JP2010515057A - 回転コンタクト部品および製造方法 - Google Patents
回転コンタクト部品および製造方法 Download PDFInfo
- Publication number
- JP2010515057A JP2010515057A JP2009544147A JP2009544147A JP2010515057A JP 2010515057 A JP2010515057 A JP 2010515057A JP 2009544147 A JP2009544147 A JP 2009544147A JP 2009544147 A JP2009544147 A JP 2009544147A JP 2010515057 A JP2010515057 A JP 2010515057A
- Authority
- JP
- Japan
- Prior art keywords
- tip
- layer
- contact component
- assembly
- members
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 239000000523 sample Substances 0.000 claims abstract description 66
- 239000000758 substrate Substances 0.000 claims abstract description 54
- 238000012360 testing method Methods 0.000 claims abstract description 34
- 239000004065 semiconductor Substances 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 29
- 238000000151 deposition Methods 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 229910052790 beryllium Inorganic materials 0.000 claims description 3
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000005382 thermal cycling Methods 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 97
- 230000008569 process Effects 0.000 description 9
- 239000004020 conductor Substances 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical group [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 238000005201 scrubbing Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- DMFGNRRURHSENX-UHFFFAOYSA-N beryllium copper Chemical compound [Be].[Cu] DMFGNRRURHSENX-UHFFFAOYSA-N 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06716—Elastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06733—Geometry aspects
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/617,394 US7851794B2 (en) | 2006-12-28 | 2006-12-28 | Rotating contact element and methods of fabrication |
| PCT/US2007/086667 WO2008082847A2 (en) | 2006-12-28 | 2007-12-06 | Rotating contact element and methods of fabrication |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010515057A true JP2010515057A (ja) | 2010-05-06 |
| JP2010515057A5 JP2010515057A5 (enExample) | 2011-02-03 |
Family
ID=39582969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009544147A Pending JP2010515057A (ja) | 2006-12-28 | 2007-12-06 | 回転コンタクト部品および製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7851794B2 (enExample) |
| EP (1) | EP2097951A2 (enExample) |
| JP (1) | JP2010515057A (enExample) |
| KR (1) | KR20090108608A (enExample) |
| CN (1) | CN101569060A (enExample) |
| TW (1) | TW200831910A (enExample) |
| WO (1) | WO2008082847A2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170064058A (ko) * | 2015-11-30 | 2017-06-09 | 삼성전자주식회사 | 프로브 카드 및 그를 포함하는 테스트 장치 |
| KR20220142312A (ko) * | 2021-04-14 | 2022-10-21 | 충화 프레시전 테스트 테크 컴퍼티 리미티드 | 프로브 카드 장치 및 스프링형 프로브 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9702904B2 (en) | 2011-03-21 | 2017-07-11 | Formfactor, Inc. | Non-linear vertical leaf spring |
| US9052342B2 (en) | 2011-09-30 | 2015-06-09 | Formfactor, Inc. | Probe with cantilevered beam having solid and hollow sections |
| JP6562896B2 (ja) * | 2016-12-22 | 2019-08-21 | 三菱電機株式会社 | 半導体装置の評価装置およびそれを用いた半導体装置の評価方法 |
| US11973301B2 (en) | 2018-09-26 | 2024-04-30 | Microfabrica Inc. | Probes having improved mechanical and/or electrical properties for making contact between electronic circuit elements and methods for making |
| US12078657B2 (en) | 2019-12-31 | 2024-09-03 | Microfabrica Inc. | Compliant pin probes with extension springs, methods for making, and methods for using |
| US12181493B2 (en) | 2018-10-26 | 2024-12-31 | Microfabrica Inc. | Compliant probes including dual independently operable probe contact elements including at least one flat extension spring, methods for making, and methods for using |
| US12000865B2 (en) | 2019-02-14 | 2024-06-04 | Microfabrica Inc. | Multi-beam vertical probes with independent arms formed of a high conductivity metal for enhancing current carrying capacity and methods for making such probes |
