JP2010511914A - ネガ型輻射線感受性組成物及び画像形成材料 - Google Patents

ネガ型輻射線感受性組成物及び画像形成材料 Download PDF

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Publication number
JP2010511914A
JP2010511914A JP2009540235A JP2009540235A JP2010511914A JP 2010511914 A JP2010511914 A JP 2010511914A JP 2009540235 A JP2009540235 A JP 2009540235A JP 2009540235 A JP2009540235 A JP 2009540235A JP 2010511914 A JP2010511914 A JP 2010511914A
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Prior art keywords
composition
radiation
vinyl
free radical
cation
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JP2009540235A
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English (en)
Japanese (ja)
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JP2010511914A5 (enExample
Inventor
エー. ベックリー,スコット
タオ,ティン
ファン,チャンビン
Original Assignee
イーストマン コダック カンパニー
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Publication of JP2010511914A publication Critical patent/JP2010511914A/ja
Publication of JP2010511914A5 publication Critical patent/JP2010511914A5/ja
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02Cover layers; Protective layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08Developable by water or the fountain solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/115Cationic or anionic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group

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  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP2009540235A 2006-12-07 2007-11-27 ネガ型輻射線感受性組成物及び画像形成材料 Pending JP2010511914A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/567,782 US7883826B2 (en) 2006-12-07 2006-12-07 Negative-working radiation-sensitive compositions and imageable materials
PCT/US2007/024386 WO2008073223A2 (en) 2006-12-07 2007-11-27 Negative-working radiation-sensitive compositions and imageable materials

Publications (2)

Publication Number Publication Date
JP2010511914A true JP2010511914A (ja) 2010-04-15
JP2010511914A5 JP2010511914A5 (enExample) 2010-10-28

Family

ID=39339879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009540235A Pending JP2010511914A (ja) 2006-12-07 2007-11-27 ネガ型輻射線感受性組成物及び画像形成材料

Country Status (5)

Country Link
US (1) US7883826B2 (enExample)
EP (1) EP2089771A2 (enExample)
JP (1) JP2010511914A (enExample)
CN (1) CN101548239B (enExample)
WO (1) WO2008073223A2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009057436A (ja) * 2007-08-31 2009-03-19 Toyo Ink Mfg Co Ltd 帯電防止ポリマーおよびその用途
JP2012068357A (ja) * 2010-09-22 2012-04-05 Eastman Kodak Co 平版印刷版原版
US9868846B2 (en) 2011-07-12 2018-01-16 Fujifilm Corporation Curable composition for imprints, patterning method and pattern

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8623586B2 (en) * 2009-02-25 2014-01-07 Gary Ganghui Teng Method for on-press developable lithographic plate utilizing light-blocking material
JP5263560B2 (ja) * 2009-08-25 2013-08-14 日産化学工業株式会社 高硬度インプリント材料
US8939080B2 (en) * 2010-11-18 2015-01-27 Eastman Kodak Company Methods of processing using silicate-free developer compositions
WO2013047228A1 (ja) * 2011-09-26 2013-04-04 富士フイルム株式会社 平版印刷版の製版方法
JP5690696B2 (ja) * 2011-09-28 2015-03-25 富士フイルム株式会社 平版印刷版の製版方法
US20150053103A1 (en) * 2013-03-06 2015-02-26 Anocoil Corporation Method of Developing a Lithographic Printing Plate Including Post Treatment

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173543A (ja) * 1984-02-20 1985-09-06 Toray Ind Inc 感光性樹脂組成物
JPH08190197A (ja) * 1995-01-10 1996-07-23 Konica Corp 感光性平版印刷版
JP2002287350A (ja) * 2001-03-28 2002-10-03 Mitsubishi Paper Mills Ltd 感光性組成物および感光性平版印刷版材料
JP2007256445A (ja) * 2006-03-22 2007-10-04 Mitsubishi Paper Mills Ltd 光重合性組成物および感光性平版印刷版材料

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766186B2 (ja) * 1985-07-02 1995-07-19 富士写真フイルム株式会社 感光性組成物
US5629354A (en) * 1995-02-28 1997-05-13 Eastman Kodak Company Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator
JPH09239943A (ja) * 1996-03-08 1997-09-16 Fuji Photo Film Co Ltd 湿し水不要平版原版
JP3824285B2 (ja) * 1997-03-14 2006-09-20 富士写真フイルム株式会社 感放射線性着色組成物
AU7764998A (en) * 1997-05-23 1998-12-11 Ciba Specialty Chemicals Holding Inc. Polyborate coinitiators for photopolymerization
JP4202589B2 (ja) 2000-10-11 2008-12-24 富士フイルム株式会社 平版印刷版原版
JP2002229203A (ja) * 2001-02-01 2002-08-14 Fuji Photo Film Co Ltd 光重合性組成物、記録材料およびボレート化合物
US7261998B2 (en) * 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
US6599676B2 (en) * 2002-01-03 2003-07-29 Kodak Polychrome Graphics Llc Process for making thermal negative printing plate
US6936384B2 (en) 2002-08-01 2005-08-30 Kodak Polychrome Graphics Llc Infrared-sensitive composition containing a metallocene derivative
US7056642B2 (en) * 2002-09-18 2006-06-06 Fuji Photo Film Co., Ltd. Method of graft polymerization and variety of materials utilizing the same as well as producing method thereof
CN1771465B (zh) * 2003-04-07 2011-02-09 东洋纺织株式会社 感光性树脂组合物、使用该组合物的感光层及感光性树脂印刷用原版
JP2005062482A (ja) 2003-08-12 2005-03-10 Fuji Photo Film Co Ltd 重合性組成物及びそれを用いた記録材料
US7250245B2 (en) * 2004-05-24 2007-07-31 Eastman Kodak Company Switchable polymer printing plates with carbon bearing ionic and steric stabilizing groups
US7189494B2 (en) * 2005-05-26 2007-03-13 Eastman Kodak Company On-press developable imageable element comprising a tetraarylborate salt
US7452638B2 (en) * 2006-09-18 2008-11-18 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
US7429445B1 (en) * 2007-03-07 2008-09-30 Eastman Kodak Company Negative-working imageable elements and methods of use

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173543A (ja) * 1984-02-20 1985-09-06 Toray Ind Inc 感光性樹脂組成物
JPH08190197A (ja) * 1995-01-10 1996-07-23 Konica Corp 感光性平版印刷版
JP2002287350A (ja) * 2001-03-28 2002-10-03 Mitsubishi Paper Mills Ltd 感光性組成物および感光性平版印刷版材料
JP2007256445A (ja) * 2006-03-22 2007-10-04 Mitsubishi Paper Mills Ltd 光重合性組成物および感光性平版印刷版材料

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009057436A (ja) * 2007-08-31 2009-03-19 Toyo Ink Mfg Co Ltd 帯電防止ポリマーおよびその用途
JP2012068357A (ja) * 2010-09-22 2012-04-05 Eastman Kodak Co 平版印刷版原版
US9868846B2 (en) 2011-07-12 2018-01-16 Fujifilm Corporation Curable composition for imprints, patterning method and pattern

Also Published As

Publication number Publication date
US7883826B2 (en) 2011-02-08
WO2008073223A3 (en) 2008-08-07
WO2008073223A2 (en) 2008-06-19
US20080138741A1 (en) 2008-06-12
EP2089771A2 (en) 2009-08-19
CN101548239B (zh) 2012-07-04
CN101548239A (zh) 2009-09-30

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