JP2010504436A5 - - Google Patents

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Publication number
JP2010504436A5
JP2010504436A5 JP2009529405A JP2009529405A JP2010504436A5 JP 2010504436 A5 JP2010504436 A5 JP 2010504436A5 JP 2009529405 A JP2009529405 A JP 2009529405A JP 2009529405 A JP2009529405 A JP 2009529405A JP 2010504436 A5 JP2010504436 A5 JP 2010504436A5
Authority
JP
Japan
Prior art keywords
chamber
coupled
process gas
filter
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2009529405A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010504436A (ja
Filing date
Publication date
Priority claimed from US11/565,400 external-priority patent/US20080072929A1/en
Priority claimed from US11/846,359 external-priority patent/US20080072822A1/en
Application filed filed Critical
Priority claimed from PCT/US2007/079084 external-priority patent/WO2008036849A2/en
Publication of JP2010504436A publication Critical patent/JP2010504436A/ja
Publication of JP2010504436A5 publication Critical patent/JP2010504436A5/ja
Withdrawn legal-status Critical Current

Links

JP2009529405A 2006-09-22 2007-09-20 希釈ガスを再循環させるための粒子トラップ／フィルタを含むシステム及び方法 Withdrawn JP2010504436A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US82671806P 2006-09-22 2006-09-22
US11/565,400 US20080072929A1 (en) 2006-09-22 2006-11-30 Dilution gas recirculation
US11/846,359 US20080072822A1 (en) 2006-09-22 2007-08-28 System and method including a particle trap/filter for recirculating a dilution gas
PCT/US2007/079084 WO2008036849A2 (en) 2006-09-22 2007-09-20 Particle trap / filter for recirculating a dilution gas in a plasma enhanced chemical vapor deposition system

Publications (2)

Publication Number Publication Date
JP2010504436A JP2010504436A (ja) 2010-02-12
JP2010504436A5 true JP2010504436A5 (enExample) 2010-11-11

Family

ID=39201842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009529405A Withdrawn JP2010504436A (ja) 2006-09-22 2007-09-20 希釈ガスを再循環させるための粒子トラップ／フィルタを含むシステム及び方法

Country Status (5)

Country Link
EP (1) EP2082077A2 (enExample)
JP (1) JP2010504436A (enExample)
KR (1) KR20090058027A (enExample)
TW (1) TW200821402A (enExample)
WO (1) WO2008036849A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101000296B1 (ko) * 2008-09-10 2010-12-13 세메스 주식회사 기액 분리 장치 및 이를 포함하는 기판 처리 장치
TW201216397A (en) 2010-07-30 2012-04-16 Jx Nippon Oil & Amp Energy Corp Discharge gas treating system
GB2489975A (en) * 2011-04-14 2012-10-17 Edwards Ltd Vacuum pumping system
JP5598454B2 (ja) * 2011-10-20 2014-10-01 信越半導体株式会社 有害物除去装置
KR102062317B1 (ko) * 2013-04-24 2020-01-06 삼성디스플레이 주식회사 가스 정제 장치 및 방법
US10395918B2 (en) 2015-05-22 2019-08-27 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system for controlling plasma in semiconductor fabrication
CN111430281B (zh) * 2020-05-25 2023-03-31 中国科学院微电子研究所 一种反应腔室、反应腔室的控制方法及半导体加工设备

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6206970B1 (en) * 1997-09-03 2001-03-27 Micron Technology, Inc. Semiconductor wafer processor, semiconductor processor gas filtering system and semiconductor processing methods
US6206971B1 (en) * 1999-03-29 2001-03-27 Applied Materials, Inc. Integrated temperature controlled exhaust and cold trap assembly

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