für die Halbleiterlithographie und Grundkörper eines optischen Elementes für die Halbleiterlithographie |
| DE102022132407A1 (de) * | 2022-12-06 | 2024-06-06 | FLABEG France S.A.S. | Spiegelelement und entsprechendes Herstellungsverfahren |
| CN116043284A (zh) * | 2023-01-10 | 2023-05-02 | 同济大学 | 一种基于多层薄膜基底精密电铸的射线反射聚焦镜制造方法 |
| DE102023121686B4 (de) * | 2023-08-14 | 2025-03-13 | Carl Zeiss Smt Gmbh | Optisches System mit einem EUV-Spiegel und Verfahren zum Betreiben eines optischen Systems |
| DE102023211114A1 (de) * | 2023-11-10 | 2025-05-15 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung einer EUV-Strahlung reflektierenden Oberflächenbeschichtung |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3526949A (en) * | 1967-10-09 | 1970-09-08 | Ibm | Fly's eye molding technique |
| JPS62116793A (ja) * | 1985-11-15 | 1987-05-28 | Ricoh Co Ltd | 電鋳スタンパの製造方法 |
| JPH01103801U (OSRAM) * | 1987-12-28 | 1989-07-13 | ||
| US5160668A (en) * | 1989-12-05 | 1992-11-03 | Optical Coating Laboratory, Inc. | Method for forming optical elements having an optical coating by replication of a mold |
| US5763930A (en) * | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
| US6586757B2 (en) * | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
| DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
| EP0955641B1 (de) * | 1998-05-05 | 2004-04-28 | Carl Zeiss | Beleuchtungssystem insbesondere für die EUV-Lithographie |
| US7006595B2 (en) * | 1998-05-05 | 2006-02-28 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Illumination system particularly for microlithography |
| DE10053587A1 (de) * | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
| US6600552B2 (en) * | 1999-02-15 | 2003-07-29 | Carl-Zeiss Smt Ag | Microlithography reduction objective and projection exposure apparatus |
| JP3751778B2 (ja) * | 1999-04-26 | 2006-03-01 | 日本板硝子株式会社 | ゾルゲル成形物の製造方法 |
| US6285737B1 (en) * | 2000-01-21 | 2001-09-04 | Euv Llc | Condenser for extreme-UV lithography with discharge source |
| EP1152555A1 (en) * | 2000-05-03 | 2001-11-07 | Media Lario S.r.L. | Telescope mirror for high bandwidth free space optical data transmission |
| US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
| WO2003014833A2 (de) * | 2001-08-10 | 2003-02-20 | Carl Zeiss Smt Ag | Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen |
| DE10317667A1 (de) * | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| US6825089B1 (en) * | 2003-06-04 | 2004-11-30 | Agere Systems Inc. | Increased quality factor of a varactor in an integrated circuit via a high conductive region in a well |
| WO2005015314A2 (en) * | 2003-07-30 | 2005-02-17 | Carl Zeiss Smt Ag | An illumination system for microlithography |
| US7081992B2 (en) * | 2004-01-16 | 2006-07-25 | Euv Llc | Condenser optic with sacrificial reflective surface |
| US7164144B2 (en) * | 2004-03-10 | 2007-01-16 | Cymer Inc. | EUV light source |
| EP1812935A2 (en) * | 2004-11-09 | 2007-08-01 | Carl Zeiss SMT AG | High-precision optical surface prepared by sagging from a masterpiece |
-
2008
- 2008-05-29 JP JP2010509734A patent/JP2010528480A/ja active Pending
- 2008-05-29 WO PCT/EP2008/004273 patent/WO2008145364A2/de not_active Ceased
- 2008-05-29 KR KR1020097024793A patent/KR20100017443A/ko not_active Withdrawn
- 2008-05-29 EP EP08801441A patent/EP2155932A2/de not_active Withdrawn
-
2009
- 2009-11-25 US US12/626,437 patent/US20100182710A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2010528480A5 (OSRAM) | ||
| EP2316056B1 (fr) | Procédé de fabrication de pièces métalliques multi-niveaux par la technique liga-uv | |
| EP2229470B1 (fr) | Procédé de fabrication d'une microstructure métallique et microstructure obtenue selon ce procédé | |
| EP2004881B1 (fr) | Procede de fabrication par liga-uv d'une structure metallique multicouche a couches adjacentes non entierement superposees, et structure obtenue | |
| TWI640825B (zh) | Ｅｕｖ微影術用反射型光罩基底、該光罩基底用之附機能膜之基板以及該等之製造方法 | |
| TW200842939A (en) | Reflective mask blank for EUV lithography, and substrate with function film for the mask blank | |
| JP2010500776A5 (OSRAM) | ||
| EP3536826B1 (fr) | Procede de fabrication d'un decor metallique sur un cadran et cadran obtenu selon ce procede | |
| TW466163B (en) | Mold for molding resin and method of forming hard film thereon | |
| JP2011501426A5 (OSRAM) | ||
| JP2004006371A (ja) | 蒸着用マスク、蒸着用マスクフレーム組立体及びこれらの製造方法 | |
| JP2010528480A (ja) | 成形によって光学素子を作製する方法、この方法により作製した光学素子、集光器および照明系 | |
| JPWO2019131506A5 (OSRAM) | ||
| WO2009083487A2 (fr) | Procédé de fabrication d'une microstructure métallique et microstructure obtenue selon ce procédé | |
| JP2008101246A (ja) | Ｅｕｖリソグラフィ用反射型マスクブランクを製造する際に使用されるスパッタリングターゲット | |
| EP3454122A1 (fr) | Procede de fabrication par technologie liga d'une microstructure metallique comportant au moins deux niveaux | |
| CN108417475B (zh) | 一种基于界面诱导生长的金属纳米结构阵列的制备方法 | |
| US7591641B2 (en) | Mold and process of production thereof | |
| JP7112470B2 (ja) | 時計構成要素を製作するための方法および前記方法に従って製造された構成要素 | |
| EP3802920B1 (fr) | Procede de fabrication d'un decor metallique sur un cadran et cadran obtenu selon ce procede | |
| KR101180372B1 (ko) | 마이크로 부품 및 금형의 제조방법 | |
| JP2004261910A (ja) | ナノ構造膜の転写金型とその製造方法 | |
| CN111041421B (zh) | 一种形状记忆合金径向梯度薄膜及其制备方法 | |
| JP2005307340A5 (OSRAM) | ||
| CH699416A2 (fr) | Procédé de fabrication de pièces métalliques multi-niveaux par la technique LIGA-UV |