| US11768227B1 (en) | 2019-02-22 | 2023-09-26 | Microfabrica Inc. | Multi-layer probes having longitudinal axes and preferential probe bending axes that lie in planes that are nominally parallel to planes of probe layers |
| US11761982B1 (en) | 2019-12-31 | 2023-09-19 | Microfabrica Inc. | Probes with planar unbiased spring elements for electronic component contact and methods for making such probes |
| US11867721B1 (en) | 2019-12-31 | 2024-01-09 | Microfabrica Inc. | Probes with multiple springs, methods for making, and methods for using |
| US12196781B2 (en) | 2019-12-31 | 2025-01-14 | Microfabrica Inc. | Probes with planar unbiased spring elements for electronic component contact, methods for making such probes, and methods for using such probes |
| US12196782B2 (en) | 2019-12-31 | 2025-01-14 | Microfabrica Inc. | Probes with planar unbiased spring elements for electronic component contact, methods for making such probes, and methods for using such probes |
| US11774467B1 (en) | 2020-09-01 | 2023-10-03 | Microfabrica Inc. | Method of in situ modulation of structural material properties and/or template shape |
| US12146898B2 (en) | 2020-10-02 | 2024-11-19 | Microfabrica Inc. | Multi-beam probes with decoupled structural and current carrying beams and methods of making |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6269164U (enExample) * | 1985-10-18 | 1987-04-30 | ||
| JPH08508613A (ja) * | 1993-03-29 | 1996-09-10 | ゼネラル・データコム・インコーポレーテッド | ばね偏倚式テーパー付き接点要素 |
| JP2006511804A (ja) * | 2002-12-23 | 2006-04-06 | フォームファクター,インコーポレイテッド | 微小電子接触構造体 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US536380A (en) * | 1895-03-26 | Brake for railway-cars | ||
| US4781640A (en) * | 1985-01-24 | 1988-11-01 | Varian Associates, Inc. | Basket electrode shaping |
| US5829128A (en) * | 1993-11-16 | 1998-11-03 | Formfactor, Inc. | Method of mounting resilient contact structures to semiconductor devices |
| US4793816A (en) * | 1987-07-20 | 1988-12-27 | Industrial Electronic Hardware | Terminal protector for circuit board connector |
| US6624648B2 (en) * | 1993-11-16 | 2003-09-23 | Formfactor, Inc. | Probe card assembly |
| US6504223B1 (en) * | 1998-11-30 | 2003-01-07 | Advantest Corp. | Contact structure and production method thereof and probe contact assembly using same |
| US6970005B2 (en) * | 2000-08-24 | 2005-11-29 | Texas Instruments Incorporated | Multiple-chip probe and universal tester contact assemblage |
| US7385411B2 (en) * | 2004-08-31 | 2008-06-10 | Formfactor, Inc. | Method of designing a probe card apparatus with desired compliance characteristics |
-
2006
- 2006-12-28 US US11/617,394 patent/US7851794B2/en not_active Expired - Fee Related
-
2007
- 2007-12-03 TW TW096145879A patent/TW200831910A/zh unknown
- 2007-12-06 KR KR1020097015660A patent/KR20090108608A/ko not_active Ceased
- 2007-12-06 CN CNA200780048252XA patent/CN101569060A/zh active Pending
- 2007-12-06 JP JP2009544147A patent/JP2010515057A/ja active Pending
- 2007-12-06 EP EP07854998A patent/EP2097951A2/en not_active Withdrawn
- 2007-12-06 WO PCT/US2007/086667 patent/WO2008082847A2/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6269164U (enExample) * | 1985-10-18 | 1987-04-30 | ||
| JPH08508613A (ja) * | 1993-03-29 | 1996-09-10 | ゼネラル・データコム・インコーポレーテッド | ばね偏倚式テーパー付き接点要素 |
| JP2006511804A (ja) * | 2002-12-23 | 2006-04-06 | フォームファクター,インコーポレイテッド | 微小電子接触構造体 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170064058A (ko) * | 2015-11-30 | 2017-06-09 | 삼성전자주식회사 | 프로브 카드 및 그를 포함하는 테스트 장치 |
| KR102466151B1 (ko) | 2015-11-30 | 2022-11-15 | 삼성전자주식회사 | 프로브 카드 및 그를 포함하는 테스트 장치 |
| KR20220142312A (ko) * | 2021-04-14 | 2022-10-21 | 충화 프레시전 테스트 테크 컴퍼티 리미티드 | 프로브 카드 장치 및 스프링형 프로브 |
| KR102631577B1 (ko) | 2021-04-14 | 2024-02-01 | 충화 프레시전 테스트 테크 컴퍼티 리미티드 | 프로브 카드 장치 및 스프링형 프로브 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2008082847A3 (en) | 2008-12-31 |
| US7851794B2 (en) | 2010-12-14 |
| US20080157789A1 (en) | 2008-07-03 |
| CN101569060A (zh) | 2009-10-28 |
| KR20090108608A (ko) | 2009-10-15 |
| WO2008082847A2 (en) | 2008-07-10 |
| EP2097951A2 (en) | 2009-09-09 |
| TW200831910A (en) | 2008-08-01 |
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